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6989536 Electron-beam writing device and electron-beam writing method  
The present invention aims at providing a device and method for writing a line with a high degree of precision at high speed. Distance calculation means 311 calculates the start-to-end point...
6984823 Electron microscope and method for controlling focus position thereof  
There are provided an electron microscope capable of carrying out focusing and astigmatism correction without depending on characteristics of a sample, and a method for controlling its focus...
6984589 Method for determining etching process conditions and controlling etching process  
Conventionally, there is no method for quantitatively evaluating the three-dimensional shape of an etched pattern in a non-destructive manner and it takes much time and costs to determine etching...
6979822 Charged particle beam system  
A charged particle beam system uses an ion generator for charge neutralization. In some embodiments, the ion generator is configured to maintain an adequate gas pressure at the ion generator to...
6979820 CD SEM automatic focus methodology and apparatus for constant electron beam dosage control  
A method and apparatus for scanning electron microscope measurements which maintains a constant e-beam dose to the surface of a wafer being measured and thereby maintains a constant resist...
6972405 Nanoscale standard sample and its manufacturing method  
An indicator indicating the direction of a diffraction grating pattern is provided on a chip so that the direction of the pattern can be accurately determined. The indicator includes an...
6969852 Method of evaluating of a scanning electron microscope for precise measurements  
A method evaluating a measuring electron microscope, comprising the steps of setting such modes of operation of a microscope, that will be used for subsequent measurements of sizes and line edge...
6963068 Method for the manufacture and transmissive irradiation of a sample, and particle-optical system  
The invention provides a method for the manufacture and transmissive irradiation of a sample, comprising the steps of: A Providing a particle-optical system having an internal low-pressure chamber...
6960767 Apparatus for measuring features of a semiconductor device  
A method and apparatus for measuring the dimensions of features on the surface of a semiconductor device. The method may include passing a first electron beam having a first depth of focus over...
6958124 SPM sensor and process for producing it  
SPM sensor comprising a holding element, cantilever and a sensor tip, which projects out of the surface of the cantilever, at the free end of the cantilever, at least the cantilever and the...
6953939 Testing apparatus using scanning electron microscope  
A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test...
6953755 Technique for monitoring the state of metal lines in microstructures  
By preparing fully-embedded interconnect structure samples for a cross-section analysis by means of electron microscopy or x-ray microscopy, degradation mechanisms may be efficiently monitored....
6949765 Padless structure design for easy identification of bridging defects in lines by passive voltage contrast  
A new test structure to locate bridging defects in a conductive layer of an integrated circuit device is achieved. The test structure comprises a line comprising a conductive layer overlying a...
6949745 Electron beam apparatus  
An electron beam apparatus has an optical axis, an electron beam source for generating an electron beam directed along the optical axis, and a magnetic field lens having an axis coincident with...
6946663 Method of fabricating multipole lens, multipole lens, and charged-particle beam instrument equipped therewith  
A method of efficiently fabricating a multipole lens. The multipole lens has plural polar elements and an annular holding member. Each polar element has a held portion. The annular holding member...
6946657 Electron microscopy system  
A particle-optical apparatus is disclosed which combines the functions of an energy selector 27 and a beam splitter 21. The particle-optical apparatus is used in an electron microscopy system and...
6936817 Optical column for charged particle beam device  
The invention provides a miniaturized optical column for a charged particle beam apparatus for examining a specimen (14). The column is constituted by, among other things, a charged particle...
6936826 Vibration-isolating coupling including an elastomer diaphragm for scanning electron microscope and the like  
A coupling in a metrology system for placement between a floating inspection chamber and a fixed transfer chamber. The coupling prevents transfer of vibrations between the chambers and seals a...
6936816 High contrast inspection and review of magnetic media and heads  
One embodiment disclosed relates to a method for inspecting or reviewing a magnetized specimen using an automated inspection apparatus. The method includes generating a beam of incident electrons...
6933501 Ultimate analyzer, scanning transmission electron microscope and ultimate analysis method  
The present invention provides an ultimate analyzer which displays an element distribution image of an object with high contrast and high accuracy. A scanning transmission electron microscope and...
6929892 Method of monitoring an exposure process  
In monitoring of an exposure process, a highly isolative pattern greatly changed in a shape of cross section by fluctuations in the exposure dose and the focal position is an observation target....
6911656 Rotational stage for high speed, large area scanning in focused beam systems  
A mechanical scanning stage for high speed image acquisition in a focused beam system. The mechanical scanning stage preferably is a combination of four stages. A first stage provides linear...
6903337 Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same  
An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles...
6897441 Reducing chromatic aberration in images formed by emmission electrons  
An imaging device, such as an EEM, includes an electric/magnetic lens used to focus pulsed electrons emitted from an object on to a target plane. Before a pulse of emitted electrons reaches the...
6897665 In-situ electron beam induced current detection  
A method and in-situ sample current amplification system for carrying out failure analysis of integrated circuit semiconductor device conductive portions. The method includes providing an...
