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7019268 |
Wafer processing apparatus and method of use
A system, apparatus, and method for thermal processing of substrates undergoing lithographic chemical processes is provided. The thermal processing system includes at least one heating element, a...
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7011712 |
Fixing structures and supporting structures of ceramic susceptors, and supporting members thereof
A supporting structure is provided, including a ceramic susceptor to be heated and having a mounting face and a back face. A ceramic supporting member is joined with the back face of the susceptor....
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6997993 |
Susceptor supporting construction
A susceptor supporting construction has a susceptor for heating a member to be processed and a supporting member, in which an inner space is arranged, connected to the susceptor. A chamber having...
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6995342 |
Apparatus and method for bonding electronic component, circuit board, and electronic component mounting apparatus
Disclosed are an apparatus and a method for bonding electronic components, a circuit board, and an electronic component mounting apparatus, whereby various kinds of circuit boards can be...
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6992270 |
Wafer bake system and method for operating the same
A wafer bake system includes a heating plate for heating a wafer, and means for supporting the wafer to be spaced from the heating plate, wherein a gap distribution between the wafer and the...
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6989513 |
Heat-generating element, heat-generating substrates, heat-generating substrate manufacturing method, microswitch, and flow sensor
A stable and durable heat-generating element and substrate, a method of efficient and highly precise manufacture of same, and equipment utilizing same are obtained. Employing as material a silicon...
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6969830 |
Wafer chuck having thermal plate with interleaved heating and cooling elements
A workpiece chuck includes a thermal plate assembly which includes both heating and cooling capability. The heating element can be a resistive heater in a coiled configuration disposed in a plane....
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6967312 |
Semiconductor manufacturing/testing ceramic heater, production method for the ceramic heater and production system for the ceramic heater
A process for producing a ceramic heater includes forming a resistance heating element on a surface of a ceramic substrate. The resistance heating element is divided into plural sections....
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6963052 |
Heater module for semiconductor manufacturing equipment
Heater module, and semiconductor manufacturing equipment in which the heater module is utilized, for raising the cooling speed of a post-heating heater markedly more than conventional, and that can...
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6960743 |
Ceramic substrate for semiconductor manufacturing, and method of manufacturing the ceramic substrate
A ceramic substrate for a semiconductor-producing/examining device, in which it is possible to promptly raise its temperature, a heating face thereof has a small temperature variation, and no...
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6958462 |
Ceramic heaters
An object of the present invention is to provide a ceramic heater so that hot spots around the end portions of a heat resistor may be prevented. A ceramic heater has a ceramic substrate having a...
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6956186 |
Ceramic heater
An objective of the present invention is to provide a ceramic heater making it possible to heat an object to be heated, such as a silicon wafer, evenly. The ceramic heater of the present invention...
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6949722 |
Method and apparatus for active temperature control of susceptors
A method and an apparatus utilized for thermal processing of substrates during semiconductor manufacturing. The method includes heating the substrate to a predetermined temperature using a heating...
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6949726 |
Heating apparatus having electrostatic adsorption function
A heating apparatus having an electrostatic adsorption function comprising at least a supporting substrate, an electrode for electrostatic adsorption and a heating layer formed on the supporting...
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6924468 |
System and method for heating materials
A system and method for heating materials is provided. Generally, the system contains a first layer upon which a material may be placed for heating the material, wherein the first layer has...
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6924464 |
Ceramic heater and manufacturing method of ceramic heater
A ceramic heater manufacturing method capable of preventing reflection of a laser beam at the time the performing trimming by irradiation using a laser beam and performing trimming of a resistance...
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6919541 |
Apparatus for preventing rapid temperature variation during wafer processing
An apparatus for fabricating a semiconductor device, whereby a semiconductor wafer is thermally treated with a wafer treatment device. The semiconductor wafer is delivered with a conveyer to the...
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6917021 |
Heating apparatus with electrostatic attraction function
There is disclosed a heating apparatus with electrostatic attraction function 1 , comprising at least a supporting base 2 , an electrode for electrostatic attraction 4 and a heating layer 5 ...
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6914222 |
Wafer heating apparatus
To provide a wafer heating apparatus that can measure a surface temperature of a wafer accurately and responsively. A front surface of a ceramic plate 2 serves as a mounting surface on which a...
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6905333 |
Method of heating a substrate in a variable temperature process using a fixed temperature chuck
A method is provided for heating a substrate in a process chamber using a heated chuck. In accordance with the method, the substrate is lowered onto the chuck and heated to a first temperature less...
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6897414 |
Ceramic heater for semiconductor manufacturing/testing apparatus
A ceramic beater for a semiconductor producing/examining device having a resistance heating element superior in adhesion to a substrate. The ceramic heater includes a ceramic substrate and a...
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6897415 |
Workpiece stage of a resist curing device
A workpiece stage of a resist curing device is devised in which a workpiece on which a resist has been applied is held on a workpiece stage by vacuum suction, in which the workpiece is irradiated...
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6893507 |
Self-centering wafer support system
Improvements in the design of a low mass wafer holder are disclosed. The improvements include the use of peripherally located, integral lips to space a wafer or other substrate above the base plate...
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6891134 |
Integrally formed bake plate unit for use in wafer fabrication system
A bake plate is integrally formed from a copper disk whose lower surface defines a desired heater element channel pattern that is filled with electrically conductive resistive material. Copper...
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6891263 |
Ceramic substrate for a semiconductor production/inspection device
The present invention provides a ceramic substrate which can keep a sufficiently large breakdown voltage even if the pore diameter of its maximum pore is 50 μm or less to be larger than that of...
