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7385194 Charged particle beam application system  
An object of the present invention is to measure a landing angle even in a multi electron beam lithography system in which current amount of each beam is small. Another object thereof is to...
7381968 Charged particle beam apparatus and specimen holder  
Information of a specimen holder or information of a specimen mounted on the specimen holder is stored in a memory inside the specimen holder mounted to an electron microscope. The memory is...
7381951 Charged particle beam adjustment method and apparatus  
A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for...
7381970 Specimen stage for charged-particle scanning microscopy  
A specimen stage for charged-particle scanning microscopy comprises a non-magnetic platform for supporting a specimen, at least one probe pin assembly including a probe pin for contacting a...
7375323 Electron beam apparatus with aberration corrector  
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a...
7375327 Method and device for measuring quantity of wear  
A method and device to accurately obtain very small quantity of wear of the order of nanometers of a protective film on the surface of a sliding member. A quantity of wear on the surface of a...
7375329 Scanning electron microscope  
In a scanning electron microscope, slimming is reduced by reducing a frame count. As the frame count is reduced, the amount of detected secondary electrons decreases, so that a probe current...
7375328 Charged particle beam apparatus and contamination removal method therefor  
A charged particle beam apparatus comprising a preparatory evacuation chamber (15 in FIG. 1A) into which a sample (12) is conveyed and which is preliminarily evacuated, an ultraviolet irradiation...
7375330 Charged particle beam equipment  
Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned....
7372025 Scanning probe microscope using a surface drive actuator to position the scanning tip  
A scanning probe microscope includes a scanning probe tip and an electrostatic surface actuator operatively coupled to the scanning probe tip. The electrostatic surface actuator includes a movable...
7372027 Electron beam apparatus and method for manufacturing semiconductor device  
A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller...
7368713 Method and apparatus for inspecting semiconductor device  
A method and apparatus for inspecting a wafer during a semiconductor device fabrication process. The apparatus performs, only via observation from the wafer's top surface, inspection and...
7365322 Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern  
In order to provide an imaging-recipe arranging or creating apparatus and method adapted so that selection rules for automatic arrangement of an imaging recipe can be optimized by teaching in a...
7365325 Method and apparatus for observing a specimen  
A method and device for observing a specimen in which an electron beam is irradiated and scanned from an oblique direction, onto a surface of a calibration substrate on which a pattern with a...
7365323 Environmental scanning electron microcope  
In an environmental scanning electron microscope in which differential pumping for maintaining the pressure ratio between an electron optical system and a specimen chamber at a predetermined value...
7365320 Methods and systems for process monitoring using x-ray emission  
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions include a system and method for process monitoring that...
7365324 Testing apparatus using charged particles and device manufacturing method using the testing apparatus  
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover...
7365321 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis  
Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a...
7365348 Adjusting device of an apparatus for generating a beam of charged particles  
An adjusting device of an apparatus for generating a beam of charged particles, wherein said beam is for interacting with a target and wherein said adjusting device comprises interface means for...
7365306 Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same  
This invention provides an electron beam length measuring technology including a standard component for length measurement that has a finer standard dimension, and its producing method. The...
7361896 Scanning electron microscope and a method for adjusting a focal point of an electron beam of said scanning electron microscope  
In a scanning electron microscope, scanning region is set to be narrow, upon which focused electron beam is scanned, so that the focused electron beam can be irradiated at the almost same position...
7358493 Method and apparatus for automated beam optimization in a scanning electron microscope  
A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM)....
7358491 Method and apparatus for the depth-resolved characterization of a layer of a carrier  
The present invention relates to a method for the depth-resolved characterization of a layer of a carrier. This involves firstly producing a cutout in the layer of the carrier with a sidewall and...
7358495 Standard reference for metrology and calibration method of electron-beam metrology system using the same  
An electron-beam metrology system includes a specimen stage to mount a specimen on which a device pattern is formed, electron optics to radiate the device pattern with an electron-beam, a...
7358494 Material composition analysis system and method  
The material composition of a thin film formed on a substrate or covered by a cap layer that shares one or more elements with the thin film can be determined by combining characteristic material...
7355175 Method and apparatus for automatically correcting charged-particle beam and method of controlling aberration corrector for charged-particle beam  
There is disclosed a method and apparatus for automatically correcting a charged-particle beam with an aberration corrector without the operator performing manual operations. The apparatus has an...
