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7482586 Methods for sample preparation and observation, charged particle apparatus  
In an SEM observation in a depth direction of a cross section processed by repeated FIB cross-sectioning and SEM observation to correct a deviation in an observation field of view and a deviation...
7479633 Methodology for critical dimension metrology using stepper focus monitor information  
A method of producing an accurate critical dimension measurement comprises navigating to a critical dimension structure, performing a scanning electron microscope focusing, performing a final...
7479632 E-beam vision system for monitoring and control  
A method of characterizing an electron beam is described, comprising providing a system including an electron gun having a steering coil. A material having a surface is also provided. An electron...
7476871 Specimen box for electron microscope capable of observing general specimen and live cell  
A specimen box for an electron microscope capable of observing a general specimen or a live cell is formed of a housing. The housing includes a receiving chamber formed therein and at least one...
7476857 Tool-to-tool matching control method and its system for scanning electron microscope  
A system for controlling a tool-to-tool matching between a plurality of scanning electron microscopes for pattern dimension measurement includes a measuring unit for, at regular intervals,...
7476882 Calibration method for electron-beam system and electron-beam system  
There is provided an electron-beam calibration technology whereby deflection calibration used in the electron-beam system can be performed with a high accuracy. A one-dimensional diffraction...
7476856 Sample dimension-measuring method and charged particle beam apparatus  
A method and apparatus for efficiently executing two types of measurements with an optical measuring device and a scanning electron microscope are provided. For example, the method and apparatus...
7476858 Particle detection auditing system and method  
A system is presented for evaluating the performance of a particle detecting and measuring instrument wherein the instrument receives a specimen and detects the number of particles on the specimen...
7470915 Detector system of secondary and backscattered electrons for a scanning electron microscope  
A system for detecting secondary and backscattered electrons in a scanning electron microscope includes a microporous plate (9) that is disposed between a lower scintillator (5) and an upper...
7468517 Single stage charged particle beam energy width reduction system for charged particle beam system  
The present invention provides a charged particle beam device. The device comprises a first lens generating a crossover a second lens positioned after the crossover and an element acting in a...
7465922 Accelerating electrostatic lens gun for high-speed electron beam inspection  
One embodiment relates to an electron beam apparatus for inspecting or reviewing a manufactured substrate. The apparatus includes a cathode, an extraction electrode, a lens electrode, an anode,...
7465935 Method for inspecting pattern defect and device for realizing the same  
When using a CCD sensor as a photo-detector in a device for inspecting foreign matters and defects, it has a problem of causing electric noise while converting the signal charge, produced inside...
7462828 Inspection method and inspection system using charged particle beam  
In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary...
7462838 Electrostatic deflection control circuit and method of electronic beam measuring apparatus  
An electrostatic deflection circuit and method of an electronic beam measuring apparatus which can achieve the high precision of the electronic beam measuring and contribute to the simplification...
7462839 Detector for variable pressure areas and an electron microscope comprising a corresponding detector  
A detector for scanning electron microscopes, which can be used under different pressure conditions in the specimen chamber of the electron microscope, designed for the detection of both electrons...
7459683 Charged particle beam device with DF-STEM image valuation method  
There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a...
7459699 Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method  
A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the...
7459680 Method of analysis using energy loss spectrometer and transmission electron microscope equipped therewith  
A method of analysis using an energy loss spectrometer and a transmission electron microscope equipped with the energy loss spectrometer. The spectrometer has a CCD camera for recording plural...
7459682 Spin-polarized electron source and spin-polarized scanning tunneling microscope  
An exemplary spin-polarized electron source includes a cathode, and a one-dimensional nanostructure made of a compound (e.g., group III-V) semiconductor with local polarized gap states. The...
7459704 Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms  
Ion sources and methods for generating molecular ions in a cold operating mode and for generating atomic ions in a hot operating mode are provided. In some embodiments, first and second electron...
7459681 Scanning electron microscope  
An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a...
7456402 Detector optics for multiple electron beam test system  
A detector optics system for collecting secondary electrons (SEs) and/or backscattered electrons (BSEs) in a multiple charged particle beam test system is disclosed. Aspects of the detector optics...
7456400 Scanning probe microscope and scanning method  
A scanning probe microscope has a probe needle and a control section that controls relative scanning movement between the probe needle and a surface of a sample in at least one direction parallel...
