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7390990 |
Heating device
A heating device is provided, including an insulating ceramic base having a heating surface for heating an object. A high frequency electrode is embedded in the insulating ceramic base in the...
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7372001 |
Ceramics heater
A ceramics heater comprises a circular heater plate formed of aluminum nitride and a metal foil heater wire formed of a high-melting metal and having a thickness of 100 μm to 175 μm. The heater...
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7361865 |
Heater for heating a wafer and method for fabricating the same
Provided is a heater capable of having a high uniform heating characteristic and substantially equally heating a wafer etc. mounted thereon, and a wafer heating device using the same, as well as a...
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7361230 |
Substrate processing apparatus
In the substrate processing apparatus, a ceramic module for mounting a substrate has a flat plate portion having an electric circuitry and a ceramic base body, and as at least a part of a surface...
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7357288 |
Component connecting apparatus
When a component, that has a connection portion to be connected to an electrode of a board and a weak heat-resistant portion of a lower heat-resisting property than a fusing point of a connection...
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7348519 |
Multi-zone griddle and grill
A multi-zone griddle with an upper substantially continuous layer of metal adapted for cooking a food product thereon. The upper substantially continuous layer of metal is positioned adjacent to a...
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7345259 |
Circuit arrangement and method for preventing overheating of a cooking appliance
The invention relates to a method and a circuit arrangement for preventing overheating of a cooking appliance. The arrangement includes a power circuit with a heating element and a control circuit...
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7342204 |
Heater and heating device
A low-radiation-rate film, made of a material whose radiation rate is lower than that of a heater substrate, is formed at least entirely over the surface of a heat-subject-placing surface of a...
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7332694 |
Heating resistances and heaters
A heating resistance 1 comprises a shaped body of a band made of a conductive material obtained by bending the band in a shape of a wave. The heating resistance 1 is fixed to a substrate made...
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7329842 |
Ceramic heater and method for producing ceramic heater
A ceramic heater including a plate member made of insulating ceramics in which one or more pair(s) of through-holes are formed, a rod member made of conductive ceramics with a power-supply terminal...
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7326886 |
Wafer support member and semiconductor manufacturing system using the same
A simple and practical wafer support member which holds vacuum tight comprises a plate-shaped ceramic body having one main surface of a mount surface on which a wafer is mounted and a penetrating...
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7326877 |
Laser thermal processing chuck with a thermal compensating heater module
Chuck methods and apparatus for supporting a semiconductor substrate and maintaining it at a substantially constant background temperature even when subject to a spatially and temporally varying...
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7297906 |
Integrated thermal unit having a shuttle with two-axis movement
An integrated thermal unit comprises a bake station comprising a bake plate configured to hold and heat a substrate; a chill station comprising a chill plate configured to hold and cool a...
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7288746 |
Integrated thermal unit having laterally adjacent bake and chill plates on different planes
An integrated thermal unit comprising a bake plate having a substrate holding surface configured to hold and heat a substrate in a baking position and a chill plate having a substrate holding...
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7282675 |
Integrated thermal unit having a shuttle with a temperature controlled surface
An integrated thermal unit comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill plate configured to cool a substrate supported on a surface of...
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7279661 |
Heating apparatus
A heating apparatus for a semiconductor producing system is provided, including a heater having a mounting face, an opposed back face, a first resistance heating element, a second resistance...
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7276125 |
Barrel type susceptor
The barrel type susceptor for use in the semiconductor epitaxial growth is characterized in that a face plate 5 of a susceptor main body 2 having the shape of a truncated cone is partitioned...
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7275309 |
Method of manufacturing electrical resistance heating element
A method of manufacturing an electrical-resistance heating element includes forming sintered ceramics or calcined ceramics, forming an electrode on the sintered ceramics or the calcined ceramics,...
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7274005 |
Bake plate having engageable thermal mass
A bake station comprising a bake plate adapted to heat a substrate supported on an upper surface of the bake plate, the bake plate vertically moveable between an upper baking position and a lower...
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7274004 |
Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base has a temperature below the desired...
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7268322 |
Semiconductor heating apparatus
A semiconductor heating apparatus, in which, when measuring the electrical properties of multiple chips formed on a large size wafer, only one or a several chips are heated uniformly, and the other...
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7259358 |
Encapsulated graphite heater and process
A graphite heater and method of forming a graphite heater comprising a graphite body configured to form an electrical heating circuit for at least one heating zone through the graphite encapsulated...
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7247819 |
Substrate heating apparatus
A substrate heating apparatus is provided, including a base group including a plurality of bases, which are arranged substantially into a plate with a gap interposed between the bases, and which...
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7247818 |
Substrate heating apparatus and manufacturing method for the same
A substrate heating apparatus includes a ceramic base having a concave heating surface on which a substrate is placed, and a resistance heating element buried in the ceramic base. The central part...
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7247817 |
Ceramic heater having a resistance heater element
A heater is provided including a plate having a heating surface for heating an object to be heated and a resistance heater element provided in the plate. This resistance heater element includes a...
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7241346 |
Apparatus for vapor deposition
A stage has a plate, a first seal surface, a stem, a second seal surface, a cover, a conductor and a flow path. A heater is embedded in the plate. A terminal for supplying power to the heater is...
