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6194730 |
Electrostatic lens
Electrostatic lens for focussing the beams of charged particles, more particularly of ions, which have electrodes being designed as an electric conductor with a ring-shaped section, the inner edge...
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6191423 |
Correction device for correcting the spherical aberration in particle-optical apparatus
Electron-optical rotationally symmetrical lenses inevitably suffer from spherical aberration which often imposes a limit on the resolution. This lens defect cannot be eliminated by compensation by...
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6191419 |
Machined electrostatic sector for mass spectrometer
An electrostatic sector device for a mass spectrometer is formed from a single piece of machinable ceramic. The machined ceramic is coated with a nickel coating, and a notch is etched in the nickel...
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6184525 |
Environmental SEM with a multiple fields for improved secondary electron detection
Amplification of the current of secondary electrons emanating from the specimen 14 is realized in an ESEM by avalanche-like ionization of the molecules 41 of the gas atmosphere. However, in order...
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6184975 |
Electrostatic device for correcting chromatic aberration in a particle-optical apparatus
Electron-optical rotationally symmetrical lenses inevitably suffer from chromatic aberration which often determines the resolution limit at low acceleration voltages. This lens defect cannot be...
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6180947 |
Multi-element deflection aberration correction for electron beam lithography
A method of optimizing locations of correction elements of a charged particle beam system determines respective corrector element currents to achieve optimum correction as a function of individual...
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6163032 |
Tapered or tilted electrodes to allow the superposition of independently controllable DC field gradients to RF fields
The present invention is embodied in a method and apparatus for transporting ions via a path generated by RF electrodes having a controllable DC field gradient generated thereon which does not...
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6153885 |
Toroidal charged particle deflector with high mechanical stability and accuracy
A semiconductor manufacturing tool for charged particle lithography systems such as an EBPS comprises a magnetic deflector with a hub comprising a cylinder mounted on flange. The hub has an opening...
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6137246 |
Charge-exchange device
A charge-exchange device is disclosed which is able to considerably reduce, without the use of foils, radio activation caused by a beam deflection angle and, which also implements a further...
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6113851 |
Apparatus and process for dry sterilization of medical and dental devices and materials
An apparatus and process for accomplishing low-temperature sterilization in a plasma generated using a variety of gas molecules. The plasma is generated using a hollow cathode discharge device of...
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6107628 |
Method and apparatus for directing ions and other charged particles generated at near atmospheric pressures into a region under vacuum
A method and apparatus for focusing dispersed charged particles. More specifically, a series of elements within a region maintained at a pressure between 10 -1 millibar and 1 bar, each having...
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6107633 |
Electron beam lens
An electron beam lens has a magnetic lens provided with first and second pole pieces for influencing an electron beam and forming a magnetic field between the two pole pieces. A third pole piece is...
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6104029 |
Spectrometer and method of spectroscopy
A spectrometer and method of spectroscopy are provided for surface analysis. The spectrometer comprises an energy analyser for analysing the energies of charged particles liberated from a sample, a...
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6104034 |
Objective lens
The invention relates to an objective lens for influencing a particle beam, particularly an electron beam with a magnetic single-pole lens and an electrostatic lens having a first and a second...
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6077417 |
Silicon microlens cleaning system
A method and system for cleaning the silicon microlenses in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current through each microlens. The current is...
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6078054 |
Charged particle beam optical system
Charged-particle-beam (CPB) optical systems are provided that reduce the required number of power supplies used to energize the constituent lenses and deflectors, while imparting no adverse effects...
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6075249 |
Methods and apparatus for scanning and focusing an ion beam
Methods and apparatus are provided for scanning and focusing a charged particle beam, such as an ion beam. The apparatus includes a charged particle source for generating a charged particle beam,...
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6069363 |
Magnetic-electrostatic symmetric doublet projection lens
Resolution of a symmetric magnetic doublet charged particle beam projection lens is improved by applying a non-uniform electrostatic field having the same symmetry conditions as the lens through...
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6066855 |
Charged-particle-beam optical system exhibiting aberration correction
Charged-particle-beam optical systems are disclosed that are usable in projection-exposure apparatus employing a charged particle beam for projecting an image of an object (e.g., region of a...
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6066852 |
Electron energy filter
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6060715 |
Method and apparatus for ion beam scanning in an ion implanter
An ion implanter for implanting ions in a target substrate is arranged to scan the ion beam at the point of extraction of the beam from the ion source. The ion beam extraction assembly includes a...
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6055719 |
Method for manufacturing an electrostatic deflector
The present invention relates to a charged particle beam exposure apparatus, deflecting a charged particle beam formed into a predetermined shape by being passed through a predetermined...
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6051838 |
Optical unit
An optical unit having an electrostatic lens for influencing a particle beam wherein the lens has at least one first and one second electrode downstream of one another in the direction of the...
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6028317 |
Charged particle beam optical element charged particle beam exposure apparatus and method of adjusting the same
An optical element includes two electrodes 1 and 2 arranged at a distance to oppose each other and configured to converge an electron beam. The opposing surfaces of the electrodes 1 and 2 are so...
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6028662 |
Adjustment of particle beam landing angle
The invention relates to a method and apparatus for measuring The landing angle of a particle beam is adjusted by scanning the beam over two cylindrical beam target surfaces that are positioned...
