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7391039 |
Semiconductor processing method and system
A secondary electron image generated by an electron beam is detected by a secondary electron/secondary ion detector while a silicon substrate is etched by a focused ion beam from a back surface of...
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7391038 |
Technique for isocentric ion beam scanning
A technique for isocentric ion beam scanning is disclosed. In one particular exemplary embodiment, the technique may be realized by an apparatus for isocentric ion beam scanning. The apparatus may...
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7388943 |
Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus
A method of making a gap between first and second objects have a predetermined value includes steps of introducing light to an entry window on the first object, detecting an intensity of light from...
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7388214 |
Charged-particle beam exposure apparatus and method
A charged particle beam exposure apparatus which splits a charged-particle beam from a charged-particle beam source into a plurality of charged-particle beams by a plurality of apertures formed in...
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7388213 |
Method of registering a blank substrate to a pattern generating particle beam apparatus and of correcting alignment during pattern generation
We have developed a method of registration of a particle beam to internal alignment targets present within photoresist areas which are to be imaged. The method does not affect the photoresist, so...
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7388201 |
Radiation detector having coated nanostructure and method
A radiation detector has an electron emitter that includes a coated nanostructure on a support. The nanostructure can include a plurality of nanoneedles. A nanoneedle is a shaft tapering from a...
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7385212 |
Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus
A light source unit of EUV light is provided as a light source unit comprising a plasma light source for emitting EUV light, a collective mirror which has a reflecting surface of an ellipsoid of...
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7385183 |
Substrate processing apparatus using neutralized beam and method thereof
In a substrate processing apparatus using a neutralized beam and a method thereof, the substrate processing apparatus includes: an ion source for emitting an ion beam at an emitting angle;...
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7381976 |
Monochromatic fluid treatment systems
Methods, systems and apparatus for photo-processing of fluids, particularly complex fluids, such as blood products, pharmaceuticals, injectables and vaccines, are provided. The disclosed methods...
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7377228 |
System for and method of gas cluster ion beam processing
System and method of gas-cluster ion beam processing is realized by incorporating improved beam and workpiece neutralizing components. Larger GCIB current transport is enabled by low energy...
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7375355 |
Ribbon beam ion implanter cluster tool
An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are...
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7375352 |
Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope
In order to make it possible to improve throughput of AFM scratch processing, enable correction of small defects in clear defect correction with a high degree of precision, and enable correction in...
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7375351 |
Micro-column electron beam apparatus
Provided is a micro-column electron beam apparatus including: a base; an electron lens bracket on which an electron lens module can be fixed, mounted in a central portion of the base; an electron...
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7375327 |
Method and device for measuring quantity of wear
A method and device to accurately obtain very small quantity of wear of the order of nanometers of a protective film on the surface of a sliding member. A quantity of wear on the surface of a...
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7372052 |
Electron beam method and apparatus for reducing or patterning the birefringence of halogenated optical materials
A controlled electron beam and heat will decrease the birefringence of a halogenated optical material under tensile stress. The electron beam and heat irradiation will occur in a chamber under near...
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7372048 |
Source multiplexing in lithography
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a...
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7368740 |
Configuration management and retrieval system for proton beam therapy system
In a complex, multi-processor software controlled system, such as proton beam therapy system (PBTS), it may be important to provide treatment configurable parameters that are easily modified by an...
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7368738 |
Advanced pattern definition for particle-beam exposure
In a pattern definition device for use in a particle-beam exposure apparatus a plurality of blanking openings ( 910 ) are arranged within a pattern definition field (bf) composed of a plurality of...
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7368735 |
Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method
Drawing-data creating method includes selecting charged beam drawing-apparatus dividing drawing area into main fields, subfields and unit fields (U-fields), dividing design data (D-data)...
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7368731 |
Method and apparatus which enable high resolution particle beam profile measurement
The PSF for a metrology array for high resolution particle beam profile measurement has been improved by improving five major elements of the metrology array. While improvement in each of the five...
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7368730 |
Weathering apparatus with UV radiation sources and radiation sensors containing a double-calibrated UV sensor
Weathering apparatus with UV radiation sources and radiation sensors containing a double-calibrated UV sensor A weathering apparatus has one or more UV radiation sources ( 2 ) and one or more first...
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7365347 |
Ion implantation apparatus for use in manufacturing of semiconductor device
Disclosed herein is an ion implantation apparatus for use in manufacturing of a semiconductor device, which has a software program including an option for selecting a manipulator, enabling a time...
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7365341 |
Gas cluster ion beam emitting apparatus and method for ionization of gas cluster
An emitting apparatus 50 has a gas cluster generation chamber 2 and a nozzle 3 as means for generating a gas cluster and emitting the gas cluster to a processing object 10 . A group of gas...
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7365325 |
Method and apparatus for observing a specimen
A method and device for observing a specimen in which an electron beam is irradiated and scanned from an oblique direction, onto a surface of a calibration substrate on which a pattern with a known...
