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7626179 |
Electron beam induced resonance
We describe an ultra-small structure that produces visible light of varying frequency, from a single metallic layer. In one example, a row of metallic posts are etched or plated on a substrate...
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7608838 |
Electron optical component
An electron optical component used to improve the spatial resolution in magnetic projection electron lenses or other electron optical devices by filtering the cyclotron orbit radii of electron...
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7598504 |
Writing error diagnosis method for charged particle beam photolithography apparatus and charged particle beam photolithography apparatus
A writing error diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which can specify an error cause within a short period of time in...
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7579604 |
Beam stop and beam tuning methods
A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the...
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7573030 |
Specimen observation method
It is an object of the present invention to provide a specimen observation method, an image processing device, and a charged-particle beam device which are preferable for selecting, based on an...
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7573053 |
Polarized pulsed front-end beam source for electron microscope
A method and an electron source are provided for generating polarized electrons for an electron microscope. The electron source includes a photoemissive cathode and a low-power drive laser. The...
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7569836 |
Transmission of data between microchips using a particle beam
A device includes first and second chips, each chip containing at least one electronic circuit. The second chip has one or more receivers. A deflection mechanism operationally connected to an...
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7566882 |
Reflection lithography using rotating platter
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
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7547899 |
Charged beam dump and particle attractor
A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end...
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7547898 |
Particulate prevention in ion implantation
A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source, a power supply operable to supply power to a filament and mirror...
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7528393 |
Charged particle beam processing apparatus
A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage...
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7528392 |
Techniques for low-temperature ion implantation
Techniques for low-temperature ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for low-temperature ion implantation. The...
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7521674 |
Method for trapping uncharged multi-pole particles
Apparatus and method for trapping uncharged multi-pole particles comprises a bound cavity for receiving the particles, and a multiplicity of electrodes coupled to the cavity for producing an...
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7511288 |
Ion implantation device
To provide an ion implantation device which suppresses diffusion of an ion beam, can finely control a scanning waveform and can obtain a large scanning angle of about 10°. In the ion implantation...
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7504642 |
Photoluminescence imaging with preferential detection of photoluminescence signals emitted from a specified material layer of a wafer or other workpiece
A method and apparatus uses photoluminescence to identify defects in one or more specified material layers of a sample. One or more filtering elements are used to filter out predetermined...
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7501625 |
Electron microscope application apparatus and sample inspection method
A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to...
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7491933 |
Electron beam apparatus
An electron beam ( 4 ) to be irradiated onto a sample ( 10 ) is two-dimensionally scanned by a scanning coil ( 9 ), and secondary electrons generated from the sample ( 10 ) by the scanning are...
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7485874 |
Apparatus for manufacturing semiconductor substrates
This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed...
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7473909 |
Use of ion induced luminescence (IIL) as feedback control for ion implantation
An ion implantation system utilizing detected ion induced luminescence as feedback control that comprises, a wafer, a spectrometer, a photodetector, an ion source generator, wherein the ion source...
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7459692 |
Electron confinement inside magnet of ion implanter
A method and apparatus are disclosed for improving space charge neutralization adjacent a magnet of an ion implanter by confining the electrons inside a magnetic region thereof to reduce electron...
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7435969 |
Method of manufacturing electrostatic deflector, and electrostatic deflector
An electrostatic deflector that can be manufactured easily and very accurately without using a member for positioning is provided. After multiple slits 81 d to 88 d have been formed in the same...
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7423276 |
Irradiation system with ion beam/charged particle beam
In an irradiation system with an ion beam/charged particle beam, an ion beam/charged particle beam is deflected by an energy filter for the energy analysis and then a wafer irradiated with the...
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7397026 |
Efficient electron transfer dissociation for mass spectrometry
The present invention relates to, inter alia, methods and apparatuses for electron transfer dissociation (ETD) that vary the internal energy of precursor ions for ETD. The methods and apparatuses...
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7397039 |
Real-time compensation of mechanical position error in pattern generation or imaging applications
Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some...
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7385203 |
Charged particle beam extraction system and method
A charged particle beam extraction system and method capable of ensuring higher safety when extraction of an ion beam is on/off-controlled during irradiation of the ion beam for treatment. The...
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7385185 |
Molecular activation for tandem mass spectroscopy
In a tandem mass spectrometer means are provided for molecular activation of ions prior to fragmentation. An embodiment of a tandem mass spectrometer comprises a first collision cell receiving...
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7375357 |
Permanent magnet radiation dose delivery enhancement
The present invention provides a plurality of permanent magnets to enhance radiation dose delivery of a high energy particle beam. The direction of the magnetic field from the permanent magnets may...
