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6841776 Method and apparatus for high-speed inspection and review  
One embodiment disclosed relates to an apparatus for substrate inspection and review. The apparatus includes at least a first subsystem, a processor, and a second subsystem. The first subsystem is...
6838668 System for imaging a cross-section of a substrate  
A system for obtaining an image of a cross-sectional surface of a workpiece includes a shaped beam ion projection column oriented along a first axis. The ion projection column projects an image of...
6835931 Chemical prefiltering for phase differentiation via simultaneous energy dispersive spectrometry and electron backscatter diffraction  
An analytical method for combining chemical information with crystallographic information to obtain a map of the crystal orientation, the nature of grain boundaries, and distinguishing crystalline...
6828565 Electron beam source, electron optical apparatus using such beam source and method of operating and electron beam source  
An electron beam source comprises a source surface illuminated with a photon beam of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo...
6828571 Apparatus and methods of controlling surface charge and focus  
One embodiment disclosed relates to a method of setting a surface charge of an area on a substrate to a desired level. The substrate is held on a stage, and a stage bias voltage applied to the...
6825468 Fine stencil structure correction device  
A fine stencil structure correction device has a charged particle beam microscope lens-barrel which scans and corrects shapes of defect portions of a fine stencil structure sample using an etching...
6825467 Apparatus for scanning a crystalline sample and associated methods  
The present invention provides and apparatus and method for scanning a crystalline sample comprising a sample holder, an electron source for generating an electron beam and a scanning actuator for...
6822233 Method and apparatus for scanning transmission electron microscopy  
A scanning transmission electron microscope (STEM) has an electron source for generating a primary electron beam and an electron illuminating lens system for converging the primary electron beam...
6818902 Positron source  
A positron source is applicable particularly to solid state physics, including a thin target receiving a continuous or practically continuous 10 MeV electron beam in grazing incidence and...
6815677 Scanning electron microscope and method of controlling the same  
The present invention provides a scanning electron microscope that can obtain a high-precision SEM image and width measurement values, without damaging an object to be measured even at a high...
6809322 Environmental scanning electron microscope  
The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture...
6809316 Electrospray ionization mass analysis apparatus and system thereof  
Because of a low flow rate of the micro LC/MS, the dead volume or the diameter of a capillary tube must be minimized, and a sample and salt are likely to deposit in the capillary tube, with the...
6803582 One dimensional beam blanker array  
A beam array includes a base plate, a plurality of conductor pads, and a ground plate. The conductor pads are arranged in a one-dimensional array on the base plate. The ground plate is coupled to...
6803570 Electron transmissive window usable with high pressure electron spectrometry  
A vacuum window transmitting keV electrons and usable for high-pressure electron analysis such as XPS and AES in which the sample is positioned outside the UHV analyzer chamber, possibly in a...
6800864 Method and structure for reducing effects of noise and resonance associated with an e-beam lithography tool  
An apparatus and method for reducing noise and resonance detractors connected with and E beam tool. The invention provides a plurality of embodiments. In one embodiment, the E beam tool will be...
6791096 Process conditions change monitoring systems that use electron beams, and related monitoring methods  
In order to accurately monitor changes in exposure conditions (changes in exposure level and focus) at a product wafer level during lithography, changes in exposure conditions can be calculated by...
6791083 Image compensation device for a scanning electron microscope  
An apparatus for preventing distortion to critical dimension line images formed by a SEM under the influence of external electro-magnetic emissions generating by neighboring manufacturing...
6791097 Adjustable conductance limiting aperture for ion implanters  
A charged particle beam apparatus includes a charged particle beam source for directing a charged particle beam along a beam path in a downstream direction to a target, and a processing station...
6787770 Method of inspecting holes using charged-particle beam  
This disclosure is directed to a method of inspecting how contact holes or via holes are formed in a sample, such as a wafer. An electron beam is directed to the contact holes in succession. An...
6787779 Apparatus wherein ionizing radiation is generated  
An apparatus, which generates ionizing radiation, includes a column having a sandwich-like configuration. The column includes one or more tubes and a layer of a cured epoxy-resin mixture...
6787773 Film thickness measurement using electron-beam induced x-ray microanalysis  
An X-ray micoanalysis test system comprising a beam generator which induces X-rays to emanate from a semiconductor device containing film stacks. The charged particle beam will penetrate at least...
6787769 Conductive probe for scanning microscope and machining method using the same  
A conductive probe for a scanning type microscope that captures the substance information of the surface of a specimen by the tip end of a conductive nanotube probe needle fastened to a...
6784438 Electron projection lithography apparatus using secondary electrons  
An electron projection lithography apparatus using secondary electrons includes a secondary electron emitter which is spaced apart from a substrate holder by a first predetermined interval and has...
6785615 Method and structure for detection of electromechanical problems using variance statistics in an E-beam lithography device  
An apparatus and method for detection of electromechanical and mechanical errors in an electron beam device is provided. First the existing subfield is divided into a gridlike structure where each...
6784425 Energy filter multiplexing  
The present invention pertains to a technique of electron spectroscopic imaging that is easy to perform and cost effective. This technique allows for spatial resolution enhancement of electron...
