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8344340 Inner gantry  
A system includes a patient support and an outer gantry on which an accelerator is mounted to enable the accelerator to move through a range of positions around a patient on the patient support....
8339071 Particle accelerator having wide energy control range  
A particle accelerator system for producing a charged particle beam having pulses of charged particles that have different energy levels from pulse to pulse. The system enables independent...
8338781 Charged particle beam scanning method and charged particle beam apparatus  
In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan...
8334509 Particle beam irradiation apparatus and particle beam irradiation method  
A particle beam irradiation apparatus includes a beam scanning indication unit which two-dimensionally indicates a position of a particle beam in series for each of slices obtained by dividing an...
8334517 Apparatus for adjusting ion beam by bended bar magnets  
Apparatus and method for adjusting an ion beam between a mass analyzer and a substrate holder. Herein, one or more bended, such as arch-shaped, curved or zigzag shaped, bar magnets are configured...
8330103 Charged particle beam apparatus and specimen inspection method  
In a multi-charged-particle-beam apparatus, when an electric field and voltage on a surface of a specimen are varied according to characteristics of the specimen, a layout of plural primary beams...
8330125 Ion beam tuning  
A beam line ion implanter includes an ion source configured to generate an ion beam, a scanner configured to scan the ion beam to produce a scanned ion beam having trajectories which diverge from...
8324573 Detector for electron column and method for detecting electrons for electron column  
In a conventional micro-channel plate (MCP), a secondary electron (SE) detector or a semi-conductor detector the number of the electrons is amplified through its own structure. For such...
8324574 Aberration-correcting dark-field electron microscopy  
A transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. An aberration corrector corrects the...
8324590 Chopper for a particle beam  
A chopper for a particle beam comprises an annular guiding element and an element for controlling the intensity of the particle beam. The control element is supported on the guiding element so...
8319192 Charged particle apparatus  
An electromagnetic compound objective lens is provided for charged particle device, especially as an objective lens of low-voltage scanning electron microscope (LVSEM), which comprises a magnetic...
8314401 Electron gun with magnetic immersion double condenser lenses  
An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly...
8314409 Pattern modification schemes for improved FIB patterning  
An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals....
8314411 Particle beam therapy system  
There is obtained a particle beam therapy system in which the beam size is reduced. There are provided an accelerator 14 that accelerates a charged particle beam; an irradiation apparatus that has...
8314402 Corrector  
The invention concerns a corrector (9) for chromatic and aperture aberration correction in an electron microscope with six multipoles (1, 2, 3, 4, 5, 6) which are disposed in the optical path (7)...
8314403 Gas field ion source with coated tip  
Coated tips, as well as related articles, systems and methods are disclosed.
8314381 Reflector for a time-of-flight mass spectrometer  
A reflector for a time-of-flight mass spectrometer for reflecting ionized atoms and/or molecules, with an entry opening and with an arrangement of successively arranged ring electrodes extending...
8309936 Ion deflector for two-dimensional control of ion beam cross sectional spread  
An ion deflector, for deflecting a beam of charged particles along an arc in a deflection plane, includes a pair of non-spherical deflection electrodes adapted for being charged with different...
8309922 Semiconductor inspection method and device that consider the effects of electron beams  
Disclosed is a device capable of probing with minimal effect from electron beams. Rough probing is made possible using a lower magnification than the magnification usually viewed. When target...
8309935 End terminations for electrodes used in ion implantation systems  
An ion implantation system includes an electrostatic lens. The electrostatic lens includes a terminal electrode, a ground electrode and a suppression electrode disposed therebetween. An ion beam...
8309937 Grid providing beamlet steering  
A grid assembly coupled to a discharge chamber of an ion beam source is configured for steering ion beamlets emitted from the discharge chamber at circularly asymmetrically determined steering...
8304743 Electron beam focusing electrode and electron gun using the same  
An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the...
8299443 Microchip and wedge ion funnels and planar ion beam analyzers using same  
Electrodynamic ion funnels confine, guide, or focus ions in gases using the Dehmelt potential of oscillatory electric field. New funnel designs operating at or close to atmospheric gas pressure...
8299448 Determination of control parameters for irradiation of a moving target volume in a body  
A control parameter is determined for a system for irradiating a predetermined target volume in a body with a particle beam. The system is constructed to direct the particle beam at a multiplicity...
8299442 Particle beam apparatus having an annularly-shaped illumination aperture  
A particle beam apparatus has an optical axis (OA), an illuminating system (1, 2, 3, 4) for illuminating an object, which is positioned in an object plane (7), with a beam of charged particles and...
