Match Document Document Title
7732765 Scanning electron microscope  
A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image...
7732762 Method of inspecting a specimen surface, apparatus and use of fluorescent material  
The invention relates to a method of inspecting a specimen surface. The method comprises the steps of generating a plurality of primary beams directed towards the specimen surface, focussing the...
7732763 Pattern inspection method, pattern inspection apparatus, semiconductor device manufacturing method, and program  
A pattern inspection method includes: irradiating a first region of a surface of a sample having a pattern to be inspected with a charged particle beam; acquiring a first two-dimensional image...
7732761 Method for measuring a pattern dimension using a scanning electron microscope  
To provide a consistent, high-speed, high-precision measurement method based on an electron beam simulation by reflecting the apparatus characteristics of a CD-SEM in an electron beam simulation,...
7732792 Pattern measurement apparatus  
Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification...
7728292 Method and apparatus for detecting positively charged and negatively charged ionized particles  
An ion detector includes collision surfaces for converting both positively and negatively charged ions into emitted secondary electrons. Secondary electrons may be detected using an electron...
7728294 Semiconductor wafer inspection tool and semiconductor wafer inspection method  
A semiconductor wafer inspection tool and a semiconductor wafer inspection method capable of conducting an inspection under appropriate conditions in any one of an NVC (Negative Voltage Contrast)...
7723681 Observation method with electron beam  
For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a...
7723682 Transmission electron microscope provided with electronic spectroscope  
In order to correct measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron...
7723683 Aberration correction system  
An aberration correction system for use in an electron microscope and which produces a negative spherical aberration and corrects a higher-order aberration. The aberration correction system has...
7718976 Charged particle beam apparatus  
The present invention provides a stable charged particle beam apparatus to enable high-resolution observation by reducing the influence of the noise of a large number of power supplies used in an...
7720632 Dimension measuring apparatus and dimension measuring method for semiconductor device  
A dimension measuring apparatus used for measuring a dimension of a semiconductor device having a first pattern of repeated structure and a second pattern that is linear and formed on the first...
7718981 Composite charged-particle beam system  
There is provided a method of arranging, as a composite charged-particle beam system, a gas ion beam apparatus, an FIB and an SEM in order to efficiently prepare a TEM sample. The composite...
7714287 Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope  
An electron beam apparatus is configured for dark field imaging of a substrate surface. Dark field is defined as an operational mode where the image contrast is sensitive to topographical features...
7714288 Charged particle beam apparatus  
Electrification affected on a surface of a sample which is caused by irradiation of a primary charged particle beam is prevented when plural frames are integrated to obtain an image of a...
7714286 Charged particle beam apparatus, aberration correction value calculation unit therefor, and aberration correction program therefor  
A charged particle beam apparatus includes: a correction image acquisition part 52 for making a detector 20 acquire items of two-dimensional image data at different focal positions; a directional...
7714289 Charged particle beam apparatus  
When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a...
7714308 Variable shaped electron beam lithography system and method for manufacturing substrate  
This VSB lithography system includes a first, second and third aperture for forming a single electron beam in each of the rectangular opening portion that are provided, and draws a figure pattern...
7709820 Radiation window with coated silicon support structure  
A window for a radiation detection system includes a frame with an aperture therein configured to receive radiation therethrough. A plurality of silicon ribs span the aperture and are carried by...
7709792 Three-dimensional imaging using electron beam activated chemical etch  
Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas...
7705304 Scanning electron microscope and three-dimensional shape measuring device that used it  
In three-dimensional shape measurement, a backscattered electron detection signal and selection signal generator in a control section controls, by selection signal, a signal switching section and...
7705300 Charged particle beam adjusting method and charged particle beam apparatus  
In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam...
7705299 Scanning ion probe systems and methods of use thereof  
Briefly described, embodiments of this disclosure, among others, include scanning ion probe systems, methods of use thereof, scanning ion source systems, methods of use thereof, scanning ion probe...
7705302 Scanning electron microscope  
An object of the present invention is to provide a scanning electron microscope including decelerating-electric-field forming means for decreasing the energy of a beam of electrons reaching a...
7705303 Defect inspection and charged particle beam apparatus  
In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus,...
7705301 Electron beam apparatus to collect side-view and/or plane-view image with in-lens sectional detector  
An electron beam apparatus and method are presented for collecting side-view and plane-view SEM imagery. The electron beam apparatus includes an electron source, some intermediate lenses if...
