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8843323 Method for computing self-consistent solution in a gun code  
Complex gun code computations can be made to converge more quickly based on a selection of one or more relaxation parameters. An eigenvalue analysis is applied to error residuals to identify two...
8841630 Corrector for axial aberrations of a particle-optical lens  
Commercially available High Resolution Transmission Electron Microscopes (HR-TEM) and Scanning Transmission Electron Microscopes (HR-STEM) are nowadays equipped with correctors for correcting the...
8835846 Imaging a sample in a TEM equipped with a phase plate  
The invention relates to a method of forming an image of a sample in a transmission electron microscope equipped with a phase plate. Prior art use of such a phase plate can introduce artifacts in...
8835842 Systems and methods for investigating a characteristic of a material using electron microscopy  
Various embodiments of the present invention provide systems and methods for determining an characteristic of a material. The characteristics may include, but are not limited to, crystallographic...
8835848 Ultra-miniaturized electron optical microcolumn  
An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an...
8835867 Multi-axis magnetic lens for focusing a plurality of charged particle beams  
A cellular-type PD unit is proposed and a plurality of the cellular-type PD units is used in pairs in a multi-axis magnetic lens for focusing a plurality of charged beams. First type PD units or...
8835844 Sample electrification measurement method and charged particle beam apparatus  
The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged...
8835845 In-situ STEM sample preparation  
A method for TEM/STEM sample preparation and analysis that can be used in a FIB-electron microscope system without a flip stage. The method allows a dual beam FIB electron microscope system with a...
8835843 Particle beam system and method of processing a TEM-sample  
A method of processing a TEM-sample, wherein the method comprises: mounting an object in a particle beam system such that the object is disposed, in an object region of the particle beam system;...
8829470 Configurable charged-particle apparatus  
The invention relates to a charged-particle apparatus having a charged particle source with an optical axis;a magnetic immersion lens comprising a first lens pole and a configurable magnetic...
8822921 Method for preparing samples for imaging  
A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample...
8822951 Manipulator carrier for electron microscopes  
The present invention relates to a carrier device for transporting one or more manipulators into a vacuum specimen chamber of an electron microscope, characterized in that the carrier device...
8822920 Charged particle beam apparatus  
In recent years, in association with the miniaturization and high integration of semiconductor manufacturing processes, there have been arising many cases where observation target portions are...
8822919 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former  
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate ā€œSā€ to be inspected into an inspection chamber 23-1; maintaining a...
8822960 Charged particle beam drawing apparatus and article manufacturing method using same  
The charged particle beam drawing apparatus of the present invention is a charged particle beam drawing apparatus that renders a pattern on a substrate using a charged particle beam and includes a...
8819859 Apparatus of analyzing a sample and a method for the same  
The apparatus includes a probe tip configured to scan a substrate having a defect to attach the defect on the probe tip while scanning the substrate, a cantilever configured to integrate a holder...
8816303 Method of processing of an object  
A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height...
8816276 Electron beam writing apparatus and electron beam writing method  
An electron beam writing apparatus comprising a XY stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an...
8809779 Method and system for heating substrate in vacuum environment and method and system for identifying defects on substrate  
A method for heating a substrate in a vacuum environment and a system therefor is provided. The system includes a chamber capable of holding the substrate located in the vacuum environment and a...
8809783 High spatial resolution non-contact temperature measurement  
Systems, methods, and computer-readable media for temperature measurement of a sample, using new temperature measurement and mapping techniques, are provided. The technique employs a temperature...
8809799 Charged particles beam apparatus and charged particles beam apparatus design method  
Problems to be solved: To obtain higher brightness than Langmuir limit. Adjust brightness to the optimum value. Method of resolution: To obtain such beams, the following means and methods are...
8809778 Pattern inspection apparatus and method  
A pattern inspection apparatus configured to perform pattern inspection based on a SEM image previously measures distortion amount data representing a magnitude distribution of positional...
8809781 Method of electron beam imaging of a specimen by combining images of an image sequence  
A method of imaging of a specimen exposed to an electron beam signal includes acquiring an image sequence of sequential images of the specimen. Each subsequent image in the image sequence...
