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7619220 Method of measuring aberrations and correcting aberrations using Ronchigram and electron microscope  
A method and apparatus for correcting aberrations using a Ronchigram. A STEM apparatus has first calculation means for taking autocorrelation of minute regions on a Ronchigram of an amorphous...
7618465 Near-field antenna  
The invention relates to a near-field antenna comprising a dielectric shaped body having a tip. The shaped body is characterized in that at least the surface of the tip is metallized, thereby...
7615746 Method and apparatus for evaluating pattern shape of a semiconductor device  
The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of...
7615745 Method for separating a minute sample from a work piece  
The invention pertains to a method for separating a minute sample ( 1 ) from a work piece ( 2 ). Such a method is routinely used in the semiconductor industry to obtain samples from wafers to be...
7615743 Overcoming space charge effects in ion cyclotron resonance mass spectrometers  
In an ion cyclotron resonance mass spectrometer in which ions are trapped axially by applying electrical potentials to a pattern of electrode elements to produce an inhomogeneous alternating...
7615738 Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements  
A scanning probe microscope assembly that has an atomic force measurement (AFM) mode, a scanning tunneling measurement (STM) mode, a near-field spectrophotometry mode, a near-field optical mode,...
7612337 Focused ion beam system and a method of sample preparation and observation  
A focused ion beam system capable of acquiring surface structure information, internal structure information, and internal composition information about a sample simultaneously from the same field...
7612334 Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same  
The present invention provides a standard reference component for calibration for performing magnification calibration used in the scanning electron microscope with high precision, and provides a...
7608845 Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect  
A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary...
7608821 Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method  
A substrate inspection apparatus includes: an electron gun which generates an electron beam to irradiate the electron beam to a substrate; an electron detection unit which detects at least one of a...
7608820 Spin microscope based on optically detected magnetic resonance  
The invention relates to scanning magnetic microscope which has a photoluminescent nanoprobe implanted in the tip apex of an atomic force microscope (AFM), a scanning tunneling microscope (STM) or...
7605381 Charged particle beam alignment method and charged particle beam apparatus  
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of...
7605368 Vibration-type cantilever holder and scanning probe microscope  
A vibration-type cantilever holder holds a cantilever opposed to a sample. The holder supports a main body part of the cantilever at only its base end so that a probe at the free end of the...
7605364 Sample and method for evaluating resolution of scanning electron microscope, and electron scanning microscope  
In the case of monitoring a resolution of a scanning electron microscope, it is required to prepare a sample and to use a measuring algorithm so as to reduce the pattern dependency of an index...
7601957 Electron microscope and combined illumination lens  
An object of the present invention is to provide an electron microscope that employs a hologram of a diffraction pattern to reconstruct a microscopic image involving no imaging aberration due to...
7598499 Charged-particle exposure apparatus  
In a particle-beam projection processing apparatus a target ( 41 ) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system ( 103 ) to image a...
7598492 Charged particle microscopy using super resolution  
A method for improving throughput in review of images from a charged particle beam microscopy tool and a charged particle beam microscopy tool are disclosed.
7598490 SEM-type reviewing apparatus and a method for reviewing defects using the same  
In order to achieve high throughput in a SEM-type defect-reviewing apparatus and method for automatically acquiring images of review defects present on samples, including: a cell comparison step...
7595490 Charged particle beam emitting device and method for operating a charged particle beam emitting device  
A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of...
7595489 Method and apparatus for material identification  
A method of identifying a material using an x-ray emission characteristic is provided. X-ray data representing a monitored x-ray emission characteristic is obtained from a specimen in response to...
7595488 Method and apparatus for specifying working position on a sample and method of working the sample  
Techniques for specifying an observing or working position of a sample are provided. Digitized data of a sample is obtained and stored in a 1st storage device. A 1st display area displays an image...
7592606 Manufacturing equipment using ION beam or electron beam  
Provided is a charged particle beam processing apparatus capable of improving yields by suppressing the spread of metal pollution to a semiconductor manufacturing process to a minimum. The charged...
7592604 Charged particle beam apparatus  
The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 ...
7592591 X-ray analyzer using electron beam  
An electron probe X-ray analyzer capable of automatically setting appropriate analytical conditions if there are unknown compounds by performing analysis under the analytical conditions adapted for...
7586093 Apparatus and method for inspecting a sample of a specimen by means of an electron beam  
The invention refers to an apparatus ( 10 ) for inspecting a sample ( 12 ) of a specimen ( 14 ) by means of an electron beam ( 34 ) comprising a vacuum chamber ( 18 ); an ion beam device ( 20 ) for...
7582868 Method of nano thin film thickness measurement by auger electron spectroscopy  
A system and method for measuring the thickness of an ultra-thin multi-layer film on a substrate is disclosed. A physical model of an ultra-thin multilayer structure and Auger electron emission...
