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5384461 |
Process for the manufacture of a multipolar elongate-electrode lens or mass filter
The method includes the steps of assembling one or more blanks (1) in supporting means (2, 3) so that the or each blank occupies at least the space to be occupied by elongate electrodes and,...
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5376792 |
Scanning electron microscope
An improved scanning electron microscope is disclosed which includes a compact, replaceable electron beam emitter assembly and concentric liner tubes. The concentric liner tubes extend through a...
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5373158 |
Field-emission transmission electron microscope and operation method thereof
An object of the present invention is to realize a field-emission transmission electron microscope which is able to cope with both observation of an electron-microscopic image of a high brightness...
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5371371 |
Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens
A magnetic immersion field emission electron gun has a vacuum vessel having a central axis in a predetermined direction, a cathode arranged along the central axis of the vacuum vessel for...
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5369279 |
Chromatically compensated particle-beam column
A particle-beam column comprising a needle-type ions source such as a liquid metal ion source, one or more round lenses, and a plurality of interleaved quadrupole lenses, by means of which the...
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5362968 |
Optic column having particular major/minor axis magnification ratio
An optic column is provided to obtain a micro beam in simple structure. The optic column has a line cathode and multi-pole lenses arranged in three steps. A beam orbit in the major axis direction...
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5363021 |
Massively parallel array cathode
A massively parallel electron beam array for controllably imaging a target includes a multiplicity of emitter cathodes, each incorporating one or more micron-sized emitter tips. Each tip is...
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5336891 |
Aberration free lens system for electron microscope
A system for reducing aberration effects in a charged particle beam. The system includes a source of charged particles, such as electrons or ions, and various building blocks for operating on the...
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5334943 |
Linear accelerator operable in TE 11N mode
In a linear accelerator which accelerates a beam of charged particles along a beam axis and which comprises a conductive cylinder defining a hollow space, first through fourth conductive vanes are...
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5321262 |
Electron imaging band pass analyser for a photoelectron spectromicroscope
A low pass filter for use in an image band pass filter of a photoelectron spectromicroscope incorporating a virtual potential surface for reflecting electrons below a particular energy and a...
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5319207 |
Imaging system for charged particles
The invention relates to an imaging system for charged particles having a correction unit for correcting an objective lens. The correction unit essentially includes a beam deflector and a mirror...
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5319198 |
Electron beam projection apparatus
An electron beam projection apparatus including electron injection unit for irradiating an object with an electron beam. The electron injection unit includes a substrate, a cathode formed on the...
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5315120 |
Univane RFQ
A radio-frequency quadrupole which includes four, extruded, identical cross-section, elongate structural components, each of which lacks any longitudinally extending plane of bilateral assembly....
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5313062 |
Automatic focusing and astigmatism correction for electron beam apparatus
A method of automatically and accurately accomplishing focusing and astigmatism correction in an electron beam apparatus such as a scanning electron microscope. The electron beam is raster scanned...
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5298757 |
Lens for charged particle beam
A lens for a charged particle beam comprises first, second, third and fourth quadrupoles, a first aperture electrode placed in front of the first quadrupole, a second aperture electrode placed...
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5296714 |
Method and apparatus for ion modification of the inner surface of tubes
A method and apparatus for modifying the inner surface of a tube by ion surface modification techniques, such as ion implantation, ion mixing and ion beam assisted coating. The apparatus includes a...
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5293045 |
Electrostatic lens
An electrostatic lens having at least three electrodes and an insulating holder for holding the electrodes, the inner wall of the holder being coated with a silicone carbide film. The silicone...
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5291016 |
Electrostatic lens arrangement of multi-stages of multi-pole electrodes and mass spectrometer using the same
An electrostatic lens arrangement of three stages of quadrupole electrodes comprising first, second and third stage electrostatic lens unit connected in series, each electrostatic lens unit...
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5285074 |
Dynamic compensation of non-linear electron beam landing angle in variable axis lenses
A dynamic correction arrangement for an electron beam projection/deflection system provides high order correction values for deflection in accordance with a correction equation. Particularly as...
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5276330 |
High accuracy beam blanker
The accuracy of a double-deflection beam blanker is dramatically improved for all blanker voltages by using provided, closed-form, trajectory equations to determine the blanker geometric parameters...
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5266809 |
Imaging electron-optical apparatus
Imaging electron-optical apparatus, e.g. photo-electron emission microscope, which has an electron-optical imaging system in which electrons of an electron pattern to be imaged are accelerated to a...
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5264703 |
Electron beam instrument
An electron beam instrument typified by a scanning electron microscope. The instrument does not suffer from defocus if the accelerating voltage is varied. The instrument has an objective lens, an...
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5254417 |
Reflection mask and electrically charged beam exposing apparatus using the reflection mask
A reflection mask has a reflection pattern which is formed on a required portion of the surface of a substrate and on which a voltage sufficient to reflect incident electrically charged beams is...
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5252176 |
Crystalline Si.sub.2 HSb.sub.2
This invention relates to a novel method of, and means for, directing energy through Si 2 HSb 2 in such a manner that normal energy parameters can be exceeded. The principal object of the...
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5245194 |
Electron beam exposure system having an electrostatic deflector wherein an electrostatic charge-up is eliminated
An electron beam exposure system comprises an electron beam source for producing an electron beam, an electron lens system for focusing the electron beam on an object, and an electrostatic...
