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6462338 |
Mass spectrometer
A mass spectrometer according to the present invention includes an ion lens composed of an even number of virtual rod electrodes 31, 32 positioned separately around the ion beam axis C, where...
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6455848 |
Particle-optical apparatus involving detection of Auger electronics
In a SEM it is desirable, in given circumstances, to acquire an image of the sample ( 14 ) by means of Auger electrons extracted from the sample and traveling back through the bore of the objective...
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6448556 |
Atomic focusers in electron microscopy
In electron microscopy, resolution is improved by using an atom or atom-array focuser, with the atom or atom array serving as an electrostatic lens at a focal plane of an electron beam probe having...
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6444990 |
Multiple target, multiple energy radioisotope production
A multiple target array for receiving particles from a particle beam generator includes a particle beam transport path having a transport inlet and a transport outlet, the inlet receiving a...
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6441378 |
Magnetic energy filter
A compact magnetic energy filter having at least four magnetic fields to deflect the trajectory of an electron beam from the entrance window to the exit slit. A rotational symmetry axis is located...
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6437353 |
Particle-optical apparatus and process for the particle-optical production of microstructures
The invention relates to a particle-optical apparatus for particle-optical mask projection. According to the invention, an energy filter is used, by which particles which are inelastically...
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6429607 |
Constant power dynamic focus coil
A dynamic focus coil produces different selected ampere-turns while consuming constant power and therefore maintaining constant temperature. The focus coil comprises a set of coils that all consume...
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6420713 |
Image position and lens field control in electron beam systems
A charged particle beam system with a source of charged particles produces a beam directed along a path. A given electromagnetic lens is located along the path. The given electromagnetic lens is...
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6420714 |
Electron beam imaging apparatus
An apparatus for projection lithography is disclosed. The apparatus has at least one magnetic doublet lens. An aperture scatter filter is interposed between the two lenses of the magnetic doublet...
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6417511 |
Ring pole ion guide apparatus, systems and method
A ring pole ion guide apparatus and method provide the focusing and confinement advantages of conventional multipoles and the axial field of a conventional DC ring guide all in one device. The ring...
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6414319 |
Electron optical lens system with a slot-shaped aperture cross section
This invention concerns a lens system, particularly for focusing electrons, with a cylindrical lens with pole shoes or electrodes, between which an aperture is located. This aperture has a...
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6392243 |
Electron beam exposure apparatus and device manufacturing method
An electron optical system for controlling an electron beam to write a pattern detects the position of a stage reference mark on a stage using the electron beam, and a wafer stage position...
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6380546 |
Focusing assembly and method for a charged particle beam column
Method and assembly are presented for focusing a charged particle beam while directing it onto a specimen. The assembly comprises a lens arrangement producing a focusing field and first and second...
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6369384 |
Time-of-flight mass spectrometer with post-deflector filter assembly
A time-of-flight mass spectrometer includes a deflector and a filter assembly that is located along a flight path between the deflector and an ion detector. The filter assembly passes incoming ions...
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6365903 |
Method of forming a quadrupole device for projection lithography by means of charged particles
According to a known projection lithography method an object is imaged on an imaging surface by means of a telescopic system of rotationally symmetrical electron lenses. The throughput during the...
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6365898 |
Scanning electron microscope
A scanning electron microscope has means for generating a beam of electrons which is scanned over a specimen held within a holder in a chamber which contains a gaseous medium. A negative potential...
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6348689 |
Focused ion beam apparatus
A charged particle beam apparatus has a heater for heating an internal component to a sufficient temperature to prevent solidification of particles thereon and to thus improve the reliability of...
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6342397 |
Homogeneous biospecific assay using a solid phase, two-photon excitation and confocal fluorescence detection
A homogeneous biospecific assay method for an analyte in solution or in a biological suspension, in which a biospecific reagent competitively binding an analyte and a ligand labeled with a...
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6329659 |
Correction device for correcting the lens defects in particle-optical apparatus
Electron-optical rotationally symmetrical lenses inevitably suffer from spherical and chromatic aberration which often impose a limit on the resolution. These lens defects cannot be eliminated by...
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6328621 |
Electron gun, CRT with electron gun
Method and apparatus for manufacturing an electron gun. A beam spot coefficient is obtained from an electrostatic lens magnification and a spherical aberration coefficient of a set resistance...
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6326631 |
Ion implantation device arranged to select neutral ions from the ion beam
An ion implantation device includes at least two successive deceleration stages the first deceleration stage, looking in the downstream direction, being arranged to decelerate the ion beam, to...
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6326633 |
Device fabrication methods using charged-particle-beam image-transfer apparatus exhibiting reduced space-charge effects
Charged-particle-beam ("CPB"; e.g., electron-beam) apparatus are disclosed that exhibit reduce image blur due to space-charge effects. With such apparatus, a reticle pattern can be imaged on a...
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6326632 |
Particle-optical imaging system for lithography purposes
In a particle-optical imaging lithography system, an illuminating system comprising a particle source and a first electrostatic lens arrangement produces a particle beam which penetrates a mask...
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6326627 |
Mass filtering sputtered ion source
A device and method for separating ions uses electric and magnetic fields that are specifically configured and oriented in a vacuum chamber. Also, a central electrode that is made of the materials...