7579591 Method and apparatus for analyzing sample  
Method and apparatus for performing sample analysis using both the WDS and an energy-dispersive X-ray spectrometer (EDS). The analysis starts with irradiating the sample with an electron beam....
7578853 Scanning probe microscope system  
A scanning probe microscope system comprising a hollow probe 3, a tube 4 connected to a rear end 32 of the hollow probe 3, a support table 1 provided under the hollow probe 3, and a...
7576325 Electron microscopic method and electron microscope using same  
There is provided an electron microscopic method capable of realizing a high resolution based on the principle of the phase retrieval method. An electron microscope ( 10 ) using the method is a...
7573053 Polarized pulsed front-end beam source for electron microscope  
A method and an electron source are provided for generating polarized electrons for an electron microscope. The electron source includes a photoemissive cathode and a low-power drive laser. The...
7573049 Wafer alignment method for dual beam system  
A gradient charged particle beam apparatus capable of moving highly accurately to a specific position by eliminating influences of warp inside a wafer surface is provided. A portion 46 having a...
7573047 Wafer holder and sample producing apparatus using it  
A wafer holder includes: a frame-shaped holder main body which has an opening at its center and carries a wafer on its upper surface; guide members which contact the outer periphery of the wafer...
7573030 Specimen observation method  
It is an object of the present invention to provide a specimen observation method, an image processing device, and a charged-particle beam device which are preferable for selecting, based on an...
7569818 Method to reduce cross talk in a multi column e-beam test system  
A method and apparatus for reducing or eliminating crosstalk between a plurality of electron beams is described. The plurality of electron beams may produce test areas on a large area substrate...
7569817 Scanning probe apparatus  
In a scanning probe apparatus capable of always effectively canceling an inertial force to suppress vibration even in repetitive use while replacing a sample holding table or a probe, a stage for a...
7566888 Method and system for treating an interior surface of a workpiece using a charged particle beam  
A method and system of treating an interior surface on an internal cavity of a workpiece using a charged particle beam. A beam deflector surface of a beam deflector is placed within the internal...
7566873 High-resolution, low-distortion and high-efficiency optical coupling in detection system of electron beam apparatus  
One embodiment relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a...
7566871 Method and apparatus for pattern inspection  
Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image...
7560940 Method and installation for analyzing an integrated circuit  
A method and installation for analyzing an integrated circuit. The method includes, for a plurality of surface points of the integrated circuit, the following steps: applying a laser radiation, in...
7560693 Electron-beam size measuring apparatus and size measuring method with electron beams  
An electron-beam size measuring apparatus includes: electron beam irradiating means that irradiates an electron beam on a surface of a sample; detection means that detects electrons emitted from...
7560692 Method of TEM sample preparation for electron holography for semiconductor devices  
A high quality electron microscopy sample suitable for electron holography is prepared by forming markers filled with TEOS oxide and by repeatedly applying multiple coats of an adhesive followed by...
7560691 High-resolution auger electron spectrometer  
One embodiment relates to a high-resolution Auger electron spectrometer in a scanning electron beam apparatus. An electron source generates a primary electron beam, and an immersion objective lens...
7557347 Charged particle beam apparatus, scanning electron microscope, and sample observation method using the same  
A charged particle beam apparatus for acquiring high-definition and highly contrasted observation images by detecting efficiently secondary signals without increasing aberration of the primary...
7554082 Pattern observation apparatus, pattern observation method, method of manufacturing semiconductor device, and program  
A pattern observation apparatus includes: a defect position information input unit which downloads defect position information for a pattern, the defect position information having been detected by...
7553335 Scanning probe microscope probe and manufacturing method therefor, scanning probe microscope and using method therefor, needle-like body and manufacturing method therefor, electronic device and manufacturing method therefor, charge density wave quantum phase microscope, and charge density wave quantum interferometer  
A scanning probe microscope probe is produced by depositing a raw-material film on the surface of a cone made of Si, etc. and growing a needle-like crystal by using the raw-material film by...
7550724 Electron beam device and its control method  
An electron beam device includes an electron gun section having an internal space kept at an ultrahigh vacuum level for generating a primary electron beam, a mirror section having an internal space...
7550723 Atom probe apparatus and method for working sample preliminary for the same  
A preliminary processing technology for a sample locally cuts out a sample part of a device to be analyzed and processes it into a needle-like projection, and a technology of realizing SAP analysis...
7550311 Near-field optical probe based on SOI substrate and fabrication method thereof  
Provided is near-field optical probe including: a cantilever arm support portion that is formed of a lower silicon layer of a silicon-on-insulator (SOI) substrate, the cantilever arm support...
7547884 Pattern defect inspection method and apparatus thereof  
In the present invention, the structure of an electrification control electrode is changed from a grid type to a slit type and thereby shadows are not formed when a wafer is irradiated with a beam....
7544953 Device for preparing microscopy samples  
A device, method and system for preparing and storing samples for microscopic analysis is disclosed. The device provides a reservoir that can be attached to a displacement pipette thereby filling...