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7361916 |
Coupled nano-resonating energy emitting structures
A coupled nano-resonating structure includes a plurality of a nano-resonating substructures constructed and adapted to couple energy from a beam of charged particles into said nano-resonating...
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7348569 |
Acceleration of charged particles using spatially and temporally shaped electromagnetic radiation
A method and apparatus for accelerating charged particles are disclosed, wherein the method comprises using at least a transverse component of a temporally and spatially shaped electromagnetic...
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7317192 |
High energy polyenergetic ion selection systems, ion beam therapy systems, and ion beam treatment centers
Devices and methods are provided for generating laser-accelerated high energy polyenergetic positive ion beams that are spatially separated and modulated based on energy level. The spatially...
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7285787 |
Epi-illumination microscope and fluorescence filter set
A microscope has a light source that emits light to illuminate a sample, a first wavelength selection member that selectively transmits the light from the light source, a light splitter that...
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7282707 |
Method and apparatus for handling a sample plate for use in mass analysis
A new sample plate handling apparatus for use with mass analysis, and methods for use the same have been developed. The sampling plate handling apparatus comprises a sample plate receiver which...
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7230240 |
Enhanced scanning control of charged particle beam systems
A charged particle beam system and scanning control method capable of imaging, and possibly editing, a device under test (DUT). The charged particle beam system contains a charged particle beam...
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7173253 |
Object-moving method, object-moving apparatus, production process and produced apparatus
A method of moving an object includes a step of fixing the object to an object-moving device, a step of moving the object to a prescribed position by the object-moving device, and a step of...
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7138642 |
Ion source with controlled superposition of electrostatic and gas flow fields
Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus...
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7109481 |
Matrix-assisted laser desorption and ionization (MALDI) sample plate releasably coupled to a sample plate adapter
Embodiments of the present invention describe a MALDI (matrix-assisted laser desorption and ionization) sample plate body that includes a reusable sample plate and a sample plate adapter that are...
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7067827 |
Apparatus and method for electron beam irradiation having improved dose uniformity ratio
The present invention is related to an apparatus and method for irradiating a product package, comprising a radiation source directing a radiation beam along a beam direction towards said product...
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6894435 |
Method and device for rastering source redundancy
A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a...
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6888139 |
Electron microscope
The present invention provides an analysis of displacement by calculating the phase variance image P′ (k, l) between Fourier transformed images of paired images S 1 (n, m) and S 2 (n, m) to...
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6872942 |
High-speed inspection of flat substrates with underlying visible topology
One embodiment disclosed relates to a method for inspecting a substrate. The method includes exposing the substrate to an incident beam, inducing relative motion between the incident beam and the...
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6855926 |
Instrument and method for combined surface topography and spectroscopic analysis
A combined surface topography and spectroscopic analysis instrument comprises a scanning tunnelling microscope tip ( 12 ); and a sample carrier ( 58 ) which supports a sample ( 10 ) so that a...
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6740894 |
Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor
An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion...
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6703627 |
Real time monitor method and system for extraction electrode
A method and apparatus for monitoring an extraction electrode utilized in the implantation of charged particles (i.e., ions) on a semiconductor wafer. A signal may be generated from an encoder...
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6674073 |
Scattering target-holding mechanism and an electron spin analyzer
A scattering target constituting an electron spin analyzer is supported by a scattering target-holding member made of a conductive material from the outside of the space formed by an accelerating...
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6657204 |
Cooling of voice coil motors in lithographic projection apparatus
A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the...
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6559463 |
Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing method
A mask stage speed |Vm|, a wafer stage speed |Vw|, and an absolute value |ΔS| of a beam deflection value are determined (step 101 ). Then, it is judged whether a stripe number is even or odd...
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6542219 |
Optical correction plate, and its application in a lithographic projection apparatus
A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the...
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6528798 |
Technique for manufacturing an electrostatic element for steering a charged particle beam
A process for manufacturing an electrostatic element for steering a charged particle beam. A cylindrical, non-conductive body having a bore therethrough is assembled with a cylindrical, conductive...
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6239543 |
Electron beam plasma formation for surface chemistry
One or more electron beam tubes are arranged to direct electron beams in air or other ambient gas toward a target object. The electron beams ionize air producing a plasma or glow discharge. An...
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6222196 |
Rotatable workpiece support including cyclindrical workpiece support surfaces for an ion beam implanter
In accordance with the present invention, an ion implanter including a rotatable support disposed in an implantation chamber of an ion beam implanter for supporting a plurality of wafer workpieces....
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