Match Document Document Title
7659508 Method for measuring dimensions of sample and scanning electron microscope  
The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements,...
7659506 Method and system for generating and reviewing a thin sample  
A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to...
7660687 Robust measurement of parameters  
A method of increasing consistency between separate parametric measurement readings that are taken with an electron beam imaging tool at different times within a period of time, by correcting...
7659509 System for scanning probe microscope input device  
In accordance with the invention, a computer pointing device is interfaced with an SPM system to provide real time control of the SPM and improve the ease of use.
7659507 Automatic method of axial adjustments in electron beam system  
Axial adjustments of an aberration corrector are made roughly. Whenever plural values of voltage are applied to an electrode in the first stage of the corrector, a different value of voltage is...
7655905 Charged particle beam equipment  
Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be...
7655907 Charged particle beam apparatus and pattern measuring method  
It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point...
7655906 Method and apparatus for scanning and measurement by electron beam  
An inspection and measurement method and apparatus for semiconductor devices and patterns such as photomasks using an electron beam capable of measuring the potential of a sample with higher...
7652269 Laser atom probe methods  
A laser atom probe (100) situates a counter electrode between a specimen mount and a detector (106), and provides a laser (116) having its beam (122) aligned to illuminate the specimen (104)...
7652248 Inspection apparatus and inspection method  
When performing an inspection using a charge control function in a SEM wafer inspection apparatus, acceleration voltage, control voltage and deceleration voltage are changed in conjunction so that...
7652263 Focussing lens for charged particle beams  
A focussing lens for focussing a charged particle beam onto a specimen at a predetermined landing angle. The focussing lens comprises at least one first electrode having a first aperture to...
7649172 Charged particle beam equipment with magnification correction  
Charged particle beam equipment enables the simultaneous measurement and correction of magnification errors in both X and Y directions in one measurement without requiring the elimination of...
7645988 Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus  
A substrate inspection method includes: generating an electron beam and irradiating the electron beam as a primary electron beam to a substrate as a specimen;inducing at least any of a secondary...
7645989 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof  
The disclosure relates to a method for manufacturing an object with miniaturized structures. The method involves processing the object by supplying reaction gas during concurrent directing an...
7646003 Focusing apparatus and lithography system using the same  
A focusing apparatus and a lithography system using the same capable of adjusting a uniformity of an electromagnetic field by moving a portion of a magnetic field generator. The focusing apparatus...
7642513 Device for obtaining the image and/or spectra of electron energy loss  
The inventive device for obtaining the electron energy loss image and/or spectra includes an image sensor, a control for at least two deflectors for alternately exposing at least two...
7638777 Imaging system with multi source array  
The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are...
7635844 Microsystem manipulation apparatus  
A microsystem manipulation apparatus and an associated kit is described that may be used to facilitate the assembly and testing of Microsystems and microsystem components. The microsystem...
7635842 Method and instrument for chemical defect characterization in high vacuum  
A method and the instrument for characterization of the defects on a surface with Auger electron spectroscopy in a high vacuum environment are disclosed. Defects on the surface of a sample may be...
7635843 In-line reliability test using E-beam scan  
A method of testing a semiconductor wafer having a test structure performs an E-beam stress scan of the test structure in an E-beam system to electrically stress the test structure to produce a...
7633074 Arrangement and method for compensating emitter tip vibrations  
A charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip and a supporting member for supporting the emitter is provided. Further, the...
7633061 Method and apparatus for measuring pattern dimensions  
It is difficult for a material having low resistance to electron beam irradiation to obtain an electron microscopic image having a high S/N ratio. A conventional image smoothing process can...
7633064 Electric charged particle beam microscopy and electric charged particle beam microscope  
An electric charged particle beam microscope measures a geometric distortion at an arbitrary magnification with high precision, and corrects the geometric distortion. A geometric distortion at a...
7629578 Charged particle beam device  
The invention provides a charged particle beam device for irradiating a specimen, comprising a particle source for providing a beam of charged particles, an optical device for directing the beam...
7626164 Method of scanning a substrate, and method and apparatus for analyzing crystal characteristics  
In an embodiment, a method of scanning a substrate, and a method and an apparatus for analyzing crystal characteristics are disclosed. A sequential scan on the scan areas using a first electron...
