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8183543 |
Multi-beam source
A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of...
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8183545 |
Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing
There is provided a charged particle beam writing apparatus in which data processing is optimized by automatically dividing process regions on which parallel distributed processing is performed. A...
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8173979 |
Generating and visualizing an ion beam profile
A method for generating and visualizing an ion beam profile is provided. The method includes specifying an incidence direction of a particle beam, specifying a target region that is to be...
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8173981 |
Gantry for medical particle therapy facility
A particle therapy gantry for delivering a particle beam to a patient includes a beam tube having a curvature defining a particle beam path and a plurality of fixed field magnets sequentially...
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8168962 |
Method and apparatus for uniformly implanting a wafer with an ion beam
Initially, an ion beam is formed as an elongated shape incident on a wafer, where the shape has a length along a first axis longer than a diameter of the wafer, and a width along a second axis...
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8164066 |
Magnetic lens, method for focusing charged particles and charged particle energy analyzer
The invention provides a magnetic lens for generating a magnetic imaging field to focus charged particles emitted from a sample, the lens comprising a central pole piece and an outer pole piece...
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8164070 |
Collimator magnet for ion implantation system
A collimator magnet (CM) usable in an ion implantation system provides an exit ion beam with a large aperture, substantially parallel in one plane or orthogonal planes. The CM includes identical...
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8164068 |
Mask health monitor using a faraday probe
In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen....
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8153965 |
Apparatus and method for merging a low energy electron flow into a high energy electron flow
An apparatus for merging a low energy electron flow into a high energy electron flow may include: a high energy electron path for accommodating the high energy electron flow; and a plurality of...
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8148702 |
Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns
The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in...
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8143588 |
Deflector array, exposure apparatus, and device manufacturing method
A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the...
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8143603 |
Electrostatic latent image measuring device
An electrostatic latent image measuring device includes a charged particle optical system which irradiates an electron beam and charges a photoconductor sample, an exposure optical system which...
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8129693 |
Charged particle beam column and method of operating same
A charged particle beam column includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first...
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8115183 |
Method for maskless particle-beam exposure
For maskless irradiating a target with a beam of energetic electrically charged particles using a pattern definition means with a plurality of apertures and imaging the apertures in the pattern...
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8106358 |
Layered scanning charged particle microscope with differential pumping aperture
A scanning charged particle apparatus includes a layered charged particle beam column package; a sample holder; and a layered differential pumping aperture that assists in maintaining two different...
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8101920 |
Spin isolation apparatus, spin asymmetric material producing method, current source, and signal processing method
A spin isolation apparatus comprising a particle source for emitting particles having spins, a receiving section for receiving the particles emitted by the particle source, a magnet for separating...
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8101911 |
Method and device for improved alignment of a high brightness charged particle gun
A charged particle gun alignment assembly for emitting a charged particle beam along an optical axis of a charged particle beam device is described. The charged particle gun alignment assembly is...
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8101928 |
Deflection signal compensation for charged particle beam
Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals...
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8093564 |
Ion beam focusing lens method and apparatus used in conjunction with a charged particle cancer therapy system
The invention comprises an ion beam focusing method and apparatus used as part of an ion beam injection system, which is used in conjunction with multi-axis charged particle or proton beam...
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8089056 |
Projection lens arrangement
A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of...
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8076649 |
Charged particle beam writing apparatus and optical axis deviation correcting method for charged particle beam
A charged particle beam writing apparatus includes a stage on which a target object is placed; an emitting unit configured to emit a charged particle beam to the stage side; a blocking unit...
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8058631 |
Semiconductor manufacturing apparatus
A semiconductor manufacturing includes: an ion source and a beam line for introducing an ion beam into a target film which is formed over a wafer with an insulating film interposed therebetween; a...
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8053725 |
Beam quality in FIB systems
Applicants have found that the asymmetrical energy distribution of ions from an ion source allow chromatic aberration to be reduced by filtering ions in the low energy beam tail without...
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8053746 |
Irradiation device
The present invention relates to an irradiation device for irradiating an irradiation object with heavy charged particles at an irradiation station, comprising a particle accelerator for providing...
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8044374 |
Ion implantation apparatus
A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis...
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8039813 |
Charged particle-optical systems, methods and components
The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures...
