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6677585 Scanning charged particle microscope, and focal distance adjusting method and astigmatism correction method thereof  
In order to provide a method to easily and surely adjust the focal distance as in a Wobbler apparatus of the transmission type electron microscope method, a crossover 11 of a charged particle beam...
6674073 Scattering target-holding mechanism and an electron spin analyzer  
A scattering target constituting an electron spin analyzer is supported by a scattering target-holding member made of a conductive material from the outside of the space formed by an accelerating...
6674077 Microelectromechanical system assembly and testing device  
A novel MEMS assembly and testing system that utilizes a scanning electron microscope (SEM) having 5 axes of freedom as the imaging instrument. Microgrippers or other tools mounted at the end of a...
6674075 Charged particle beam apparatus and method for inspecting samples  
A beam directing method and device are presented for spatially separating between a primary charged particle beam and a beam of secondary particles returned from a sample as a result of its...
6670615 Electron detection device  
An electron detection device for use with an electron microscope defining a sample chamber. The device comprises a housing which in use is mounted to and opens into or forms part of a sample...
6667483 Apparatus using charged particle beam  
An apparatus using charged particle beam is provided with means for detecting positional difference between a target position on a chip pattern within an observation visual field of a microscope...
6667475 Method and apparatus for cleaning an analytical instrument while operating the analytical instrument  
A method and apparatus for cleaning an analytical instrument while operating the analytical instrument are described. In one embodiment, a method comprises evacuating hydrocarbons from a specimen...
6664541 Methods and apparatus for defect localization  
The present invention includes a system for localization of defects in test samples. A sample is scanned using a particle beam. Some particles interact with conductive elements and may cause the...
6664546 In-situ probe for optimizing electron beam inspection and metrology based on surface potential  
Disclosed is a method and apparatus for generating an image from a sample. The apparatus includes a charged particle beam generator arranged to generate and control a charged particle beam...
6661007 Method of diagnosing magnification, linearity and stability of scanning electron microscope  
A method of diagnosing a parameter of a scanning electron microscope such as magnification, linearity and stability, includes loading a reference material into a microscope, setting a permissible...
6657193 Scanning electron microscope  
A scanning electron microscope is provided which is capable of efficiently detecting ions, such as primary electron excitation ions, reflection electron excitation ions or secondary electron...
6653634 Method of measuring length with scanning type electron microscope  
A method of measuring length with a scanning type electron microscope (SEM) includes the steps of: performing length measurement with the SEM of an already know pattern provided in advance in a...
6642529 Methods for the automated testing of reticle feature geometries  
A method for inspecting features on a reticle is provided. The method includes providing a layout design of a test feature and transferring the layout design of the test feature onto the reticle....
6642519 Fine pattern inspection apparatus and method and managing apparatus and method of critical dimension scanning electron microscope device  
A fine pattern inspection apparatus includes: a first calculation unit which receives data of a first secondary electron signal obtained by irradiating a plurality of test patterns formed on a...
6635869 Step function determination of Auger peak intensity  
An electron analyzer and its method of operation useful for determining the intensity of a peak in the electron spectrum. The invention is particularly useful for determining the intensity of an...
6635872 Defect inspection efficiency improvement with in-situ statistical analysis of defect data during inspection  
A method and system for increasing the efficiency and reducing the time required for defect inspection of microfabricated structures such as semiconductor wafers, masks or reticles for...
6627890 Particle beam apparatus for tilted observation of a specimen  
A particle beam apparatus for tilted observation of a specimen is capable of producing magnification images of the specimen under tilted observation with high accuracy. The particle beam apparatus...
6627884 Simultaneous flooding and inspection for charge control in an electron beam inspection machine  
Disclosed are methods and apparatus for simultaneously flooding a sample (e.g., a semiconductor wafer) to control charge and inspecting the sample. The apparatus includes a charged particle beam...
6627885 Method of focused ion beam pattern transfer using a smart dynamic template  
The present invention provides a method of forming a dynamic template with a focused beam. The method includes forming a desired template that represents a desired image, forming an actual...
6624412 Energy filter  
An omega energy filter capable of increasing energy dispersion while canceling out second-order aberrations. The energy filter is mirror-symmetric with respect to the center plane C. A beam enters...
6617580 Electron holography microscope  
Systems and methods are described for an electron holography microscopy. Changing a size of an electron object image includes maintaining rotation of the electron object image with respect to a...
6614029 Electrostatic manipulating apparatus  
An electrostatic manipulating apparatus for handling a sample (1) during and after removal from semiconductor wafers (3) under a continuous vacuum, comprising a fork (7) of at least two...
6608305 Selective deposition of a particle beam based on charging characteristics of a sample  
A method of preparation of a map of areas on a sample that collects charge, and a method for using the map to selectively scan and modulate the intensity of the electron beam of a SEM so as to...
6600162 Method and device for exposing a substrate to light  
The invention concerns a method for exposing a substrate (1) equipped with an n-layer photoresist system (2), an electrically conductive connection being created between a ground potential and the...
