Match Document Document Title
7321232 Charge amount measurement method, shift value measurement method of charged beam, charge amount measuring device and shift value measuring device of charged beam  
A charge amount measurement method comprises: interposing a measurement subject between a first substance and a second substance having a through hole; measuring a first collision position where a...
7321118 Scanning transmission ion microscope  
Scanning Transmission Ion Microscope. The microscope includes a bright helium ion source to generate an ion beam and a focusing electrostatic optical column to focus the ion beam. A translation...
7319223 Method and apparatus for characterizing a recess located on a surface of a substrate  
Method and apparatus for characterizing a recess located on a surface of a substrate are provided. One embodiment of the invention provides a method for characterizing a recess located on a...
7315023 Method of preparing a sample for examination in a TEM  
A method of preparing a sample for examination in a TEM, where the sample is attached to a probe tip point, uses a TEM sample holder form embodied in a TEM sample holder coupon. The probe-tip...
7315022 High-speed electron beam inspection  
One embodiment disclosed relates to an electron beam apparatus for inspection of a semiconductor wafer, wherein substantially an entire area of the wafer surface is scanned without moving the...
7315024 Monochromator and scanning electron microscope using the same  
An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly...
7313494 Semiconductor chip inspection supporting apparatus  
A semiconductor chip inspection supporting apparatus includes a data processing unit. To the data processing unit, an image data is supplied. The image data indicates a layout of a plurality of...
7312449 Electron beam system and method of manufacturing devices using the system  
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for...
7312448 Method and apparatus for quantitative three-dimensional reconstruction in scanning electron microscopy  
A method and an apparatus are for three-dimensional tomographic image generation in a scanning electron microscope system. At least two longitudinal marks are provided on the top surface of the...
7312447 Electron beam depicting method, mother die manufacturing method, mother die, metallic mold manufacturing method, metallic mold and optical element  
There is described a method for depicting a predetermined pattern, such as a diffraction pattern employed in an optical element, on a substrate. The method includes the steps of: acquiring shape...
7309864 Method for analysing physical and/or chemical properties of the surface layer of a solid body (variants)  
According to the method for analyzing physical and/or chemical properties of the surface layer of a solid as per claim 1, the surface layer is activated by a unit irradiation pulse and, when the...
7304302 Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis  
Various systems configured to reduce distortion of a resist during a metrology process are provided. The systems include an electron beam metrology tool configured to measure one or more...
7304320 Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device  
A charged beam exposure apparatus includes: a first shaping aperture provided with a plurality of rectangular openings which are different from each other in at least one of area and shape...
7301159 Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same  
A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points...
7301146 Probe driving method, and probe apparatus  
A probe driving method and a probe apparatus for bringing a probe into contact with the surface of a sample in a safe and efficient manner by monitoring the probe height. Information about the...
7298163 TFT array inspection device  
A TFT array inspection device inspects a TFT array substrate having thin film transistors arranged in a matrix pattern. The TFT array inspection device includes a probe frame to be electrically...
7294834 Scanning electron microscope  
In a scanning electron microscope, an emitted primary electron beam is diverted by an angle of at least about 45 degrees prior to incidence with a specimen. The beam may be bent by a magnetic...
7294833 Method of alignment for efficient defect review  
An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for...
7291849 Calibration standard for transmission electron microscopy  
A calibration standard includes a silicon substrate having a plurality of defined regions and a plurality of calibration marks placed on respective defined regions of the silicon substrate. Each...
7288764 Pattern measuring method  
A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern...
7288763 Method of measurement accuracy improvement by control of pattern shrinkage  
A scanning method for a scanning electron microscope is provided which minimizes a degradation in dimension measuring accuracy caused by a shrink of a specimen. A time between the first and the...
7285777 Sample dimension measuring method and scanning electron microscope  
An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this...
7285785 Apparatus with permanent magnetic lenses  
The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is...
7285781 Characterizing resist line shrinkage due to CD-SEM inspection  
A CD-SEM (critical dimension-scanning electron microscope) system may utilize a technique for characterizing and reducing shrinkage carryover due to CD-SEM measurements. The system may identify...