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7227103 |
Induction hot plate comprising heating regions having a reconfigurable structure, and method for increasing the maximum power of said heating regions
An induction hot plate including a plurality of heating regions with a reconfigurable structure. The hot plate includes at least two power modules, each supplying electrical power to at least one...
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7211153 |
Ceramic joined body, substrate holding structure and substrate processing apparatus
A substrate holding structure having excellent corrosion resistance and airtightness, excellent dimensional accuracy and sufficient durability when mechanical or thermal stress is applied thereto...
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7204887 |
Wafer holding, wafer support member, wafer boat and heat treatment furnace
The present invention provides a wafer holder, a wafer support member, a wafer boat and a heat treatment furnace, which are capable of sufficiently suppressing slip dislocations, without lowering...
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7203565 |
Temperature abnormality detection method and semiconductor manufacturing apparatus
A semiconductor manufacturing apparatus includes: a hot plate that heats an article to be processed; a temperature control section that controls temperature of the hot plate; a main body control...
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7189946 |
Substrate heating device
A substrate heating device is provided, including a ceramic base plate having a heating surface on which a substrate is placed, resistance heating elements buried in the ceramic base plate...
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7186298 |
Wafer support system
A wafer support system comprising a segmented susceptor having top and bottom sections and gas flow passages therethrough. A plurality of spacers projecting from a recess formed in the top section...
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7176417 |
Apparatuses and methods for resistively heating a thermal processing system
A resistive heater having a doped ceramic heating element embedded either partially or completely within a matrix of undoped ceramic material. The ceramic may be silicon carbide, and the dopant may...
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7173220 |
Heating device
A heating device comprises a substrate having a heating surface, a heating element buried in the substrate, a cylindrical member joined to the substrate, and lead wires for supplying current to the...
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7173219 |
Ceramic heaters
An object of the present invention is to provide a heater having a ceramic substrate with a through hole formed therein so that the uniformity of temperature on the heating face of the substrate...
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7166187 |
Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling
The present invention is directed to a semiconductor thermal processing system and an apparatus for thermally cooling a semiconductor substrate. According to one aspect of the present invention, a...
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7154070 |
Heater plate and a method for manufacturing the heater plate
A heater plate manufactured by receiving a sheath heater within a groove portion formed in a base member made of aluminum or aluminum alloy, placing a joint member made of aluminum or aluminum...
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7151239 |
Heat treating apparatus and heat treating method
A heat treating apparatus is provided to apply a heat treatment on a substrate. Prior to the heat treatment, an exclusive transfer mechanism transfers the substrate from a cooling plate onto a...
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7145106 |
Heater module for semiconductor manufacturing equipment
Heater module, and semiconductor manufacturing equipment in which the heater module is utilized, for raising the cooling speed of a post-heating heater markedly more than conventional, and that can...
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7141763 |
Method and apparatus for rapid temperature change and control
An apparatus and a method for controlling the temperature of a substrate during substrate processing. The apparatus comprises a substrate table having a thermal surface supporting the substrate....
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7126093 |
Heating systems
An object of the present invention is to provide a heating system having a ceramic heater and a supporting member supporting the back face of the heater, so that the cost of the supporting member...
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7126092 |
Heater for wafer processing and methods of operating and manufacturing the same
A heater for wafer processing, such as thin film deposition, includes a first heating unit and a second heating unit. The first heating unit includes a substrate with a top surface for supporting a...
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7126091 |
Workpiece holder for vacuum processing
A substrate for use in a vacuum chamber has a workpiece supporting surface that has two or more mutually electrically insulated bifilar conductors configured as interleaved spirals disposed on it....
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7126090 |
Ceramic heaters, a method for producing the same and articles having metal members
A ceramic heater is provided including a ceramic sintered body and a heat resistor embedded in the substrate, wherein a change in the temperature uniformity on the heating face is reduced. The heat...
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7115840 |
Wafer bake apparatus
A wafer bake apparatus includes an air flow control unit of pneumatic cylinder structure operating interlockingly with a wafer lift unit and induces the air flow between a wafer and a hot plate....
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7115839 |
Heaters
A heater is provided, including an insulating substrate and a heating resistance, wherein the temperature on the heating face is easily controlled without providing a separate temperature...
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7115838 |
Unit for varying a temperature of a test piece and testing instrument incorporating same
A disc-type unit 10 adjusts temperature of a control face 14 by means of a heater 12 and coolant, with a hollow plate 11 to which the heater 12 is secured, a cavity 13 formed in the...
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7098428 |
System and method for an improved susceptor
A susceptor including a substrate support and a conductor is provided. The substrate support includes a conductive element, a contact bonded to the conductive element, and a bushing. The conductor...
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7094994 |
Heat treatment apparatus and method of semiconductor wafer
A semiconductor wafer heat treatment apparatus and method, which can carry out a heat treatment to suppress variations in line widths within a surface on a semiconductor wafer and the like,...
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7084376 |
Semiconductor production device ceramic plate
A ceramic board is provided which, when used as a heater, heats a silicon wafer uniformly throughout and, hence, does not damage the wafer and, when used as an electrostatic chuck, provides a...
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