6600156 Scanning electron microscope  
A scanning electron microscope comprises: an electron gun for emitting an electron beam; a system of condenser lenses; scanning coils; and an objective lens having inner and outer magnetic...
6586735 Method for detecting an element in a sample  
A method for detecting an element in a sample using a transmission electron microscope to measure a first image of the intensities of the sample at an energy loss in the range of the element...
6586753 Electron beam apparatus and electron beam adjusting method  
An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged...
6583410 Polarimeter  
A polarimeter for analysing the electron-spin polarisations of an electron beam, the polarimeter comprising first target means comprising a layer of material for scattering a beam of electrons in...
6580075 Charged particle beam scanning type automatic inspecting apparatus  
A charged particle beam scanning inspecting apparatus for irradiating a charged particle beam, fetching information of a subject to be inspected at a predetermined beam scanning position and...
6580076 Micro-manipulation method  
A micro-manipulation method enables micro-objects to be handled as desired with excellent repeatability when using microscopes that radiate electron beams and use secondary, reflected and...
6576902 Correction method of scanning electron microscope  
A method of correcting a scanning electron microscope using a detection sample for producing light of an intensity corresponding to an electron density of an electron beam irradiating a surface of...
6573511 Electron beam irradiation system and electron beam irradiation method  
A focusing stage is provided on a slide table of a support mechanism portion on which a master is supported, at a position adjacent to the master. At the time of recording, first, the focusing...
6573501 Holography transmission electron microscope  
A holography electron microscope permitting electron holography without limitations on the magnification. An electron biprism is mounted between a system of intermediate lenses and a system of...
6570157 Multi-pitch and line calibration for mask and wafer CD-SEM system  
The present invention relates to a system and method for calibrating a scanning electron microscope (SEM). The method comprises using a reference having multiple features of different dimensions...
6570164 Resolution enhancement device for an optically-coupled image sensor using high extra-mural absorbent fiber  
A resolution enhancement device is provided which utilizes either high extra-mural absorbent optical fibers in the transfer optic, and/or which uses a transfer optic which is bonded to the...
6570154 Scanning electron beam microscope  
A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM (200) has a source unit (202 through 220) for directing an electron...
6563114 Substrate inspecting system using electron beam and substrate inspecting method using electron beam  
A host computer controlling a secondary optical system under such an image focusing condition that secondary beams obtained from an arbitrary region on a substrate form an image on a MCP detector,...
6559446 System and method for measuring dimensions of a feature having a re-entrant profile  
A system and method are disclosed for measuring and/or imaging a feature having a re-entrant cross-sectional profile. Beams are emitted onto the feature and substrate at different angles during...
6552338 Ion photon emission microscope  
An ion beam analysis system that creates microscopic multidimensional image maps of the effects of high energy ions from an unfocussed source upon a sample by correlating the exact entry point of...
6552341 Installation and method for microscopic observation of a semiconductor electronic circuit  
The installation for microscopic observation of a semiconductor electronic circuit includes, in a vacuum, a reflection particle interaction microscope and parts for supporting the circuit facing...
6548810 Scanning confocal electron microscope  
A scanning confocal microscope and methods are provided for configuring scanning confocal microscopes for imaging specimens, such as, high resolution imaging of thick non-optically transparent...
6545277 High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM  
A high efficiency enhanced detecting light guide scintillator detector for charged particle beam apparatus, wherein primary beam passes through the light guide scintillator detector. Light guide...
6541770 Charged particle system error diagnosis  
A plurality of features are first formed on a workpiece in a special standard test pattern, and these features are then overwritten with a charged particle beam in an overlay pattern which matches...
6541771 Scanning electron microscope  
A secondary electron signal obtained from a specimen when the specimen is scanned with an electron beam is detected by a detector and a specimen image is displayed on a first display screen area...
6534766 Charged particle beam system and pattern slant observing method  
A charged particle beam system comprising a charged beam source, a condenser lens, a scanning deflecting device, an objective lens and a secondary electron detector further comprises a slant...
6528787 Scanning electron microscope  
A scanning electron microscope capable of imaging a specimen at a magnification lower than the minimum magnification of the microscope. The specimen surface is virtually partitioned into cells....
6525316 Multiaxis actuator and measuring head, especially for a scanning probe microscope  
Finely adjustable actuators are used for positioning a sensor or a scanning tip, especially for scanning tunnelling microscopes and other scanning microscopes, i.e. scanning probe microscopes. The...
6525317 Reduction of charging effect and carbon deposition caused by electron beam devices  
A method and apparatus for reducing the charging effect of electron beam devices on non-conducting samples includes introducing a water containing gas on the sample surface. Because the water...
6525318 Methods of inspecting integrated circuit substrates using electron beams  
Methods of inspecting integrated circuit substrates include the steps of directing a beam of electrons into a first conductive plug located within a first contact hole on an integrated circuit...
6521891 Focusing method and system  
According to one aspect of the present invention, there is provided a method for controlling of charged particle beam to compensate for a potential being present on a specimen, the method...