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8183543 |
Multi-beam source
A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of...
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8183545 |
Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing
There is provided a charged particle beam writing apparatus in which data processing is optimized by automatically dividing process regions on which parallel distributed processing is performed. A...
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8183546 |
Ion implantation through laser fields
Ions are generated and directed toward a workpiece. A laser source generates a laser that is projected above the workpiece in a line. As the laser is generated, a fraction of the ions are blocked...
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8178857 |
Method and apparatus for flattening solid surface
A method for flattening a sample surface by irradiating the sample surface with a gas cluster ion beam, generates clusters of source gas in a cluster generating chamber, ionizes the generated...
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8178856 |
Charged particle beam writing apparatus and method thereof
A charged particle beam writing apparatus includes a charge amount distribution calculation unit configured to calculate a charge amount distribution which is charged by irradiation of a charged...
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8178837 |
Logical CAD navigation for device characteristics evaluation system
A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created...
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8178855 |
Variable spatial beam modulator
For use with an irradiation system including a radiation source operable to produce a radiation beam towards a target, a beam modulator including a flexible, deformable container at least partially...
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8173552 |
Method of fabricating an identification mark utilizing a liquid film assisted by a laser
Methods of forming a microelectronic structure are described. Embodiments of those methods include forming a liquid on a region of a die, and then forming an identification mark through the liquid...
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8173962 |
Pattern displacement measuring method and pattern measuring device
An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally....
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8173093 |
Iron silicide sputtering target and method for production thereof
Provided is an iron silicide sputtering target in which the oxygen as the gas component in the target is 1000 ppm or less, and a manufacturing method of such iron silicide sputtering target...
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8173978 |
Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same
Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n×m matrix. A voltage ...
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8173977 |
Laser irradiation apparatus and laser irradiation method
It is an object of the present invention to provide a laser irradiation apparatus and a laser irradiation method that increase energy intensity distribution in a region having low energy intensity...
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8168961 |
Charged particle beam masking for laser ablation micromachining
An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A...
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8168962 |
Method and apparatus for uniformly implanting a wafer with an ion beam
Initially, an ion beam is formed as an elongated shape incident on a wafer, where the shape has a length along a first axis longer than a diameter of the wafer, and a width along a second axis...
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8168960 |
Method for the production of a sample for electron microscopy
A probe (1) for electron microscopy is cut from a solid material. A sample surface (3) is configured on the same, which is treated with an ion beam (J) at a predetermined angle of incidence such...
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8168959 |
Reticle protection member, reticle carrying device, exposure device and method for carrying reticle
A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position...
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8164069 |
Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device
A light-emitting body of rapid speed of response and high light emission intensity, and an electron beam detector, scanning electron microscope and mass spectroscope using this are provided. In the...
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8158092 |
Iron silicide powder and method for production thereof
Provided is iron silicide powder in which the content of oxygen as the gas component is 1500 ppm or less, and a method of manufacturing such iron silicide powder including the steps of reducing...
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8153338 |
Apparatus and method for repairing photo mask
An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron...
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8148702 |
Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns
The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in...
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8143604 |
Insulator system for a terminal structure of an ion implantation system
An ion implantation system includes an ion source configured to provide an ion beam, a terminal structure defining a cavity, the ion source at least partially disposed within the cavity, and an...
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8143602 |
High-volume manufacturing massive e-beam maskless lithography system
The present disclosure provides a maskless lithography apparatus. The apparatus includes a plurality of writing chambers, each including: a wafer stage operable to secure a wafer to be written and...
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8143588 |
Deflector array, exposure apparatus, and device manufacturing method
A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the...
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8143603 |
Electrostatic latent image measuring device
An electrostatic latent image measuring device includes a charged particle optical system which irradiates an electron beam and charges a photoconductor sample, an exposure optical system which...
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8138486 |
Lithographic apparatus and device manufacturing method
In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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8138485 |
Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector
A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The...
