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7435960 Charged particle beam apparatus  
A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for...
7435954 Electron microscope, methods to determine the contact point and the contact of the probe  
An electron microscope suitable for observing at least one sample is provided. The sample has at least one testing area, and a material of the sample on the testing area is semiconductive or...
7435973 Material processing system and method  
A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to...
7432503 Scanning electron microscope and method for detecting an image using the same  
In the present invention, in order to realize both a reduction of an image detecting time and high quality image detection in a scanning electron microscope for measurement, inspection, defect...
7427756 Method of precision measurements of sizes and line width roughness of small objects in accordance with their images obtained in scanning electron microscope  
A novel method of precision measurements of sizes and line width roughness of small objects in accordance with their images obtained in scanning electron microscope, which is improvement of the...
7427757 Large collection angle x-ray monochromators for electron probe microanalysis  
X-ray monochromators and electron probe micro-analysis (EPMA) systems using such monochromators are disclosed. A turretless x-ray monochromator may have a cassette of reflectors instead of a...
7427753 Method of cross-section milling with focused ion beam (FIB) device  
A method of milling a cross section of a wafer and a milling device. The method includes a coarse scanning of at least two milling frames and a fine scanning of at least one milling frame. The...
7425704 Inspection method and apparatus using an electron beam  
An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a...
7425702 Charged particle beam apparatus  
When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a...
7423267 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus  
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the...
7423746 Circuit-pattern inspecting apparatus and method  
A circuit pattern inspection apparatus and inspection method facilitate the creation of a recipe and the confirmation of a defect. The apparatus and method employ a dialogue-based operation for...
7423268 Projection imaging type electron microscope  
It is an object of the present invention to provide an projection imaging type electron microscope in which the imposition of restrictions on the design of the illumination electron optical system...
7423266 Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus  
In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image...
7423269 Automated feature analysis with off-axis tilting  
One embodiment relates to a method of automated microalignment using off-axis beam tilting. Image data is collected from a region of interest on a substrate at multiple beam tilts. Potential edges...
7420164 Objective lens, electron beam system and method of inspecting defect  
An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of...
7420106 Scanning probe characterization of surfaces  
Characterizing dielectric surfaces by detecting electron tunneling. An apparatus includes an atomic force probe. A mechanical actuator is connected to the atomic force probe. A mechanical...
7420167 Apparatus and method for electron beam inspection with projection electron microscopy  
An apparatus and method for electron beam inspection with projection electron microscopy, is constructed so as to allow correction of changes in focus offsets due to changes in the electrically...
7420163 Determining layer thickness using photoelectron spectroscopy  
According to one embodiment of the invention, photoelectron spectroscopy is used to determine the thickness of one or more layers in a single or multi-layer structure on a substrate. The thickness...
7420190 Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device  
A length measurement pattern is used for forming a contact and a via on a diffusion layer and on a lower layer interconnect, respectively, with a photoresist. The length measurement pattern...
7417444 Method and apparatus for inspecting integrated circuit pattern  
A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the...
7417242 Method of measuring ion beam position  
A system, apparatus, and method for determining position and two angles of incidence of an ion beam to a surface of a workpiece is provided. A measurement apparatus having an elongate first and...
7417236 Sheet beam-type testing apparatus  
An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam...
7414250 Cryogenic variable temperature vacuum scanning tunneling microscope  
A cryogenic variable temperature scanning tunneling microscope of novel design and component configuration, for use in conjunction with a variety of low temperature methodologies.
7411189 Cantilever array, method for fabricating the same, scanning probe microscope, sliding apparatus of guiding and rotating mechanism, sensor, homodyne laser interferometer, laser doppler interferometer having optically exciting function for exciting sample, each using the same, and method for exciting cantilevers  
A cantilever array having a simple structure and being able to reliably detect a surface of a sample, a method for fabricating the same, a scanning probe microscope, a sliding apparatus of a...
7411192 Focused ion beam apparatus and focused ion beam irradiation method  
A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic...
7408175 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former  
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate ā€œSā€ to be inspected into an inspection chamber 23-1; maintaining a...
7408155 Measuring method and its apparatus  
A method for measuring a dimension of a pattern formed on a sample using a secondary electron image obtained by picking up an image of the sample using a scanning electron microscope includes:...
