Match Document Document Title
7183547 Element-specific X-ray fluorescence microscope and method of operation  
An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then...
7183546 System and method for voltage contrast analysis of a wafer  
System and a method for electrically testing a semiconductor wafer, the method including: (a) scanning a charged particle beam along at least one scan line while maintaining an electrode located...
7176459 Electron beam apparatus  
An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an...
7173259 Automatically aligning objective aperture for a scanning electron microscope  
An automatically aligning objective aperture assembly for a CDSEM includes a plate that is moveable in X and Y directions relative to an electron beam generated by the SEM. The plate defines one...
7170068 Method and system for discharging a sample  
A method for discharging a sample, the method includes: determining whether to discharge a negatively charged area of a sample or to discharge a positively charged area of the sample; and...
7170593 Method of reviewing detected defects  
A method to solve the problem of a technique generally used to detect a defect of a semiconductor by calculating the differential image based on pattern matching, which requires that a reference...
7170056 Methodology and apparatus for leakage detection  
A method for measuring leakage through a dielectric layer of a semiconductor device on a wafer, including irradiating the dielectric layer with a charged particle beam having a beam current. The...
7166840 Method for determining depression/protrusion of sample and charged particle beam apparatus therefor  
A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being...
7166839 Apparatus for measuring a three-dimensional shape  
Conventionally, there is no method for quantitatively evaluating the three-dimensional shape of an etched pattern in a non-destructive manner and it takes much time and costs to determine etching...
7166838 X-ray imaging for patterned film measurement  
An x-ray metrology system includes an e-beam generator to cause a test sample to emit x-rays, x-ray optics for focusing the x-rays, and an x-ray imager to generate an image of the test sample from...
7164127 Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the same  
The present invention relates to a CDSEM (scanning electron microscope) capable of evaluating and presenting the measurement repeatability as a tool with a high degree of accuracy without being...
7161149 Scanning electron microscope and method of controlling same  
A scanning electron microscope has an electron gun producing the electron beam, an objective lens for sharply focusing the beam onto the specimen, a tilting mechanism for tilting the specimen...
7161158 System and method for fast focal length alterations  
An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control...
7157702 High resolution atom probe  
A three dimensional atom probe comprising a sharp specimen (10) coupled to a mounting means (12) where emission of charged particles is caused by application of a potential to the specimen tip...
7154089 Scanning electron microscope  
A scanning electron microscope in which the secondary electrons generated from a specimen are efficiently caught by a secondary electron detector by correcting and controlling the trajectory of...
7151269 Sample inspection apparatus  
A sample inspection apparatus comprises a sample support; a detection system for detecting radiation emitted by or transmitted through a sample on the sample support in response to radiation...
7148479 Defect inspection apparatus, program, and manufacturing method of semiconductor device  
A defect inspection apparatus includes a charged particle beam source which emits a charged particle beam to illuminate the charged particle beam onto a sample as a primary beam; an image pickup...
7145140 Method of determining whether a conductive layer of a semiconductor device is exposed through a contact hold  
In a method for determining the degree of charge-up induced by plasma used for manufacturing a semiconductor device and an apparatus therefor, a predetermined region on a surface of a wafer on...
7145154 Method of automatically correcting aberrations in charged-particle beam and apparatus therefor  
The present invention provides method and apparatus for automatically correcting aberrations in a charged-particle beam. The apparatus has a memory for storing image data obtained by scanning a...
7141790 Defect inspection instrument and positron beam apparatus  
The purpose of the present invention is to inspect the position, number, and size of fine defects in a variety of solid state materials, including a semiconductor device and metallic materials,...
7141800 Non-dispersive charged particle energy analyzer  
An electron energy analyzer including a curved electrostatic low-pass reflector and a high-pass electrostatic transmissive filter. The reflector comprises a curved grid, preferably ellipsoidal,...
7138641 Beam deflecting method, beam deflector for scanning, ion implantation method, and ion implantation system  
A beam deflector for scanning performs deflecting of a charged particle beam having a regular trajectory in a vacuum space to thereby periodically change the trajectory of the charged particle...
7135678 Charged particle guide  
A charged particle guide adapted to be coupled with a charged particle detector, such as a secondary electron detector. The charged particle guide, in one example, comprising two wires extending...
7135675 Multi-pixel and multi-column electron emission inspector  
One embodiment disclosed pertains to an inspection system for inspecting a specimen. The system includes a plurality of columns for directing a plurality of multi-pixel incident beams onto a...
7135677 Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system  
An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is...
