Match Document Document Title
7863587 Symmetrical shaper for an ion beam deposition and etching apparatus  
A shaper for shaping an ion beam and that can be used for both deposition and etching is described. The shaper includes a plate that is placed between an ion beam grid and an ion beam source. The...
7858950 Electrostatic dispersion lenses and ion beam dispersion methods  
An EDL includes a case surface and at least one electrode surface. The EDL is configured to receive through the EDL a plurality of ion beams, to generate an electrostatic field between the one...
7858929 Ion energy spread reduction for mass spectrometer  
A method for reducing the energy spread of ions over a specific and limited mass to charge ratio range is disclosed, along with an ion deceleration arrangement for implementing such a method. An...
7858955 System and method of controlling broad beam uniformity  
An ion beam uniformity control system, wherein the uniformity control system comprising a differential pumping chamber that encloses an array of individually controlled gas jets, wherein the gas...
7855373 Charged particle gun  
An electron gun (1) includes an emitter (2), a tubular support (3) and an adaptor (4) for receiving the emitter. The adaptor includes a tapered plugging surface (7) and the tubular support...
7851774 System and method for direct writing to a wafer  
A direct-write (DW) exposure system is provided which includes a stage for holding a substrate and configured to scan the substrate along an axis during exposure, a data processing module for...
7851755 Apparatus for detecting backscattered electrons in a beam apparatus  
A beam apparatus has a beam source producing a primary electron beam, an objective lens focusing the beam onto an observed sample, and at least one condenser lens mounted between the beam source...
7851772 Ion implantation apparatus and ion implantation method  
An ion implantation apparatus according to the invention includes a park electrode as a deflecting apparatus arranged at a section of a beam line from an outlet of a mass analysis magnet apparatus...
7851752 Ion guide for mass spectrometers  
The present invention relates generally to mass spectrometry and the analysis of chemical samples, and more particularly to ion guides for use therein. The invention described herein comprises an...
7851768 Ultra high precision measurement tool with control loop  
A focused ion beam device is described comprising a gas field ion source with an emitter emitting an ion beam including ions of gas, an ion beam column and a beam current control loop comprising a...
7851756 Charged particle beam irradiation system  
It is to prevent an image drift from occurring caused by a specimen being charged when observing the specimen including an insulating material. A first scan is performed in a predetermined...
7851773 Ion beam apparatus and method employing magnetic scanning  
A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the...
7851767 Beam control assembly for ribbon beam of ions for ion implantation  
A beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire,...
7847273 Carbon nanotube electron gun  
An electron gun, an electron source for an electron gun, an extractor for an electron gun, and a respective method for producing the electron gun, the electron source and the extractor are...
7847266 Device and method for selecting an emission area of an emission pattern  
A charged particle beam apparatus and a method for measuring an emission pattern of such an apparatus are provided. The apparatus comprises an emitter with an emission pattern including at least...
7847271 Ion implanting apparatus  
An ion implanter for manufacturing a single crystal film by extracting a hydrogen ion or a rare-gas ion from an ion source, selects a desired ion with a first sector electromagnet, scanning the...
7847268 Three modes particle detector  
The invention discloses a charged particle detecting apparatus for detecting positive ions, negative ions and electrons emitted from a sample, the apparatus comprising a housing, defining a...
7847249 Charged particle beam apparatus  
A technology whereby removal of magnetic hysteresis is enabled in short time in parallel with a process for stage transfer, and so forth. There is executed a magnetic hysteresis removal sequence...
7842920 Methods and systems of performing device failure analysis, electrical characterization and physical characterization  
An analysis system has a charged particle beam instrument and a scanning probe microscope operably coupled with the charged particle beam instrument. A stage defines an aperture, the stage is...
7838849 Ion implanters  
The present invention relates to components in ion implanters having surfaces, such as graphite surfaces, adjacent to the path of the ion beam through the ion implanter. Such surfaces will be...
7838840 Charged particle beam apparatus  
A charged particle beam apparatus for measuring and inspecting a sample having some parts in focus and other parts out of focus in an image due to the effect of the roughness of the sample surface...
7838839 Hybrid multibeam electronic emission device with controlled divergence  
An electronic emission device including plural electron beams including a first structure having a plurality of emission sources of electron beam, hybridized with a second structure including a...
7838826 Apparatus and method for parallel flow ion mobility spectrometry combined with mass spectrometry  
Analyte ions entrained in a carrier gas are analyzed by parallel flow ion mobility spectrometry prior to analysis by a mass analyzer. An extended ion funnel is located in the vacuum system of the...
7834333 Charged particle beam lithography system and method for evaluating the same  
In the charged particle beam lithography system, a pattern area to be drawn is divided into a plurality of frames, a main deflection positions a charged particle beam to a subfield within the...
