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7638779 |
Medical radiotherapy assembly
The invention relates to a radiotherapy assembly comprising a particle emitter ( 2 ) with an exit window ( 4 ) for a fixed particle stream ( 6 ) and a patient support device ( 16 ) comprising a...
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7619207 |
Lithographic apparatus and device manufacturing method
The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object...
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7619234 |
Ultraviolet monitoring system
An ultraviolet radiation emission unit includes a housing and an aperture located on the housing. A radiation source includes a light emitting diode configured to emit radiation having a wavelength...
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7612347 |
Charged particle beam apparatus and charged particle beam resolution measurement method
A charged particle beam apparatus in accordance with one preferred form of this invention includes an irradiation unit for irradiating a charged particle beam, an instrumentation unit which...
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7608842 |
Driving scanning fiber devices with variable frequency drive signals
Methods of moving or vibrating cantilevered optical fibers of scanning fiber devices are disclosed. In one aspect, a method may include vibrating the cantilevered optical fiber at an initial...
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7605381 |
Charged particle beam alignment method and charged particle beam apparatus
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of...
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7598504 |
Writing error diagnosis method for charged particle beam photolithography apparatus and charged particle beam photolithography apparatus
A writing error diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which can specify an error cause within a short period of time in...
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7595482 |
Standard component for length measurement, method for producing the same, and electron beam metrology system using the same
A standard component for length measurement includes a first diffraction grating and a second diffraction grating. Each of components of the second diffraction grating is disposed between...
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7595488 |
Method and apparatus for specifying working position on a sample and method of working the sample
Techniques for specifying an observing or working position of a sample are provided. Digitized data of a sample is obtained and stored in a 1st storage device. A 1st display area displays an image...
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7592604 |
Charged particle beam apparatus
The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 ...
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7589335 |
Charged-particle beam pattern writing method and apparatus and software program for use therein
A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere...
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7573049 |
Wafer alignment method for dual beam system
A gradient charged particle beam apparatus capable of moving highly accurately to a specific position by eliminating influences of warp inside a wafer surface is provided. A portion 46 having a...
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7569840 |
Alignment method of a laser beam processing machine
An alignment method of a laser beam processing machine comprising a chuck table, a laser beam application means having a condenser for applying a laser beam to the workpiece held on the chuck...
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7566886 |
Throughput enhancement for scanned beam ion implanters
An ion implantation system that optimizes productivity that includes an ion generator configured to implant ions into a workpiece by scanning the ions along an axis in a first direction, a movable...
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7566882 |
Reflection lithography using rotating platter
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
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7550697 |
Systems and methods for boresight adapters
Boresighting systems and methods are disclosed. In one embodiment, an assembly adapted for boresighting a launch system includes first and second elongated members adapted to be coupled to the...
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7550747 |
Parallel electron beam lithography stamp (PEBLS)
An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed and patterned for use as a lithographic stamp. The spacing and/or arrangement of the nanotips...
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7541600 |
Lithographic and measurement techniques using the optical properties of biaxial crystals
A method and apparatus for accurately retrieving the position of an optical feature. The method uses the optical properties of biaxial crystals to conically refract the optical feature and...
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7542546 |
Sample mounts for microcrystal crystallography
Sample mounts ( 10 ) for mounting microcrystals of biological macromolecules for X-ray crystallography are prepared by using patterned thin polyimide films ( 12 ) that have curvature imparted...
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7535001 |
Method and system for focusing a charged particle beam
A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample...
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7531810 |
Integrated half-beam profile measurement and polar profile for circular radiation field symmetry assessment
A method for routine monitoring and quality assurance of field asymmetry of high energy circular radiation beam producing equipment. The quality assurance process of field symmetry for devices such...
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7530795 |
Fluid control mechanism
A fluid control mechanism includes a laser irradiation control unit to control irradiation of a light beam generated by a laser generation unit, and a liquid tank, having at least one liquid...
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7528393 |
Charged particle beam processing apparatus
A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage...
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7528391 |
Techniques for reducing contamination during ion implantation
Techniques for reducing contamination during ion implantation is disclosed. In one particular exemplary embodiment, the techniques may be realized by an apparatus for reducing contamination during...
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7521697 |
Method for fabricating semiconductor device and equipment for fabricating the same
A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is...
