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7538323 Interferometer  
The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using...
7535001 Method and system for focusing a charged particle beam  
A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample...
7531799 Charged particle beam column  
A scanning electron microscope includes an electron gun to generate an electron beam, and an electron optical system directing the electron beam to a specimen. The electron optical system includes...
7531812 Method and system for the directional detection of electrons in a scanning electron microscope  
A system detects electrons according to their emission direction in a scanning electron microscope. The system includes a scintillator electron detector and a set of electrodes focusing and...
7531796 Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods  
Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing...
7533000 Method and apparatus for analysing a dataset of spectra  
A method of analyzing a dataset of spectra is provided in which each spectrum has a count value for each of a number of parameter values within a parameter range. The method is for identifying one...
7531816 Vacuum conveying apparatus and charged particle beam equipment with the same  
A charged particle beam examination equipment for examining and measuring a semiconductor wafer, comprising a wafer exchange portion for exchanging an unexamined wafer and an examiner wafer with...
7525091 Charged particle beam system and a method for inspecting a sample  
A method and system for inspecting an inspected object. The system includes: a detector adapted to detect charged particles scattered from a sample; a magnetic lens adapted to generate a magnetic...
7525089 Method of measuring a critical dimension of a semiconductor device and a related apparatus  
A method and apparatus for measuring a critical dimension (CD) are provided. Image data of a measurement pattern are generated. The measurement pattern may include a first surface and a second...
7525090 Dynamic centering for behind-the-lens dark field imaging  
One embodiment relates to a method of behind-the-lens dark-field imaging using a scanning electron microscope apparatus. An incident beam is focused onto a specimen surface using an immersion...
7525325 System and method for floating-substrate passive voltage contrast  
A passive voltage contrast (PVC) system and method are disclosed for analyzing ICs to locate defects and failure mechanisms. During analysis a device side of a semiconductor die containing the IC...
7521677 Method and device for distance measurement  
A method and a device for determining the distance from the sample to be examined to at least one reference point which function independently of the type of sample. A signal is modulated to a...
7521695 Scanning electron microscope  
In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the...
7521692 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus  
An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for...
7521678 Charged particle beam apparatus, charged particle beam focusing method, microstructure measuring method, microstructure inspecting method, semiconductor device manufacturing method, and program  
A charged particle beam apparatus includes: a charged particle source which generates a charged particle beam to apply to a specimen having a microstructure formed on a surface thereof; an...
7521675 Charged particle beam apparatus  
A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an...
7521688 Charged-particle beam instrument  
A charged-particle beam instrument is offered which can cancel out deflection aberrations arising from a first deflector or oblique incidence on the surface of a workpiece without (i) increasing...
7521676 Method and apparatus for inspecting pattern defects and mirror electron projection type or multi-beam scanning type electron beam apparatus  
The present invention provides a mirror electron projection (MPJ) type (SEPJ type included) scanning electron beam apparatus that is capable of performing condition setup, and a method and...
7518109 Method and apparatus of measuring thin film sample and method and apparatus of fabricating thin film sample  
In a method of measuring a thin film sample of irradiating an electron beam to a thin film sample, detecting a generated secondary electron and measuring a film thickness of the thin film sample...
7514681 Electrical process monitoring using mirror-mode electron microscopy  
One embodiment relates to a method of inspecting a substrate using electrons. Mirror-mode electron-beam imaging is performed on a region of the substrate at multiple voltage differences between an...
7514680 Apparatus for modifying and measuring diamond and other workpiece surfaces with nanoscale precision  
Apparatus and techniques are provided for modifying and measuring surfaces of diamond workpieces and other workpieces with nanoscale precision. The apparatus and techniques exploit scanning probe...
7514683 Scanning electron microscope  
Disclosed is a scanning electron microscope capable of performing speedy focusing by automatically measuring an electrostatic voltage of a surface of a wafer inside a specimen chamber in an...
7514682 Electron anti-fogging baffle used as a detector  
Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to...
7511271 Scanning electron microscope  
A scanning electron microscope includes an irradiation optical system for irradiating an electron beam to a sample; a sample holder for supporting the sample, arranged inside a sample chamber; at...
