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7928378 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former  
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate ā€œSā€ to be inspected into an inspection chamber 23-1; maintaining a...
7928383 Charged particle system including segmented detection elements  
A charged particle detector consists of a plurality independent light guide modules assembled together to form a segmented in-lens on-axis annular detector, with a center hole for allowing the...
7928405 Magnetic lens assembly  
A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece...
7928376 Element mapping unit, scanning transmission electron microscope, and element mapping method  
There is provided an element mapping unit, scanning transmission electron microscope, and element mapping method that enable to acquire an element mapping image very easily. On the scanning...
7928381 Coaxial charged particle energy analyzer  
A non-dispersive electrostatic energy analyzer for electrons and other charged particles having a generally coaxial structure of a sequentially arranged sections of an electrostatic lens to focus...
7923700 Sample inspection apparatus, sample inspection method and sample inspection system  
Sample inspection apparatus, sample inspection method, and sample inspection system are offered which can give a stimulus to a sample held on a film when the sample is inspected by irradiating it...
7923701 Charged particle beam equipment  
Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned....
7923685 Electron beam device  
A multi-biprism electron interferometer is configured so as to arrange a plurality of biprisms in an imaging optical system of a specimen. An upper electron biprism is arranged upstream of the...
7923703 Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus  
One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same...
7923702 System and method for processing an object  
A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object...
7923684 Methods, systems and computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles  
A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the...
7923683 Method for treatment of samples for transmission electron microscopes  
A method for analyzing a sample for the manufacture of integrated circuits, e.g., dynamic random access memory devices, commonly called DRAMS. The method also provides an integrated chip including...
7923686 Transmission electron microscope  
An apparatus which permits high-angle annular dark-field (HAADF) imaging comprises an electron gun, a specimen chamber in which a specimen is set, a gas cylinder for supplying environmental gas...
7919760 Operation stage for wafer edge inspection and review  
The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect...
7919750 Electron gun, electron beam exposure apparatus, and exposure method  
An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission...
7919749 Energy filter for cold field emission electron beam apparatus  
An electron beam apparatus and a method for providing an energy-filtered primary electron beam are described. Therein, a primary electron beam having an asymmetric first energy distribution is...
7915584 TEM with aberration corrector and phase plate  
The invention relates to a TEM with a corrector (330) to improve the image quality and a phase plate (340) to improve contrast. The improved TEM comprises a correction system completely placed...
7915583 Method and system for ultrafast photoelectron microscope  
An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is...
7915581 Methods for sample preparation and observation, charged particle apparatus  
In an SEM observation in a depth direction of a cross section processed by repeated FIB cross-sectioning and SEM observation to correct a deviation in an observation field of view and a deviation...
7915582 Method for estimation of probe shape in charged particle beam instruments  
A method for estimation of a probe shape, in a scanning electron microscope provided with an aberration corrector, and the method is designed so as to obtain a probe image, by inputting to a...
7910885 System and method for determining a cross sectional feature of a structural element using a reference structural element  
A system and method for determining a cross sectional feature of a measured structural element having a sub-micron cross section, the cross section is defined by an intermediate section that is...
7910884 Apparatus and method for inspection and measurement  
An electrification control electrode B is installed at a measured or inspected specimen side of an electrification control electrode A, and a constant voltage is applied from an electrification...
7910886 Sample dimension measuring method and scanning electron microscope  
An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this...
7910887 Electron-beam device and detector system  
An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons...
7910895 Luminous body, electron beam detector using the same, scanning electron microscope, and mass analysis device  
A light-emitting body of rapid speed of response and high light emission intensity, and an electron beam detector, scanning electron microscope and mass spectroscope using this are provided. In...
7906760 Inspection method and reagent solution  
An electron microscope method for inspecting a liquid specimen and a reagent solution therefor. A culture medium and biological cells are put in the sample holder. A plugging agent is mixed into...
7906761 Charged particle beam apparatus  
A charged particle beam apparatus that can achieve both high defect-detection sensitivity and high inspection speed for a sample with various properties in a multi-beam type semiconductor...
7906762 Compact scanning electron microscope  
A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the...
7902504 Charged particle beam reflector device and electron microscope  
A charged particle beam reflector device is configured to include at least two electrostatic mirrors arranged with a predetermined interval on a linear optical axis, each having a through hole...
7902505 Charged particle beam apparatus  
When a sample includes repeated cells, a scale pattern corresponding to the repeated cells is generated. Next, the scale pattern generated is superimposed on the image of the repeated cells of the...
7902506 Phase-shifting element and particle beam device having a phase-shifting element  
A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a article beam device having a phase-shifting element of this type. In the...
7902521 Method for focusing electron beam in electron column  
The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to...
7888642 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus  
The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the...
7888654 Cold field emitter  
A stable cold field electron emitter is produced by forming a coating on an emitter base material. The coating protects the emitter from the adsorption of residual gases and from the impact of...
7888643 Focusing and positioning device for a particle-optical raster microscope  
The invention relates to a focusing and positioning ancillary device for a particle-optical scanning microscope, a particle-optical scanning microscope including a corresponding positioning aid,...
7888638 Method and apparatus for measuring dimension of circuit pattern formed on substrate by using scanning electron microscope  
In the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), in order to make it possible to automatically image desired evaluation points (EPs) on a sample, and...
7888641 Electron microscope with electron spectrometer  
A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions...
7888640 Scanning electron microscope and method of imaging an object by using the scanning electron microscope  
A scanning electron microscope capable of modifying the focal position of a condenser lens with high speed and high reproducibility in order that low-magnification images are obtained at large...
7888639 Method and apparatus for processing a micro sample  
An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with...
7884322 Scanning electron microscope and a method for pattern composite inspection using the same  
A scanning electron microscope capable of performing alone the critical dimension measurement and the defect inspection is provided. The scanning electron microscope has a reference image storage...
7884326 Manipulator for rotating and translating a sample holder  
A manipulator for use in e.g. a Transmission Electron Microscope (TEM) is described, said manipulator capable of rotating and translating a sample holder (4). The manipulator clasps the round...
7884334 Charged particle beam imaging method and system thereof  
The method includes scanning a sample in at least one first scan line using a first charged particle beam probe; scanning the sample in at least one second scan line using a second charged...
7884325 Electron beam measurement apparatus  
The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam...
7884324 Nanopillar arrays for electron emission  
The present invention provides systems, devices, device components and structures for modulating the intensity and/or energies of electrons, including a beam of incident electrons. In some...
7880143 Electron beam apparatus  
A plurality of primary beams are formed from a single electron source, the surface charge of a sample is controlled by at least one primary beam, and at the same time, the inspection of the sample...
7880152 Device and method for producing resist profiled elements  
The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis...
7880144 Liquid medium for preventing charge-up in electron microscope and method of observing sample using the same  
An object of the present invention is to provide a medium; a specimen; a method for preparing the specimen; a method for observing the specimen; a sample cell; and an electron microscope capable...
7875851 Advanced process control framework using two-dimensional image analysis  
The claimed subject matter provides a system and/or a method that facilitates utilizing a resolution enhancement for a circuit feature. A scanning electron microscope component (104, 204, 304,...
7875850 Standard component for calibration and electron-beam system using the same  
The invention provides a standard component for calibration that enables a calibration position to be easily specified in order to calibrate accurately a scale factor in the electron-beam system,...
7875849 Electron beam apparatus and electron beam inspection method  
The present invention provides a charged-particle beam inspection technology that enables to acquire a shadow contrast enhanced image, and to detect a shallow roughness with sufficient...