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7511286 |
Image-based flat panel alignment
Some embodiments include determination of a first misalignment between an imaging device and an axis of a radiation beam emitted from a treatment head, determination of a rotational misalignment...
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7498065 |
UV printing and curing of CDs, DVDs, Golf Balls And Other Products
A special method is provided for more uniformly and quickly curing products with a scratch-resistant UV curable coating or UV curable printing thereon, such as for CDs, DVDs, golf balls, golf tees,...
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7498590 |
Scan pattern for an ion implanter
An ion implanter includes an ion beam generator configured to generate an ion beam and direct the ion beam towards a workpiece, wherein relative motion between the ion beam and the workpiece...
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7498591 |
Critical dimension effects correction in raster pattern generator
A method for generating a flash. The method includes computing dose correction multipliers taking into account fogging scattering effects, backscattering effects and fast secondary scattering...
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7495216 |
Electron beam apparatus for work function measurements
The inventive apparatus measures workfunction values using deflection of an electron beam without direct contact of the electron beam with the sample surface. The apparatus, mounted within a vacuum...
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7488956 |
Support and positioning system for miniature radioactive sources by aerodynamic levitation and application to a device for continuous characterisation of prostate implants
The invention relates to a support and positioning system for at least one miniaturized element in the form of a cylinder. The system comprises a tube comprising an upper part, a median part and a...
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7479644 |
Ion beam diagnostics
This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam...
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7476879 |
Placement effects correction in raster pattern generator
A method for generating a charged particle beam flash. The method includes computing an array of dose correction multipliers, based, at least in part, on a resist sensitivity correction factor, and...
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7470919 |
Substrate support assembly with thermal isolating plate
Embodiments of the invention generally provide a substrate support assembly. In one embodiment, a substrate support assembly includes a substrate support plate, a thermal regulating plate coupled...
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7462846 |
Apparatus for measuring a position of an ion beam profiler and a method for its use
In an embodiment, an ion beam profiler center measuring apparatus is releasably mounted to the ion beam profiler and measures a center position of an ion beam profiler using a laser beam. Accurate...
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7462828 |
Inspection method and inspection system using charged particle beam
In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary...
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7459701 |
Stage apparatus, lithographic apparatus and device manufacturing method
A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing...
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7459699 |
Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method
A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the...
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7456414 |
Beam re-registration system and method
A beam re-registration system and method for error correction of a particle or other beam are disclosed. The beam re-registration system and method may include a particle or other beam, a stage...
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7453070 |
Methods and apparatus for beam density measurement in two dimensions
A beam density measurement system includes a shield, a beam sensor, and an actuator. The beam sensor is positioned downstream from the shield in a direction of travel of a beam. The beam sensor is...
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7453077 |
EUV light source
An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced...
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7449699 |
Method and apparatus for creating a topography at a surface
Methods and apparatus whereby an optical interferometer is utilized to monitor and provide feedback control to an integrated energetic particle column, to create desired topographies, including the...
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7442946 |
Nonuniform ion implantation apparatus and method using a wide beam
A nonuniform ion implantation apparatus comprises a wide ion beam generator for generating a wide ion beam including a plurality of wide ion beams irradiated on at least two sections among a...
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7439525 |
Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus
A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system,...
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7439527 |
Ion beam irradiation apparatus
Three axes that are orthogonal to each other at one point are taken as an X-axis, a Y-axis and a Z-axis. An irradiation angle setting motor holds a holder, and sets an irradiation angle θ of an...
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7435959 |
Microstructured pattern inspection method
The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the...
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7432515 |
Charged particle beam lithography apparatus and method
A charged particle beam lithography apparatus includes a charged particle beam generation source; a charged particle beam forming portion through which the charged particle beam is transmitted; a...
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7429733 |
Method and sample for radiation microscopy including a particle beam channel formed in the sample source
A method and sample for radiation microscopy include a sample source that includes an area of interest, an outer side of a sample formed in the sample source adjacent to the area of interest, an...
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7425713 |
Synchronous raster scanning lithographic system
A multi-beam synchronous raster scanning lithography system includes a processor that generates electrical signals representing a desired exposure pattern at an output. A multi-beam source of...
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7423266 |
Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus
In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image...
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