6781141 Method and structure for detection and measurement of electrical and mechanical resonance associated with an E-beam lithography tool  
As disclosed herein, a system and method are provided for detection and measurement of noise on E beam tools and devices including a spectrum analyzer which looks at the different frequency...
6774364 Electron microscope, method for operating the same, and computer-readable medium  
In an operation of an electron microscope, at least a spot size of an electron beam on a specimen, an acceleration voltage, a detector type, a specimen position, and an observation magnification...
6774362 Analytical method for electron microscopy  
There is disclosed an analytical method capable of performing an analysis in electron microscopy by directing an electron beam at set analysis points wherein a reference image is displayed on a...
6774365 SEM inspection and analysis of patterned photoresist features  
A process for improving the accuracy of critical dimension measurements of features patterned on a photoresist layer using a scanning electron microscope (SEM) is disclosed herein. The process...
6770889 Method of controlling electrostatic lens and ion implantation apparatus  
The ion implantation apparatus deals with an ion beam as a charged particle beam and has an accelerating tube 8 incorporating an electrostatic lens for converging/diverging it. The control of the...
6770887 Aberration-corrected charged-particle optical apparatus  
Aberration-corrected charged-particle optical apparatus improving the resolution of charged-particle optical systems by eliminating or minimizing optical aberrations. The apparatus comprises a...
6768112 Substrate inspection system and method for controlling same  
A substrate inspection system includes: a charged particle beam irradiation part; an electron image detecting part; a mapping projecting part which projects the secondary and/or reflected charge...
6765202 Microscope having an electron beam for illumination  
The microscope (2) is substantially similar to the configuration of a conventional microscope. The microscope (2) comprises a foot element (4) on which a column (6) sits. An arm (8) is mounted or...
6744058 Geometric compensation method for charged particle beam irradiation  
A charged particle beam method for irradiating an array of sub-regions within an areal region within a substrate with a series of shots of a charged particle beam provides that a sequencing of...
6744048 Lens system for phase plate for transmission electron microscope and transmission electron microscope  
A lens system for use with a phase plate in a transmission electron microscope comprises a phase plate placed after the back-focal plane of the objective lens in an imaging system mounted...
6734437 System and method for electron beam irradiation  
An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner...
6727911 Method and apparatus for observing specimen image on scanning charged-particle beam instrument  
Method and apparatus for observing a specimen image on a scanning charged-particle beam instrument in such a way that the original observational position can be automatically resumed after...
6723997 Aberration corrector for instrument utilizing charged-particle beam  
An aberration corrector comprises four stages of electrostatic quadrupole elements, two stages of electrostatic quadrupole elements for superimposing a magnetic potential distribution analogous to...
6720564 Method and apparatus for fingerprint detection and analysis  
A method of detecting fingerprints on a substrate includes ion beam mixing materials associated with the fingerprint into the substrate to create an ion beam mixed fingerprint; and analyzing the...
6720557 Particle beam apparatus  
A particle beam apparatus includes a source for providing a primary particle beam along a primary beam axis, an objective lens for focussing the primary particle beam onto a specimen so as to...
6720556 Electron spectroscopy employing controlled surface charging  
A method of examining a sample, including: performing a first spectroscopic analysis of a surface portion of the sample when the sample surface portion is in a first electrical charge state;...
6717141 Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like  
In order to improve the resolution of an electron beam in a scanning electron microscope or the like in which a Wien filter is employed for particle detection purposes, the beam is caused to have...
6717145 Mapping electron microscopes exhibiting improved imaging of specimen having chargeable bodies  
Mapping electron microscopes are disclosed in which the amount of charging of the specimen is controlled to between a minimum amount needed to view an image and a maximum amount beyond which a...
6700122 Wafer inspection system and wafer inspection process using charged particle beam  
The present invention provides a wafer inspection technique capable of detecting a defect in a wafer on which a pattern having a large step such as a contact hole being subjected to a...
6693288 Charged particle beam irradiation apparatus and irradiation method using the apparatus  
A charged particle beam irradiation apparatus includes a specimen stage for holding a specimen; a specimen stage drive unit for moving the specimen stage; a detector for detecting the amount of...
6693278 Particle-optical inspection device especially for semiconductor wafers  
In the production of semiconductors it is necessary to inspect circuit patterns on wafers. In circuits having very small details (for example, 40 nm), inspection can be carried out by means of...
6690009 Method of determining the charge carrier concentration in materials, notably semiconductors  
A method for determining the concentration of charge carriers in doped specimens, notably semiconductors, wherein the beam produced by an electron source is made to interact with the specimen, an...
6683307 Scanning type charged particle beam microscope  
A scanning type charged particle beam microscope has a scanning signal generator for generating a scanning signal, a scanning device for scanning a surface of a sample to generate a scanned image...
6683320 Through-the-lens neutralization for charged particle beam system  
An electron source provides electrons that are directed through the final lens of an ion optical column to neutralize at least a portion of the accumulated charge on a sample. The invention can...
6680474 Semiconductor calibration wafer with no charge effect  
A semiconductor calibration wafer that has no charge effect is disclosed. The calibration wafer has a substrate layer and a conductive metal layer. The conductive metal layer completely covers the...