7626166 Electron microscope  
An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the...
7626163 Defect review method and device for semiconductor device  
A defect review method and device of the invention solves the previous problem of a long inspection time that is caused by the increase of a process-margin-narrow pattern as a result of the size...
7626165 Focused ion beam apparatus and method of preparing/observing sample  
A focused ion beam apparatus includes a sample base for mounting a sample, a three axis stage capable of moving the sample base in three directions: along two axes on a horizontal face and a...
7619219 Scanning electron microscope  
The present invention was made in view of a problem of an electron microscope in which a reduction in detection efficiency of electrons detected by a detector should be prevented by eliminating...
7619218 Charged particle optical apparatus with aberration corrector  
When an accelerating voltage and operating distance are changed, an excitation current and a pole voltage of an aberration corrector must also be changed. Moreover, different multipole voltages or...
7618465 Near-field antenna  
The invention relates to a near-field antenna comprising a dielectric shaped body having a tip. The shaped body is characterized in that at least the surface of the tip is metallized, thereby...
7615747 Sampling feedback system  
An electron microscope includes an electron beam source, which produces an electron beam. Scan deflectors direct the electron beam in a pattern across a sample, which thereby emits electrons. The...
7615764 Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus  
The invention provides a cross section evaluating apparatus capable of analyzing the cross sectional structure in a state where the temperature of the specimen is regulated. There is disclosed an...
7615746 Method and apparatus for evaluating pattern shape of a semiconductor device  
The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of...
7612334 Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same  
The present invention provides a standard reference component for calibration for performing magnification calibration used in the scanning electron microscope with high precision, and provides a...
7612337 Focused ion beam system and a method of sample preparation and observation  
A focused ion beam system capable of acquiring surface structure information, internal structure information, and internal composition information about a sample simultaneously from the same field...
7612336 Scanning electron microscope having a monochromator  
A scanning electron microscope having a monochromator that can automatically adjust an electron beam entering the monochromator and operating conditions of the monochromator. The scanning electron...
7608844 Charged particle beam drawing apparatus  
In the present invention, vector data developing unit, ends separating unit, overlap removing unit and bitmapped data generating unit are sequentially connected in order to make pipeline...
7608821 Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method  
A substrate inspection apparatus includes: an electron gun which generates an electron beam to irradiate the electron beam to a substrate; an electron detection unit which detects at least one of...
7605368 Vibration-type cantilever holder and scanning probe microscope  
A vibration-type cantilever holder holds a cantilever opposed to a sample. The holder supports a main body part of the cantilever at only its base end so that a probe at the free end of the...
7605378 Charged-particle beam system  
There is disclosed a charged-particle beam system equipped with a higher-order aberration corrector capable of correcting fifth-order spherical aberration and third-order chromatic aberration such...
7605364 Sample and method for evaluating resolution of scanning electron microscope, and electron scanning microscope  
In the case of monitoring a resolution of a scanning electron microscope, it is required to prepare a sample and to use a measuring algorithm so as to reduce the pattern dependency of an index...
7605381 Charged particle beam alignment method and charged particle beam apparatus  
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis...
7601954 Method and apparatus for reviewing defects  
A method and an apparatus for reviewing defects detected by an optical particle inspection system or an optical profile inspection system in detail by an electron microscope are provided. In order...
7601955 Scanning electron microscope  
A scanning electron microscope is provided. The scanning electron microscope includes an electron beam source generating a primary electron beam, a condenser lens converging the primary electron...
7601957 Electron microscope and combined illumination lens  
An object of the present invention is to provide an electron microscope that employs a hologram of a diffraction pattern to reconstruct a microscopic image involving no imaging aberration due to...
7598492 Charged particle microscopy using super resolution  
A method for improving throughput in review of images from a charged particle beam microscopy tool and a charged particle beam microscopy tool are disclosed.
7599075 Automatic optical inspection using multiple objectives  
Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical...
7598491 Observing method and its apparatus using electron microscope  
The present invention relates to high-speed acquisition of both a perpendicular observation image and a tilt observation image, in observation using a scanning electron microscope. An...
7598497 Charged particle beam scanning method and charged particle beam apparatus  
A method and an apparatus for calculating a scan signal so that the scan region becomes a scan region which is based on magnification ratio between desired magnification in a scan-line interval...