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7365324 |
Testing apparatus using charged particles and device manufacturing method using the testing apparatus
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover...
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7365320 |
Methods and systems for process monitoring using x-ray emission
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions include a system and method for process monitoring that analyze...
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7362454 |
Method and system for measuring overcoat layer thickness on a thin film disk
A method for measuring the thickness of a thin film disk overcoat layer includes radiating x-rays on a thin film disk comprising at least one base layer and an overcoat layer, collecting...
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7361913 |
Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control
An ion implanter includes a source of a stationary, planar ion beam, a set of beamline components that steer the ion beam along a normal beam path as determined by first operating parameter values,...
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7361909 |
Method and apparatus for correcting drift during automated FIB processing
A method and apparatus for correcting drift of the beam irradiation position during automated FIB (focused ion beam) processing with a reference image-setting unit, an image read-in unit for...
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7358510 |
Ion implanter with variable scan frequency
An ion implanter includes an ion beam generator configured to generate an ion beam, a scanner configured to scan the ion beam in at least one direction at a scan frequency, and a controller. The...
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7358507 |
Liquid removal in a method and device for irradiating spots on a layer
For irradiating a layer ( 3 ) a radiation beam ( 7 ) is directed and focused to a spot ( 11 ) on the layer ( 3 ), relative movement of the layer ( 3 ) relative to the optical element ( 59 ) is...
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7358495 |
Standard reference for metrology and calibration method of electron-beam metrology system using the same
An electron-beam metrology system includes a specimen stage to mount a specimen on which a device pattern is formed, electron optics to radiate the device pattern with an electron-beam, a secondary...
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7358493 |
Method and apparatus for automated beam optimization in a scanning electron microscope
A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM)....
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7358479 |
Method and computed tomography gantry for measurement of rotation angle of rotor
In a gantry for an x-ray computed tomography apparatus with a rotor and a stator and a device for measurement of the rotation angle as well as a method for measurement of the rotation angle, a disc...
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7355192 |
Adjustable suspension assembly for a collimating lattice
According to one aspect of the invention a plasma-based substrate processing apparatus comprises a collimator holding device, which efficiently and accurately positions a collimator over a...
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7354504 |
Dielectric profile controlled microwave sterilization system
A dielectric profiler establishes a dielectric profile of microwave characteristics for identifying, sterilizing or inactivating a target material prior to performing a microwave irradiation event...
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7353722 |
Contactless measurement of the surface temperature of naturally or artificially weathered samples
A holding frame ( 2 ) is mounted in a weathering chamber ( 1 ) of a weathering tester so that it can be rotated around a xenon radiation source ( 3 ), which is located on the cylinder or rotation...
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7351988 |
Beam allocation apparatus and beam allocation method for medical particle accelerators
The invention relates to a beam allocation apparatus ( 21 ) for medical particle accelerators and also to a beam allocation method. This beam allocation apparatus ( 21 ) should manage a plurality...
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7351987 |
Irradiation system with ion beam
An irradiation system comprises a beam generation source, a mass analysis device, a beam transformer, a deflector for scanning which swings the beam reciprocally, a beam parallelizing device, an...
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7351983 |
Focused ion beam system
A focused ion beam (FIB) system has an ion beam from an ion source, a condenser lens, a current-limiting aperture, an electrostatic angular aperture control lens, an electrostatic objective lens,...
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7351374 |
Surface plasmon enhanced illumination apparatus having non-periodic resonance configurations
An apparatus configured to generate surface plasmon enhanced radiation comprises a metal film having first and second surfaces, and one or more resonance configurations formed in the metal film. An...
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7349517 |
System for measuring burn-out of fuel elements of a high-temperature reactor
The burnout of a fuel element in a reactor is determined by first transferring a fuel element from a reactor to a measuring position and then subjecting the transferred fuel element at the position...
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7348582 |
Light source apparatus and exposure apparatus having the same
A light source apparatus for irradiating a laser light onto a target, for generating plasma, and for producing light from the plasma, said light source apparatus includes a first detection part for...
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7348555 |
Apparatus and method for irradiating electron beam
An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and...
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7345291 |
Device for irradiation therapy with charged particles
The present invention is related to a device for irradiating a patient with a charged particle beam, comprising a number of beam channels attached to a vertical wall, wherein a deflection magnet is...
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7345290 |
Lens array for electron beam lithography tool
A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a...
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7342241 |
Method and apparatus for electron-beam lithography
The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric...
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7342238 |
Systems, control subsystems, and methods for projecting an electron beam onto a specimen
Systems, control subsystems, and methods for projecting an electron beam onto a specimen are provided. One system includes a stage configured to move the specimen with a non-uniform velocity. The...
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7339179 |
Technique for providing a segmented electrostatic lens in an ion implanter
A technique for providing a segmented electrostatic lens in an ion implanter is disclosed. In one particular exemplary embodiment, the technique may be realized as an electrostatic lens for use in...
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7332731 |
Radiation system and lithographic apparatus
A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a...
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