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7078687 Thin film analyzing method  
The present invention provides is a thin film analyzing method which can be applied to various fields, and which makes it possible to detect and analyze in a simple manner, with high precision, a...
7078690 Monitoring of contact hole production  
A method for production testing includes receiving a wafer including a semiconductor substrate and a non-conducting layer formed over the substrate, following etching of contact openings through...
7075074 Electron beam inspection apparatus and method for testing an operation state of an electron beam inspection apparatus  
In a method for testing an operation state of an electron beam inspection apparatus, an electron beam sequentially scans a plurality of scan lines in a predetermined inspection area on a...
7075075 Charged particle deflecting system  
The invention provides a deflecting system for deflecting a charged particle beam from a first direction to a second direction, the deflecting system comprising a first deflector for deflecting...
7075076 Inspection system, inspection method, and process management method  
The present invention relates to an inspection apparatus comprising: an electron emitting unit for sequentially emitting an electron beam in the direction of the inspection area of a sample;a...
7075092 Charged particle beam microscope with minicolumn  
One embodiment of the present invention is an electron microscope that includes: (a) a main vacuum chamber housing a stage therein and connected to a vacuum pump; (b) a load lock for loading a...
7075073 Angle resolved x-ray detection  
An apparatus for detecting properties of a sample. An electron beam generator produces an electron beam and directs the electron beam at a desired point on the sample. The sample thereby emits...
7075077 Method of observing a specimen using a scanning electron microscope  
A method of observing a specimen using a scanning electron microscope, makes it possible to shorten the time required to perform automatic focusing at the time of semiconductor defect automatic...
7071468 Circuit pattern inspection method and its apparatus  
A circuit pattern inspection method and apparatus capable of readily setting an optimum threshold value while it is confirmed that a defect detected when a defect is checked can be detected at...
7067823 Micro-sample pick-up apparatus and micro-sample pick-up method  
A micro-sample pick-up apparatus has a probe for picking up a micro sample, a probe holder for holding the probe, an XYZ driver mechanism for moving the probe holder in the three-dimensional...
7067820 Particle-optical apparatus with a permanent-magnetic lens and an electrostatic lens  
Particle-optical apparatus are normally embodied with a magnetic or electrostatic lens so as to focus a beam 1 of charged particles onto a sample 8. It is desirable to be able to use these...
7060978 Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system  
A detector system for a particle beam apparatus, in particular for a scanning electron microscope, has a target structure, which in a central region near the optical axis includes an...
7060986 Automated method of correcting aberrations in electron beam, method of visualizing aberrations, and automated aberration corrector  
There is disclosed a method and apparatus for automatically correcting aberrations in an electron beam by the use of a computer. An axis deviation-correcting means for correcting deviation of the...
7057184 Scanning electron microscope  
The invention provides a liquid injection system (12) for an environmental scanning electron microscope. The liquid injection system comprises a liquid firing device (18) for firing a liquid and a...
7053371 Scanning electron microscope with measurement function  
A scanning electron microscope which efficiently makes measurements for plural measurement items at a time and allows easy entry, confirmation and revision of auto measurement parameters....
7049588 Device for measuring the emission of X-rays produced by an object exposed to an electron beam  
The present invention relates to a device for measuring the X-ray emission produced by an object, or specimen, exposed to an electron beam. The device includes at least one subassembly or electron...
7049605 Detector using microchannel plates and mass spectrometer  
A mass spectrometer detector having a coupling capacitor including an anode that is placed at a high potential of say −4.9 kV. An annular electrode is placed outside the anode. A voltage of say −5...
7049587 Apparatus for inspecting a specimen  
Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for...
7049590 Capping layer to impede atom ejection  
A method of reducing atom ejection from a sample during electron beam bombardment. An electron beam is directed through a low pressure environment toward a surface of the sample. The electron beam...
7049589 Pattern inspection method  
The present invention may include a pattern inspection method of extracting a pattern edge shape from an image obtained by a scanning microscope and inspecting the pattern. A control section and a...
7049616 Methods, apparatus, and software for adjusting the focal spot of an electron beam  
A method of adjusting a beam spot width includes scanning a phantom with an electron beam having a beam spot width to obtain data; and adjusting the beam spot width using the obtained data.
7045798 Characterizing an electron beam treatment apparatus  
One embodiment of the present invention is a method for characterizing an electron beam treatment apparatus that includes: (a) e-beam treating one or more of a predetermined type of wafer or...
7045791 Column simultaneously focusing a partilce beam and an optical beam  
The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing...
7041976 Automated focusing of electron image  
One embodiment disclosed relates to a method for automated focusing of an electron image. An EF cut-off voltage is determined. In compensation for a change in the EF cut-off voltage, a focusing...
7038222 System and method for using areas near photo global alignment marks or unpatterned areas of a semiconductor wafer to create structures for SIMS or E-Beam or XRD testing  
A system and method is described for using areas in or near photo global alignment marks or in or near unpatterned areas of a semiconductor wafer to create structures for secondary ion mass...