6894288 Manipulator for an optical or particle-optical apparatus  
The invention is directed to a manipulator for an optical apparatus including a particle-optical apparatus. The manipulator is especially a diaphragm or specimen manipulator in an electron...
6888139 Electron microscope  
The present invention provides an analysis of displacement by calculating the phase variance image P′ (k, l) between Fourier transformed images of paired images S1 (n, m) and S2 (n, m) to...
6888136 Method of obtaining a particle-optical image of a sample in a particle-optical device  
In relatively thick samples for electron microscopy imaging, details of interest are often located in the bulk of the sample, so that they cannot be directly imaged in the form of a SEM image....
6885009 Device for influencing an electron beam  
A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a...
6881955 Metrology process for enhancing image contrast  
A metrology process for increasing image contrast of a buried feature, comprising milling a selected surface of a substrate to expose a cross section of the buried feature; exposing the exposed...
6881956 Method and apparatus for scanning semiconductor wafers using a scanning electron microscope  
An apparatus and method for scanning the surface of a specimen is disclosed for defect inspection purposes. Scanning Electron Microscope (SEM) is used to scan the surface of a specimen. The...
6881954 Scanning probe microscope and method of measurement  
A scanning probe microscope has an XY scanner for making a probe scan a sample surface, an approach and separate drive element for making the probe approach to the sample surface at a sampling...
6878935 Method of measuring sizes in scan microscopes  
For measuring sizes in a scanning measuring microscope a nominal magnification is selected so that an object image occupies a substantial part of a field of view, an actual magnification is...
6872942 High-speed inspection of flat substrates with underlying visible topology  
One embodiment disclosed relates to a method for inspecting a substrate. The method includes exposing the substrate to an incident beam, inducing relative motion between the incident beam and the...
6870161 Apparatus for processing and observing a sample  
An apparatus for processing and observing a sample has a sample stage for supporting a sample at a preselected location thereof, a focused ion beam irradiation system for irradiating the sample...
6870169 Method and apparatus for analyzing composition of defects  
In order to be able to detect an irradiation position of an electron beam matching a defect position and conduct composition analysis of a defect with high precision and high efficiency, in the...
6865927 Sharpness testing of micro-objects such as miniature diamond tool tips  
A micro-object having a desired sharp point or edge may be optically tested during fabrication. This is accomplished by applying a known force to the workpiece against an optically opaque layer...
6864481 Probe for scanning probe microscope  
A probe for a scanning probe microscope has a cantilever portion and a microscopic probe portion formed of a solid columnar tip at a distal end of the cantilever portion by deposition using an...
6864487 Environmental sampler for mass spectrometer  
An environmental sampler for a mass spectrometer is disclosed that provides for controlled introduction of small amounts of fluids or gases into the vacuum system of the mass spectrometer under...
6861650 Electron beam detector, scanning type electron microscope, mass spectrometer, and ion detector  
In an electron beam detector, a light guide optically couples a fluorescence emitting surface of the compound semiconductor substrate to a light incident surface of the photodetector, and...
6862142 Multi-detector microscopic inspection system  
Techniques for utilizing a microscope inspection system capable of inspecting specimens at high throughput rates are described. The inspection system achieves the higher throughput rates by...
6858844 Method for detecting geometrical-optical aberrations  
The invention relates to a method for determining geometrical-optical aberrations up to and including 3rd order in particle-optical, probe-forming systems, in particular scanning electron...
6855927 Method and apparatus for observing element distribution  
There are provided an element distribution observing method and an element distribution observing apparatus under utilization of core-loss electrons capable of restricting artifact caused by...
6855926 Instrument and method for combined surface topography and spectroscopic analysis  
A combined surface topography and spectroscopic analysis instrument comprises a scanning tunnelling microscope tip (12); and a sample carrier (58) which supports a sample (10) so that a surface...
6855939 Particle beam system having a mirror corrector  
The invention relates to a particle beam system comprising a particle source (1), a mirror corrector (9, 21 to 25), and an objective lens (16). The mirror corrector comprises an electrostatic...
6855938 Objective lens for an electron microscopy system and electron microscopy system  
An objective lens with magnetic and electrostatic focusing for an electron microscopy system is provided whose at least partially conical outer shape allows orienting an object to be imaged at a...
6852982 Magnetic lens  
In one embodiment of the present invention, a magnetic lens is provided that can generate a substantially constant amount of average heat power over a pre-selected range of resultant magnetic...
6852973 Scanning charged particle microscope  
The present invention sets out to provide a scanning charged particle microscope equipped with a rapid control function capable of extrapolating an in-focus point from image information for a...
6844551 Method of determining lattice constant, method of evaluating material by using the same and electronic microscope suitable for using the same  
The invention provides a method of determining a lattice constant of an arbitrary material such as a polycrystalline material speedily and easily, and a method of evaluating the stress and strain...
6841775 Electron microscope  
An electron microscope which permits an operator to perform astigmatic correction and beam alignment. A field of view capable of clearly displaying astigmatism or beam misalignment in terms of a...