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7235796 |
Method and apparatus for the generation of anionic and neutral particulate beams and a system using same
An apparatus for the generation of anionic and neutral particulate beams is described. The apparatus comprises a duct defined by walls having an inner surface capable of sustaining a temperature...
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7233008 |
Multiple electrode lens arrangement and a method for inspecting an object
A inspection system includes: a lens arrangement adapted to generate a substantially symmetrical electrostatic field about an optical axis and to direct a primary electron beam towards an object...
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7230257 |
Electron beam exposure apparatus
An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit...
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7230252 |
Aberration adjusting method, device fabrication method, and charged particle beam lithography machine
An aberration adjusting method of a charged particle beam optical system. The method includes an aberration measuring step of measuring N aberrations of the charged particle beam optical system, an...
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7227155 |
Electrostatic deflection system with impedance matching for high positioning accuracy
An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable....
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7227141 |
Electron beam apparatus
An electron beam apparatus is provided in which a sample is scanned with a plurality of primary electron beams respectively emitted from a plurality of electron guns. Each of the electron guns...
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7217924 |
Holey mirror arrangement for dual-energy e-beam inspector
One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam...
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7211804 |
Chromatic aberration corrector for charged particles and charged-particle optical apparatus using the corrector
The present invention provides an aberration corrector functioning under a condition outside the setting optical condition of an incorporated charged particle beam apparatus. An intermediate...
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7208889 |
Particle accelerator having wide energy control range
A particle accelerator system for producing a charged particle beam having pulses of charged particles that have different energy levels from pulse to pulse. The system enables independent...
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7208729 |
Monolithic micro-engineered mass spectrometer
A method of constructing a micro-engineered mass spectrometer from bonded silicon-on-insulator (BSOI) wafers is described with reference to a quadrupole spectrometer. The quadrupole geometry is...
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7205542 |
Scanning electron microscope with curved axes
One embodiment relates to a scanning electron beam apparatus having curved electron-optical axes. An electron gun and illumination electron optics are configured to generate a primary electron beam...
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7199373 |
Particle-optic electrostatic lens
In a charged-particle beam exposure device, an electrostatic lens (ML) comprises several (at least three) electrodes with rotational symmetry (EFR, EM, EFN) surrounding a particle beam path; the...
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7196337 |
Particle processing apparatus and methods
This invention relates to an apparatus for processing particles. The apparatus comprises a particle source having an exist aperture; an extraction electrode located at the exist aperture; an...
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7196336 |
Apparatus for injecting plasma gas in atmosphere
An apparatus for injecting plasma in the atmosphere is provided, including a plurality of dielectric panels ( 13 a, 13 b, 13 c ), and 13 d , which are disposed in parallel at predetermined...
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7193221 |
Electronic optical lens barrel and production method therefor
The present invention provides an electron optical lens column suitable for miniaturization, and provides the manufacturing method thereof. The column unit ( 1 ) comprises an inner column ( 11 )...
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7189980 |
Methods and systems for optimizing ion implantation uniformity control
An apparatus and method are provided for optimizing ion implantation uniformity in a workpiece, such as a semiconductor wafer, which includes an ion beam generator for generating an ion beam, a...
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7189982 |
Focused ion beam apparatus and aperture
In an aperture for use in an ion beam optical system having its surface coated with a liquid metal, instability of an ion source attributable to sputtering and re-deposition of an aperture base...
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7189981 |
Electromagnetic focusing method for electron-beam lithography system
A method for projecting a predetermined pattern of an electron beam from an emitter to a wafer in a vacuum chamber of an electron-beam lithography system is provided. An initial condition for...
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7187345 |
Image forming method and charged particle beam apparatus
An image forming method and a charged particle beam apparatus suitable for suppressing the inclination of charging when scanning a two-dimensional area with a charged particle beam. A third...
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7180078 |
Integrated planar ion traps
An apparatus for an ion trap includes an electrically conductive substrate having top and bottom surfaces and having vias that cross from the top surface to the bottom surface. The apparatus...
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7173262 |
Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing method
A charged particle beam exposure apparatus for writing a desired pattern on a substrate using a charged particle beam. The apparatus includes a blanking unit, having a deflector capable of...
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7173263 |
Optical switching in lithography system
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator generates a plurality of beamlets. A plurality of modulators modulate the...
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7166836 |
Ion beam focusing device
The invention provides an apparatus for focusing ions exiting a multipole mass filter. In general terms, the ion focusing apparatus comprises: a housing having an ion entrance and an ion exit, and,...
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7166965 |
Waveguide and microwave ion source equipped with the waveguide
A waveguide of the present invention comprises a waveguide main body made of a material selected from a boron nitride or an aluminum oxide, and a thin film made of a titanium nitride to cover an...