7038204 Method for reducing proximity effects in electron beam lithography  
An electric field is applied below a resist to reduce proximity effects associated with electron beam scattering, thereby improving the resolution of features or lines written into the resist....
7034319 Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium  
An electron beam irradiation apparatus, includes a support section for supporting an electron beam irradiation subject to be irradiated with an electron beam, and an electron beam irradiation head...
7034297 Method and system for use in the monitoring of samples with a charged particle beam  
A method and apparatus for use in monitoring a sample with a charged particle beam are presented. A mechanical displacement between a plane defined by the sample's surface and an optical axis...
7034296 Method of forming a sample image and charged particle beam apparatus  
An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with...
7026614 Automatic methods for focus and astigmatism corrections in charged-particle beam instrument  
Automatic methods for focus and astigmatism corrections in a charged-particle beam instrument find an amount of excitation of the objective lens that provides the position of a circle of least...
7022986 Apparatus and method for wafer pattern inspection  
An electric field for decelerating an electron beam is formed on a surface of a sample semiconductor to be inspected, an electron beam having a specific area (a sheet electron beam) and containing...
7022987 Particle-optical arrangements and particle-optical systems  
There are disclosed particle-optical beam splitters providing at least three beam-manipulating regions having magnetic fields of different field strengths provided therein for at least one...
7019293 Position detecting system and method  
In a position detecting system and method, an electron beam is irradiated to a sample including a portion to be measured, and the electron beam is caused to move in relation to the portion to be...
7019292 E-beam detection of defective contacts/vias with flooding and energy filter  
One embodiment disclosed relates to a method for robustly detecting a defective high aspect ratio (HAR) feature. A surface area of a semiconductor specimen with HAR features thereon is charged up,...
7015481 Charged-particle optical system  
On a charged-particle optical system for achieving optimum aberration correction and obtaining a minimum probe diameter, the optical system focuses a beam of charged particles onto a surface of a...
7015482 Electron beam writing equipment using plural beams and method  
An electron beam writing system, using discrete electron beams in which the interval of the beams is larger than the size of the beams, generates plural electron beams, on/off controls each of the...
7015468 Methods of stabilizing measurement of ArF resist in CD-SEM  
A method of improving stability for CD-SEM measurements of photoresist, in particular 193 nm photoresist, and of reducing shrinkage of 193 nm photoresist during CD-SEM measurements. The...
7015467 Generating electrons with an activated photocathode  
An electron beam apparatus comprises a beam source to generate a radiation beam that is directed onto a photocathode to generate an electron beam. The photocathode comprises an electron-emitting...
7012261 Multipole lens, charged-particle beam instrument fitted with multipole lenses, and method of fabricating multipole lens  
A multipole lens producing less magnetic field variations is offered. Also, a charged-particle beam instrument fitted with such multipole lenses is offered. The multipole lens has plural polar...
7012249 High capacity and scanning speed system for sample handling and analysis  
Disclosed is an apparatus for examining and inspecting at least one sample in order to determine characteristics of the sample having the a support for receiving a compact disc, the compact disc...
7012253 Transmission electron microscope and three-dimensional observing method  
An electron beam is emitted from an electron beam source, and deflected at different directions with a deflection plate to form a first electron beam E1 and a second electron beam E2. The first...
7009177 Apparatus and method for tilted particle-beam illumination  
One embodiment disclosed relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection...
7009192 Charged particle beam application apparatus  
The present invention enables the same target to be precisely machined and observed in a short time when a focal distance of a charged particle beam is changed or if the focal distances of charged...
7005652 Sample-stand for scanning electron microscope  
The present invention is a sample-stage for a scanning electron microscope. The sample stage has a U-shaped base, horizontally oriented with the closed end forming the right side. A bottom member...
7006596 Light element measurement  
A spectrometer for detecting and quantifying elements in a sample. An exciter ionizes atoms in the sample, and the atoms thereby produce characteristic x-rays. A detector receives the x-rays and...
7005640 Method and apparatus for the characterization of a depth structure in a substrate  
The present invention provides a method for the characterization of a depth structure in a substrate at a surface of the substrate, in which a cutout is produced at the surface of the substrate...
7002151 Scanning electron microscope  
An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high...
6995378 Lens array with a laterally movable optical axis for corpuscular rays  
Disclosed is a lens array having a laterally movable axis for corpuscular rays, particularly for transmission from areas of an object surface onto the focal plane by means of electrons. The...
6995369 Scanning electron beam apparatus and methods of processing data from same  
One embodiment disclosed relates to a scanning electron beam apparatus. The apparatus includes an electron beam column, a scanning system, and a detection system. Circuitry in the apparatus is...
6992289 Method for performing focusing in a particle-optical device with the aid of astigmatism in the particle beam  
Method for performing focusing in a particle-optical device with the aid of astigmatism in the particle beam. In a particle-optical device such as an electron microscope it is advantageous to...