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8044369 Electrostatic deflection control circuit and method of electronic beam measuring apparatus  
An electrostatic deflection circuit and method of an electronic beam measuring apparatus which can achieve the high precision of the electronic beam measuring and contribute to the simplification...
8039813 Charged particle-optical systems, methods and components  
The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of...
8039819 Device and method for creating a spatial dose distribution in a medium volume  
A device and a method for creating a spatial dose distribution in a medium volume (22) are described. A laser system produces laser pulses (12) with a pulse length shorter than 200 fs...
8035086 Aberration correction apparatus that corrects spherical aberration of charged particle apparatus  
To provide an aberration correction configuration that can realize both an aberration correction function for a long focus and an aberration correction function for a short focus. While having a...
8035082 Projection electron beam apparatus and defect inspection system using the apparatus  
A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun 1 are...
8035087 Open-ended electromagnetic corrector assembly and method for deflecting, focusing, and controlling the uniformity of a traveling ion beam  
The present invention is an electromagnetic controller assembly for use in ion implantation apparatus, and provides a structural construct and methodology which can be employed for three...
8030625 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium  
When writing element shapes of a fine pattern on a substrate applied with a resist by scanning an electron beam thereon, ON/OFF control is performed for emitting the electron beam at a...
8030620 System and method for nano-pantography  
A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a...
8031436 Electron beam writing method for magnetic recording medium  
When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron...
8026492 Dual mode gas field ion source  
A focused ion beam device is provided, including: an ion beam column adapted to house a gas field ion source emitter with an emitter tip and an emitter area for generating ions, a heating means...
8026475 Method and apparatus for a dual gate for a mass spectrometer  
An ion gate apparatus for controlling the transmission of ion pulses between an origin and a destination in a mass spectrometer is disclosed, comprising: a first split gate having a length L1,...
8026491 Charged particle beam apparatus and method for charged particle beam adjustment  
A charged particle beam apparatus facilitating adjusting a beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of...
8026480 Mass spectrometer  
A basic ion optical system (2) in which the temporal focusing of ions is ensured includes a plurality of sector-shaped electrodes (11, 12, 13, and 14), an ion injection slit (15), and an ion...
8017918 Charged-particle beam instrument  
A charged-particle beam instrument (such as a transmission electron microscope) which facilitates modifying the diameters of aperture stops installed above and below (on the beam entrance and exit...
8013296 Charged-particle condensing device  
Ions and charged droplets move from the nozzle (6) towards the orifice (22) of a charged-particle transport device or the desolvation pipe (7). This particle motion is governed by the distribution...
8013292 Mass spectrometer  
One cycle of loop orbit is formed by two identical time-focusing unit structures (T1 and T2). Each of the time-focusing unit structures (T1 and T2) has a time-focusing point (P1) at the injection...
8013311 Dual beam system  
A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the...
8013293 Time-of-flight mass spectrometer  
A shift of mass axis that occurs when the temperature of a vacuum container consisting of a vacuum chamber (15) and IT block (16) or that of a TOF power unit (20) for applying an ion acceleration...
8008631 Method of acquiring offset deflection amount for shaped beam and lithography apparatus  
A method of acquiring an offset deflection amount for a shaped beam, includes forming reference images of first and second figures which can be shaped by first and second aperture plates placed on...
8008636 Ion implantation with diminished scanning field effects  
Ion implantation systems and scanning systems are provided, in which a focus adjustment component is provided to adjust a focal property of an ion beam to diminish zero field effects of the...
8008630 Ion implantation apparatus and method of correcting deviation angle of ion beam  
To increase a transport efficiency of an ion beam by correcting Y-direction diffusion caused by the space charge effect of the ion beam between an ion beam deflector, which separates the ion beam...
8008619 High sensitivity mass spectrometer interface for multiple ion sources  
An interface for mass spectrometers. The interface uses non coaxial sampling pathways of the analyte ion beam prior to entering the entrance of a mass spectrometer for decreasing chemical...
8008629 Charged particle beam device and method for inspecting specimen  
A charged particle beam device is provided. The device includes a primary objective lens for focusing a primary charged particle beam, the primary objective lens defining an optical axis, a...
8003952 Integrated deflectors for beam alignment and blanking in charged particle columns  
A charged particle beam column package includes an assembly (e.g., comprising a plurality of layers, which can have a component coupled to one of the layers), and at least one deflector between an...
8004197 Method and apparatus for collector sweeping control of an electron beam  
A collector sweeping method for controlling an electron beam in a beam collector, in particular of a magnetic gyrotron device, comprises the steps of subjecting the electron beam to a transversal...
