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9040935 Blanking apparatus, drawing apparatus, and method of manufacturing article  
The present invention provides a blanking apparatus comprising a plurality of blankers configured to respectively blank a plurality of beams with respect to a target position on an object, and a...
9040942 Electron beam lithography with linear column array and rotary stage  
One embodiment relates to an apparatus for electron beam lithography which includes a linear array of reflection electron beam lithography columns and a rotary stage. Each column is separately...
9040937 Charged particle beam apparatus  
In a pattern inspection of a semiconductor circuit, to specify a cause of a process defect, not only a distribution on and across wafer of the number of defects but also more detailed, that is,...
9035269 Control module for an ion implanter  
A control module for an ion implanter having a power supply, the power supply comprising: an electricity generator HT having its positive pole connected to ground; a first switch SW1 having its...
9029810 Using wafer geometry to improve scanner correction effectiveness for overlay control  
Systems and methods for providing improved scanner corrections are disclosed. Scanner corrections provided in accordance with the present disclosure may be referred to as wafer geometry aware...
9029809 Movable microchamber system with gas curtain  
A movable microchamber system with a gas curtain is disclosed. The microchamber system has a top member with a light-access feature and a stage assembly that supports a substrate to be processed....
9024281 Method for dual energy implantation for ultra-shallow junction formation of MOS devices  
An apparatus for implanting ions of a selected species into a semiconductor wafer includes an ion source, an accelerator, and an magnetic structure. The ion source is configured to generate an ion...
9025130 Method and apparatus for maintaining depth of focus  
A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum...
9012867 Ion sources, systems and methods  
Ion sources, systems and methods are disclosed.
9012873 Treatment planning system, device for calculating a scanning path and particle therapy system  
In a particle therapy treatment planning system for creating treatment plan data, the movement of a target (patient's affected area) is extracted from plural tomography images of the target, and...
9006692 Apparatus and techniques for controlling ion implantation uniformity  
A system to control an ion beam in an ion implanter includes a detector to perform a plurality of beam current measurements of the ion beam along a first direction perpendicular to a direction of...
9006691 Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block  
A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in...
9001387 Drawing apparatus, data processing method, and method of manufacturing article that transform partially overlapping regions using different transformation rules  
A drawing apparatus performs drawing on a first partial region and a second partial region. The first and second partial regions having an overlap region in which the first and second partial...
8993982 Switchable ion gun with improved gas inlet arrangement  
A switchable ion gun switchable between a cluster mode setting for producing an ion beam substantially comprising ionised gas clusters and an atomic mode setting for producing an ion beam...
8993985 Drawing apparatus and method of manufacturing article  
The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality...
8987691 Ion implanter and ion implant method thereof  
An ion implanter and an ion implant method are disclosed. Essentially, the wafer is moved along one direction and an aperture mechanism having an aperture is moved along another direction, so that...
8987683 Charged particle beam drawing apparatus and charged particle beam drawing method  
A charged particle beam drawing apparatus according to one embodiment of the present invention comprises a load lock chamber provided for introducing a target object from the outside and capable...
8981321 Charged-particle beam exposure apparatus and method of manufacturing article  
A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate...
8981322 Multiple nozzle gas cluster ion beam system  
Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of...
8975603 Systems and methods for plasma doping microfeature workpieces  
Systems and methods for plasma doping microfeature workpieces are disclosed herein. In one embodiment, a method of implanting boron ions into a region of a workpiece includes generating a plasma...
8975601 Method and apparatus for electron beam lithography  
A method of manufacturing a wafer with an integrated circuit (IC) layout includes receiving a first plurality of pixels, wherein each of the pixels corresponds to a portion of the IC layout and...
8969836 Method and apparatus for electron beam lithography  
A system using an energy beam to expose patterns on a wafer includes first mirror elements, a multiplexer element, and second mirror elements. The first and second mirror elements are dynamically...
8969835 Particle beam system including a supply of process gas to a processing location  
A system for supplying a process gas to a processing location of a particle beam system is disclosed. The system for supplying the processing gas includes a gas reservoir, a gas conduit, a pipe...
8969837 Multi charged particle beam writing method, and multi charged particle beam writing apparatus  
A multi charged particle beam writing method includes dividing a maximum irradiation time per a shot into a digit number of first irradiation time periods, each of which is calculated by...
