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7612353 |
Lithographic apparatus, contaminant trap, and device manufacturing method
A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The...
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7612336 |
Scanning electron microscope having a monochromator
A scanning electron microscope having a monochromator that can automatically adjust an electron beam entering the monochromator and operating conditions of the monochromator. The scanning electron...
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7612334 |
Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same
The present invention provides a standard reference component for calibration for performing magnification calibration used in the scanning electron microscope with high precision, and provides a...
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7612321 |
Optical coupling apparatus for a dual column charged particle beam tool for imaging and forming silicide in a localized manner
An optical coupling apparatus for a dual column charged particle beam tool allowing both optical imaging of an area of an integrated circuit, as well as localized heating of the integrated circuit...
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7609009 |
Linear ion accelerator
The electrode lengths of a plurality of electrodes linearly arranged in an acceleration cavity are proportional to the velocity of a traveling ion beam. Further, the electrode length is so...
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7608845 |
Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary...
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7608838 |
Electron optical component
An electron optical component used to improve the spatial resolution in magnetic projection electron lenses or other electron optical devices by filtering the cyclotron orbit radii of electron...
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7605378 |
Charged-particle beam system
There is disclosed a charged-particle beam system equipped with a higher-order aberration corrector capable of correcting fifth-order spherical aberration and third-order chromatic aberration such...
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7605377 |
On-chip reflectron and ion optics
A microelectronics apparatus comprising a substrate, a pair of grid electrodes coupled to the substrate on opposing sides of a central axis, wherein the grid electrodes are substantially parallel...
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7601969 |
Illumination condenser for a particle optical projection system
An illumination condenser for a particle optics projection system is disclosed. The illumination condenser is formed of a magnetic lens comprising a plurality of gaps. The magnetic lens is formed...
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7601968 |
Charged particle beam writing method and apparatus
A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an...
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7598504 |
Writing error diagnosis method for charged particle beam photolithography apparatus and charged particle beam photolithography apparatus
A writing error diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which can specify an error cause within a short period of time in...
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7598499 |
Charged-particle exposure apparatus
In a particle-beam projection processing apparatus a target ( 41 ) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system ( 103 ) to image a...
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7598498 |
Electric field lens and ion implanter having the same
An electric field lens includes an entrance electrode, an intermediate electrode, and an exit electrode that are arranged in a traveling direction of ion beams. The intermediate electrode is...
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7598497 |
Charged particle beam scanning method and charged particle beam apparatus
A method and an apparatus for calculating a scan signal so that the scan region becomes a scan region which is based on magnification ratio between desired magnification in a scan-line interval...
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7598496 |
Charged-particle beam system
An aberration for correcting higher-order aberrations with a relatively small number of components is by let N1 being the aberration order at a first location, S1 being the symmetry at the first...
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7598495 |
Methods and systems for trapping ion beam particles and focusing an ion beam
A focusing particle trap system for ion implantation comprising an ion beam source that generates an ion beam, a beam line assembly that receives the ion beam from the ion beam source comprising a...
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7595486 |
RF multipole ion guides for broad mass range
In a multipole rod ion guide system operated with RF voltages to collect or transmit ions, the inhomogeneity of the electric RF fields is increased in front of the ion guide rods by forming the rod...
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7592604 |
Charged particle beam apparatus
The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 ...
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7592590 |
Charged particle beam device with detection unit switch and method of operation thereof
The invention provides a charged particle beam device and a method of operation thereof. An emitter ( 2 ) emits a primary charged particle beam ( 12 ). Depending on the action of a deflection...
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7586111 |
Ion implanter having combined hybrid and double mechanical scan architecture
A system and method are provided for implanting ions into a workpiece in a plurality of operating ranges. A desired dosage of ions is provided, and a spot ion beam is formed from an ion source and...
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7586098 |
Ion stripper device made of carbon nanotubes or fullerenes
A system and method for developing a solid state stripper device is described that more effectively strips off negative carbon ions to produce positively charged carbon ions. In one embodiment the...
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7586097 |
Switching micro-resonant structures using at least one director
When using micro-resonant structures, it is possible to use the same source of charged particles to cause multiple resonant structures to emit electromagnetic radiation. This reduces the number of...
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7579605 |
Multi-purpose electrostatic lens for an ion implanter system
Multi-purpose electrostatic lens for an ion implanter. The electrostatic lens allows an ion implanter to scan, accelerate, decelerate, expand, compress, focus and parallelize an ion beam. This...
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7579604 |
Beam stop and beam tuning methods
A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the...