7132652 Automatic classification of defects using pattern recognition applied to X-ray spectra  
Disclosed are methods and apparatus for classifying defects based on X-ray spectrum obtained from the defects. In general terms, the present invention provides pattern recognition techniques for...
7132671 Substrate testing device and substrate testing method  
In a substrate testing device, a testing unit acquires a tested result of a substrate by scanning of an electron beam. An alignment mark detecting unit optically detects an alignment mark on the...
7130063 Micropattern shape measuring system and method  
A test pattern formed in a scribe line area of a wafer is irradiated with a light beam to measure the width thereof; the test pattern is irradiated with an electron beam so as to measure the width...
7126357 Method for inspecting a wafer and apparatus for inspecting a wafer  
Disclosed are a method and apparatus for inspecting a wafer for electrical defects. A first electron beam is irradiated onto an area of the wafer including an inspection region to charge the area....
7122796 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same  
An inspection method and apparatus includes control of an acceleration voltage of an electron beam, irradiation of the electron beam to an object to be inspected mounted on a stage which is...
7122795 Detector optics for charged particle beam inspection system  
A charged particle beam column for substrate inspection includes detector optics with high secondary electron detection efficiency combined with minimal distortion of the charged particle beam....
7115866 Site stepping for electron beam micro analysis  
A method of measuring properties of a sample using an electron beam. Coordinates of a measurement site on the sample, and a diameter of the electron beam are defined. Multiple measurement...
7112803 Beam directing system and method for use in a charged particle beam column  
A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a...
7109484 Sheet beam-type inspection apparatus  
An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam...
7109487 Particle beam device  
A particle beam device, in particular an electron microscope, having at least two particle beam columns and one object slide having a receiving surface for receiving an object. The particle beam...
7109483 Method for inspecting substrate, substrate inspecting system and electron beam apparatus  
The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection...
7109493 Particle beam generator  
The source of electrons is a nanotip in a vacuum as used in near field microscopy. The source of ions is a similar nanotip in vacuum supplied with liquid metal (gallium) as in a liquid-metal ion...
7109486 Layered electron beam column and method of use thereof  
An electron beam column package comprises a plurality of layers having components, such as lenses, coupled thereto. The layers may be made of LTCC, HTCC or other layer technology.
7105814 Electron microscopy system and electron microscopy method  
A probe-forming electron microscopy system 1 (SEM) is proposed which comprises a position-sensitive detector 15. As a result, position-dependent secondary electron intensities in the object plane...
7105833 Deflection system for a particle beam device  
A particle beam apparatus and a device for an energy corrected deflection by a predetermined deflection angle of a particle beam coming in along a beam axis are disclosed, whereby the particle...
7105815 Method and apparatus for collecting defect images  
To acquire defect images even when a defect exists below an optically transparent film, an electron optical system of an electron microscope is set to a first imaging condition. A defect position...
7098456 Method and apparatus for accurate e-beam metrology  
One embodiment disclosed relates to a method for accurate electron beam metrology. A substrate with a target feature is loaded into a scanning electron microscope. An electron beam is scanned over...
7098457 Electron beam apparatus and device manufacturing method using same  
A defect inspecting apparatus is provided for generating a less distorted test image to reliably observe a surface of a sample for detecting defects thereon. The defect detecting apparatus...
7095024 TEM sample equipped with an identifying function, focused ion beam device for processing TEM sample, and transmission electron microscope  
The problem of the present invention is to provide a TEM sample equipped with an identifying function for easily specifying a detailed TEM sample and to provide a system for handling the...
7095023 Charged particle beam apparatus, charged particle detection method, and method of manufacturing semiconductor device  
A charged particle beam apparatus includes: a charged particle beam source which generates a charged particle beam to irradiate the charged particle beam onto a specimen; a demagnification optical...
7091485 Methods and systems for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles  
A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the...
7084406 Detector arrangement and detection method  
A detector arrangement for detecting position information contained in a beam (5) of charged particles is provided, comprising a plurality of position-sensitive detectors (17), each for supplying...
7081625 Charged particle beam apparatus  
The object of the present invention is to transmit the position information of a defect that has been specified by means of a circuit pattern inspection apparatus quickly and precisely so that the...
7078689 Integrated electron beam and contaminant removal system  
One embodiment disclosed relates to an integrated electron beam inspection and contaminant removal tool. An electron beam column is configured to image an area on a substrate being inspected. A...
7078688 Shape measuring device and shape measuring method  
This invention is to provide a shape measuring device and a shape measuring method that can accurately measure a cross-sectional shape or a three-dimensional shape of a sample without using...