Match Document Document Title
8803102 Retarding field analyzer integral with particle beam column  
A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. Using components of the...
8796620 Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens  
Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply...
8796616 Miniature mass spectrometer system  
A miniature mass spectrometer that may be coupled to an atmospheric pressure ionisation source is described. Ions pass through a small orifice from a region at atmospheric pressure or low vacuum,...
8796614 Apparatuses for generating proton beam  
Provided is an apparatus for generating a proton beam, which includes a laser system providing a laser pulse, a target generating a proton beam by using the laser pulse, and a phase conversion...
8796638 Mass spectrometry for a gas analysis with a two-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens  
Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply...
RE45049 Electron beam exposure system  
The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron...
8791425 Multi-axis magnetic lens for focusing a plurality of charged particle beams  
The present invention provides two ways to form a special permeability discontinuity unit inside every sub-lens of a multi-axis magnetic lens, which either has a simpler configuration or has more...
8791435 Multi-field charged particle cancer therapy method and apparatus  
The invention relates generally to treatment of solid cancers. More particularly, the invention relates to a multi-field charged particle cancer therapy method and apparatus coordinated with...
8791422 Charged particle beam writing apparatus and charged particle beam writing method  
Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the...
8791423 Aberration correction device and charged particle beam device employing same  
An aberration correction device includes, between a TEM objective lens and an STEM objective lens, a transfer lens group for transferring a coma-free surface of the TEM objective lens to a...
8791424 Control grid design for an electron beam generating device  
The invention relates to a control grid for an electron beam generating device, wherein the control grid comprises apertures arranged in rows in a width direction and columns in a height...
8785843 Mass spectrometer sampling cone with coating  
A sampling cone of a mass spectrometer is disclosed having a metallic boride coating such as titanium diboride.
8785878 Charged particle beam apparatus  
An apparatus includes an irradiation device configured to irradiate an object with charged particle beams, a measurement device configured to measure a characteristic of each of charged particle...
8785880 Chromatic aberration corrector and electron microscope  
The chromatic aberration corrector (100) has a first multipole element (110) for producing a first electromagnetic field and a second multipole element (120) for producing a second electromagnetic...
8779399 Electrostatic deflector, lithography apparatus, and method of manufacturing device  
The present invention provides an electrostatic deflector which deflects a plurality of charged particle beams, the deflector comprising a first electrode member including a plurality of first...
8779396 Drawing apparatus, and method of manufacturing article  
The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam based on drawing data generated from pattern data representing a circuit...
8779357 Multiple image metrology  
Metrology is performed using multiple registered images derived from one or more charged particle beams. Measurements combine features from one image that may not be visible in a second image to...
8779393 Charged particle beam irradiation system and neutron beam irradiation system  
A charged particle beam irradiation system includes: an accelerator which accelerates charged particles along an orbit, thereby emitting a charged particle beam; a gantry on which the accelerator...
8779381 Aperture unit for a particle beam device  
An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units...
8772708 Time-of-flight mass spectrometer  
An embodiment with a dual-stage reflectron is as follows: (1) On the assumption that a reflector has a base potential XA(U) created by uniform electric fields, its design parameters are adjusted...
8772734 Charged particle beam lithography apparatus and method, and article manufacturing method  
A lithograph apparatus that performs writing on a substrate with a plurality of charged particle beams. A blanking deflector array blanks the plurality of charged particle beams. An aperture array...
8772732 Scanning charged particle beam device and method for correcting chromatic spherical combination aberration  
Disclosed is a scanning charged particle beam apparatus equipped with an aberration corrector, contrived to eliminate resolution degradation in tilt observation by a chromatic third-order aperture...
8772716 Phase plate for a TEM  
A phase plate, specifically a Zernike type phase plate, for use in an electron microscope comprises a central hole, and a thin film causing a phase shift of the electrons passing through said...
8766219 Particle beam microscope for generating material data  
A method of operating a particle beam microscopy. A particle beam is scanned across a scanning region of a surface of the object. Particles are detected by a detector system for a plurality of...
