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Match Document Document Title
7414252 Method and apparatus for the automated process of in-situ lift-out  
An apparatus for performing automated in-situ lift-out of a sample from a specimen includes a computer having a memory with computer-readable instructions, a stage for a specimen and a...
7411192 Focused ion beam apparatus and focused ion beam irradiation method  
A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic...
7408155 Measuring method and its apparatus  
A method for measuring a dimension of a pattern formed on a sample using a secondary electron image obtained by picking up an image of the sample using a scanning electron microscope includes:...
7408154 Scanning electron microscope, method for measuring a dimension of a pattern using the same, and apparatus for correcting difference between scanning electron microscopes  
As measurement accuracy required for the scanning electron microscope (SEM) for measuring a pattern width becomes stringent, a technique of reducing the difference in a measured dimension between...
7405402 Method and apparatus for aberration-insensitive electron beam imaging  
One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the...
7399964 Electron microscope, measuring method using the same, electron microscope system, and method for controlling the system  
The present invention relates to an electron microscope which reduces a difference in measured values that occur due to a difference in resolution that cannot be fully adjusted which exists among...
7397050 Method and apparatus for specimen fabrication  
A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber, with an ion beam, a specimen holder to mount a specimen separated by...
7394078 Technique for ion beam angle spread control for advanced applications  
A technique for ion beam angle spread control for advance applications is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread...
7394075 Preparation of integrated circuit device samples for observation and analysis  
In one embodiment, a sample of an integrated circuit device is prepared for observation in a transmission electron microscope (TEM). The sample may be placed on a surface formed by vertical edges...
7394071 Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate  
A micro column electron beam apparatus having a reduced number of interconnections is provided. The micro column electron beam apparatus includes: a low temperature co-fired ceramic (LTCC)...
7394070 Method and apparatus for inspecting patterns  
When the electrode potential of a charge control electrode above a wafer is reduced, image brightness is reduced. A point of change in the image brightness is a switching point between a positively...
7391037 Apparatus for generating a plurality of beamlets  
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging...
7391034 Electron imaging beam with reduced space charge defocusing  
One embodiment pertains to an apparatus which impinges a focused electron beam onto a substrate. The apparatus includes an irradiation source and at least two non-axisymmetric lenses. The...
7388211 Semi-closed observational environment for electron microscope  
A semi-closed observational environment for an electron microscope includes a housing having at least two spacers for partitioning itself into a receiving chamber, a gas chamber below the receiving...
7388198 Electron microscope  
An electron microscope capable of producing EELS (electron energy-loss spectroscopy) has a spectral position correcting signal supply circuit for supplying a spectral position correcting signal H...
7378664 Deicing of radiation detectors in analytical instruments  
In an analytical instrument having a radiation detector, such as an electron microscope with an X-ray detector, a thermoelectric element (such as one or more Peltier junctions) is driven by a...
7375330 Charged particle beam equipment  
Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned....
7375329 Scanning electron microscope  
In a scanning electron microscope, slimming is reduced by reducing a frame count. As the frame count is reduced, the amount of detected secondary electrons decreases, so that a probe current amount...
7375328 Charged particle beam apparatus and contamination removal method therefor  
A charged particle beam apparatus comprising a preparatory evacuation chamber ( 15 in FIG. 1 A) into which a sample ( 12 ) is conveyed and which is preliminarily evacuated, an ultraviolet...
7375326 Method and system for focusing a charged particle beam  
A method for focusing a charged particle beam, the method including: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample...
7375325 Method for preparing a sample for electron microscopic examinations, and sample supports and transport holders used therefor  
In a method for preparing a sample for electron microscopic examinations, in particular with a transmission electron microscope (TEM), a) a substrate containing the sample to be prepared on...
7375323 Electron beam apparatus with aberration corrector  
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a...
7372051 Electric charged particle beam microscopy, electric charged particle beam microscope, critical dimension measurement and critical dimension measurement system  
Magnification errors are reduced in the required range of magnification in electric charged particle beam application apparatuses and critical dimension measurement instruments. To achieve this, a...
7372029 Scanning transmission electron microscope and scanning transmission electron microscopy  
A scanning transmission electron microscope for scanning a primary electron beam on a sample, detecting a transmitted electron from the sample by a detector, and forming an image of the transmitted...
7372028 Sample electrification measurement method and charged particle beam apparatus  
The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged...
7372025 Scanning probe microscope using a surface drive actuator to position the scanning tip  
A scanning probe microscope includes a scanning probe tip and an electrostatic surface actuator operatively coupled to the scanning probe tip. The electrostatic surface actuator includes a movable...