7456401 Projection electron microscope, electron microscope, specimen surface observing method and micro device producing method  
The illuminating beam 4 emitted from the cathode 1 is incident on a deflector 3. In a state in which a voltage is applied to the deflector 3, the optical path of the illuminating beam 4 is altered...
7453076 Bi-polar treatment facility for treating target cells with both positive and negative ions  
A system for treating target cells with both positive and negative ions comprises a bi-polar beam delivery system configured to create and deliver both positive ion beams and negative ion beams....
7453062 Energy-filtering cathode lens microscopy instrument  
An energy filtering microscopy instrument is provided. An objective lens is disposed for reception of electrons in order to form an electron diffraction pattern in a backfocal plane of the...
7453274 Detection of defects using transient contrast  
One embodiment relates to a method for detecting defects in circuitry formed on a semiconductor substrate. A first scan of said circuitry is performed by scanning a primary electron beam in a...
7453063 Calibration substrate and method for calibrating a lithographic apparatus  
A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat...
7449699 Method and apparatus for creating a topography at a surface  
Methods and apparatus whereby an optical interferometer is utilized to monitor and provide feedback control to an integrated energetic particle column, to create desired topographies, including...
7449692 Charged particle beam apparatus  
The charged particle beams is provided, which can analyze contamination of the inner wall of the system without being disassembled and supply information on appropriate maintenance timing. The...
7449689 Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method  
The present invention relates to a dimension measuring SEM system and a circuit pattern evaluating system capable of achieving accurate, minute OPC evaluation, the importance of which increase...
7449691 Detecting apparatus and device manufacturing method  
A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an...
7449690 Inspection method and inspection apparatus using charged particle beam  
To establish a technique that enables sorting of the elevation and azimuth angle in the direction of emitting secondary electrons and obtaining images with emphasized contrast, in order to perform...
7446313 Scanning electron microscope  
It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation...
7442929 Scanning electron microscope  
A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed....
7442924 Repetitive circumferential milling for sample preparation  
A method of sample extraction entails making multiple, overlapping cuts using a beam, such as a focused ion beam, to create a trench around a sample, and then undercutting the sample to free it....
7442930 Method for correcting distortions in electron backscatter diffraction patterns  
A method is provided for correcting magnetic field distortions in an electron backscatter diffraction (EBSD) pattern. An EBSD pattern is firstly generated from a sample placed within an electron...
7442942 Charged particle beam apparatus  
To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice...
7442925 Working method using scanning probe  
The present invention provides a working method using a scanning probe which can enhance a working speed and prolong a lifetime of the probe. The present invention provides the working method...
7442923 Scanning electron microscope  
To make it possible to observe the bottom of a contact hole and internal wires, in observation of the contact hole 102, by scanning it at a predetermined acceleration voltage, the positive charge...
7442928 Charged particle beam apparatus  
When a sample includes repeated cells, a scale pattern corresponding to the repeated cells is generated. Next, the scale pattern generated is superimposed on the image of the repeated cells of the...
7442922 Method for locally highly resolved, mass-spectroscopic characterization of surfaces using scanning probe technology  
The invention relates to a combined method in which a high-resolution image of a sample surface is recorded by means of scanning force microscopy and the locally high-resolution, chemical nature...
7439504 Pattern inspection method and apparatus using electron beam  
A pattern inspection method and apparatus in which a charged particle beam is irradiated onto a surface of a specimen on which a pattern is formed, plural sensors simultaneously detect secondary...
7439503 Charged particle beam irradiation method, method of manufacturing semiconductor device and charged particle beam apparatus  
A charged particle beam irradiation method includes: obtaining shape information of an edge of a pattern to be inspected that is formed on a subject; creating a first line group substantially...
7439506 Method and an apparatus of an inspection system using an electron beam  
Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel...
7439500 Analyzing system and charged particle beam device  
The present invention relates to an analyzing system with improved detection scheme and a charged particle beam device comprising the same. The analyzing system for analyzing a beam of charged...
7439502 Electron beam apparatus and device production method using the electron beam apparatus  
The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of...
7435959 Microstructured pattern inspection method  
The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the...
7435956 Apparatus and method for inspection and testing of flat panel display substrates  
A charged particle optical system for testing, imaging or inspecting substrates comprises: a charged particle optical assembly configured to produce a line of charged particle beams equally spaced...
7435957 Charged particle beam equipment and charged particle microscopy  
On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view...