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6888106 |
Ceramic heater
A ceramic heater making it possible to prevent a short circuit in its resistance heating element and heat a semiconductor wafer evenly. The ceramic beater includes a ceramic substrate, an...
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6884972 |
Ceramic plate for a semiconductor producing/inspecting apparatus
A ceramic heater for a semiconductor producing/examining device including a ceramic substrate having a disc form with a diameter exceeding 200 mm and first and second surfaces, the first surface...
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6878907 |
Ceramic substrate and process for producing the same
It is a an object of the present invention to provide a ceramic substrate for a semiconductor producing/examining device which has high fracture toughness value, exellent thermal shock resistivity,...
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6878211 |
Supporting structure for a ceramic susceptor
A supporting structure for attaching a ceramic susceptor into a processing chamber is provided. The ceramic susceptor is used for placing and heating an article to be processed. The supporting...
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6878906 |
Ceramic heater for semiconductor manufacturing and inspecting equipment
An object of the present invention is to provide a ceramic heater for a semiconductor producing/examining device which is capable of accurately measuring the temperature of an object to be heated...
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6875960 |
Heating system
A heating system 25 has a main electric heat-generating element 3 and a heating surface 4 a for heating an object, auxiliary electric heat-generating elements 5 A to 5 D, and a main power...
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6863734 |
Substrate processing apparatus and method for manufacturing semiconductor device
By indirectly monitoring a warping amount of a substrate, it is possible to examine causes easily when substrate processing such as deposition is performed with nonuniform in-plane temperature of...
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6861619 |
Method and apparatus for preparing semiconductor wafers for measurement
A wafer-cleaning module can remove contaminants from a semiconductor wafer prior to measurement in a metrology tool. A heating chamber and heater plate of the cleaning module can be used to heat...
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6858821 |
Method of adapting an operating device to user behavior and adaptive operating device
An operating device for an electrical and/or electronic apparatus is adapted to the operating behavior of a user. The apparatus has a plurality of operating states which can be chosen or set by way...
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6838645 |
Heater assembly for manufacturing a semiconductor device
A heater assembly that is capable of uniformly heating a wafer in an apparatus for manufacturing a semiconductor device is provided. The heater assembly preferably includes a susceptor configured...
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6838646 |
Susceptor device
A susceptor device comprises a susceptor base body, a temperature controlling section, an adhesive layer which attaches the susceptor base body and the temperature controlling section unitarily, an...
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6835917 |
Molding heater for heating semiconductor wafer and fabrication method thereof
A molding heater includes a first metal plate having a recess formed on one side and a flat surface formed at the other side. A groove is formed at a lower portion of the recess and a wafer is...
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6815647 |
Heat treatment unit and heat treatment method
A heat treatment unit comprises a heat plate made of aluminum nitride which is excellent in heat conductivity and strength inside thereof. The entire circumference of the heat plate is supported by...
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6815646 |
Ceramic substrate for semiconductor manufacture/inspection apparatus, ceramic heater, electrostatic clampless holder, and substrate for wafer prober
The present invention discloses a ceramic substrate for semiconductor manufacture and/or inspection conducive to decrease radiated α-rays and to minimize changes in thermal conductivity as a...
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6812434 |
Ceramic heaters, a method for producing the same and heating apparatuses used for a system for producing semiconductors
A ceramic heater is provided, including a ceramic substrate with a heating face and a heat generator so that the temperature on the heating face may be controlled without a temperature controlling...
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6809299 |
Hot plate for semiconductor manufacture and testing
A hot plate for a semiconductor producing/examining device, in which hot plate, when an object to be heated such as a silicon wafer is heated in a state that the object is distanced by a certain...
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6787739 |
Apparatus for processing a substrate including a heating apparatus
An apparatus for heating a substrate of a semiconductor device includes a hot plate, on which a semiconductor substrate is placed, and a heater for heating the hot plate. The hot plate is...
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6780251 |
Substrate processing apparatus and method for fabricating semiconductor device
A substrate processing apparatus includes a first holder made of silicon carbide or silicon and a second holder made of quartz. Each of the first and the second holder is of a ring shape and the...
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6758669 |
Variable surface hot plate for improved bake uniformity of substrates
A system, method and apparatus are described for improving critical dimension uniformity in baked substrates. The system, method and apparatus provide for varying the distance between a substrate...
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6756568 |
Hot plate unit
A hot plate unit ( 1 ) having a reduced heater temperature rise time and not generating dusts. The hot plate unit comprises a casing ( 2 ) having an opening portion; a heater ( 3 ) arranged on the...
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6753507 |
Wafer heating apparatus
In a ceramic heater having a plate-like body made of a ceramic, heating element in one main face of the plate like body, and an electric supply portion to be electrically connected with the heating...
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6753508 |
Heating apparatus and heating method
A heating apparatus includes a central hot plate for heating the center portion of a substrate, a plurality of segment hot plates for heating the peripheral portion of the substrate, a hot plate...
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6744020 |
Heat processing apparatus
A heat processing apparatus comprises a hot plate for putting the substrate on or near its surface, a ceiling with a first and second concentric regions with a first and second heat pipes,...
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6740853 |
Multi-zone resistance heater
A substrate holder for holding a substrate (e.g., a wafer or an LCD panel) during plasma processing. The substrate holder is a stack of processing elements which each perform at least one function....
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6731496 |
Electrostatic chuck
An electrostatic chuck which allows sufficiently rapid temperature rising/dropping thereof, in case that the diameter of a ceramic substrate is 190 mm or more or especially in case that the...
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