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6025600 |
Method for astigmatism correction in charged particle beam systems
A method for calculating and correcting an astigmatism error in a charged particle beam system. Images are collected during a single focus sweep of the charged particle beam system. Different...
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6023067 |
Blanking system for electron beam projection system
A charged particle beam projection system includes a source of charged particles and a first doublet of condenser lenses with a first symmetry plane through which the beam is directed, located...
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6013913 |
Multi-pass reflectron time-of-flight mass spectrometer
A novel design for a time-of-flight mass spectrometer capable of tandem mass spectrometry measurements with high resolution and high sensitivity using two variable reflectrons in a co-linear...
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6008495 |
Electron beam exposure device
An electron beam exposure device in which an electron beam from an electron beam source is passed through at least a slit of a first slit assembly. The first slit assembly includes: a base; a...
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6005250 |
Illumination deflection system for E-beam projection
An electron beam projection system comprises a source of an electron beam, a first doublet of condenser lenses with a first symmetry plane, a first aperture comprising a trim aperture located at...
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5998795 |
Electron beam pattern-writing column
An electron beam pattern-writing column comprises an emitter and an extractor (14, 15) for generating a low-energy electron beam (13), a series of three electrostatic triple element lenses (17, 18,...
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5994695 |
Optical path devices for mass spectrometry
An apparatus, system and method of fabricating the apparatus utilize a flexible substrate to provide structural integrity for the apparatus. The apparatus is an optical path device used in mass...
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5986269 |
Correction device for correcting chromatic aberration in particle-optical apparatus
Particle-optical rotationally symmetrical lenses inevitably have chromatic aberration. This lens fault determines the limit of the resolution of known particle-optical apparatus at a comparatively...
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5965894 |
Method of operating a particle-optical apparatus
Electron-optical, rotationally-symmetrical lenses inevitably exhibit spherical and chromatic aberration which usually determine the limit of the resolution. Such lens aberrations cannot be...
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5952656 |
Energy filter
There is disclosed an Ω-filter for use with an electron microscope. This filter has only one parameter that controls the exciting currents supplied to four magnets M 1 -M 4 . Only those electrons...
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5947053 |
Wear-through detector for multilayered parts and methods of using same
The present invention relates to wear-through detection in multilayered parts. This invention specifically encompasses, in one aspect, wear-through detection in semiconductor vacuum processing...
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5949076 |
Charged beam applying apparatus
A charged beam applying apparatus comprises a column at least having a charged beam generation section and optical system for controlling the charged beam and a chamber for holding a specimen in...
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5945677 |
Focused ion beam system
A focused ion beam (FIB) system produces a final beam spot size down to 0.1 μm or less and an ion beam output current on the order of microamps. The FIB system increases ion source brightness by...
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5929452 |
Electrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the same
A method of manufacturing an electrostatic deflecting electrode unit for use in charged beam lithography apparatus comprises a first step of preparing a hollow cylindrical member made of metal, a...
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5920073 |
Optical system
An optical system for a particle beam device such as an electron microscope, e-beam device or FIB device, including a particle beam column having an optical axis along which a beam of particles is...
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5895917 |
Detector objective lens
The invention relates to a detector objective lens and a charged particle am device with such a detector objective lens containing a main lens for focussing a charged particle beam on a specimen,...
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5895919 |
Gun lens for generating a particle beam
The invention relates to a gun lens for generating a particle beam with a cathode, an extraction electrode, an anode and a condenser lens, wherein a deceleration field is generated between the...
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5888699 |
Pattern transfer method and transfer apparatus by charged particle beam
Disclosed herein is a pattern transfer method wherein a beam transmitting portion which transmits a charged particle beam and a beam limiting portion which scatters or absorbs the charged particle...
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5874739 |
Arrangement for shadow-casting lithography
An arrangement for shadow-casting lithography by focusing electrically charged particles for the purpose of imaging structures of a mask on a substrate disposed immediately to the rear thereof,...
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5872356 |
Spatially-resolved electrical deflection mass spectrometry
A mass spectrometer is disclosed which yields fast, full-scan spectra over a wide mass-to-charge ratio range. The instrument contains an ion source which generates nearly monoenergetically-pulsed...
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5869838 |
Field composable electrostatic lens system
An electrostatic lens system consisting of several electrodes and a novel method of making same. The invention relates to a lithography apparatus that includes a field composable lens where at...
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5850083 |
Charged particle beam lithograph apparatus
A charged particle beam lithograph apparatus of the present invention projects a charged particle beam onto a sample through a mask and lithographs a mask pattern on the sample through the movement...
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5843603 |
Method of evaluating shaped beam of charged beam writer and method of forming pattern
A method of evaluating a shaped beam generated by a charged beam writer, comprises the steps of: a first step of shaping line beams by dividing into 1/n one side of the shaped beam having a...
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5838120 |
Accelerator with closed electron drift
The invention is related to a plasma technology field, in particular, to plasma accelerators, used in a space technology, in scientific researches and in industry. A technical result is that the...
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5838011 |
Correction device for the correction of lens aberrations in particle-optical apparatus
Particle-optical rotationally-symmetrical lenses inevitably exhibit spherical and chromatic aberration. These lens aberrations usually determine the limit of the resolution of the known...
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