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7626179 Electron beam induced resonance  
We describe an ultra-small structure that produces visible light of varying frequency, from a single metallic layer. In one example, a row of metallic posts are etched or plated on a substrate...
7608838 Electron optical component  
An electron optical component used to improve the spatial resolution in magnetic projection electron lenses or other electron optical devices by filtering the cyclotron orbit radii of electron...
7598504 Writing error diagnosis method for charged particle beam photolithography apparatus and charged particle beam photolithography apparatus  
A writing error diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which can specify an error cause within a short period of time in...
7579604 Beam stop and beam tuning methods  
A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the...
7573030 Specimen observation method  
It is an object of the present invention to provide a specimen observation method, an image processing device, and a charged-particle beam device which are preferable for selecting, based on an...
7573053 Polarized pulsed front-end beam source for electron microscope  
A method and an electron source are provided for generating polarized electrons for an electron microscope. The electron source includes a photoemissive cathode and a low-power drive laser. The...
7569836 Transmission of data between microchips using a particle beam  
A device includes first and second chips, each chip containing at least one electronic circuit. The second chip has one or more receivers. A deflection mechanism operationally connected to an...
7566882 Reflection lithography using rotating platter  
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
7547899 Charged beam dump and particle attractor  
A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end...
7547898 Particulate prevention in ion implantation  
A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source, a power supply operable to supply power to a filament and mirror...
7528393 Charged particle beam processing apparatus  
A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage...
7528392 Techniques for low-temperature ion implantation  
Techniques for low-temperature ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for low-temperature ion implantation. The...
7521674 Method for trapping uncharged multi-pole particles  
Apparatus and method for trapping uncharged multi-pole particles comprises a bound cavity for receiving the particles, and a multiplicity of electrodes coupled to the cavity for producing an...
7511288 Ion implantation device  
To provide an ion implantation device which suppresses diffusion of an ion beam, can finely control a scanning waveform and can obtain a large scanning angle of about 10°. In the ion implantation...
7504642 Photoluminescence imaging with preferential detection of photoluminescence signals emitted from a specified material layer of a wafer or other workpiece  
A method and apparatus uses photoluminescence to identify defects in one or more specified material layers of a sample. One or more filtering elements are used to filter out predetermined...
7501625 Electron microscope application apparatus and sample inspection method  
A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to...
7491933 Electron beam apparatus  
An electron beam ( 4 ) to be irradiated onto a sample ( 10 ) is two-dimensionally scanned by a scanning coil ( 9 ), and secondary electrons generated from the sample ( 10 ) by the scanning are...
7485874 Apparatus for manufacturing semiconductor substrates  
This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed...
7473909 Use of ion induced luminescence (IIL) as feedback control for ion implantation  
An ion implantation system utilizing detected ion induced luminescence as feedback control that comprises, a wafer, a spectrometer, a photodetector, an ion source generator, wherein the ion source...
7459692 Electron confinement inside magnet of ion implanter  
A method and apparatus are disclosed for improving space charge neutralization adjacent a magnet of an ion implanter by confining the electrons inside a magnetic region thereof to reduce electron...
7435969 Method of manufacturing electrostatic deflector, and electrostatic deflector  
An electrostatic deflector that can be manufactured easily and very accurately without using a member for positioning is provided. After multiple slits 81 d to 88 d have been formed in the same...
7423276 Irradiation system with ion beam/charged particle beam  
In an irradiation system with an ion beam/charged particle beam, an ion beam/charged particle beam is deflected by an energy filter for the energy analysis and then a wafer irradiated with the...
7397026 Efficient electron transfer dissociation for mass spectrometry  
The present invention relates to, inter alia, methods and apparatuses for electron transfer dissociation (ETD) that vary the internal energy of precursor ions for ETD. The methods and apparatuses...
7397039 Real-time compensation of mechanical position error in pattern generation or imaging applications  
Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some...
7385203 Charged particle beam extraction system and method  
A charged particle beam extraction system and method capable of ensuring higher safety when extraction of an ion beam is on/off-controlled during irradiation of the ion beam for treatment. The...
7385185 Molecular activation for tandem mass spectroscopy  
In a tandem mass spectrometer means are provided for molecular activation of ions prior to fragmentation. An embodiment of a tandem mass spectrometer comprises a first collision cell receiving...
7375357 Permanent magnet radiation dose delivery enhancement  
The present invention provides a plurality of permanent magnets to enhance radiation dose delivery of a high energy particle beam. The direction of the magnetic field from the permanent magnets may...
