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8242468 Ion implanter for photovoltaic cell fabrication  
Ion implanters are especially suited to meet process dose and energy demands associated with fabricating photovoltaic devices by ion implantation followed by cleaving.
8242457 Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams  
A charged particle shaped beam column includes: a charged particle source; a gun lens configured to provide a charged particle beam approximately parallel to the optic axis of the column; an...
8242474 Extreme ultraviolet light generation apparatus  
An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam...
8237118 Partial ovoidal FAIMS electrode  
A partial ovoidal FAIMS apparatus for separating ions is presented with inner and outer electrodes that have geometrically matched convex and concave partial ovoidal surfaces, respectively, that...
8237136 Method and system for tilting a substrate during gas cluster ion beam processing  
A method and system for treating a non-planar structure is described. The method includes forming a non-planar structure on a substrate. Additionally, the method includes generating a gas cluster...
8237119 Scanning type charged particle beam microscope and an image processing method using the same  
Design data and sample characteristic information corresponding to individual areas on the design data are used to perform an image quality improvement operation to make appropriate improvements...
8232536 Particle beam irradiation system and method for controlling the particle beam irradiation system  
There is provided a particle beam irradiation system so as to provide the dose distribution having more accuracy. An irradiation control part comprises an energy setting controller that sets the...
8232532 Off-axis ion milling device for manufacture of magnetic recording media and method for using the same  
A tool for patterning a disk such as a magnetic media disk for use in a disk drive system. The tool includes a chamber and a first and second series of magnets, each evenly spaced about the...
8232748 Traveling wave linear accelerator comprising a frequency controller for interleaved multi-energy operation  
An electromagnetic wave having a phase velocity and an amplitude is provided by an electromagnetic wave source to a traveling wave linear accelerator. The traveling wave linear accelerator...
8227773 Versatile beam glitch detection system  
A glitch duration threshold is determined based on an allowable dose uniformity, a number of passes of a workpiece through an ion beam, a translation velocity, and a beam size. A beam dropout...
8222597 Ion guide for mass spectrometers  
The present invention relates generally to mass spectrometry and the analysis of chemical samples, and more particularly to ion guides for use therein. The invention described herein comprises an...
8222617 Laser-driven particle beam irradiation apparatus and method  
A laser-driven particle beam irradiation apparatus includes: a particle beam generator irradiating a target with pulsed laser light to emit a laser-driven particle ray; a beam converging unit...
8222621 Method for maskless particle-beam exposure  
In a maskless particle multibeam processing apparatus, a particle beam is projected through a pattern definition system producing a regular array of beamlets according to a desired pattern, which...
8217373 Determination of a planning volume for irradiation of a body  
A system for irradiating a predetermined target volume in a body with a particle beam is constructed to direct the particle beam at a multiplicity of target points in the body in succession, in...
8217364 Particle beam irradiation apparatus  
A particle beam irradiation apparatus which can perform high-precision beam irradiation position is obtained. The apparatus is provided with inverse mapping means having an inverse mapping...
8212224 Charged particle beam device  
The present invention provides a charged particle beam device which can effectively restrain misalignment of an optical axis even if a position of an anode is changed. The present invention is a...
8212227 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus  
An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of...
8212223 Particle beam irradiation apparatus  
There is obtained a particle beam irradiation apparatus which does not use any IF sentence (conditional expression for case classification) and can calculate a control command and enhance...
8203119 Charged particle beam device with retarding field analyzer  
The invention provides a charged particle beam device to inspect or structure a specimen with a primary charged particle beam propagating along an optical axis; a beam tube element having a tube...
8198607 Tandem accelerator method and apparatus used in conjunction with a charged particle cancer therapy system  
The invention comprises a tandem accelerator method and apparatus, which is part of an ion beam injection system used in conjunction with multi-axis charged particle radiation therapy of cancerous...
8198601 Method for producing a multi-beam deflector array device having electrodes  
The disclosure relates to a method for producing a multi-beam deflector array device with a plurality of openings for use in a particle-beam exposure apparatus, in particular a projection...
8198602 Electrostatic lens structure  
An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first...
8193512 Irradiation field forming device  
An irradiation field forming device for forming an irradiation field when a specimen is irradiated with a charged particle beam generated by an accelerator, the irradiation field forming device...
8193511 Method of calibrating beam position in charged-particle beam system  
A method of calibrating the beam position in a charged-particle beam system starts with finding a focus deviation on the material surface for each point within a deflection field. A focus...