8294093 Wide aperature wien ExB mass filter  
An E×B Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be...
8294118 Method for adjusting optical axis of charged particle radiation and charged particle radiation device  
Provided are a method for adjusting the optical axis of a charged particle beam and a device therefor, wherein an artificial criterion is quantified, and whether or not the adjustment of the axis...
8294126 Apparatus for sterilising containers  
An apparatus (1) for sterilizing containers (10), comprising a treatment head (5) which has an exit window (8) through which charge carriers can pass, comprising a charge carrier generation source...
8294116 Photocathode with nanomembrane  
Optical beam modulation is accomplished with the aid of a semiconductive nanomembrane, such as a silicon nanomembrane. A photocathode modulates a beam of charged particles that flow between the...
8294117 Multiple beam charged particle optical system  
The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, andcharged particle optics...
8294115 Linear electron source, evaporator using linear electron source, and applications of electron sources  
A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for...
8294097 Charged particle radiation device  
The present invention provides a scanning charged particle beam device including a sample chamber (8) and a detector. The detector has: a function of detecting light at least ranging from the...
8294085 Mass spectrometric analyzer  
A mass spectrometric analyzer and an analysis method based on the detection of ion image current are provided. The method in one embodiment includes using electrostatic reflectors or electrostatic...
8288717 Apparatus and method for parallel flow ion mobility spectrometry combined with mass spectrometry  
Analyte ions entrained in a carrier gas are analyzed by parallel flow ion mobility spectrometry prior to analysis by a mass analyzer. An extended ion funnel is located in the vacuum system of the...
8283629 Aberration-corrected wien ExB mass filter with removal of neutrals from the Beam  
A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or...
8278635 Global point spreading function in multi-beam patterning  
In a particle multi-beam structuring apparatus for forming a pattern on a target's surface using a beam of electrically charged particles, during exposure steps the particle beam is produced,...
8274046 Monochromator for charged particle beam apparatus  
This invention provides a monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus, which comprises a beam adjustment element, two Wien-filter type...
8269188 Charged particle beam apparatus and sample processing method  
A charged particle beam apparatus includes an ion beam column having an ion source for generating an ion beam, a first objective lens electrode which forms a first objective lens for focusing the...
8263943 Ion beam device  
Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization...
8264174 Laser acceleration system for generating monoenergetic protons  
A proton acceleration system is provided for accelerating protons within a target. The system includes a laser source generating a laser beam having a wavelength λL and intensity and a target...
8258489 Transmission energy contamination detector  
An energy contamination detection apparatus includes a membrane and a charge collection plate disposed at a distance from the membrane. The membrane is configured to receive an ion beam and allow...
8258484 Beamlet blanker arrangement  
The invention relates to a charged particle multi-beamlet lithography system for exposing a target using a plurality of beamlets. The system has a beam generator, a beamlet blanker, and a beamlet...
8258475 Charged particle radiation device provided with aberration corrector  
There is provided a charged particle radiation device provided with an aberration corrector capable of correcting aberration with high precision in a short time by automatically setting an...
8258470 Radio frequency lens for introducing ions into a quadrupole mass analyzer  
An improved ion optical lens designed to increase the amount of ion current delivered into a multi-pole ion detector or transfer device, such as quadrupole mass analyzer, an ion guide, collision...
8258471 Pattern measuring apparatus and pattern measuring method  
A pattern measurement apparatus and a pattern measurement method are capable of easily distinguishing a line pattern and a space pattern from one another, without being affected by the luminance...
8253112 Lithography apparatus and focusing method for charged particle beam  
A lithography apparatus includes a unit irradiating a charged particle beam; first and second aperture plate members configured to shape the beam; first and second coils configured to be arranged...
8253113 Charged particle beam irradiation system and charged particle beam extraction method  
A charged particle beam irradiation system includes a synchrotron which accelerates an ion beam, an irradiation apparatus for irradiating an object with the ion beam introduced from the...
8253119 Well-based dynamic pattern generator  
One embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. The apparatus includes a plurality of base electrodes in a two-dimensional array, an...
8247783 Method of determining main deflection settling time for charged particle beam writing, method of writing with charged particle beam, and apparatus for writing with charged particle beam  
An electron beam is moved a long distance along a straight line from a sub-deflection region 101a to a diagonally opposite sub-deflection region 123w by main deflection of the beam, and a pattern...
8247782 Apparatus and method for investigating and/or modifying a sample  
An apparatus and a method for investigating and/or modifying a sample is disclosed. The apparatus comprises a charged particle source, at least one particle optical element forming a charged...