7361916 Coupled nano-resonating energy emitting structures  
A coupled nano-resonating structure includes a plurality of a nano-resonating substructures constructed and adapted to couple energy from a beam of charged particles into said nano-resonating...
7348569 Acceleration of charged particles using spatially and temporally shaped electromagnetic radiation  
A method and apparatus for accelerating charged particles are disclosed, wherein the method comprises using at least a transverse component of a temporally and spatially shaped electromagnetic...
7317192 High energy polyenergetic ion selection systems, ion beam therapy systems, and ion beam treatment centers  
Devices and methods are provided for generating laser-accelerated high energy polyenergetic positive ion beams that are spatially separated and modulated based on energy level. The spatially...
7285787 Epi-illumination microscope and fluorescence filter set  
A microscope has a light source that emits light to illuminate a sample, a first wavelength selection member that selectively transmits the light from the light source, a light splitter that...
7282707 Method and apparatus for handling a sample plate for use in mass analysis  
A new sample plate handling apparatus for use with mass analysis, and methods for use the same have been developed. The sampling plate handling apparatus comprises a sample plate receiver which...
7230240 Enhanced scanning control of charged particle beam systems  
A charged particle beam system and scanning control method capable of imaging, and possibly editing, a device under test (DUT). The charged particle beam system contains a charged particle beam...
7173253 Object-moving method, object-moving apparatus, production process and produced apparatus  
A method of moving an object includes a step of fixing the object to an object-moving device, a step of moving the object to a prescribed position by the object-moving device, and a step of...
7138642 Ion source with controlled superposition of electrostatic and gas flow fields  
Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus...
7109481 Matrix-assisted laser desorption and ionization (MALDI) sample plate releasably coupled to a sample plate adapter  
Embodiments of the present invention describe a MALDI (matrix-assisted laser desorption and ionization) sample plate body that includes a reusable sample plate and a sample plate adapter that are...
7067827 Apparatus and method for electron beam irradiation having improved dose uniformity ratio  
The present invention is related to an apparatus and method for irradiating a product package, comprising a radiation source directing a radiation beam along a beam direction towards said product...
6894435 Method and device for rastering source redundancy  
A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a...
6888139 Electron microscope  
The present invention provides an analysis of displacement by calculating the phase variance image P′ (k, l) between Fourier transformed images of paired images S 1 (n, m) and S 2 (n, m) to...
6872942 High-speed inspection of flat substrates with underlying visible topology  
One embodiment disclosed relates to a method for inspecting a substrate. The method includes exposing the substrate to an incident beam, inducing relative motion between the incident beam and the...
6855926 Instrument and method for combined surface topography and spectroscopic analysis  
A combined surface topography and spectroscopic analysis instrument comprises a scanning tunnelling microscope tip ( 12 ); and a sample carrier ( 58 ) which supports a sample ( 10 ) so that a...
6740894 Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor  
An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion...
6703627 Real time monitor method and system for extraction electrode  
A method and apparatus for monitoring an extraction electrode utilized in the implantation of charged particles (i.e., ions) on a semiconductor wafer. A signal may be generated from an encoder...
6674073 Scattering target-holding mechanism and an electron spin analyzer  
A scattering target constituting an electron spin analyzer is supported by a scattering target-holding member made of a conductive material from the outside of the space formed by an accelerating...
6657204 Cooling of voice coil motors in lithographic projection apparatus  
A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the...
6559463 Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing method  
A mask stage speed |Vm|, a wafer stage speed |Vw|, and an absolute value |ΔS| of a beam deflection value are determined (step 101 ). Then, it is judged whether a stripe number is even or odd...
6542219 Optical correction plate, and its application in a lithographic projection apparatus  
A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the...
6528798 Technique for manufacturing an electrostatic element for steering a charged particle beam  
A process for manufacturing an electrostatic element for steering a charged particle beam. A cylindrical, non-conductive body having a bore therethrough is assembled with a cylindrical, conductive...
6239543 Electron beam plasma formation for surface chemistry  
One or more electron beam tubes are arranged to direct electron beams in air or other ambient gas toward a target object. The electron beams ionize air producing a plasma or glow discharge. An...
6222196 Rotatable workpiece support including cyclindrical workpiece support surfaces for an ion beam implanter  
In accordance with the present invention, an ion implanter including a rotatable support disposed in an implantation chamber of an ion beam implanter for supporting a plurality of wafer workpieces....
Matches 1 - 50 out of 120 1 2 3 >