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7807979 Specimen kit and fabricating method thereof  
A specimen kit for enclosing a specimen is described, including a first substrate, a second substrate and a sealant. The first substrate has a first observation window at which a thickness thereof...
7804066 Charged-particle beam apparatus  
Provided is a charged-particle beam apparatus capable of preventing a small amount of dust from being attached to an electrostatic lens serving as an objective lens to apply a high voltage to the...
7800074 Electron-optical corrector for an aplanatic imaging system  
An electron-optical corrector for rendering superfluous both the third-order opening error and the anisotropic part of the extra-axial third-order coma, using round lenses and hexapole fields, the...
7800059 Method of forming a sample image and charged particle beam apparatus  
An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with...
7800063 ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***
Manipulator for rotating and translating a sample holder
 
A manipulator for use in e.g. a Transmission Electron Microscope (TEM) is described, said manipulator capable of rotating and translating a sample holder (4). The manipulator clasps the round...
7800062 Method and system for the examination of specimen  
The present invention provides, according to a first aspect, a method for the examination of specimen with a beam of charged particles. The method provides one or more images of the specimen made...
7800060 Pattern measurement method and pattern measurement system  
Easily and correctly measuring a dimension of a pattern of a photomask or of an OPC pattern of the photomask. A pattern measurement method of the present invention includes steps of obtaining both...
7800075 Multi-function module for an electron beam column  
A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting,...
7800076 Electron-optical corrector for aplanatic imaging systems  
A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially...
7795581 Pattern measuring method and electron microscope  
An object of the present invention is to provide a pattern measuring method and an electron microscope that achieve truly high measurement throughput by achieving both precise location of a...
RE41665 Object observation apparatus and object observation  
This invention relates to an object observation apparatus and observation method. The object observation apparatus is characterized by including a drivable stage on which a sample is placed, an...
7795601 Method and apparatus to improve lithography throughput  
The present disclosure provides a lithography apparatus with improved lithography throughput. The lithography apparatus includes a first lens system; a first substrate stage configured to receive...
7795593 Surface contamination analyzer for semiconductor wafers  
A semiconductor wafer is radiated with an electron beam so that the inelastic scattering takes place in the narrow region, and current flows out from the narrow region; the amount of current is...
7791020 Multistage gas cascade amplifier  
A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the...
7791024 Method of measuring dimension of film constituting element and apparatus therefor  
A method of evaluating an element that includes the step of preparing a thin evaluation sample including a first portion in which a first layer containing a first material and a second layer...
7791021 Microstructured pattern inspection method  
The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the...
7791022 Scanning electron microscope with length measurement function and dimension length measurement method  
A scanning electron microscope with a length measurement function includes an electron gun for emitting an electron beam, a measurement target region setting unit for setting a measurement region...
7786437 Pattern inspection method and pattern inspection system  
A pattern data examination method and system capable of accurately and speedily examining a circuit pattern without failing to extract pattern contour data are provided. While pattern comparison...
7781742 Corrector  
The invention concerns a corrector (10) for chromatic and aperture aberration correction in a scanning electron microscope or a scanning transmission electron microscope, comprising four multipole...
7781733 In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniques  
An apparatus for simultaneous parallel processing of a sample using light energy for optical viewing or surface processing in parallel with a charged particle beam. A charged particle beam...
7781732 Real-time S-parameter imager  
Disclosed is a fully automated system capable of producing high quality real-time S-parameter images. It is a useful and versatile tool in Material Science and Solid State Technology for...
7777183 Charge particle beam system, sample processing method, and semiconductor inspection system  
A charged particle beam system, a sample processing method, and a semiconductor inspection system enable an accurate detection of a particle in a film without causing LMIS contamination and allow...
7777195 Charged particle beam instrument and method of detecting charged particles  
A charged particle beam instrument (10) is provided, the instrument comprising a charged particle optical column (12), a voltage source, a detector (14) and a sample holder (18), the column (12)...
7772553 Scanning electron microscope  
Disclosed is a scanning electron microscope capable of checking an abrupt change of probe current due to changes in intensities of the respective condenser lenses when the probe current is...
7772554 Charged particle system  
To provide a charged particle system capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but also three-dimensional CAD data....