8188443 Focusing method of charged particle beam and astigmatism adjusting method of charged particle  
A focusing method of a charged particle beam includes measuring a first set value to focus a beam on a position of a reference plane by using a lens coil, acquiring a first factor to change a set...
8188425 Ion optics systems  
In various embodiments, provided are ion optics systems comprising an even number of ion mirrors arranged in pairs such that a trajectory of an ion exiting the ion optics system can be provided...
8183539 High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter  
The present invention provides a mass analyzing magnet which can bend a very wide charged particle ribbon beams through angles between 90 to 200 degrees. The shorter dimension of the ribbon beam...
8183526 Mirror monochromator for charged particle beam apparatus  
One embodiment relates to an apparatus for generating a charged particle beam with reduced energy width. A charged particle source is configured to generate a charged particle beam with a range of...
8183545 Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing  
There is provided a charged particle beam writing apparatus in which data processing is optimized by automatically dividing process regions on which parallel distributed processing is performed. A...
8183543 Multi-beam source  
A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of...
8178856 Charged particle beam writing apparatus and method thereof  
A charged particle beam writing apparatus includes a charge amount distribution calculation unit configured to calculate a charge amount distribution which is charged by irradiation of a charged...
8178850 Chromatic aberration corrector for charged-particle beam system and correction method therefor  
An aberration corrector has two stages of multipole elements each of which has a thickness along the optical axis. Each multipole element produces a static electric or magnetic field of 3-fold...
8178849 Objective lens  
An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of...
8173948 Optical coupling apparatus for a dual column charged particle beam tool for imaging and forming silicide in a localized manner  
An optical coupling apparatus for a dual column charged particle beam tool allowing both optical imaging of an area of an integrated circuit, as well as localized heating of the integrated circuit...
8173963 Phase-shifting element and particle beam device having a phase-shifting element  
A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the...
8173979 Generating and visualizing an ion beam profile  
A method for generating and visualizing an ion beam profile is provided. The method includes specifying an incidence direction of a particle beam, specifying a target region that is to be...
8173335 Beam ablation lithography  
Provided are beam ablation lithography methods capable of removing and manipulating material at the nanoscale. Also provided are nanoscale devices, nanogap field effect transistors, nano-wires,...
8173976 Linear ion processing apparatus with improved mechanical isolation and assembly  
An ion processing apparatus includes a plurality of electrodes, first and second insulators, a housing, and a plurality of compliant first supports and second supports. Each electrode has a length...
8168962 Method and apparatus for uniformly implanting a wafer with an ion beam  
Initially, an ion beam is formed as an elongated shape incident on a wafer, where the shape has a length along a first axis longer than a diameter of the wafer, and a width along a second axis...
8168946 Charged particle separation apparatus and charged particle bombardment apparatus  
A charged particle separation apparatus that separates ionized gas clusters is disclosed. The charged particle separation apparatus includes an electric field applying part including two...
8168956 Scanning transmission electron microscope and method of aberration correction therefor  
A scanning transmission electron microscope (STEM) and method of aberration correction have autocorrelation function calculation means, aberration coefficient calculation means, and feedback...
8164068 Mask health monitor using a faraday probe  
In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen....
8164070 Collimator magnet for ion implantation system  
A collimator magnet (CM) usable in an ion implantation system provides an exit ion beam with a large aperture, substantially parallel in one plane or orthogonal planes. The CM includes identical...
8164066 Magnetic lens, method for focusing charged particles and charged particle energy analyzer  
The invention provides a magnetic lens for generating a magnetic imaging field to focus charged particles emitted from a sample, the lens comprising a central pole piece and an outer pole piece...
8164060 System and method for a charged particle beam  
System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for...
8153990 Particle beam therapy system  
A particle beam therapy system that is capable of irradiating a target area with an irradiation beam suitable for a particle beam therapy using a spot scanning method includes a synchrotron, a...
8153989 Charged particle beam irradiating apparatus  
The present invention provides a charged particle beam irradiating apparatus capable of simply preventing unevenness or reduction in a peripheral portion of the dose distribution of a charged...
8153991 Direct write lithography system  
A direct write lithography system. The system includes a converter having an array of light controllable electron sources, each field emitter being arranged for converting light into an electron...
8153965 Apparatus and method for merging a low energy electron flow into a high energy electron flow  
An apparatus for merging a low energy electron flow into a high energy electron flow may include: a high energy electron path for accommodating the high energy electron flow; and a plurality of...
8148702 Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns  
The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in...