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7939812 Ion source assembly for ion implantation apparatus and a method of generating ions therein  
A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis...
7935923 Performance enhancement through use of higher stability regions and signal processing in non-ideal quadrupole mass filters  
A quadrupole mass filter (QMF) is provided. The QMF includes a plurality of rectangular shaped electrodes aligned in a symmetric manner to generate a quadrupole field. An aperture region is...
7935925 Charged particle beam scanning method and charged particle beam apparatus  
In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan...
7935924 Batch fabricated rectangular rod, planar MEMS quadrupole with ion optics  
A quadrupole mass filter (QMF) is provided. The QMF includes a plurality of rectangular shaped electrodes aligned in a symmetric manner to generate a quadrupole field. An aperture region is...
7932491 Quantitative measurement of isotope ratios by time-of-flight mass spectrometry  
A mass spectrometer includes a pulsed ion source that generates an ion beam comprising a plurality of ions. A first timed ion selector passes a first group of ions. A first ion mirror generates a...
7932501 Particle-beam exposure apparatus and particle-beam therapeutic apparatus  
A particle-beam exposure apparatus and a particle-beam therapeutic apparatus are obtained, in which, by reducing diameter increase, due to scattering in a range shifter, of a charged particle...
7928403 Multiple lens assembly and charged particle beam device comprising the same  
The invention provides a multiple-lens assembly 1 for a charged particle beam device which comprises at least two lens sub units 2, each sub unit having an optical axis 3, wherein at least two of...
7928411 Linear electron source, evaporator using linear electron source, and applications of electron sources  
A method of charging a web or foil is described. The method includes guiding a web or foil having a thickness of 10 μm or larger with at least on roller; providing a linear electron source having...
7928406 Method and system for extracting ion beams composed of molecular ions (cluster ion beam extraction system)  
A new type of triode extraction system, a Cluster Ion Beam Extraction System, is disclosed for broad energy range cluster ion beam extraction applications while still being applicable to atomic...
7928404 Variable-ratio double-deflection beam blanker  
The invention provides methods for conjugate blanking of a charged particle beam within a charged particle column using a beam blanker. The beam blanker comprises a first deflector, a second...
7923699 Tracking control method and electron beam writing system  
Control data for a main deflector is calculated based on position data that specifies the position of a region to be irradiated with the electron beam on the subfield, data on the number of all...
7919759 Charged particle beam irradiator and rotary gantry  
A charged particle beam 2 which enters a final bending electromagnet 7 after traveling through quadrupole electromagnets 4, 5, 6 travels through the final bending electromagnet 7 in an arc shape...
7919750 Electron gun, electron beam exposure apparatus, and exposure method  
An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission...
7919749 Energy filter for cold field emission electron beam apparatus  
An electron beam apparatus and a method for providing an energy-filtered primary electron beam are described. Therein, a primary electron beam having an asymmetric first energy distribution is...
7915597 Extraction electrode system for high current ion implanter  
A system and method extraction electrode system, comprising an extraction electrode, wherein the extraction electrode, further defines an aperture and forms a portion of the outside wall of the...
7902504 Charged particle beam reflector device and electron microscope  
A charged particle beam reflector device is configured to include at least two electrostatic mirrors arranged with a predetermined interval on a linear optical axis, each having a through hole...
7902527 Apparatus and methods for ion beam implantation using ribbon and spot beams  
An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam...
7902502 Multichannel energy analyzer for charged particles  
The present invention provides charged particle energy deflectors, analyzers, devices, device components and methods for terminating charged particle systems and electrically isolating device...
7902506 Phase-shifting element and particle beam device having a phase-shifting element  
A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a article beam device having a phase-shifting element of this type. In the...
7902521 Method for focusing electron beam in electron column  
The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to...
7897943 Controlling the characteristics of implanter ion-beams  
A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for...
7898447 Methods and systems for testing digital-to-analog converter/amplifier circuits  
A digital-to-analog converter (DAC)/amplifier testing system for use in an electron-beam (e-beam) mask writer, the e-beam mask writer including a plurality of DAC/amplifier circuits to output...
7893406 Electron gun with magnetic immersion double condenser lenses  
An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly...