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6326629 |
Projection lithography device utilizing charged particles
An object (14) is imaged on an imaging surface (16) by means of a telescopic system of rotationally symmetrical electron lenses (10, 12). The imaging system includes two quadrupoles, each of which...
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6323499 |
Electron beam exposure apparatus and method, and device manufacturing method
An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area...
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6310353 |
Shielded lens
The present invention relates generally to ion beam handling in mass spectrometers, arid more specifically to a method and apparatus for focusing ions in time-of-flight mass spectrometers (TOFMS)....
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6307209 |
Pattern-transfer method and apparatus
Charged-particle-beam pattern-transfer methods and apparatus are disclosed. Circuit patterns on a mask are divided into a plurality of fields, each field including respective connection ends....
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6300628 |
Focused ion beam machining method and device thereof
A focused ion beam machining method for etching the surface of a sample to obtain a desired profile formation portion by recurrently irradiating a focused ion beam to a desired region of the...
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6300625 |
Time-of-flight mass spectrometer
A small-sized, high-resolution, time-of-flight (TOF) mass spectrometer has a closed ion orbit formed by plural electric sectors. Ions can make plural revolutions in the closed orbit. An entrance...
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6291827 |
Insulating apparatus for a conductive line
A novel insulating apparatus for a conductive line is disclosed. The proposed insulating apparatus can be applied to various conductive lines with different shapes. The problem of short circuit can...
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6288401 |
Electrostatic alignment of a charged particle beam
A field emission source produces a charged particle beam that can be electrostatically aligned with the optical axis. Quadrupole (or higher multipole) centering electrodes approximately centered on...
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6281508 |
Precision alignment and assembly of microlenses and microcolumns
A method and the associated apparatus for alignment and assembly of microlenses and microcolumns in which aligning structures such as rigid fibers are used to precisely align multiple microlens...
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6274866 |
Systems and methods of mass spectrometry
The invention provides mass spectrometer systems, including time-of-flight mass spectrometers, and methods of performing mass spectroscopy. The systems are capable of operating in tandem or...
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6274876 |
Inspection apparatus and method using particle beam and the particle-beam-applied apparatus
The inspection apparatus uses a particle beam and has a high throughput by obtaining a characteristic frequency corresponding to the characteristic quantity of focusing-shift from a Fourier...
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6268606 |
Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-up
An electrostatic deflector of an electron beam exposure apparatus is disclosed. A cylindrical holding member is made of an insulating material. An electrode including a plurality of electrode...
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6265653 |
High voltage photovoltaic power converter
An array of independently connected photovoltaic cells on a semi-insulating substrate contains reflective coatings between the cells to enhance efficiency. A uniform, flat top laser beam profile is...
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6246058 |
Correction device for correcting chromatic aberration in particle-optical apparatus
particle-optical apparatus at a comparatively low acceleration voltage (from 0.5 kV to 5 kV). This lens defect cannot be eliminated by means of rotationally-symmetrical fields. In order to enhance...
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6242747 |
Method and system for optimizing linac operational parameters
A method and apparatus is provided for controlling the operational parameters of a radio frequency (RF) linear accelerator (linac) (23) in an ion implanter (1). An operator or a higher level...
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6242750 |
Ion implantation device
The present invention provides ion implantation equipment in which the beam current in a lower energy region can be increased without making the equipment very large and the production of the...
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6236052 |
Quadrupole device for projection lithography by means of charged particles
According to a known projection lithography method an object is imaged on an imaging surface by means of a telescopic system of rotationally symmetrical electron lenses. The throughput during the...
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6236053 |
Charged particle detector
A device for directing a primary particle beam at a sample and detecting particles in accordance with the emergence of particles from the sample. The device comprises a source for generating the...
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6232601 |
Dynamically compensated objective lens-detection device and method
The invention relates to a charged particle beam device and a method for inspecting a specimen, comprising a source for generating a charged particle beam, an objective lens with an optical axis...
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6225627 |
Focused ion beam system
A charged beam system is provided which includes: a focusing lens system for focusing an ion beam emitted from an ion source; scanning electrodes for applying the focused ion beam onto a...
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6218664 |
SEM provided with an electrostatic objective and an electrical scanning device
The detector 6 for the secondary electrons in a SEM provided with an electrostatic objective 14, 16 is arranged ahead of the objective, thus enabling a high detection efficiency. According to the...
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6218676 |
Charged-particle-beam image-transfer apparatus exhibiting reduced space-charge effects and device fabrication methods using the same
Charged-particle-beam ("CPB"; e.g., electron-beam) apparatus are disclosed that exhibit reduce image blur due to space-charge effects. With such apparatus, a reticle pattern can be imaged on a...
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6207963 |
Ion beam implantation using conical magnetic scanning
Method and apparatus for use in treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. Ions emitted by an ion source are accelerated away from the...
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6201251 |
Compensation of space charge in a particle beam system
Variable space charge effects in the imaging portion of a particle beam projection system due to variations in transmitted beam current are compensated with an additional lens appropriately...
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6198095 |
Apparatus and method for imaging a particle beam
An apparatus and method for imaging on a detector a particle beam of charged particles having a distinct energy distribution and a distinct angle distribution. The apparatus has deflectors which...
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6194729 |
Particle beam apparatus
The invention relates to a particle beam apparatus, in which very low target energies of the particles focused on the object can be set, with good imaging conditions. For this purpose, the beam...
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