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8618500 Multi channel detector, optics therefor and method of operating thereof  
A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection...
8610083 Systems and methods providing electron beam writing to a medium  
A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The...
8610060 Charged particle beam device  
An object of the present invention is related to detecting of a detection signal at an optimum position in such a case that a sample plane is inclined with respect to a charged particle beam. The...
8610061 Scanning electron microscope  
A seal member to be contacted with an observation object is provided at an open end of a lens barrel so that the observation object can be attracted to the lens barrel via the seal member and...
8604428 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system  
A method of controlling particle absorption on a wafer sample and charged particle beam imaging system thereof prevents particle absorption by grounding the wafer sample and kept electrically...
8604429 Electron beam device and sample holding device for electron beam device  
An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high...
8604427 Three-dimensional mapping using scanning electron microscope images  
A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are...
8604431 Pattern-height measuring apparatus and pattern-height measuring method  
An electron beam is irradiated on an observation region of a sample surface. An image (SEM image) is acquired based on a detection signal of secondary electrons from a detector disposed obliquely...
8604430 Method and an apparatus of an inspection system using an electron beam  
The inspection apparatus disclosed generates an electron beam, an acceleration electrode accelerates the electron beam, a convergence lens converges the electron beam, an electron beam deflector...
8604446 Devices and methods for cryo lift-out with in situ probe  
Cryogenic manipulation of a material sample with an in situ probe is enabled with a novel cooled probe design. A material sample mounted on a cryo-stage in a vacuum chamber is cooled to a...
8604432 Defect inspection apparatus and defect inspection method  
In accordance with an embodiment, a defect inspection apparatus includes a charged beam irradiation unit, a detection unit, an energy filter, and an inspection unit. The charged beam irradiation...
8598524 Slider bearing for use with an apparatus comprising a vacuum chamber  
An apparatus for loading a sample into a particle-optical instrument that includes a slider bearing having a base plate in contact with the vacuum chamber at one side, said base plate showing a...
8598527 Scanning transmission electron microscopy  
A scanning transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam to a probe, such as for example a...
8598525 Particle beam system  
A particle beam system comprises a particle beam source for generating a particle beam, an objective lens for focusing the particle beam onto an object plane, wherein the objective lens comprises...
8598526 Transmission electron microscope  
A transmission electron microscope in which a sample is positioned in a sample plane 9b comprises an objective lens 11b, a first projection lens system 61b having plural lenses, a second...
8596107 Correlation standard for calibrating a scanning electron microscope  
A correlation standard for calibrating a scanning electron microscope is provided. The correlation standard comprises a pellet and a metal stub. The pellet comprises a compressed mixture of carbon...
8592777 Integrable magnetic field compensation for use in scanning and transmission electron microscopes  
An arrangement and a method for imaging, examining and processing a sample using electrons. The arrangement comprises an electron microscope for providing electrons, a chamber with a sample holder...
8592762 Method of using a direct electron detector for a TEM  
A method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high...
8592776 Charged particle beam apparatus  
With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude...
8586923 Low-voltage transmission electron microscopy  
Embodiments of the invention relate to electron microscopy. Example embodiments relate to an apparatus including a first electron beam source, a second electron beam source, and a receiving unit....
8586920 Charged particle beam apparatus  
It has been difficult to obtain pattern contrast required for inspecting a specific layer of a circuit pattern in a charged particle beam apparatus which inspects, by using a charged particle...
8586921 Charged-particle microscope providing depth-resolved imagery  
A method of charged-particle microscopy, comprising: irradiating a sample surface S to cause radiation to emanate from the sample; detecting at least a portion of said emitted radiation recording...
8586919 Low-voltage transmission electron microscopy  
Embodiments of the invention relate to electron microscopy. Example embodiments relate to an apparatus including a first electron beam source, a second electron beam source, and a receiving unit....
8581186 Charged particle beam apparatus  
There is proposed a charged particle beam apparatus including: a plurality of noise removal filters that remove noise of an electrical signal; a measurement unit that measures the...
8581190 Charged particle beam apparatus and geometrical aberration measurement method therefor  
Disclosed is a scanning charged particle microscope provided with an aberration measuring means that measures high-order geometrical aberration at high precision and high speed. An image obtained...