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8138066 |
Dislocation engineering using a scanned laser
A method for generating patterned strained regions in a semiconductor device is provided. The method includes directing a light-emitting beam locally onto a surface portion of a semiconductor body;...
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8134134 |
Particle attachment preventing method and substrate processing apparatus
In a particle attachment preventing method in a substrate processing apparatus, an electron density control power supplied from the second power supply is adjusted such that an electron density...
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8134135 |
Multiple beam charged particle optical system
The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size...
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8130626 |
Recording apparatus, recording control signal generating apparatus, method of manufacturing imprint mold, imprint mold, and magnetic disc
Blanking by a blanking control unit is eliminated by making the tangential direction movement velocity of the substrate and the deflection velocity of the beam faster in the segment, in which the...
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8129698 |
Charged-particle beam writing method and charged-particle beam writing apparatus
A pattern density distribution and a dose distribution calculated using the pattern density distribution are multiplied by each other to calculate an exposure distribution. A fogging electron...
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8124947 |
Ion implanter having combined hybrid and double mechanical scan architecture
A system and method are provided for implanting ions into a workpiece in a plurality of operating ranges. A desired dosage of ions is provided, and a spot ion beam is formed from an ion source and...
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8124942 |
Plasma igniter for an inductively coupled plasma ion source
A focused ion beam (FIB) system is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber containing the plasma, a conducting source biasing electrode in...
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8124946 |
Post-decel magnetic energy filter for ion implantation systems
A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from...
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8115180 |
Processing system
A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second...
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8115183 |
Method for maskless particle-beam exposure
For maskless irradiating a target with a beam of energetic electrically charged particles using a pattern definition means with a plurality of apertures and imaging the apertures in the pattern...
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8110794 |
Soft ablative desorption method and system
Methods and systems are provided for the soft desorption of analyte from a sample, in which an optical beam absorbed within an irradiate zone of the sample causes vibrational excitations of a...
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8110814 |
Ion sources, systems and methods
Ion sources, systems and methods are disclosed.
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8110813 |
Charged particle optical system comprising an electrostatic deflector
A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The...
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8101927 |
Masking apparatus for an ion implanter
A masking apparatus includes a mask positioned upstream of a target positioned for treatment with ions. The mask is sized relative to the target to cause a first half of the target to be treated...
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8101928 |
Deflection signal compensation for charged particle beam
Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals...
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8101925 |
Installation and method of nanofabrication
Nanofabrication installation comprising: a specimen holder, for holding a specimen; a mask, having a through-opening between the upper and lower faces of the mask, for letting charged particles...
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8097866 |
Apparatus for measuring beam characteristics and a method thereof
An apparatus and a method for detecting particle beam characteristics are disclosed. In one embodiment, the apparatus may have a body including a first end and second end and at least one detector...
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8097846 |
Metrology and 3D reconstruction of devices in a wafer
A method for measuring three-dimensional devices in a wafer comprises the step of obtaining a plurality of cross-sectional images of a corresponding plurality of three-dimensional devices in the...
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8097092 |
Method of cleaning and after treatment of optical surfaces in an irradiation unit
The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting...
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8097860 |
Multiple nozzle gas cluster ion beam processing system and method of operating
A gas cluster ion beam (GCIB) processing system using multiple nozzles for forming and emitting at least one GCIB and methods of operating thereof are described. The GCIB processing system may be...
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8094288 |
Lithographic apparatus and device manufacturing method
A lithographic apparatus includes an illumination system configured to transmit a beam of radiation, the beam of radiation comprising desired radiation having a predetermined wavelength or a...
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8092641 |
System and method for removing organic residue from a charged particle beam system
A system and method for removing an organic residue from a charged particle beam system includes a conduit that is coupled to the column and is for adding oxygen to the column. A heater is coupled...
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8094298 |
Method for detecting particles and defects and inspection equipment thereof
A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate...
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8089051 |
Electron reflector with multiple reflective modes
One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is...
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