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8030626 |
Apparatus and method for charged-particle beam writing
An average write speed M is calculated by averaging write speeds for blocks of a tentative block size La, and write speed variation σ of the blocks with respect to the average write speed M is ...
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8030625 |
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
When writing element shapes of a fine pattern on a substrate applied with a resist by scanning an electron beam thereon, ON/OFF control is performed for emitting the electron beam at a...
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8008639 |
System for processing an object
A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at...
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8003952 |
Integrated deflectors for beam alignment and blanking in charged particle columns
A charged particle beam column package includes an assembly (e.g., comprising a plurality of layers, which can have a component coupled to one of the layers), and at least one deflector between an...
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8003958 |
Apparatus and method for doping
There is proposed an apparatus for doping a material to be doped by generating plasma (ions) and accelerating it by a high voltage to form an ion current is proposed, which is particularly suitable...
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7994488 |
Low contamination, low energy beamline architecture for high current ion implantation
An ion implantation system comprising an ion source that generates an ion beam along a beam path, a mass analyzer component downstream of the ion source that performs mass analysis and angle...
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7989777 |
Method for inspecting settling time of deflection amplifier, and method for judging failure of deflection amplifier
A method for inspecting a settling time of a deflection amplifier includes setting a settling time, performing shooting a plurality of times alternately to project two patterns of different types...
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7982194 |
Single nanoparticle tracking spectroscopic microscope
A system that can maintain and track the position of a single nanoparticle in three dimensions for a prolonged period has been disclosed. The system allows for continuously imaging the particle to...
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7982192 |
Beam processing apparatus
In a beam processing apparatus including a beam scanner having a two electrodes type deflection scanning electrode, the beam scanner further includes shielding suppression electrode assemblies...
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7974804 |
Registration detection system
A registration detection system realizes both substrate-by-substrate correction and highly accurate correction of an exposure process. Therefore, the registration detection system includes: the...
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7960697 |
Electron beam apparatus
The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review. The present invent provides solution of...
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7952083 |
Ion beam system and machining method
An ion beam system includes a sample stage which holds a sample, an ion source which generates an ion beam so that the ion beam is extracted from the ion source along an extraction axis, an...
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7935947 |
Glass composition for ultraviolet light and optical device using the same
A glass composition for ultraviolet light is provided. The glass composition for ultraviolet light contains Lu, Si, and O in an amount of 99.99 weight % or more in total. The glass composition...
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7935945 |
Ion implantation method and apparatus
Using a beam current of an ion beam, and a dose amount to a substrate, and an initial value of a scan number of the substrate set to 1, a scan speed of the substrate is calculated. If the scan...
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7935946 |
Ion implantation method and apparatus
Using a beam current of an ion beam, a dose amount to a substrate, and a reference scan speed, a scan number of the substrate is calculated as an integer value in which digits after a decimal point...
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7928414 |
Charged particle beam writing apparatus and charged particle beam writing method
A charged particle beam writing apparatus includes an irradiation part configured to irradiate a charged particle beam; a first shaping aperture member having passing areas, that the charged...
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7928383 |
Charged particle system including segmented detection elements
A charged particle detector consists of a plurality independent light guide modules assembled together to form a segmented in-lens on-axis annular detector, with a center hole for allowing the...
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7928405 |
Magnetic lens assembly
A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece...
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7928404 |
Variable-ratio double-deflection beam blanker
The invention provides methods for conjugate blanking of a charged particle beam within a charged particle column using a beam blanker. The beam blanker comprises a first deflector, a second...
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7923699 |
Tracking control method and electron beam writing system
Control data for a main deflector is calculated based on position data that specifies the position of a region to be irradiated with the electron beam on the subfield, data on the number of all...
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7906761 |
Charged particle beam apparatus
A charged particle beam apparatus that can achieve both high defect-detection sensitivity and high inspection speed for a sample with various properties in a multi-beam type semiconductor...
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7902527 |
Apparatus and methods for ion beam implantation using ribbon and spot beams
An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam...
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7902521 |
Method for focusing electron beam in electron column
The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to...
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7897942 |
Dynamic tracking of wafer motion and distortion during lithography
A substrate processing apparatus and method for dynamic tracking of wafer motion and distortion during lithography are disclosed. An energetic beam may be applied to a portion of a substrate...
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