7999225 Charged particle source with integrated energy filter  
The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As...
7994472 Laser-driven deflection arrangements and methods involving charged particle beams  
Systems, methods, devices and apparatus are implemented for producing controllable charged particle beams. In one implementation, an apparatus provides a deflection force to a charged particle...
7994488 Low contamination, low energy beamline architecture for high current ion implantation  
An ion implantation system comprising an ion source that generates an ion beam along a beam path, a mass analyzer component downstream of the ion source that performs mass analysis and angle...
7994739 Internal injection betatron  
A betatron magnet having at least one electron injector positioned approximate an inside of a radius of a betatron orbit, the betatron magnet further includes a first guide magnet having a first...
7989777 Method for inspecting settling time of deflection amplifier, and method for judging failure of deflection amplifier  
A method for inspecting a settling time of a deflection amplifier includes setting a settling time, performing shooting a plurality of times alternately to project two patterns of different types...
7989776 Corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial, chromatic aberration  
A corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration includes two correction pieces, which are arranged one behind the...
7989768 Scanning electron microscope  
A scanning electron microscope having a charged particle beam that when in a state being irradiated toward a sample, a voltage is applied to the sample so that the charged particle beam does not...
7986113 Selectable frequency light emitter  
We describe an ultra-small resonant structure that produces electromagnetic radiation (e.g., visible light) at selected frequencies that can also be used or formed in conjunction with passive...
7982183 Ion transfer tube with spatially alternating DC fields  
An ion transfer arrangement for transporting ions between higher and lower pressure regions of a mass spectrometer includes an electrode assembly (120) with a first plurality of ring electrodes...
7982192 Beam processing apparatus  
In a beam processing apparatus including a beam scanner having a two electrodes type deflection scanning electrode, the beam scanner further includes shielding suppression electrode assemblies...
7977648 Scanning aperture ion beam modulator  
A modulator for ions such as protons employs multiple shutter pairs to create independently movable apertures effecting a multiple pencil beam treatment of the patient thereby increasing treatment...
7977630 Electron microscope  
There is disclosed an electron microscope that achieves low-magnification imaging while the objective lens is kept at high excitation in the same way as during high-magnification imaging. An...
7977649 Plasma ion source mass spectrometer  
Provided is a plasma ion source mass spectrometer with an ion deflector lens having an improved removal ratio of photons and neutral particles as compared with the conventional art while an ion...
7977633 Phase plate, in particular for an electron microscope  
The invention concerns a phase plate, in particular for an electron microscope, which is disposed in an electron beam path (4), comprises at least one thin film (8, 8a-h), which thin film is at...
7973485 Particle controller  
A particle controller is disclosed. In some embodiments, a particle controller includes an input port configured to receive a particle stream and a set of cells configured to form a tube through...
7973290 System and method of beam energy identification for single wafer ion implantation  
The present invention involves a beam energy identification system, comprising an accelerated ion beam, wherein the accelerated ion beam is scanned in a fast scan axis within a beam scanner,...
7973297 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium  
When writing a hard disk pattern on a substrate applied with a resist by scanning an electron beam on the substrate while rotating a rotation stage, writing is started with respect to each radial...
7973289 Method for producing image contrast by phase shifting in electron optics  
According to the invention, the image contrast in electron optics can be improved without causing aberrations that are no longer tolerable by using, for production and correction of the at least...
7968855 Dual mode gas field ion source  
A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for...
7960693 Microengineered electrode assembly  
Microengineered stacked ring electrode assemblies capable of acting as either RF or DC ion guides in an ion optical system, and method of fabricating same are described. The electrodes are...
7960703 Charged-particle beam lithography apparatus and device manufacturing method  
A charged-particle beam lithography apparatus includes a projection system that projects a charged-particle beam, and images a pattern on a substrate with the projected charged-particle beam. The...
7947964 Charged particle beam orbit corrector and charged particle beam apparatus  
The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a...
7943903 Defect inspection method and its system  
A method for enabling management of fatal defects of semiconductor integrated patterns easily, the method enables storing of design data of each pattern designed by a semiconductor integrated...
7939800 Arrangement and method for compensating emitter tip vibrations  
The present invention provides a charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip; and supporting member for supporting the emitter....
7939809 Charged particle beam extraction method and apparatus used in conjunction with a charged particle cancer therapy system  
The invention comprises a charged particle beam extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. The system uses a...