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7161158 |
System and method for fast focal length alterations
An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control...
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7154105 |
Method of exposing using electron beam
Provided is a method of exposing using an electron beam. The provided method of exposing using the electron beam includes defining main fields on an exposure area of an electron beam exposure...
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7151268 |
Field emission gun and electron beam instruments
A field-emission electron gun includes a field-emission cathode including a single fiber-like carbon substance and an electrically-conductive substrate for supporting the substance, an extractor...
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7145154 |
Method of automatically correcting aberrations in charged-particle beam and apparatus therefor
The present invention provides method and apparatus for automatically correcting aberrations in a charged-particle beam. The apparatus has a memory for storing image data obtained by scanning a...
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7141789 |
Method and apparatus for providing two-dimensional substantially quadrupole fields having selected hexapole components
A method and apparatus for manipulating ions using a two-dimensional substantially quadrupole field, and a method of manufacturing and operating an apparatus for manipulating ions using a...
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7141800 |
Non-dispersive charged particle energy analyzer
An electron energy analyzer including a curved electrostatic low-pass reflector and a high-pass electrostatic transmissive filter. The reflector comprises a curved grid, preferably ellipsoidal, and...
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7138641 |
Beam deflecting method, beam deflector for scanning, ion implantation method, and ion implantation system
A beam deflector for scanning performs deflecting of a charged particle beam having a regular trajectory in a vacuum space to thereby periodically change the trajectory of the charged particle...
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7138642 |
Ion source with controlled superposition of electrostatic and gas flow fields
Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus...
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7135677 |
Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system
An electron microscopy system comprises an objective lens ( 19 ) which images a field displaceable in x-direction on a fixed beam axis ( 17 ). The objective lens has an astigmatic effect which is...
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7129502 |
Apparatus for generating a plurality of beamlets
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging...
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7129485 |
Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the...
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7112786 |
Atmospheric pressure ion source high pass ion filter
For generation and delivery of ions from an ionization chamber through an ion entrance orifice to a mass analyzer operating at high vacuum, high pass ion filtration is effected within the...
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7112803 |
Beam directing system and method for use in a charged particle beam column
A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a...
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7112809 |
Electrostatic lens for ion beams
A lens structure for use with an ion beam implanter. The lens structure includes first and second electrodes spaced apart along a direction of ion movement. The lens structure extends across a...
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7109494 |
Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector
A deflector which makes multilayered wiring possible and prevents contamination during the manufacture includes an electrode substrate ( 400 ) having a plurality of through holes, and an electrode...
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7109486 |
Layered electron beam column and method of use thereof
An electron beam column package comprises a plurality of layers having components, such as lenses, coupled thereto. The layers may be made of LTCC, HTCC or other layer technology.
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7109498 |
Radiation source, lithographic apparatus, and device manufacturing method
A radiation source for use in lithography. The radiation source comprising a pn-junction disposed on a substrate that can be reverse-biased to cause avalanche breakdown and emission of UV or DUV...
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7109493 |
Particle beam generator
The source of electrons is a nanotip in a vacuum as used in near field microscopy. The source of ions is a similar nanotip in vacuum supplied with liquid metal (gallium) as in a liquid-metal ion...
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7105833 |
Deflection system for a particle beam device
A particle beam apparatus and a device for an energy corrected deflection by a predetermined deflection angle of a particle beam coming in along a beam axis are disclosed, whereby the particle beam...
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7105839 |
Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams
In system for implanting workpieces with an accurately parallel scanned ion beam, a fine-control collimator construct is used to reduce the deviation of the scanned ion beam from a specified axis...
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7105817 |
Method of forming images in a scanning electron microscope
An imaging device having many detector elements is used to construct multiple images of the surface of a specimen in a scanning electron microscope (SEM) using signals from different elements of...
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7094312 |
Focused particle beam systems and methods using a tilt column
Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a)...
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7095031 |
Method of automatically correcting aberrations in charged-particle beam and apparatus therefor
The present invention provides method and apparatus for automatically correcting aberrations in a charged-particle beam. The apparatus extracts line profiles from the probe profile of the...
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7091478 |
Method and device for controlling a beam extraction raster scan irradiation device for heavy ions or protons
The invention relates to a method and to a device for controlling a beam extraction irradiation device for heavy ions operating according to the raster scan technique, wherein the beam energy, beam...
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7091504 |
Electron beam exposure system
The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising:
a beamlet generator for generating a plurality of electron...
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7078852 |
Method and apparatus for simultaneously depositing and observing materials on a target
A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The...
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