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9023664 Multi-zone temperature control for semiconductor wafer  
An apparatus and a method for controlling critical dimension (CD) of a circuit is provided. An apparatus includes a controller for receiving CD measurements at respective locations in a circuit...
9018567 Wafer processing apparatus with heated, rotating substrate support  
A semiconductor substrate processing apparatus (1), comprising a substrate support assembly (30), including a substrate support (32) defining an outer support surface (34) for supporting a...
8987639 Electrostatic chuck with radiative heating  
An electrostatic chuck is formed using materials that are optically transparent to a range of frequencies, such as infrared radiation. The invention discloses several methods for achieving optical...
8981263 Electrostatic chuck apparatus  
Disclosed is an electrostatic chuck apparatus which is configured of: an electrostatic chuck section; an annular focus ring section provided to surround the electrostatic chuck section; and a...
8963052 Method for controlling spatial temperature distribution across a semiconductor wafer  
A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base is controlled in operation a temperature...
8963050 Apparatus for and method of heat-treating thin film on surface of substrate  
A semiconductor wafer having a surface with a thin film formed thereon is transported into a chamber and held by a holder. After an atmosphere provided in the chamber is replaced, flashes of light...
8957351 Catalytic CVD equipment, method for formation of film, process for production of solar cell, and substrate holder  
In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.
8927906 Heating device, coating/developing system, heating method, coating/developing method, and recording medium having program for executing heating method or coating/developing method  
The disclosed heating device is to perform a heating process on an exposed substrate formed with a resist film before a developing process, the device including a heating part to perform a heating...
8921740 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support  
A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base has a temperature below the desired...
8901464 Variable watt density layered heater  
A layered heater is provided that includes at least one resistive layer having a resistive circuit pattern, the resistive circuit pattern defining a length, a width, and a thickness, wherein the...
8884194 Heating plate with planar heater zones for semiconductor processing  
A heating plate of a semiconductor substrate support for supporting a semiconductor substrate in a plasma processing chamber includes a first layer with an array of heater zones operable to tune a...
8874254 Temperature setting method of heat processing plate, temperature setting apparatus of heat processing plate, program, and computer-readable recording medium recording program thereon  
An object of the present invention is to perform temperature setting of a heating plate so that a wafer is uniformly heated in an actual heat processing time. The temperature of a wafer is...
8847122 Method and apparatus for transferring substrate  
A method and an apparatus for transferring a substrate are described. In the method, a substrate is provided on the surface of a first plate at a first position, the first plate is moved from the...
8835813 Heat treatment apparatus and method for heating substrate by light-irradiation  
A light-emission output of a flash lamp for performing a light-irradiation heat treatment on a substrate in which impurities are implanted is increased up to a target value L1 over a period of...
8829397 Corrosion-resistant multilayer ceramic member  
The present invention relates to a corrosion-resistant multilayer ceramic member consisting at least of: a ceramic support substrate; an electrode layer formed on the ceramic support substrate; a...
8791392 Methods of fault detection for multiplexed heater array  
Described herein is a method of detecting fault conditions in a multiplexed multi-heater-zone heating plate for a substrate support assembly used to support a semiconductor substrate in a...
8785821 Substrate processing apparatus with heater element held by vacuum  
A substrate processing apparatus for heating a substrate is provided. The substrate processing apparatus can include a top and bottom planar member. A heater layer can be disposed between the top...
8779334 Integrated apparatus able to condition a dry low-temperature environment in a baking process  
An integrated apparatus able to condition a dry low-temperature environment in a baking process includes a baking unit, a drying unit, and at least a dry air introducing part. The baking unit has...
8698048 High temperature vacuum chuck assembly  
A vacuum chuck and a process chamber equipped with the same are provided. The vacuum chuck assembly comprises a support body, a plurality of protrusions, a plurality of channels, at least one...
8680441 Heating plate with planar heater zones for semiconductor processing  
A heating plate for a substrate support assembly in a semiconductor plasma processing apparatus, comprises multiple independently controllable planar heater zones arranged in a scalable...
8624168 Heating plate with diode planar heater zones for semiconductor processing  
A heating plate for a substrate support assembly in a semiconductor plasma processing apparatus, comprises multiple independently controllable planar heater zones arranged in a scalable...
8608885 Substrate heat treatment apparatus  
A substrate heat treatment apparatus includes a heat-treating plate having a flat upper surface, support devices formed of a heat-resistant resin for contacting and supporting a substrate, a seal...
8610034 Heater, manufacturing apparatus for semiconductor device, and manufacturing method for semiconductor device  
A heater for heating a wafer includes elements that are arranged at a distance from one another in a rotationally symmetrical fashion with respect to a shaft extending through a center of the...
8581153 Method of detecting abnormal placement of substrate, substrate processing method, computer-readable storage medium, and substrate processing apparatus  
A method of detecting an abnormal placement of a substrate W, which is carried out when a substrate W placed on a substrate table 3, in which a heater 6a, 6b is disposed, is processed by heating....
