Match Document Document Title
8569694 Aberration-correcting dark-field electron microscopy  
A transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. An aberration corrector comprising either...
8563942 Multi-beam deflector array means with bonded electrodes  
The invention relates to a multi-beam deflector array means for use in a particle-beam exposure apparatus employing a beam of charged particles, said multi-beam deflector array means having an...
8564224 High average current, high quality pulsed electron injector  
An electron injector including an electron source and a conducting grid situated close to the electron source, one or more RF accelerating/bunching cavities operating at the same fundamental RF...
8563927 Shielding member having a charge control electrode, and a charged particle beam apparatus  
A shielding member for a charged particle beam apparatus includes a conductive substrate; and a through hole extending through the conductive substrate. The conductive substrate is comprised of a...
8563951 Exposure systems for integrated circuit fabrication  
Exposure systems include a beam generator, which is configured to irradiate source beams in a direction of an object to be exposed by the source beams, along with first and second beam shapers....
8563953 Charged particle beam writing apparatus and charged particle beam writing method  
A charged particle beam writing apparatus includes a unit calculating a total charge amount of charged particle beams irradiating each minimum deflection region in deflection regions having...
8563944 Ion beam device  
Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization...
8563954 Ion beam stabilization  
Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability.
8558196 Charged particle lithography system with aperture array cooling  
A charged particle lithography system for pattern transfer onto a target surface, comprising a beam generator for generating a plurality of beamlets, and a plurality of aperture array elements...
8558198 Beam line system of ion implanter  
A beam line system includes a hollow tube and a plurality of protruding structures. The hollow tube has an inlet and an outlet. An ion beam emitted by the ion implanter is introduced into the...
8558190 Charged particle beam column and method of operating same  
A charged particle beam system includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first...
8558191 Charged particle beam lens and charged particle beam exposure apparatus  
A charged particle beam lens includes a first electrode on a downstream side and a second electrode on an upstream side in a travelling direction of a charged particle beam. Each of the first...
8552405 Charged particle beam writing apparatus and charged particle beam writing method  
A charged particle beam writing apparatus includes a unit to calculate a gradient of a convolution amount that is calculated from a convolution operation between an area density and a distribution...
8552397 Focused ion beam device and focused ion beam processing method  
Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused...
8552377 Particle detection system  
This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and...
8546770 Charged particle beam device and sample observation method  
There is provided a charged particle beam device which has a mechanism adjusting the shape of an ionic liquid droplet to be adhered to a sample and the thickness of a film of the ionic liquid, in...
8546767 Pattern definition device with multiple multibeam array  
A multi-beam pattern definition device (102) for use in a particle-beam processing or inspection apparatus is configured to be irradiated with a beam (lp,bp) of electrically charged particles so...
8541755 Electron microscope  
An electron microscope is offered which can correct chromatic and spherical aberrations without producing residual aberrations. In this microscope, a chromatic aberration-correcting optical system...
8541756 Systems and methods for generating X-rays and neutrons using a single linear accelerator  
Systems and methods for generating X-rays and neutrons using a single linear accelerator are disclosed. Such system and methods may interrogate an object at times with X-rays and at other times...
8541757 Accelerator on a chip having a cold ion source  
An assembly includes a cold ion source and a chip. The cold ion source is fixed to the chip so that ions from the ion source can enter an acceleration channel in the chip. In one specific example,...
8536538 Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments  
One embodiment relates to a focused electron beam imaging apparatus. The apparatus includes an electron beam column, an electron source, a gun lens, a pre-scanning deflector, a main scanning...
8536539 Ion beam generator, and substrate processing apparatus and production method of electronic device using the ion beam generator  
An ion beam generator includes a discharge tank for generating plasma that includes ions. A lead-out electrode has an annular grid portion provided with openings for leading out the ions generated...
8530853 Charged particle source from a photoionized cold atom beam  
A system for producing a charged particle beam from a photoionized cold atom beam. A vapor of neutral atoms is generated. From these atoms, an atom beam having axial and transverse velocity...
8530856 Beam device system comprising a particle beam device and an optical microscope  
A beam device, in particular a particle beam device, for analyzing an object is provided, as well as a system comprising a particle beam device and an optical microscope for optically analyzing an...
8530835 Imaging energy filter for electrically charged particles and spectroscope having same  
The present invention concerns an imaging energy filter for electrically charged particles with a toroidal energy analyzer, preferably with a hemispherical analyzer, with an entrance plane and an...