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7579602 |
Ion implantation with a collimator magnet and a neutral filter magnet
This disclosure describes an ion implanter having a collimator magnet that is configured to shape an ion beam. A first deceleration stage is configured to manipulate energy of the ion beam shaped...
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7576340 |
Focused ion beam processing method
There is provided a focused ion beam processing method in which damage to a workpiece is minimized when the surface of the workpiece is irradiated and processed with an ion beam. The method...
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7576339 |
Ion implantation apparatus and method for obtaining non-uniform ion implantation energy
An ion implantation apparatus includes an ion beam source for generating an ion beam; an implantation energy controller disposed on a path of the ion beam for controlling the ion implantation...
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7573051 |
Ion beam guide tube
The present invention relates to a guide tube for an ion beam in an ion implanter located adjacent a semiconductor wafer. Such guide tubes are provided to confine charged particles used for wafer...
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7573050 |
Column simultaneously focusing a particle beam and an optical beam
Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a...
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7573045 |
Plasmon wave propagation devices and methods
Nanoantennas are formed on a substrate (e.g., silicon) and generate light via interactions with a charged particle beam, where the frequency of the generated light is based in large part on the...
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7569835 |
Gating grid and method of manufacture
The present invention relates generally to grids for gating a stream of charged particles and methods for manufacturing the same. In one embodiment, the present invention relates to a...
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7569834 |
High resolution charged particle projection lens array using magnetic elements
A charged particle optic apparatus for improvement in resolution of an electrostatic, multi-beam column is disclosed. The charged particle optic apparatus includes an electrostatic lens array...
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7569833 |
Apparatus for generating a plurality of beamlets
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging...
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7566888 |
Method and system for treating an interior surface of a workpiece using a charged particle beam
A method and system of treating an interior surface on an internal cavity of a workpiece using a charged particle beam. A beam deflector surface of a beam deflector is placed within the internal...
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7566887 |
Method of reducing particle contamination for ion implanters
The present invention is directed to a beam control circuit and method used to minimize particle contamination in an ion implantation system by reducing the duty factor of the ion beam. In one...
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7566882 |
Reflection lithography using rotating platter
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
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7566873 |
High-resolution, low-distortion and high-efficiency optical coupling in detection system of electron beam apparatus
One embodiment relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a...
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7564042 |
Ion beam apparatus having plasma sheath controller
An ion beam apparatus includes a plasma chamber with a grid assembly installed at one end of the plasma chamber and a plasma sheath controller disposed between the plasma chamber and the grid...
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7564025 |
Multipole devices and methods
The present invention provides, inter alia, a multipole ion guide for moving and guiding ions, particularly in a mass spectrometer. The multipole ion guide comprises multiple rods with a resistive...
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7560717 |
Particle beam irradiation apparatus, treatment planning unit, and particle beam irradiation method
A particle beam irradiation apparatus includes a synchrotron, two scanning electromagnets, a beam delivery apparatus for outputting an ion beam extracted from the synchrotron, and an accelerator...
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7557347 |
Charged particle beam apparatus, scanning electron microscope, and sample observation method using the same
A charged particle beam apparatus for acquiring high-definition and highly contrasted observation images by detecting efficiently secondary signals without increasing aberration of the primary...
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7557343 |
Segmented rod multipole as ion processing cell
A method and apparatus for processing ions in mass spectrometry is provided. The apparatus includes an ion processing cell having segmented multipole rods and a means for admitting reactive reagent...
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7554106 |
Partial ion implantation apparatus and method using bundled beam
An ion implantation apparatus comprises an ion beam source for generating an initial ion beam, a bundled ion beam generator adapted to change the initial ion beam into a bundled ion beam based on a...
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7551358 |
Camera module having an array lens
In a camera module having an array lens, a first lens group has at least two lenses. A second lens group has a plurality of lenses corresponding to the lenses of the first lens group, the second...
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7550751 |
Ion beam scanning control methods and systems for ion implantation uniformity
One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam...
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7550740 |
Focused ION beam apparatus
A focused ion beam apparatus enables an ion beam to be focused highly accurately on a sample at the beam spot position of the case of the absence of magnetic field without causing isotope...
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7547899 |
Charged beam dump and particle attractor
A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end...
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7547898 |
Particulate prevention in ion implantation
A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source, a power supply operable to supply power to a filament and mirror...
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7547460 |
Ion implanter optimizer scan waveform retention and recovery
Methods and apparatus are provided for controlling dose uniformity in an ion implantation system. According to one embodiment of the invention, an initial scan waveform is adjusted to obtain a...
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