8766216 Drawing apparatus, and article manufacturing method  
A drawing apparatus include: a charged particle optical system configured to generate M×N charged particle beams; a limiting device configured to limit number of charged particle beams that the...
8759787 Charged particle multi-beamlet lithography system with modulation device  
The invention relates to a charged particle lithography system for patterning a target. The lithography system has a beam generator for generating a plurality of charged particle beamlets, a beam...
8759763 Method and apparatus to measure step height of device using scanning electron microscope  
A method of measuring a step height of a device using a scanning electron microscope (SEM), the method may include providing a device which comprises a first region and a second region, wherein a...
8759796 Particle beam system  
A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The...
8759801 Ion implantation apparatus and ion implantation method  
During ion implantation into a wafer, an ion beam current is measured, a change in vacuum conductance which changes in accordance with a change of the location of a structure operating in a vacuum...
8754388 Radiation control and minimization system and method using collimation/filtering  
A radiation control system and method are provided in which radiation delivered to a patient and/or the operator of the equipment is minimized. The radiation control system may be used in a large...
8748819 Transmission electron microscopy system and method of operating a transmission electron microscopy system  
A transmission electron microscopy system has an illumination system and an objective lens system. A first projection system images the diffraction plane of the objective lens system into a first...
8748818 Incoherent transmission electron microscopy  
A transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. An aberration corrector corrects the...
8748841 Drawing apparatus and method of manufacturing article  
A drawing apparatus includes a first aperture array configured to split a diverging charged particle beam, a converging lens array configured to form a plurality of first crossovers of a plurality...
8748842 Electrostatic lens array  
Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in...
8742341 Testing apparatus using charged particles and device manufacturing method using the testing apparatus  
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover...
8742361 Focused charged particle column for operation at different beam energies at a target  
A charged particle column having improved performance at multiple beam energies. The column employs a four-element objective lens to enable improved beam focusing performance at both high and low...
8742374 Ion implantation apparatus  
A hybrid ion implantation apparatus that is equipped with shaping masks that shape the two edges of a ribbon-like ion beam IB in the short-side direction, a profiler that measures the current...
8741547 Multi charged particle beam writing apparatus and multi charged particle beam writing method  
A multi charged particle beam writing apparatus according to an embodiment, includes a setting unit to set a second region such that more openings in remaining openings except for an opening...
8735848 Charged particle beam treatment planning device and charged particle beam treatment planning method  
There is provided a charged particle beam treatment planning device that creates a treatment plan and is connected to a charged particle beam irradiation apparatus that includes a scanning...
8735847 High resolution gas field ion column with reduced sample load  
A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source,...
8735814 Electron beam device  
The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted...
RE44908 Electron beam exposure system  
The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron...
8729492 Methods, devices, and systems for manipulating charged particle streams  
A multiple-deflection blanker for charged particle beam lithography includes a support structure, a first pair of electrodes mounted to the support structure and providing a first electric field,...
8729508 Beam transport system for a hadron therapy facility  
A beam transport system for a hadron therapy facility comprises: a main beam transport line; secondary beam transport lines branching off from the main beam transport line for delivering the...
8729509 Drawing apparatus and method of manufacturing article  
A drawing apparatus performs drawing on a substrate with a plurality of charged particle beams. The apparatus comprises a stage configured to hold the substrate and to be moved; a projection...
8729466 Aberration-corrected and energy-filtered low energy electron microscope with monochromatic dual beam illumination  
One embodiment relates to an apparatus for correcting aberrations introduced when an electron lens forms an image of a specimen and simultaneously forming an electron image using electrons with a...
8729491 Charged particle beam apparatus  
The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a...
8729493 Drawing apparatus, method of manufacturing article, method of manufacturing deflecting apparatus, and method of manufacturing drawing apparatus  
A drawing apparatus includes a plurality of charged particle optical elements that are sequentially passed through by a plurality of charged particle beams and performs drawing on a substrate with...
8723134 Electrostatic corrector  
A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction...
8723136 Particle beam system and method for operating the same  
A method of operating a particle beam system includes determining a deflection amount and a deflection time of a beam deflection module connected to a data network. The method also includes...