8581188 Electron detector including one or more intimately-coupled scintillator-photomultiplier combinations, and electron microscope employing same  
An electron detector includes a plurality of assemblies, the plurality of assemblies including a first assembly having a first SiPM and a first scintillator made of a first scintillator material...
8581187 Method for measuring sample and measurement device  
An amount of displacement and an overlapping area between first and second patterns formed through a double patterning lithography process can be determined. The first pattern is formed by a first...
8581189 Charged particle microscopy imaging method  
A charged-particle microscopy includes irradiating a sample in measurement sessions, each having an associated beam parameter (P) value detecting radiation emitted during each measurement session,...
8577171 Method for normalizing multi-gain images  
A method for correcting an image made from a system having a plurality of settings wherein the system has optical artifacts which vary according to the settings. The method includes acquiring one...
8575547 Electron beam measurement apparatus  
The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam...
8575573 Structure for discharging extreme ultraviolet mask  
A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an...
8575867 Electric field-guided particle accelerator, method, and applications  
A charged particle accelerator having a curvilinear beam trajectory maintained solely by a laterally directed, constant electric field; requiring no magnetic field. A method for controlling the...
8569695 Photon induced near field electron microscope and biological imaging system  
A method of obtaining PINEM images includes providing femtosecond optical pulse, generating electron pulses, and directing the electron pulses towards a sample. The method also includes...
8569694 Aberration-correcting dark-field electron microscopy  
A transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. An aberration corrector comprising either...
8569719 Method and apparatus for specimen fabrication  
A focused ion beam apparatus, including: a sample holder provided with a fixing surface for fixing, via a deposition film, a micro-specimen extracted from a specimen using a method for fabrication...
8569693 Distortion free stigmation of a TEM  
A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing...
8563927 Shielding member having a charge control electrode, and a charged particle beam apparatus  
A shielding member for a charged particle beam apparatus includes a conductive substrate; and a through hole extending through the conductive substrate. The conductive substrate is comprised of a...
8563926 Method of making axial alignment of charged particle beam and charged particle beam system  
A method of making axial alignment of a charged particle beam starts with obtaining at least first through sixth image data while controlling the focal position of the beam on a sample in the...
8558193 Charged particle beam device  
The present invention provides a charged particle beam device in which the change of expansion/contraction of a specimen which is an observing object is restricted thereby eliminating position...
8558190 Charged particle beam column and method of operating same  
A charged particle beam system includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first...
8558174 Processing system  
A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second...
8558173 Method of inspecting pattern and inspecting instrument  
An electron beam apparatus equipped with a review function of a semiconductor wafer includes a scanning electron microscope to obtain image information of a semiconductor wafer, and an information...
8558171 Charged particle beam apparatus including aberration corrector  
A focused charged particle beam apparatus including an aberration corrector, capable of finding the absolute value of the aberration coefficient at high speed, and capable of making high-accuracy...
8552373 Charged particle beam device and sample observation method  
Disclosed is a charged particle beam device, wherein multibeam secondary electron detectors (121a, 121b, 121c) and a single beam detector (140; 640) are provided, and under the control of a system...
8552371 Method for adjusting imaging magnification and charged particle beam apparatus  
There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern. For...
8546154 Apparatus and method to inspect defect of semiconductor device  
An apparatus and method to inspect a defect of a substrate. Since a recess of an under layer of a substrate is darker than a projection of a top layer, a ratio of a value of a secondary electron...
8546770 Charged particle beam device and sample observation method  
There is provided a charged particle beam device which has a mechanism adjusting the shape of an ionic liquid droplet to be adhered to a sample and the thickness of a film of the ionic liquid, in...
8546962 Mark structure and method for measuring alignment accuracy between former layer and latter layer  
A mark structure for measuring the alignment accuracy between a former layer and a latter layer with electron beam inspection (EBI) is described. The mark structure includes multiple divisions,...
8546756 System and method for material analysis of a microscopic element  
A system and a method for material analysis of a microscopic element, the method comprising: illuminating an area that includes at least a portion of the microscopic element by a charged particle...
8536538 Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments  
One embodiment relates to a focused electron beam imaging apparatus. The apparatus includes an electron beam column, an electron source, a gun lens, a pre-scanning deflector, a main scanning...