7408154 Scanning electron microscope, method for measuring a dimension of a pattern using the same, and apparatus for correcting difference between scanning electron microscopes  
As measurement accuracy required for the scanning electron microscope (SEM) for measuring a pattern width becomes stringent, a technique of reducing the difference in a measured dimension between...
7405402 Method and apparatus for aberration-insensitive electron beam imaging  
One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the...
7402736 Method of fabricating a probe having a field effect transistor channel structure  
A probe of a scanning probe microscope having a sharp tip and an increased electric characteristic by fabricating a planar type of field effect transistor and manufacturing a conductive carbon...
7399964 Electron microscope, measuring method using the same, electron microscope system, and method for controlling the system  
The present invention relates to an electron microscope which reduces a difference in measured values that occur due to a difference in resolution that cannot be fully adjusted which exists among...
7399965 Method of detecting array of liquid crystal display and apparatus thereof  
A detection apparatus for detecting a defect in an array of a liquid crystal display, comprises a main chamber, a stage, a detection device and a main heater. The stage is disposed in the main...
7397031 Method of inspecting a circuit pattern and inspecting instrument  
An apparatus for inspecting a sample using a scanning electron microscope includes a sample stage, a first electron-optical system to scan an electron beam of a first beam current on the sample, a...
7394078 Technique for ion beam angle spread control for advanced applications  
A technique for ion beam angle spread control for advance applications is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread...
7394070 Method and apparatus for inspecting patterns  
When the electrode potential of a charge control electrode above a wafer is reduced, image brightness is reduced. A point of change in the image brightness is a switching point between a...
7394531 Apparatus and method for automatic optical inspection  
An automated optical inspection system, comprising at least one camera having a field of view; and at least one image scanning module comprising a plurality of objective modules arranged to have...
7394066 Electron microscope and electron beam inspection system  
An electron microscope includes an illuminating lens system that illuminates an electron beam that is emitted from an electron source onto a specimen as a planar illuminating electron beam having...
7394069 Large-field scanning of charged particles  
One embodiment relates to a charged-particle beam apparatus. The apparatus includes at least a source for generating the charged-particle beam, a first deflector, and a second deflector. The first...
7394067 Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems  
Systems and methods for reducing alteration of a specimen during by charged particle based and other measurements systems are provided. One system configured to reduce alteration of a specimen...
7394068 Mask inspection apparatus, mask inspection method, and electron beam exposure system  
A mask inspection apparatus includes: an electron gun for generating an electron beam; an exposure mask for shaping the electron beam into a predetermined cross-sectional shape; means for scanning...
7391034 Electron imaging beam with reduced space charge defocusing  
One embodiment pertains to an apparatus which impinges a focused electron beam onto a substrate. The apparatus includes an irradiation source and at least two non-axisymmetric lenses. The...
7391039 Semiconductor processing method and system  
A secondary electron image generated by an electron beam is detected by a secondary electron/secondary ion detector while a silicon substrate is etched by a focused ion beam from a back surface of...
7391022 Scanning probe microscope  
A scanning probe microscope (SPM) is provided capable of a narrow to a wide range observation according to observed targets or purposes without replacing a scanner while maintaining a high...
7391023 Lithography tool image quality evaluating and correcting  
Electron beam lithography tool image quality evaluating and correcting including a test pattern with a repeated test pattern cell, an evaluation method and correction program product are...
7388201 Radiation detector having coated nanostructure and method  
A radiation detector has an electron emitter that includes a coated nanostructure on a support. The nanostructure can include a plurality of nanoneedles. A nanoneedle is a shaft tapering from a...
7388198 Electron microscope  
An electron microscope capable of producing EELS (electron energy-loss spectroscopy) has a spectral position correcting signal supply circuit for supplying a spectral position correcting signal H...
7385205 Method and device for aligning a charged particle beam column  
The invention provides a method and apparatus for automatically aligning a beam of charged particles with an aperture. Thereby, a defocusing is introduced and a signal calculated based on an image...
7385198 Method and apparatus for measuring the physical properties of micro region  
A method and apparatus for measuring the physical properties of a micro region measures the two-dimensional distribution of stress/strain in real time at high resolution and sensitivity and with a...
7385195 Semiconductor device tester  
A system and method is disclosed for obtaining information regarding one or more contact and/or via holes on a semiconductor wafer. In one embodiment, the method obtains information regarding one...
7385196 Method and scanning electron microscope for measuring width of material on sample  
A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value...