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5241182 |
Precision electrostatic lens system and method of manufacture
A precision electrostatic lens system is formed from lens electrodes having high precision inner bores by aligning said bores on a ceramic rod, inserting segmented glass spacers between adjacent...
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5233196 |
Electron beam apparatus and method for driving the same
An electron beam apparatus for applying an electron beam from an electron source onto a target plane is characterized by comprising one sheet of electrode disposed between said electron source for...
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5229607 |
Combination apparatus having a scanning electron microscope therein
A combination apparatus having a scanning electron microscope includes equipment for performing any of observing, measuring and processing operations on a sample placed in a sample chamber. The...
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5225676 |
Electrooptical viewing apparatus capable of switching depth of focus
An electron microscope capable of switching its depth-of-focus mode between a first and a second mode. The microscope includes an electron gun, a first condenser lens, a second condenser lens, an...
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5221844 |
Charged particle beam device
In an electron microscope correction of spherical and chromatic aberration can be achieved in a number of freely adjustable directions by using a multipole correction element whereby a magnetic or...
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5221841 |
Fast atom beam source
A fast atom beam source used e.g., for sputtering, includes an ion source that emits an ion beam and an electron gun that emits an electron beam at a speed substantially equal to the speed of the...
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5215623 |
Blanking aperture array and method of producing same
A blanking aperture array for use in an electron beam exposure system and a method of producing the same. An electrode layer is formed on a substrate having shift register devices, and then an...
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5214289 |
Charged particle beam deflector
A charged particle beam deflector has a simple structure for providing a uniform potential distribution over each blanking aperture. The deflector is easy to operate, and stabilizes the shape of a...
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5206516 |
Low energy, steered ion beam deposition system having high current at low pressure
An ion beam deposition system in which ions of different masses and from different sources are independently steered into different parts of an analyzer magnet to be converged into a single wide...
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5198666 |
Mass spectrometer having a multichannel detector
The invention typically provides a double focusing mass spectrometer comprising an ion source (55), an ion momentum analyzer (56), a multichannel detector (58) and a multielectrode electrostatic...
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5198674 |
Particle beam generator using a radioactive source
The apparatus of the present invention selects from particles emitted by a radioactive source those particles having momentum within a desired range and focuses the selected particles in a beam...
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5196706 |
Extractor and deceleration lens for ion beam deposition apparatus
A pair of lenses for an ion beam deposition device permit the formation of an ion beam with good beam characteristics and the variation of ion energy over an extremely wide range and at high...
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5196707 |
Low Aberration field emission electron gun
A field emission source is used in conjunction with a three element asymmetric lens system to provide an electron gun having greater magnitude beam currents focused on a smaller spot size than has...
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5194732 |
Charged-particle energy analyzer and mass spectrometer incorporating it
An electrostatic analyzer (1) for dispersing a beam of charged particles (10) according to their energy comprises two groups (2, 3) of spaced-apart linear electrodes (4, 8, 9, 20) respectively...
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5191216 |
Quantum mechanical semiconductor device with electron/hole diffractive grating
A solid state, quantum mechanical electron/hole wave device in the form of a switch or multiplexor includes a layer of semiconductor material supporting substantially ballistic electron/hole...
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5189304 |
High transmission mass spectrometer with improved optical coupling
The disclosed mass spectrometer has, positioned between an input slit and an output slit, crossed by particles emitted by a sample, an optical coupling system placed between two respectively...
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5187371 |
Charged particle beam apparatus
A charged particle beam apparatus includes at least a charged particle source and an objective lens for converging onto a sample a charged particle beam emitted by the charged particle source. The...
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5173582 |
Charged particle beam lithography system and method
A charged particle beam lithography system includes a beam source of a charged particle beam, a beam shaping aperture for providing a predetermined cross section to the charged particle beam, a...
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5172331 |
Apparatus and method for effecting exposure of sample to charged particle beam
An apparatus includes an optical unit for effecting an exposure of a sample to a charged particle beam and a control unit for effecting a deflection control of the charged particle beam. The...
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5164594 |
Charged particle extraction arrangement
An arrangement is described for extracting charged particles which have been emitted from a sample due to the impact of a primary ion beam. The arrangement comprises an electrode arrangement...
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5155368 |
Ion beam blanking apparatus and method
Ion beam apparatus provides beam blanking by utilizing an aperture through which the beam passes during unblanked periods, and elements for deflecting the beam during blanking so that the beam is...
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5155412 |
Method for selectively scaling a field emission electron gun and device formed thereby
The present invention is directed to a method for selectively scaling the dimensions of a field emission electron gun. The electron gun includes a field emission tip followed by a dual electrode...
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5153433 |
Portable mass spectrometer with one or more mechanically adjustable electrostatic sectors and a mechanically adjustable magnetic sector all mounted in a vacuum chamber
A portable mass spectrometer is described having one or more electrostatic focusing sectors and a magnetic focusing sector, all of which are positioned inside a vacuum chamber, and all of which may...
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5149976 |
Charged particle beam pattern generation apparatus and method
A pattern control system and method for a charged particle beam such as a focused ion beam (FIB) (20) or electron beam writes beam patterns on a pixel-by-pixel (56) basis. Respective dwell times...
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5144142 |
Blanking aperture array, method for producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure method
A blanking aperture array for use in a charged particle beam exposure has a substrate, at least m rows by n columns of apertures arranged two-dimensionally in the substrate, where each of the...
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