7893407 High performance micro-fabricated electrostatic quadrupole lens  
A method of aligning sets of cylindrical electrodes in the geometry of a miniature quadrupole electrostatic lens, which can act as a mass filter in a quadrupole mass spectrometer is provided. The...
7888653 Techniques for independently controlling deflection, deceleration and focus of an ion beam  
Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus...
7888660 Controlling the characteristics of implanter ion-beams  
A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for...
7883839 Method and apparatus for nano-pantography  
A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a...
7884333 Particle beam and crabbing and deflecting structure  
A new type of structure for the deflection and crabbing of particle bunches in particle accelerators comprising a number of parallel transverse electromagnetic (TEM)-resonant) lines operating in...
7884334 Charged particle beam imaging method and system thereof  
The method includes scanning a sample in at least one first scan line using a first charged particle beam probe; scanning the sample in at least one second scan line using a second charged...
RE42111 Multideflector  
A method and apparatus to direct ions away from their otherwise intended or parallel course. Deflectors are used to establish electric fields in regions through which ions are to pass. With such...
7880147 Components for reducing background noise in a mass spectrometer  
Novel components reduce background noise caused by secondary ions generated by metastable entity bombardment in a mass spectrometric system. Layered structures for exit electrodes and deflector...
7880143 Electron beam apparatus  
A plurality of primary beams are formed from a single electron source, the surface charge of a sample is controlled by at least one primary beam, and at the same time, the inspection of the sample...
7880146 Tune-stabilized, non-scaling, fixed-field, alternating gradient accelerator  
A FFAG is a particle accelerator having turning magnets with a linear field gradient for confinement and a large edge angle to compensate for acceleration. FODO cells contain focus magnets and...
7875860 Charged particle beam profile measurement  
According to an embodiment, an apparatus for measuring the uniformity of a beam of charged particles at an exposure location includes a plurality of Faraday cups, each cup including an...
7875857 X-ray photoelectron spectroscopy analysis system for surface analysis and method therefor  
An X-ray photoelectron spectroscopy analysis system for analysing an insulating sample 20, and a method of XPS analysis. The system comprises an X-ray generating means 30 having an exit opening 32...
7875859 Ion energy analyzer and methods of manufacturing and operating  
An ion energy analyzer is described for use in diagnosing the ion energy distribution (IED) of ions incident on a radio frequency (RF) biased substrate immersed in plasma. The ion energy analyzer...
7875858 Charged particle beam trajectory corrector and charged particle beam apparatus  
The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged...
7872242 Charged particle extraction device and method of design there for  
The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied...
7872229 Three-dimensional RF ion traps with high ion capture efficiency  
In a three-dimensional Paul RF ion trap at least one of the ring electrode and end cap electrodes is structured to produce a high capture efficiency for analyte ions introduced into the trap. The...
7872240 Corrector for charged-particle beam aberration and charged-particle beam apparatus  
In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to...
7872239 Electrostatic lens assembly  
A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second...
7872241 Method and apparatus for production and maintenance of electron beam space-charge neutralization  
An electron beam production and control assembly includes a vacuum chamber, a beam source, and a target. The target has an active section and an inactive section. The active section is adapted to...
7868305 Technique for ion beam angle spread control  
A technique for ion beam angle spread control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread control. The method may...
7868564 H-mode drift-tube linac and design method therefor  
A linearity of a voltage change to a tuner insertion amount is verified for at least one of a plurality of tuners. Based on the voltage change linearity, individual voltage change data...
7868308 Electron beam writing method, fine pattern writing system, and manufacturing method of uneven pattern carrying substrate  
A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and...
7868289 Mass spectrometer ion guide providing axial field, and method  
An ion guide includes a plurality of rods, arranged about an axis that extends lengthwise from one end to the other of the guide. The rods guide ions in a guide region along and about the axis. A...
7868300 Lithography system, sensor and measuring method  
Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in...
7863564 Electric charged particle beam microscope and microscopy  
An electric charged particle beam microscope is provided in which a specimen movement due to a specimen rotation is classified into a repeatable movement and a non-repeatable movement, a model of...
7863557 Mass spectrometer  
A multi-turn Time of Plight mass analyzer is disclosed comprising a first electric sector (5) and a second electric sector (8). The second electric sector (8) is arranged orthogonal to the first...
7863580 Electron beam apparatus and an aberration correction optical apparatus  
An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high...