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7566882 |
Reflection lithography using rotating platter
One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern...
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7564025 |
Multipole devices and methods
The present invention provides, inter alia, a multipole ion guide for moving and guiding ions, particularly in a mass spectrometer. The multipole ion guide comprises multiple rods with a resistive...
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7564042 |
Ion beam apparatus having plasma sheath controller
An ion beam apparatus includes a plasma chamber with a grid assembly installed at one end of the plasma chamber and a plasma sheath controller disposed between the plasma chamber and the grid...
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7560717 |
Particle beam irradiation apparatus, treatment planning unit, and particle beam irradiation method
A particle beam irradiation apparatus includes a synchrotron, two scanning electromagnets, a beam delivery apparatus for outputting an ion beam extracted from the synchrotron, and an accelerator...
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7557343 |
Segmented rod multipole as ion processing cell
A method and apparatus for processing ions in mass spectrometry is provided. The apparatus includes an ion processing cell having segmented multipole rods and a means for admitting reactive reagent...
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7557347 |
Charged particle beam apparatus, scanning electron microscope, and sample observation method using the same
A charged particle beam apparatus for acquiring high-definition and highly contrasted observation images by detecting efficiently secondary signals without increasing aberration of the primary...
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7554106 |
Partial ion implantation apparatus and method using bundled beam
An ion implantation apparatus comprises an ion beam source for generating an initial ion beam, a bundled ion beam generator adapted to change the initial ion beam into a bundled ion beam based on a...
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7550751 |
Ion beam scanning control methods and systems for ion implantation uniformity
One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam...
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7551358 |
Camera module having an array lens
In a camera module having an array lens, a first lens group has at least two lenses. A second lens group has a plurality of lenses corresponding to the lenses of the first lens group, the second...
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7550740 |
Focused ION beam apparatus
A focused ion beam apparatus enables an ion beam to be focused highly accurately on a sample at the beam spot position of the case of the absence of magnetic field without causing isotope...
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7547899 |
Charged beam dump and particle attractor
A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end...
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7547898 |
Particulate prevention in ion implantation
A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source, a power supply operable to supply power to a filament and mirror...
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7547460 |
Ion implanter optimizer scan waveform retention and recovery
Methods and apparatus are provided for controlling dose uniformity in an ion implantation system. According to one embodiment of the invention, an initial scan waveform is adjusted to obtain a...
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7544951 |
Electron gun assembly
A device which employs an electron beam, for performing a desired function, includes an electron gun for generating the electron beam. The electron gun includes a barrel shaped rotatable structure...
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7544957 |
Non-uniform ion implantation
A method includes receiving an input signal representative of a desired two-dimensional non-uniform dose pattern for a front surface of a workpiece, driving the workpiece relative to an ion beam to...
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7538320 |
Ion detection device and method with compressing ion-beam shutter
An ion detection device, method and computer readable medium storing instructions for applying voltages to shutter elements of the detection device to compress ions in a volume defined by the...
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7535001 |
Method and system for focusing a charged particle beam
A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample...
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7531816 |
Vacuum conveying apparatus and charged particle beam equipment with the same
A charged particle beam examination equipment for examining and measuring a semiconductor wafer, comprising a wafer exchange portion for exchanging an unexamined wafer and an examiner wafer with...
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7531796 |
Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods
Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing...
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7528380 |
Method and apparatus for generating a focused beam using duality modulation
An energy-depleted optical or particle beam is generated, transformed into a beam of converging annular cross section, and directed along the same axis as a primary beam. The energy-depleted beam...
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7528390 |
Broad beam ion implantation architecture
An ion implantation system for providing a mass analyzed ribbon beam that comprises an ion beam source that includes a plasma source and an extraction component, wherein the extraction component is...
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7528391 |
Techniques for reducing contamination during ion implantation
Techniques for reducing contamination during ion implantation is disclosed. In one particular exemplary embodiment, the techniques may be realized by an apparatus for reducing contamination during...
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7528394 |
Focused ion beam system
A focused ion beam (FIB) system that can automatically set processing and scanning conditions under which a specimen is processed includes an arithmetic unit for selecting optical conditions for...
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7525104 |
Particle beam irradiation method and particle beam irradiation apparatus used for the same
In a particle beam irradiation method and a particle beam irradiation apparatus in which depth direction irradiation field spread and lateral direction irradiation field spread are performed, an...
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7521674 |
Method for trapping uncharged multi-pole particles
Apparatus and method for trapping uncharged multi-pole particles comprises a bound cavity for receiving the particles, and a multiplicity of electrodes coupled to the cavity for producing an...