8530867 Electron generation and delivery system for contamination sensitive emitters  
Contamination may be removed from a field emitter unit during operation of the emitter unit in an environment at a pressure that lies within a range between 10−6 torr and 10−8 torr. At regular...
8525448 Circular accelerator and operating method therefor  
The circular accelerator comprises: a bending electromagnet that generates a bending magnetic field; a radio-frequency power source that generates a radio-frequency electric field in accordance...
8525133 Particle beam irradiation system and particle beam irradiation method  
A particle beam irradiation system comprising a first deflector having the maximum deflection amount which enables to move a particle beam in one direction to the maximum width of a target and a...
8519644 Accelerator having acceleration channels formed between covalently bonded chips  
An accelerator assembly includes a first chip and a second chip. An acceleration channel is formed into a surface of a first side of the first chip. The first side of the first chip is covalently...
8519366 Debris protection system having a magnetic field for an EUV light source  
Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal...
8519355 Charged particle source  
A charged particle source comprises at least one gas inlet configured to supply gas particles, at least one tip having a tip apex being biased to provide an electrical field for generating charged...
8519353 Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam  
A method of controlling deflection of a charged particle beam in an electrostatic lens includes establishing a symmetrical electrostatic lens configuration comprising a plurality of electrodes...
8513619 Non-planar extractor structure for electron source  
One embodiment disclosed relates to an electron source for generating an electron beam. The electron source includes an electron emitter having a tip from which an electron beam is extracted. The...
8513599 Guiding spray droplets into an inlet capillary of a mass spectrometer  
Charged droplets are guided along a defined path from a droplet source to a droplet sink. A focusing pseudopotential distribution generated by audio frequencies on electrodes of a guiding device...
8507873 Drift measuring method, charged particle beam writing method, and charged particle beam writing apparatus  
A detector 32 measures the value of the current formed by reflected electrons generated as a result of irradiation of a reference mark on a substrate with an electron beam 54, where the reference...
8507857 Charged particle beam inspection apparatus and inspection method using charged particle beam  
A charged particle beam inspection apparatus includes: an electron gun emitting an electron beam; first and second condenser lenses used to focus the electron beam; a beam control panel disposed...
8507848 Wire electrode based ion guide device  
This invention presents a kind of ion guide device comprising multiple layers of stretched wire electrodes crossing in space. These wire electrodes are distributed along a defined ion guiding axis...
8502159 Apparatuses and methods for generating electric fields  
Apparatuses and methods relating to generating an electric field are disclosed. An electric field generator may include a semiconductive material configured in a physical shape substantially...
8502174 Method of and system for exposing a target  
The invention relates to a method of exposing a target by means of a plurality of beamlets. First, a plurality of beamlets is provided. The beamlets are arranged in an array. Furthermore, a target...
8502160 Beam control assembly for ribbon beam of ions for ion implantation  
A beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire,...
8502175 Charged particle beam pattern forming apparatus and charged particle beam pattern forming method  
A charged particle beam pattern forming apparatus, includes a charge amount distribution calculation unit configured to calculate a charge amount distribution charged by vertical incidence of a...
8502139 Mass analysis device with wide angular acceptance including a reflectron  
A mass analysis device with wide angular acceptance, notably of the mass spectrometer or atom probe microscope type, includes means for receiving a sample, means for extracting ions from the...
8497486 Ion source having a shutter assembly  
An ion source includes arc chamber housing defining an arc chamber. The arc chamber housing has an extraction plate in a fixed position, and the extraction plate defines a plurality of extraction...
8492731 Charged particle multi-beamlet lithography system with modulation device  
A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the...
8492714 System and method for trapping and measuring a charged particle in a liquid  
A system and method for trapping a charged particle is disclosed. A time-varying periodic multipole electric potential is generated in a trapping volume. A charged particle under the influence of...
8492732 Multi charged particle beam writing apparatus and multi charged particle beam writing method  
A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality...
8492713 Multipole assembly and method for its fabrication  
A multipole rod assembly, such as used as mass analyzer, is fabricated using rods adhesively attached to shoes, which are then attached to isolation rings. A fixture is used in conjunction with...
8487281 Electron beam exposure apparatus and electron beam exposure method  
In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and...
8487253 Scanning electron microscope  
An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up,...
8487279 Gas contamination sensor, lithographic apparatus, method of determining a level of contaminant gas and device manufacturing method  
A gas contamination sensor includes an ion source configured to generate a beam of ions from a sample of gas to be tested, and first and second ion detectors, each positioned to receive ions from...