7705298 System and method to determine focus parameters during an electron beam inspection  
This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention...
7700918 Sample electrification measurement method and charged particle beam apparatus  
The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged...
7700916 Logical CAD navigation for device characteristics evaluation system  
A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created...
7700931 Ion beam processing apparatus  
The present invention provides an ion beam processing technology for improving the precision in processing a section of a sample using an ion beam without making a processing time longer than a...
7700380 Surface contamination analyzer for semiconductor wafers, method used therein and process for fabricating semiconductor device  
A semiconductor wafer is radiated with an electron beam so that the inelastic scattering takes place in the narrow region, and current flows out from the narrow region; the amount of current is...
7700915 Method, computer program and apparatus for the characterization of molecules  
The present invention relates to a method, computer program and device for determining the crystal structure and/or the range of crystal structures of one or more crystalline tubular molecules...
7700917 Specimen holder with integral ion beam screen and in situ adjustment  
An apparatus for holding a specimen to be viewed in a focused beam microscope, which can be an electron microscope or a focused ion beam microscope. The apparatus has a base and a specimen...
7698098 Efficient spectral matching, particularly for multicomponent spectra  
An unknown spectrum obtained from infrared or other spectroscopy can be compared to spectra in a reference library to find the best matches. The best match spectra can then each in turn be...
7696497 Focusing system and method for a charged particle imaging system  
Apparatus for focusing a charged particle beam onto a surface, including a charged particle beam generator which is adapted to project the charged particle beam onto a location on the surface,...
7696487 Circuit pattern inspection apparatus  
The via chain conduction failure due to non-conduction caused by insufficient etching in a contact plug/via plug forming process can be detected precisely in a short time. For its achievement, a...
7692165 Charged particle beam device with a gas field ion source and a gas supply system  
The present invention provides a charged particle beam device for irradiating a specimen with ions. The charged particle beam device comprises a gas field ion source unit for generating a beam of...
7692145 Method to analyze physical and chemical properties on the surface layer of a solid  
The present invention relates generally to a method for analyzing the surface and the near-surface layers of a solid and, more specifically, to a method that utilizes activating actions to analyze...
7692144 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus  
A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height...
7683317 Method and system for detecting hidden defects  
A method for detecting hidden defects and patterns, the method includes: receiving an object that comprises an opaque layer positioned above an intermediate layer; defining an energy band in...
7683319 Charge control apparatus and measurement apparatus equipped with the charge control apparatus  
The invention solves charge nonuniformity of a specimen surface resulting from emission variation of a carbon nanotube electron source and individual difference of emission characteristics. During...
7679056 Metrology system of fine pattern for process control by charged particle beam  
The present invention provides a pattern inspection technique that enables measurement and inspection of a fine pattern by a charged particle beam to be performed with high throughput. A metrology...
7679071 Electron beam drawing apparatus  
An example electron beam drawing apparatus includes an electron beam emitting unit which emits an electron beam, a rotary stage which rotatably supports a turntable for retaining a drawing object,...
7675034 Charged particle instrument equipped with optical microscope  
An optical microscope slide in a charged particle instrument such as an electron microscope or a focused ion beam instrument. Conventional microscope slides are not fit for use in an electron...
7675049 Sputtering coating of protective layer for charged particle beam processing  
A coating is applied to a work piece in a charged particle beam system without directing the beam to work piece. The coating is applied by sputtering, either within the charged particle beam...
7671332 Autofocus method for scanning charged-particle beam instrument  
An autofocus method for bringing an electron beam into focus on a specimen. Characteristics of the brightness at plural kinds of focus values are found for sets of data. The characteristics are...
7671333 Apparatus for observing a sample with a particle beam and an optical microscope  
An apparatus for observing a sample (1) with a TEM column and an optical high resolution scanning microscope (10). The sample position when observing the sample with the TEM column differs from...
7663102 High current density particle beam system  
The present invention relates to charged particle beam devices. The devices comprise an emitter for emitting charged particles; an aperture arrangement with at least two apertures for separating...
7663104 Specimen inspection equipment and how to make electron beam absorbed current images  
An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a...
7663103 Line-width measurement adjusting method and scanning electron microscope  
A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of...