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7521688 |
Charged-particle beam instrument
A charged-particle beam instrument is offered which can cancel out deflection aberrations arising from a first deflector or oblique incidence on the surface of a workpiece without (i) increasing...
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7521689 |
Deflector for equipment of electron beam lithography and equipment of electron beam lithography
A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron...
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7521697 |
Method for fabricating semiconductor device and equipment for fabricating the same
A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is...
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7521687 |
Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate
A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing...
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7518121 |
Method for determining lens errors in a particle-optical device
The invention relates to a method for determining lens errors in a Scanning Electron Microscope, more specifically to a sample that enables such lens errors to be determined. The invention...
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7518130 |
Ion beam blocking component and ion beam blocking device having the same
An ion beam blocking component suitable for blocking an ion beam generated by an ion source of an ion implanter is provided. The blocking component includes a front plate, a back plate, and a...
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7514673 |
Ion transport device
A device for transporting and focusing ions in a low vacuum or atmospheric-pressure region of a mass spectrometer is constructed from a plurality of longitudinally spaced apart electrodes to which...
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7514676 |
Method and apparatus for selective filtering of ions
An adjustable, low mass-to-charge (m/z) filter is disclosed employing electrospray ionization to block ions associated with unwanted low m/z species from entering the mass spectrometer and...
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7514682 |
Electron anti-fogging baffle used as a detector
Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an...
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7514677 |
Hybrid ion guide
Disclosed is a hybrid ion guide which combines the advantages of the conventional electrostatic ion guide and the RF ion guide, comprising an electrostatic ion guide for transmitting the injected...
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7511282 |
Sample preparation
Methods of extracting a TEM sample from a substrate include milling a hole on the sample and inserting a probe into the hole. The sample adheres to the probe, and can be processed on transferred...
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7511288 |
Ion implantation device
To provide an ion implantation device which suppresses diffusion of an ion beam, can finely control a scanning waveform and can obtain a large scanning angle of about 10°. In the ion implantation...
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7507956 |
Charged particle beam energy width reduction system for charged particle beam system
The present invention provides a charged particle beam energy width reduction system. The system comprises a first element acting in a focusing and dispersive manner in an x-z-plane; a second...
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7504645 |
Method of forming pattern writing data by using charged particle beam
A method of forming pattern writing data to write a predetermined pattern from layout data of a circuit by using a charged particle beam while deflecting the charged particle beam, includes...
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7504624 |
Charged particle beam device
A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from a...
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7501638 |
Charged particle beam emitting device and method for operating a charged particle beam emitting device
A charged particle beam emitting device includes at least two charged particle beam guns, each of the at least two charged particle beam guns having a separate charged particle emitter with an...
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7501641 |
Dual hemispherical collectors
A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a...
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7501623 |
Two-dimensional electrode constructions for ion processing
An electrode for use in a device such as an ion trap has an axial length extending generally in the direction of a central axis from a first axial end to a second axial end, and an inside surface....
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7498569 |
Ion trap mass analyzer
An ion trap mass analyzer includes an elongated tunnel that has a wall, a longitudinal axis and an inner space. The wall includes a substrate and conductor trace patterns. There is also a variable...
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7498572 |
Deflecting electromagnet and ion beam irradiating apparatus
A deflecting electromagnet has first and second magnetic poles that are opposed to each other via an inter-pole space through which an ion beam passes. The deflecting electromagnet further has: a...
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7495212 |
Ion guide for mass spectrometers
The present invention relates generally to mass spectrometry and the analysis of chemical samples, and more particularly to ion guides for use therein. The invention described herein comprises an...
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7495216 |
Electron beam apparatus for work function measurements
The inventive apparatus measures workfunction values using deflection of an electron beam without direct contact of the electron beam with the sample surface. The apparatus, mounted within a vacuum...
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7491946 |
Electrostatic deflection system for corpuscular radiation
The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or...
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7491933 |
Electron beam apparatus
An electron beam ( 4 ) to be irradiated onto a sample ( 10 ) is two-dimensionally scanned by a scanning coil ( 9 ), and secondary electrons generated from the sample ( 10 ) by the scanning are...
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7491930 |
Hooked differential mobility spectrometry apparatus and method therefore
Disclosed are a device and method for improved interfacing of differential mobility spectrometry (DMS) or field asymmetric waveform ion mobility spectrometry (FAIMS) analyzers of substantially...
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