8970509 Touch panel and liquid crystal display device including the same  
A touch panel includes a plurality of first sensors disposed on a substrate, the plurality of first sensors including a plurality of first electrodes spaced from one another in a first direction...
8963110 Continuous generation of extreme ultraviolet light  
The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots...
8963337 Thin wafer support assembly  
A semiconductor wafer assembly formed by bonding a support wafer to a thin wafer using a double-sided bonding release tape. The support wafer provides support for the thin target wafer such that...
8952344 Techniques for processing photoresist features using ions  
A method of treating a substrate includes directing first ions over a first range of angles to one or more photoresist features disposed on the substrate, the first ions effective to generate an...
8946627 Three-dimensional mapping using scanning electron microscope images  
A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are...
8946631 Testing apparatus using charged particles and device manufacturing method using the testing apparatus  
A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching...
8941891 Organic light emitting display device and driving method thereof  
An organic light emitting diode (OLED) display is disclosed. One aspect includes a pixel unit including a plurality of pixels formed at portions at which scanning lines and data lines intersect...
8941085 Electron beam lithography systems and methods including time division multiplex loading  
The present disclosure provides a systems and methods for e-beam lithography. One system includes an electron source operable to produce a beam and an array of pixels operable to pattern the beam....
8941336 Optical characterization systems employing compact synchrotron radiation sources  
A compact synchrotron radiation source includes an electron beam generator, an electron storage ring, one or more wiggler insertion devices disposed along one or more straight sections of the...
8937003 Technique for ion implanting a target  
A technique for ion implanting a target is disclosed. In accordance with one exemplary embodiment, the technique may be realized as a method for ion implanting a target, the method comprising:...
8937289 High heat load optics with vibration isolated hoses in an extreme ultraviolet lithography system  
Methods and apparatus for reducing vibrations in an extreme ultraviolet (EUV) lithography system associated with the cooling of mirrors are described. According to one aspect of the present...
8933424 Method for measuring transverse beam intensity distribution  
An ion implantation system and method are provided where an ion source generates an ion and a mass analyzer mass analyzes the ion beam. A beam profiling apparatus translates through the ion beam...
8933423 Charged particle beam device and sample production method  
Provided is a technique to perform FIB milling, in spite of its sample dependency, effectively into a desired shape without influences of individual differences among operators. A charged particle...
8933422 Charged particle beam device  
The objective of the present invention is to provide a charged particle beam device such that a tip part can be effectually maintained in a clean state, while the frequency of valve body...
8933400 Inspection or observation apparatus and sample inspection or observation method  
Provided is an inspection apparatus or observation apparatus enabling appropriate inspection or observation of a sample in an easy-to-use manner, using a charged-particle technique and an optical...
8921783 Method of collecting and processing electron diffraction data  
A method of using electron diffraction to obtain PDFs from crystalline, nanocrystalline, and amorphous inorganic, organic, and organometallic compound.
8921786 Charged particle beam apparatus  
Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant...
8921812 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle  
A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement...
8921811 High pressure charged particle beam system  
The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include...
8916840 Lithography apparatus, and article manufacturing method  
A lithography apparatus includes a deflector configured to deflect the charged particle beam to scan the charged particle beam on the substrate in a scan direction; a detector including a shield...
8916837 Charged particle lithography system with intermediate chamber  
A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a source for generating a charged particle beam, a first chamber housing the source, a...
8916796 Method for depositing and curing nanoparticle-based ink  
An apparatus for forming a pattern of a nanoparticle-based ink on a substrate has a printing apparatus that is energizable to deposit the nanoparticle-based ink in a pattern on a surface of the...
8912616 Device for detecting electromagnetic radiation comprising a diffusion junction and a resonant grating in a single layer  
A photodiode device including a photosensitive diffusion junction within a single layer. The photodiode device further includes a resonant grating located within the single layer. The...
8912513 Charged particle beam writing apparatus and charged particle beam writing method  
A charged particle beam writing apparatus according to an embodiment, includes a laser displacement meter configured to measure a position of a substrate to be written; a correction unit...
8907306 Multi charged particle beam writing apparatus and multi charged particle beam writing method  
In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form...
8907278 Charged particle beam applied apparatus, and irradiation method  
Provided is a charged particle beam applied apparatus for observing a sample, provided with: a beam-forming section that forms a plurality of charged particle beams on a sample; an energy control...