7511272 Method for controlling charged particle beam, and charged particle beam apparatus  
According to the invention, to achieve the above objective, there is provided a charged particle beam apparatus that creates a first image by irradiating a charged particle beam on a sample to...
7511282 Sample preparation  
Methods of extracting a TEM sample from a substrate include milling a hole on the sample and inserting a probe into the hole. The sample adheres to the probe, and can be processed on transferred...
7507956 Charged particle beam energy width reduction system for charged particle beam system  
The present invention provides a charged particle beam energy width reduction system. The system comprises a first element acting in a focusing and dispersive manner in an x-z-plane; a second...
7507961 Method and apparatus of pattern inspection and semiconductor inspection system using the same  
A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates...
7507962 Electron-beam device and detector system  
An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons...
7507959 Method for charging substrate to a potential  
A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than...
7504627 Electron beam inspection apparatus  
An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of...
7504626 Scanning electron microscope and apparatus for detecting defect  
A scanning electron microscope, by which an image of unevennesses on the surface of a sample may be obtained in a high-resolution manner and a high contrast one, is provided according to the...
7504625 Substrate inspection method, manufacturing method of semiconductor device and substrate inspection apparatus  
A substrate inspection method includes: generating primary charged particle beams; applying the generated primary charged particle beams to an inspection target of a substrate; condensing first...
7504624 Charged particle beam device  
A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from...
7501625 Electron microscope application apparatus and sample inspection method  
A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to...
7498573 Method for obtaining and processing surface analysis data  
A method of managing data obtained by measurements. The method permits EDS (energy dispersive spectroscopy) spectra to be collected in one operation. Energies detected by an EDS detector are...
7498589 Scanning probe microscope  
A scanning probe microscope for measuring a surface profile of a sample by bringing a probe into close proximity to or contact with the surface of the sample and scanning the sample surface...
7495216 Electron beam apparatus for work function measurements  
The inventive apparatus measures workfunction values using deflection of an electron beam without direct contact of the electron beam with the sample surface. The apparatus, mounted within a...
7495217 Film thickness and composition measurement via auger electron spectroscopy and electron probe microanalysis  
In some embodiments, techniques are described for combining an X-ray detector (e.g., for providing EPMA) and an electron detector (e.g., for providing AES) to provide a tool for determining film...
7495240 Apparatus and method for modifying an object  
A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to...
7491933 Electron beam apparatus  
An electron beam (4) to be irradiated onto a sample (10) is two-dimensionally scanned by a scanning coil (9), and secondary electrons generated from the sample (10) by the scanning are detected by...
7491934 SEM technique for imaging and measuring electronic transport in nanocomposites based on electric field induced contrast  
Methods and apparatus are described for SEM imaging and measuring electronic transport in nanocomposites based on electric field induced contrast. A method includes mounting a sample onto a sample...
7488936 TFT array inspecting apparatus  
A TFT array inspecting apparatus inspects a TFT array disposed at either an inclined position and a level position. The TFT array inspecting apparatus includes a vacuum chamber, a stage disposed...
7488938 Charge-control method and apparatus for electron beam imaging  
One embodiment relates to a method of electron beam imaging of a target area of a substrate. During an imaging phase, an electron beam is controllably scanned over the target area of the...
7490009 Method and system for spectroscopic data analysis  
A method of analyzing spectroscopic data, the method comprising collecting spatially resolved measurement spectroscopic data of a sample for a series of measurements spots, assigning the...
7488937 Method and apparatus for the improvement of material/voltage contrast  
A method and system for registering a CAD layout to a Focused Ion Beam image for through-the substrate probing, without using an optical image and without requiring biasing, includes an improved...
7488961 Charged particle beam irradiation method and charged particle beam apparatus  
A computer sets a process area based on an image obtained by observing a mask, and determines the positions of representative points that form a contour of the process area for each pixel with...
7485880 Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method  
After a scan area for observing or processing a mask is set, a computer of the charged particle beam apparatus determines a plurality of scan lines in the scan area by the following steps of:...
7485856 Scanning probe microscopy inspection and modification system  
A scanning probe microscopy (SPM) inspection and/or modification system which uses SPM technology and techniques. The system includes various types of microstructured SPM probes for inspection...
7485858 Inspection method for semiconductor wafer and apparatus for reviewing defects  
An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in...