RE40221 Object observation apparatus and object observation  
This invention relates to an object observation apparatus and observation method. The object observation apparatus is characterized by including a drivable stage on which a sample is placed, an...
7355174 Charged particle beam emitting device and method for adjusting the optical axis  
A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative...
7351967 System and method for inspecting a semiconductor sample  
The present invention relates to a system and method of inspecting a semiconductor sample. A plurality of scans of the semiconductor sample are recorded. Each of the scans comprises a spatially...
7351971 Charged-particle beam instrument and method of detection  
A charged-particle beam instrument and method are offered which can inspect side and rear surfaces of the outer periphery of a specimen. The instrument has a source of the charged-particle beam...
7351970 Scanning electron microscope  
There is disclosed a scanning electron microscope capable of removing the effects of vibrations on image information easily and reliably by detecting variations in the relative position between a...
7351966 High-resolution optical channel for non-destructive navigation and processing of integrated circuits  
An optical-fiber based light channel system is included in an ion/electron beam tool for imaging and/or processing integrated circuits. The optical channel system includes an image collection...
7351968 Multi-pixel electron emission die-to-die inspection  
One embodiment disclosed is a method of detecting defects in objects. A selected surface area of an object is inspected with a multi-pixel electron microscope, and first set of data is generated...
7348558 Charged particle beam apparatus and automatic astigmatism adjustment method  
According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged...
7348566 Aberration-correcting cathode lens microscopy instrument  
An aberration-correcting microscopy instrument is provided. The instrument has a first magnetic deflector disposed for reception of a first non-dispersed electron diffraction pattern. The first...
7348557 Scanning particle beam instrument  
A scanning particle beam instrument is provided, the instrument including a scanner, a radiation detector and a DC amplifier, the DC amplifier being operable to amplify a signal generated by the...
7348556 Method of measuring three-dimensional surface roughness of a structure  
An improved method of measuring the three-dimensional surface roughness of a structure. A focused ion beam is used to mill a succession of cross-sections or “slices” of the feature of interest at...
7342225 Crystallographic metrology and process control  
A system (70) for crystallography including a sample holder (74), an electron source (76) for generating an electron beam, and a scanning actuator (80) for controlling the relative movement...
7339167 Charged particle beam apparatus  
A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam...
7335879 System and method for sample charge control  
A system and method for characterizing and charging a sample. The system includes a vacuum chamber, a first apparatus in the vacuum chamber and configured to characterize a sample, and a second...
7335881 Method of measuring dimensions of pattern  
With complexity of a process, the setting of conditions for pattern measurement by an SEM image falls into difficulties. However, the present invention aims to realize the setting of easy and...
7335880 Technique for CD measurement on the basis of area fraction determination  
The present invention provides a technique for estimating critical dimensions of highly scaled circuit features on the basis of scanning electron microscopy, wherein area fractions of a scan area...
7329868 Charged particle beam apparatus  
It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional...
7329878 Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same  
The present invention provides a method for manufacturing a lens assembly of a microcolumn having a plurality of microlenses and a plurality of insulating layers alternately interposed between the...
7329881 Charged-particle beam system  
A charged-particle beam system used to fabricate or inspect semiconductor devices comprises the charged-particle beam accurately brought into position on a workpiece. The system has a workpiece...
7329867 Electron beam system and electron beam measuring and observing methods  
To provide an electron beam system capable of performing three-dimensional measurement of a sample with high precision irrespective of the tilt angle and height of the sample. The electron beam...
7326928 Electron microscope and a method of imaging objects  
An electron microscope and a method of imaging objects. The method including the steps of: generating at least one electron pulse, each electron pulse including a plurality of electrons with the...
7326927 Focusing lens and charged particle beam device for titled landing angle operation  
The present invention relates to a focusing lens, a charged particle beam device, and a method for focusing a charged particle beam onto a specimen, wherein the focusing lens comprises an...
7323888 System and method for use in functional failure analysis by induced stimulus  
A scanning/imaging system wherein an external stimulus is used for exciting a device under test (DUT). A stimulus source is included for providing a stationary stimulus with a controllable spot...
7323684 Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope  
In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate...