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7619220 |
Method of measuring aberrations and correcting aberrations using Ronchigram and electron microscope
A method and apparatus for correcting aberrations using a Ronchigram. A STEM apparatus has first calculation means for taking autocorrelation of minute regions on a Ronchigram of an amorphous...
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7618465 |
Near-field antenna
The invention relates to a near-field antenna comprising a dielectric shaped body having a tip. The shaped body is characterized in that at least the surface of the tip is metallized, thereby...
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7615746 |
Method and apparatus for evaluating pattern shape of a semiconductor device
The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of...
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7615745 |
Method for separating a minute sample from a work piece
The invention pertains to a method for separating a minute sample ( 1 ) from a work piece ( 2 ). Such a method is routinely used in the semiconductor industry to obtain samples from wafers to be...
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7615743 |
Overcoming space charge effects in ion cyclotron resonance mass spectrometers
In an ion cyclotron resonance mass spectrometer in which ions are trapped axially by applying electrical potentials to a pattern of electrode elements to produce an inhomogeneous alternating...
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7615738 |
Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements
A scanning probe microscope assembly that has an atomic force measurement (AFM) mode, a scanning tunneling measurement (STM) mode, a near-field spectrophotometry mode, a near-field optical mode,...
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7612337 |
Focused ion beam system and a method of sample preparation and observation
A focused ion beam system capable of acquiring surface structure information, internal structure information, and internal composition information about a sample simultaneously from the same field...
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7612334 |
Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same
The present invention provides a standard reference component for calibration for performing magnification calibration used in the scanning electron microscope with high precision, and provides a...
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7608845 |
Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary...
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7608821 |
Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method
A substrate inspection apparatus includes: an electron gun which generates an electron beam to irradiate the electron beam to a substrate; an electron detection unit which detects at least one of a...
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7608820 |
Spin microscope based on optically detected magnetic resonance
The invention relates to scanning magnetic microscope which has a photoluminescent nanoprobe implanted in the tip apex of an atomic force microscope (AFM), a scanning tunneling microscope (STM) or...
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7605381 |
Charged particle beam alignment method and charged particle beam apparatus
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of...
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7605368 |
Vibration-type cantilever holder and scanning probe microscope
A vibration-type cantilever holder holds a cantilever opposed to a sample. The holder supports a main body part of the cantilever at only its base end so that a probe at the free end of the...
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7605364 |
Sample and method for evaluating resolution of scanning electron microscope, and electron scanning microscope
In the case of monitoring a resolution of a scanning electron microscope, it is required to prepare a sample and to use a measuring algorithm so as to reduce the pattern dependency of an index...
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7601957 |
Electron microscope and combined illumination lens
An object of the present invention is to provide an electron microscope that employs a hologram of a diffraction pattern to reconstruct a microscopic image involving no imaging aberration due to...
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7598499 |
Charged-particle exposure apparatus
In a particle-beam projection processing apparatus a target ( 41 ) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system ( 103 ) to image a...
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7598492 |
Charged particle microscopy using super resolution
A method for improving throughput in review of images from a charged particle beam microscopy tool and a charged particle beam microscopy tool are disclosed.
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7598490 |
SEM-type reviewing apparatus and a method for reviewing defects using the same
In order to achieve high throughput in a SEM-type defect-reviewing apparatus and method for automatically acquiring images of review defects present on samples, including: a cell comparison step...
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7595490 |
Charged particle beam emitting device and method for operating a charged particle beam emitting device
A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of...
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7595489 |
Method and apparatus for material identification
A method of identifying a material using an x-ray emission characteristic is provided. X-ray data representing a monitored x-ray emission characteristic is obtained from a specimen in response to...
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7595488 |
Method and apparatus for specifying working position on a sample and method of working the sample
Techniques for specifying an observing or working position of a sample are provided. Digitized data of a sample is obtained and stored in a 1st storage device. A 1st display area displays an image...
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7592606 |
Manufacturing equipment using ION beam or electron beam
Provided is a charged particle beam processing apparatus capable of improving yields by suppressing the spread of metal pollution to a semiconductor manufacturing process to a minimum. The charged...
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7592604 |
Charged particle beam apparatus
The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 ...
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7592591 |
X-ray analyzer using electron beam
An electron probe X-ray analyzer capable of automatically setting appropriate analytical conditions if there are unknown compounds by performing analysis under the analytical conditions adapted for...
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7586093 |
Apparatus and method for inspecting a sample of a specimen by means of an electron beam
The invention refers to an apparatus ( 10 ) for inspecting a sample ( 12 ) of a specimen ( 14 ) by means of an electron beam ( 34 ) comprising a vacuum chamber ( 18 ); an ion beam device ( 20 ) for...
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7582868 |
Method of nano thin film thickness measurement by auger electron spectroscopy
A system and method for measuring the thickness of an ultra-thin multi-layer film on a substrate is disclosed. A physical model of an ultra-thin multilayer structure and Auger electron emission...