8558146 Position control with compensation for thermal cycling of a workpiece support  
Embodiments of the present invention are directed to establishing a desired position control over a workpiece by compensating for thermal cycling affecting a member supporting the workpiece during...
8546732 Heating plate with planar heater zones for semiconductor processing  
A heating plate for a substrate support assembly in a semiconductor plasma processing apparatus, comprises multiple independently controllable planar heater zones arranged in a scalable...
8536494 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support  
A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base has a temperature below the desired...
8522848 Methods and apparatuses for assembling components onto substrates  
The present invention relates to methods and apparatuses for assembling substrates with functional blocks, using a printhead to deliver individual functional blocks to the appropriate locations on...
8519309 Wafer heating apparatus and semiconductor manufacturing apparatus  
A wafer heating apparatus which is capable of quickly cooling by improving the cooling rate of the heater section is provided. The wafer heating apparatus comprises a plate-shaped member having...
8492682 Micro heater  
A micro heater includes a first electrode, a second electrode, a first carbon nanotube, and a second carbon nanotube. The first carbon nanotube extends from the first electrode. The second carbon...
8461490 Substrate heating unit and substrate treating apparatus including the same  
Provided are a substrate heating unit heating a substrate, and a substrate treating apparatus including the same. The substrate heating unit heats the substrate by transferring heat generated from...
8450657 Temperature controlled substrate holder having erosion resistant insulating layer for a substrate processing system  
A substrate holder for supporting a substrate in a processing system includes a temperature controlled support base having a first temperature, a substrate support opposing the temperature...
8405005 Electrostatic chuck system and process for radially tuning the temperature profile across the surface of a substrate  
An electrostatic chuck system for maintaining a desired temperature profile across the surface of the substrate is disclosed. The electrostatic chuck system includes a pedestal support defining a...
8399811 Stage for substrate temperature control apparatus  
A stage for a substrate temperature control apparatus having high reliability at low cost by preventing thermal deformation of a plate while employing a material other than ceramics as a material...
8383990 Substrate transport apparatus and heat treatment apparatus  
A chilled arm that transports a substrate to and from a heating plate for performing a heating process on the substrate is formed with a flow passage pipe therein, and cools the entire holding...
8378270 Ceramic hob  
A ceramic hob includes a cooking surface for positioning a cooking pot, a housing, an electronic circuit carrier mounted in the housing beneath the cooking surface, and a positioning element on a...
8378269 Wafer thermometer, temperature measuring device, heat treatment device and method for measuring temperature of heat treatment unit  
A wafer thermometer includes a wafer, a plurality of temperature sensors, a converter, a wafer data transmitter, and a photoelectric conversion element. The wafer has an upper surface divided to a...
8357880 Far infrared ray ceramic plate heating module  
A far infrared ray ceramic flat plate heating module is provided. The far infrared ray ceramic flat plate heating module includes a ceramic heat-generating flat plate, an integrated terminal block...
8334481 Mounting table structure, and processing apparatus  
A mounting table body made of ceramic includes power-receiving conductor portions and buried therein. A surface of mounting table body is formed with a recessed connection hole and a connection...
8314371 Rapid thermal processing chamber with micro-positioning system  
Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described....
8304701 Ceramic heater and method for making the same  
A resistive heating element 30 has a higher molybdenum carbide content in a central portion 35 than in a peripheral portion 34. Since molybdenum carbides have a low temperature coefficient of...
8294069 Heating device for heating a wafer  
A heating device made of ceramics includes: a plate-like heating base having a heating surface; and a hollow cylindrical support member bonded to a back surface of the heating base. A concave...
8283606 Substrate processing apparatus and substrate stage used therein  
A substrate stage includes a stage upon which a wafer is placed, a heater element installed within the stage, an upright support that ranges upright from a bottom of a processing chamber and...
8282737 Substrate processing apparatus and method for manufacturing a semiconductor device  
A CVD device has a reaction furnace (39) for processing a wafer (1); a seal cap (20) for sealing the reaction furnace (39) hermetically; an isolation flange (42) opposite to the seal cap (20); a...
8269147 Hotplate, and also assembly comprising such a hotplate  
The invention relates to a hotplate, comprising a metal plate part and an electric heating element fixed on the lower side of the plate part. The hotplate furthermore comprises a ring. The ring is...
8263908 Heater plate and a method for manufacturing the heater plate  
A heater plate may be manufactured by receiving a sheath heater within a groove portion formed in a base member made of aluminum or aluminum alloy. At least one joint member made of aluminum or...
8253077 Substrate processing method, computer-readable storage medium and substrate processing system  
A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of...
8222570 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy  
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear...
8222574 Temperature measurement and control of wafer support in thermal processing chamber  
Apparatus and methods for achieving uniform heating or cooling of a substrate during a rapid thermal process are disclosed. More particularly, apparatus and methods for controlling the temperature...
8217317 Apparatus with strain release feature for high temperature processes  
A method and apparatus for thermally treating a substrate is provided. A thermal treatment chamber has a substrate support and a magnetically permeable rotor housed in a rotor well. An annular...
Matches 1 - 50 out of 359 1 2 3 4 5 6 7 8 >