7368713 Method and apparatus for inspecting semiconductor device  
A method and apparatus for inspecting a wafer during a semiconductor device fabrication process. The apparatus performs, only via observation from the wafer's top surface, inspection and...
7365342 Device for operating gas in vacuum or low-pressure environment and for observation of the operation  
A device for operating gas in the vacuum or low-pressure environment and for observation of the operation includes a housing. The housing has a thinner part formed at a side thereof, and at least...
7365325 Method and apparatus for observing a specimen  
A method and device for observing a specimen in which an electron beam is irradiated and scanned from an oblique direction, onto a surface of a calibration substrate on which a pattern with a known...
7365324 Testing apparatus using charged particles and device manufacturing method using the testing apparatus  
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover...
7365323 Environmental scanning electron microcope  
In an environmental scanning electron microscope in which differential pumping for maintaining the pressure ratio between an electron optical system and a specimen chamber at a predetermined value...
7365306 Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same  
This invention provides an electron beam length measuring technology including a standard component for length measurement that has a finer standard dimension, and its producing method. The...
7361897 Imaging apparatus for high probe currents  
An imaging apparatus is provided, comprising a first lens, a Wien filter having a first opening and a second opening, and further comprising a 2*m-pole element, m≧2, and a second lens, wherein...
7361896 Scanning electron microscope and a method for adjusting a focal point of an electron beam of said scanning electron microscope  
In a scanning electron microscope, scanning region is set to be narrow, upon which focused electron beam is scanned, so that the focused electron beam can be irradiated at the almost same position...
7358495 Standard reference for metrology and calibration method of electron-beam metrology system using the same  
An electron-beam metrology system includes a specimen stage to mount a specimen on which a device pattern is formed, electron optics to radiate the device pattern with an electron-beam, a secondary...
7358494 Material composition analysis system and method  
The material composition of a thin film formed on a substrate or covered by a cap layer that shares one or more elements with the thin film can be determined by combining characteristic material...
7358493 Method and apparatus for automated beam optimization in a scanning electron microscope  
A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM)....
7355177 Electron beam device  
Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles...
7355176 Method of forming TEM specimen and related protection layer  
A method of forming a protection layer on a specimen for TEM inspection and a method of forming a specimen for TEM inspection are provided. The method of forming a protection layer on a specimen...
7355175 Method and apparatus for automatically correcting charged-particle beam and method of controlling aberration corrector for charged-particle beam  
There is disclosed a method and apparatus for automatically correcting a charged-particle beam with an aberration corrector without the operator performing manual operations. The apparatus has an...
7351971 Charged-particle beam instrument and method of detection  
A charged-particle beam instrument and method are offered which can inspect side and rear surfaces of the outer periphery of a specimen. The instrument has a source of the charged-particle beam and...
7351968 Multi-pixel electron emission die-to-die inspection  
One embodiment disclosed is a method of detecting defects in objects. A selected surface area of an object is inspected with a multi-pixel electron microscope, and first set of data is generated...
7348576 Technique for ion beam angle process control  
A technique for ion beam angle process control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle process control in an ion implanter...
7345289 Sample support prepared by semiconductor silicon process technique  
A sample support of the present invention is prepared such that a silicon substrate is used as a raw material, the thickness structure having a shape and a thickness of 10 μm or less is prepared...
7342226 Stress measuring method and system  
A convergent electron beam is incident on an evaluation region of a crystalline material to obtain a HOLZ pattern formed by the convergent electron beam transmitted to the crystalline material...
7335882 High resolution low dose transmission electron microscopy real-time imaging and manipulation of nano-scale objects in the electron beam  
The present invention includes a method, apparatus and system for nanofabrication in which one or more target molecules are identified for manipulation with an electron beam and the one or more...
7335881 Method of measuring dimensions of pattern  
With complexity of a process, the setting of conditions for pattern measurement by an SEM image falls into difficulties. However, the present invention aims to realize the setting of easy and...
7335880 Technique for CD measurement on the basis of area fraction determination  
The present invention provides a technique for estimating critical dimensions of highly scaled circuit features on the basis of scanning electron microscopy, wherein area fractions of a scan area...
7329878 Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same  
The present invention provides a method for manufacturing a lens assembly of a microcolumn having a plurality of microlenses and a plurality of insulating layers alternately interposed between the...
7326928 Electron microscope and a method of imaging objects  
An electron microscope and a method of imaging objects. The method including the steps of: generating at least one electron pulse, each electron pulse including a plurality of electrons with the...
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