7834326 Aberration corrector and charged particle beam apparatus using the same  
The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage...
7829863 Electron beam irradiation device  
An electron beam irradiation device of the present invention includes: a projector 8 for generating a two-dimensional light pattern 13; a microchannel plate 11 for (i) generating an electron beam...
7829866 Broad energy-range ribbon ion beam collimation using a variable-gradient dipole  
A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are...
7829865 Electrostatic deflector  
An electrostatic deflector that can be manufactured easily and very accurately without using a member for positioning is provided. After multiple slits 81d to 88d have been formed in the same...
7829864 Microfabricated miniature grids  
A grid structure and method for manufacturing the same. The grid is used for gating a stream of charged particles in certain types of particle measurement instruments, such as ion mobility...
7825377 Electron beam apparatus with aberration corrector  
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a...
7825374 Tandem time-of-flight mass spectrometer  
A tandem mass spectrometer includes a linear time-of-flight mass analyzer and curved field reflectron mass analyzer. The curved-field reflectron mass analyzer is disposed at an end of the linear...
7820988 Implant uniformity control  
An apparatus and method for ion implantation that include destabilizing the ion beam as it passes through magnetic field, preferably a dipole magnetic field is disclosed. By introducing a bias...
7820978 Charged-particle beam system  
A charged-particle beam system has a demagnifying lens for reducing the dimensions of an electron beam produced from an electron beam source, an objective lens for focusing the demagnified beam...
7820987 Predicting dose repeatability in an ion implantation  
An approach for predicting dose repeatability in an ion implantation is described. In one embodiment, an ion source is tuned to generate an ion beam with desired beam current. Beam current...
7816655 Reflective electron patterning device and method of using same  
One embodiment disclosed relates to a reflective electron patterning device. The device includes a pattern on a surface. There is an electron reflective portion of the pattern and an electron...
7817105 Image forming method and charged particle beam apparatus  
An image forming method and a charged particle beam apparatus suitable for suppressing the inclination of charging when scanning a two-dimensional area with a charged particle beam. A third...
7812325 Implanting with improved uniformity and angle control on tilted wafers  
A system, method and program product for improving uniformity and angle control wafers being implanted. A system is provided that includes an end station for positioning a wafer being implanted,...
7807964 Ion mobility spectrometer and method thereof  
An ion mobility spectrometer and method thereof are disclosed. The ion mobility spectrometer comprises an electrode and an ion source arranged adjacent to the electrode, wherein the ion mobility...
7807986 Ion implanter and method for adjusting ion beam  
An ion implanter and method for adjusting the shape of an ion beam are disclosed. After an ion beam is outputted from an analyzer magnet unit, at least one set of bar magnets is used to adjust the...
7807965 Corrector for axial and off-axial beam paths  
A corrector (1) for the axial and off-axial beam path of a particle-optical system, comprises a first (10) and a second (20) correction piece, which are disposed one behind the other in the beam...
7800074 Electron-optical corrector for an aplanatic imaging system  
An electron-optical corrector for rendering superfluous both the third-order opening error and the anisotropic part of the extra-axial third-order coma, using round lenses and hexapole fields, the...
7800062 Method and system for the examination of specimen  
The present invention provides, according to a first aspect, a method for the examination of specimen with a beam of charged particles. The method provides one or more images of the specimen made...
7800084 System and method for charged-particle beam lithography  
A charged-particle beam lithography system is provided. A region to be patterned is divided into plural frames, a main deflection positions a beam to a subfield within the frame, and an auxiliary...
7800075 Multi-function module for an electron beam column  
A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting,...
7800076 Electron-optical corrector for aplanatic imaging systems  
A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially...
7795597 Deflector array, exposure apparatus, and device manufacturing method  
A deflector array in which a plurality of deflectors, which deflect charged particle beams, are arrayed on a substrate. The plurality of deflectors include respective openings different from each...
7791041 Ion source, ion implantation apparatus, and ion implantation method  
This ion source generates a ribbon-like ion beam whose dimension in the Y direction is larger than the dimension in the X direction. This ion source includes a plasma generating vessel having an...
7791049 Ion implantation apparatus  
A beam line before incidence on a beam scanner is arranged with an injector flag Faraday cup that detects a beam current by measuring a total beam amount of an ion beam to be able to be brought in...
7791040 Ion implanting apparatus for forming ion beam shape  
Aimed at providing an ion implantation apparatus elongated in period over which failure of a target work, due to deposition and release of ion species typically to and from the inner surface of a...
7786450 Multipole coils  
Multipole coils (1, 2, 3, 4, 5, 6) for influencing particle beams have at least two coils (1, 2) which concentrically enclose an imaginary axis (10), wherein a winding (7) made from a flexible...