8809782 Scanning electron microscope  
A scanning electron microscope includes a main scanning electron microscope unit having an electron optical column and a sample chamber, a controller over the main scanning electron microscope...
8803103 Inspection system by charged particle beam and method of manufacturing devices using the system  
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam...
8803111 Sample preparation apparatus and sample preparation method  
Provided is an apparatus for preparing a sample including: a sample stage that supports a sample; a focused ion beam column that applies a focused ion beam to the same sample and processes the...
8803102 Retarding field analyzer integral with particle beam column  
A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. Using components of the...
8796621 Detector and inspecting apparatus  
An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12for receiving an electron beam emitted...
RE45049 Electron beam exposure system  
The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron...
8791416 On-chip thin film Zernike phase plate and applications thereof  
The present invention provides an on-chip thin film phase plate for a releasing charging, comprising a chip substrate having one or more apertures; and a thin film layer attached to the top...
8791415 Electron microscope device  
The present invention provides an electron microscope device, comprising a scanning electron microscope 2 provided with scanning means 10 for scanning an electron beam and an electron detector 12...
8788242 Pattern measurement apparatus  
It is the object of the present invention to provide a pattern measurement apparatus which suitably evaluates a pattern formed by a double patterning method prior to a transfer using masks or...
8785890 Charged particle beam apparatus permitting high-resolution and high-contrast observation  
A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is...
8785883 Transmission electron microscope, and method of observing specimen  
Provided is means which enables observation of the shape of a specimen as it is without deforming the specimen. Observation is made by allowing a specimen-holding member having an opening (for...
8785851 Interference electron microscope  
In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the...
8785879 Electron beam wafer inspection system and method of operation thereof  
An electron beam wafer imaging system is described. The system includes an emitter for emitting an electron beam; a power supply for applying a voltage between the emitter and the column housing...
8785880 Chromatic aberration corrector and electron microscope  
The chromatic aberration corrector (100) has a first multipole element (110) for producing a first electromagnetic field and a second multipole element (120) for producing a second electromagnetic...
8779357 Multiple image metrology  
Metrology is performed using multiple registered images derived from one or more charged particle beams. Measurements combine features from one image that may not be visible in a second image to...
8779360 Charged particle beam device, defect observation device, and management server  
Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an...
8779359 Defect review apparatus and defect review method  
A defect review apparatus includes: an electron scanning part which irradiates and scans an electron beam over an observation region on a surface of a sample; four electron detectors arranged...
8779378 Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector  
There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and...
8772732 Scanning charged particle beam device and method for correcting chromatic spherical combination aberration  
Disclosed is a scanning charged particle beam apparatus equipped with an aberration corrector, contrived to eliminate resolution degradation in tilt observation by a chromatic third-order aperture...
8772715 Electron beam device including a first electron biprism to split an electron beam into two beams and a second electron biprism in the image forming lens system to superpose the two beams  
An electron beam device includes a first electron biprism between an acceleration tube and irradiation lens systems, and an electron biprism in the image forming lens system. The first electron...
8773158 Inspection method  
An inspection system is provided, which applies a forward or reverse voltage on a light-emitting device and measures a current thereof respectively before and after temperature rise, and...
8772716 Phase plate for a TEM  
A phase plate, specifically a Zernike type phase plate, for use in an electron microscope comprises a central hole, and a thin film causing a phase shift of the electrons passing through said...
8766184 Scanning electron microscope  
With a scanning electron microscope (SEM) adopting a commonly available exhaust system such as a turbo-molecular pump, an ion pump, or a rotary pump, and so forth, there is realized an apparatus...
8766183 Charged particle beam device  
The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a...
8766182 Method for detecting information of an electric potential on a sample and charged particle beam apparatus  
An object of the present invention is to provide a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential...
8766181 Control imaging methods in advanced ultrafast electron microscopy  
An optical system includes a beam splitter disposed along an optical axis and a set of mirrors optically coupled to the beam splitter. The set of mirrors are oriented perpendicular to each other....
8766214 Method of preparing and imaging a lamella in a particle-optical apparatus  
The invention relates to a method of preparing and imaging a sample using a particle-optical apparatus, equipped with an electron column and an ion beam column, a camera system, a manipulator. The...