7767962 Method for SEM measurement of features using magnetically filtered low loss electron microscopy  
A magnetically focused scanning charged particle microscope having an array detector placed to detect scattered particles, wherein the particles fall substantially non-tangentially to the surface...
7767982 Optical auto focusing system and method for electron beam inspection tool  
A method and system for inspecting a semiconductor wafer. The method includes providing an illumination flux through a pattern plate and a lens to a surface of a specimen to project a pattern onto...
7767961 Method for determining material interfacial and metrology information of a sample using atomic force microscopy  
A method for determining interfacial information and critical dimensions of a sample using atomic force microscopy. Tip-specimen deconvolution is performed on the scan lines before the critical...
7763852 Scanning electron microscope having time constant measurement capability  
In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An...
7763851 Particle-beam apparatus with improved wien-type filter  
In a particle-beam apparatus for irradiating a target, a pattern defined in a pattern definer is projected onto the target through a projection system by a beam of energetic electrically charged...
7759653 Electron beam apparatus  
The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the...
7759640 Mass spectrometer  
In a mass spectrometer for carrying out mass analysis while microscopically observing a two-dimensional area of a sample 15, the observation position for selecting a target portion while observing...
7759642 Pattern invariant focusing of a charged particle beam  
A method for focusing a scanning microscope, including scanning a primary charged particle beam across first sites of a reference die of a wafer, detecting a secondary beam emitted from the sites,...
7755042 Auger electron spectrometer with applied magnetic field at target surface  
A scanning electron beam apparatus with an Auger spectrometer. The apparatus includes at least an electron column for generating a primary electron beam, a magnetic objective lens configured to...
7755045 Scanning electron microscope  
In a scanning electron microscope, a reflection plate at ground potential is provided in a specimen chamber and backscattering electrons given off from a specimen impinge on the reflection plate...
7755043 Bright-field/dark-field detector with integrated electron energy spectrometer  
One embodiment relates to an electron beam apparatus including an electron beam column, an immersion objective lens, a Wien filter, a bright-field/dark-field detector, and an electron energy...
7750296 Scanning electron microscope and calibration of image distortion  
In method and apparatus for obtaining a scanning electron microscope image devoid of distortion by measuring a scanning distortion and calibrating the scanning distortion, there occurs a problem...
7751035 Method and device to quantify active carrier profiles in ultra-shallow semiconductor structures  
A method and device for determining, in a non-destructive way, at least the active carrier profile from an unknown semiconductor substrate are disclosed. In one aspect, the method comprises...
7750318 Working method by focused ion beam and focused ion beam working apparatus  
A first working process performs a deposition working or an etching working to a workpiece by face-irradiating a focused ion beam to the workpiece, and a second working process then performs a...
7750298 Interferometer having three electron biprisms  
An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle Φ among filament electrodes...
7750295 Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof  
The present invention provides a new extractor for a micro-column and an alignment method of the aperture of the extractor and an electron emitter for a micro-column. Further, the present...
7745802 Specimen holder, specimen inspection apparatus, specimen inspection method, and method of fabricating specimen holder  
A specimen holder, a specimen inspection apparatus, and a specimen inspection method permitting a specimen consisting of cultured cells to be observed or inspected. Also, a method of fabricating...
7745784 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus  
The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a...
7745782 Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope  
A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the...
7745786 Method and apparatus allowing simultaneous direct observation and electronic capture of scintillation images in an electron microscope  
A method and apparatus allowing for simultaneous direct viewing and electronic capture of images in an electron microscope (TEM). For this, the usual opaque direct viewing plate in the TEM is...
7745785 Sample inspection method, sample inspection apparatus, and sample holder  
A sample holder is offered which is used when a sample is inspected by irradiating the sample with a primary beam consisting of a charged-particle beam (such as an electron beam) via a film....
7741601 Testing apparatus using charged particles and device manufacturing method using the testing apparatus  
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover...
7741602 Phase contrast electron microscope  
A phase contrast electron microscope has an objective (8) with a back focal plane (10), a first diffraction lens (11), which images the back focal plane (10) of the objective (8) magnified into a...
7737416 Sample transfer unit and sample transferring method  
There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod...
7732764 Field emission electron gun and electron beam applied device using the same  
The object of the present invention is to enable the optical axis of an electron beam of a field emission electron gun mounting thereon an electron gun composed of a fibrous carbon material to be...