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7579591 |
Method and apparatus for analyzing sample
Method and apparatus for performing sample analysis using both the WDS and an energy-dispersive X-ray spectrometer (EDS). The analysis starts with irradiating the sample with an electron beam....
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7578853 |
Scanning probe microscope system
A scanning probe microscope system comprising a hollow probe 3, a tube 4 connected to a rear end 32 of the hollow probe 3, a support table 1 provided under the hollow probe 3, and a...
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7576325 |
Electron microscopic method and electron microscope using same
There is provided an electron microscopic method capable of realizing a high resolution based on the principle of the phase retrieval method. An electron microscope ( 10 ) using the method is a...
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7573053 |
Polarized pulsed front-end beam source for electron microscope
A method and an electron source are provided for generating polarized electrons for an electron microscope. The electron source includes a photoemissive cathode and a low-power drive laser. The...
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7573049 |
Wafer alignment method for dual beam system
A gradient charged particle beam apparatus capable of moving highly accurately to a specific position by eliminating influences of warp inside a wafer surface is provided. A portion 46 having a...
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7573047 |
Wafer holder and sample producing apparatus using it
A wafer holder includes: a frame-shaped holder main body which has an opening at its center and carries a wafer on its upper surface; guide members which contact the outer periphery of the wafer...
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7573030 |
Specimen observation method
It is an object of the present invention to provide a specimen observation method, an image processing device, and a charged-particle beam device which are preferable for selecting, based on an...
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7569818 |
Method to reduce cross talk in a multi column e-beam test system
A method and apparatus for reducing or eliminating crosstalk between a plurality of electron beams is described. The plurality of electron beams may produce test areas on a large area substrate...
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7569817 |
Scanning probe apparatus
In a scanning probe apparatus capable of always effectively canceling an inertial force to suppress vibration even in repetitive use while replacing a sample holding table or a probe, a stage for a...
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7566888 |
Method and system for treating an interior surface of a workpiece using a charged particle beam
A method and system of treating an interior surface on an internal cavity of a workpiece using a charged particle beam. A beam deflector surface of a beam deflector is placed within the internal...
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7566873 |
High-resolution, low-distortion and high-efficiency optical coupling in detection system of electron beam apparatus
One embodiment relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a...
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7566871 |
Method and apparatus for pattern inspection
Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image...
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7560940 |
Method and installation for analyzing an integrated circuit
A method and installation for analyzing an integrated circuit. The method includes, for a plurality of surface points of the integrated circuit, the following steps: applying a laser radiation, in...
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7560693 |
Electron-beam size measuring apparatus and size measuring method with electron beams
An electron-beam size measuring apparatus includes: electron beam irradiating means that irradiates an electron beam on a surface of a sample; detection means that detects electrons emitted from...
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7560692 |
Method of TEM sample preparation for electron holography for semiconductor devices
A high quality electron microscopy sample suitable for electron holography is prepared by forming markers filled with TEOS oxide and by repeatedly applying multiple coats of an adhesive followed by...
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7560691 |
High-resolution auger electron spectrometer
One embodiment relates to a high-resolution Auger electron spectrometer in a scanning electron beam apparatus. An electron source generates a primary electron beam, and an immersion objective lens...
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7557347 |
Charged particle beam apparatus, scanning electron microscope, and sample observation method using the same
A charged particle beam apparatus for acquiring high-definition and highly contrasted observation images by detecting efficiently secondary signals without increasing aberration of the primary...
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7554082 |
Pattern observation apparatus, pattern observation method, method of manufacturing semiconductor device, and program
A pattern observation apparatus includes: a defect position information input unit which downloads defect position information for a pattern, the defect position information having been detected by...
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7553335 |
Scanning probe microscope probe and manufacturing method therefor, scanning probe microscope and using method therefor, needle-like body and manufacturing method therefor, electronic device and manufacturing method therefor, charge density wave quantum phase microscope, and charge density wave quantum interferometer
A scanning probe microscope probe is produced by depositing a raw-material film on the surface of a cone made of Si, etc. and growing a needle-like crystal by using the raw-material film by...
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7550724 |
Electron beam device and its control method
An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space...
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7550723 |
Atom probe apparatus and method for working sample preliminary for the same
A preliminary processing technology for a sample locally cuts out a sample part of a device to be analyzed and processes it into a needle-like projection, and a technology of realizing SAP analysis...
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7550311 |
Near-field optical probe based on SOI substrate and fabrication method thereof
Provided is near-field optical probe including: a cantilever arm support portion that is formed of a lower silicon layer of a silicon-on-insulator (SOI) substrate, the cantilever arm support...
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7547884 |
Pattern defect inspection method and apparatus thereof
In the present invention, the structure of an electrification control electrode is changed from a grid type to a slit type and thereby shadows are not formed when a wafer is irradiated with a beam....
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7544953 |
Device for preparing microscopy samples
A device, method and system for preparing and storing samples for microscopic analysis is disclosed. The device provides a reservoir that can be attached to a displacement pipette thereby filling...
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