7285779 Methods of scanning an object that includes multiple regions of interest using an array of scanning beams  
A multi beam inspection method and system. The inspection system includes: (i) a beam array generator adapted to generate an array of beams characterized by a beam array axis; and (ii) at least...
7285776 Scanning transmission electron microscope and electron energy loss spectroscopy  
The present invention provides a scanning transmission electron microscope which is capable of setting an acceptance angular range of an energy loss spectrometer independent of an acceptance...
7285780 Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system  
With a detector system for the specimen chamber of a scanning electron microscope, signals are simultaneously detected in transmission which signals correspond to a light field contrast and a dark...
7285778 Probe current imaging  
A method including directing a first electrical signal to at least one of a plurality of probes each positioned within a chamber of a charged particle beam device. At least one of the plurality of...
7282711 Multiple electron beam device  
The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to...
7276693 Inspection method and apparatus using charged particle beam  
A scanning electron microscope or inspection system includes a sample stage on which a sample such as a wafer is loaded, an electro optical unit to scan an electron beam to the sample, and a...
7276694 Defect detection using energy spectrometer  
One embodiment disclosed relates to an apparatus for detecting defects in substrates. An irradiation source is configured to generate an incident beam, and a lens system configured to focus the...
7276690 Method and system for e-beam scanning  
The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to...
7276692 Beam adjusting sample, beam adjusting method and beam adjusting device  
A beam adjusting sample having a flat surface being like a plate and having two edges orthogonal to each other is employed. A beam is applied to the beam adjusting sample to detect an amount of...
7274017 Electron beam apparatus and high-voltage discharge prevention method  
Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage...
7274018 Charged particle beam apparatus and method for operating the same  
A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of...
7271396 Method and device for aligning a charged particle beam column  
The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to...
7271385 Inspection method and inspection apparatus using electron beam  
An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of...
7265382 Method and apparatus employing integrated metrology for improved dielectric etch efficiency  
A method and apparatus for processing a semiconductor wafer is provided for reducing dimensional variation by feeding forward information relating to photoresist mask CD and profile and underlying...
7262410 Sample observing apparatus and sample observing method  
There is provided a sample observing apparatus for observing the surface of a sample by irradiating an electron beam thereto, having an electron gun for irradiating the electron beam to the...
7262411 Direct collection transmission electron microscopy  
A preferred method for transmission electron microscopy includes a step of generating a microscopy signal. The microscopy signal is then detected with an active pixel detector that includes a...
7262418 Method and apparatus for multiple charged particle beams  
A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of...
7256405 Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method  
An object of the present invention is to provide a sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method, which can reduce an edge roughness...
7253419 Apertured plate support mechanism and charged-particle beam instrument equipped therewith  
An apertured plate support mechanism used in an electron beam lithography machine. The apertured plate is held to a plate holder. The plate support mechanism has the plate holder for holding the...
7253901 Laser-based cleaning device for film analysis tool  
A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only...
7254212 Particulate matter analyzer, collecting filter and system for analyzing and collecting samples from fluids  
A system, including a particulate matter analyzer and collecting filter, provides a method of analyzing and collecting samples from fluids, such as collecting particulate matter from air. A mass...
7253410 Charge-control pre-scanning for e-beam imaging  
One embodiment described relates to a method of electron beam imaging of a target area of a substrate. An electron beam column is configured for charge-control pre-scanning using a primary...
7253645 Detection of defects in patterned substrates  
A method of detecting defects in a patterned substrate includes positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column...
7250602 Probe device  
A probe device comprises a cantilever comprising a probe allocated to be opposed to a surface of a sample, means for feeding back a vibration amplitude value of the cantilever, thereby...
7250599 Energy filter image generator for electrically charged particles and the use thereof  
The invention relates to an energy filter image generator for filtering electrically charged particles. The inventive energy filter comprises at least two toroidal energy analysers (30, 40)...
7247849 Automated focusing of electron image  
One embodiment disclosed relates to a method for automated focusing of an electron image. An EF cut-off voltage is determined. In compensation for a change in the EF cut-off voltage, a focusing...