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7616872 |
Temperature measurement and heat-treating methods and systems
Temperature measurement and heat-treating methods and systems. One method includes identifying a temperature of a first surface of a workpiece, and controlling energy of an irradiance flash...
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7608802 |
Heating device for heating semiconductor wafers in thermal processing chambers
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer....
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7598150 |
Compensation techniques for substrate heating processes
Methods for compensating for a thermal profile in a substrate heating process are provided herein. In one embodiment, a method of processing a substrate includes determining an initial thermal...
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7592570 |
Oven with convection air current and energy savings features
An oven for heating, cooking, or toasting a food product. The oven can comprise a conveyor for conveying the food product, and a parabolically shaped top surface with a plurality of reflectors...
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7570875 |
Handheld heating tool
A handheld heating tool has a pair of elliptical reflectors with the major axes of the ellipses being at an acute angle to each other and intersecting in a focal region including one focus of each...
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7532749 |
Light processing apparatus
Provided is a light processing apparatus which can judge goodness or badness of small amount and various kind processing, and is useful for small amount and various kind processing, and can realize...
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7528349 |
Temperature stabilization for substrate processing
A temperature stabilization system, method, composition of matter and substrate processing system are disclosed. A heat absorbing material is disposed in thermal contact with a substrate. The heat...
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7528347 |
Cooling device and heat treating device using the same
A heat treating device ( 50 ) has a cooling sleeve that covers a treating vessel ( 56 ) and a heater ( 100 ). The cooling sleeve has a cylindrical base member ( 110 ) and a cooling pipe ( 112 )...
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7525068 |
Heating system of batch type reaction chamber and method thereof
A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right...
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7517217 |
Method and apparatus for heat processing of substrate
The present invention relates to a method for heat processing of a substrate having the step of baking a substrate, on which a coating film is formed, at a predetermined high temperature,...
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7515986 |
Methods and systems for controlling and adjusting heat distribution over a part bed
Methods and systems for controlling and adjusting heat distribution over a part bed are disclosed. In one embodiment, a technique for providing a calibrated heat distribution over a part bed...
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7509035 |
Lamp array for thermal processing exhibiting improved radial uniformity
A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them....
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7499633 |
Infrared heater
An infrared heater includes a support body and a heat source irradiating device. The heat source irradiating device includes a reflecting hood, a hood body, two non-planar symmetric arc bodies...
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7491913 |
Bake apparatus for use in spin-coating equipment
Bake apparatus for use in baking a substrate, such as a semiconductor wafer, includes a chamber, a hot plate installed within the chamber, and first and second buffer plates for uniformly...
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7489858 |
Heater assembly
A heater is disclosed. The comprises a housing; a reflector; and a pair of opposite connectors supported by the reflector and configured to support opposite ends of a heating element. The reflector...
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7482558 |
Thermotherapy device
A thermotherapy device is operated as an incubator or as an open care unit. The care unit has a bed for receiving newborns, which can be closed with a hood ( 3 ). At least one heat radiation source...
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7482555 |
Substrate transportation device (air)
A substrate transportation device includes a housing for transporting substrates. The housing is formed of an upper surface, a lower surface, and opposing sidewalls. The housing has a rear opening...
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7479618 |
Device for heat treatment
Device ( 1 ) for the heat treatment of scalp hair ( 2 ) of a person ( 3 ), consisting of one first and one second heat radiator ( 11, 12 ), which are formed and arranged facing each other as a left...
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7466907 |
Annealing process and device of semiconductor wafer
A device for use in a thermal annealing process for a wafer (T) of material chosen among the semiconductor materials for the purpose of detaching a layer from the wafer at an weakened zone. During...
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7453051 |
System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear...
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7446284 |
Etch resistant wafer processing apparatus and method for producing the same
A wafer processing apparatus is fabricated by depositing a film electrode onto the surface of a base substrate, the structure is then overcoated with a protective coating film layer comprising at...
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7432475 |
Vertical heat treatment device and method controlling the same
A vertical heat processing apparatus includes a process chamber ( 5 ) defining a process field (A 1 ) configured to accommodate a plurality of target substrates (W) supported at intervals in a...
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7429718 |
Heating and cooling of substrate support
A substrate support assembly and method for controlling the temperature of a substrate within a process chamber are provided. A substrate support assembly includes an thermally conductive body...
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7429717 |
Multizone heater for furnace
The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor...
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7415312 |
Process module tuning
A process module tuning method characterizes a process module by gathering data using a process condition measuring device to measure process outputs while inputs are excited. The data is used to...
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7383875 |
Heating/cooling method, manufacturing method of image displaying apparatus, heating/cooling apparatus, and heating/cooling processing apparatus
A heating/cooling method, a manufacturing method of an image displaying apparatus, a heating/cooling apparatus, and a heating/cooling processing apparatus, in which the heating and cooling of a...
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7381928 |
Thermal processing apparatus and thermal processing method
A light source including a plurality of flash lamps emits flashes thereby flash-heating a semiconductor wafer held by a thermal diffuser and a hot plate. The current distance of irradiation between...
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7378618 |
Rapid conductive cooling using a secondary process plane
A method and apparatus for thermally processing a substrate is described. The apparatus includes a substrate support configured to move linearly and/or rotationally by a magnetic drive. The...
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7371997 |
Thermal processing apparatus and thermal processing method
In a thermal processing apparatus, using a lamp for heating a substrate, an opening is formed for a camera unit, which is used to image portions of an auxiliary ring supporting the substrate, to...
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7358666 |
System and method for sealing high intensity discharge lamps
In accordance with certain embodiments, the present technique includes a system for sealing a lamp including a thermal shield and a thermally susceptible enclosure disposed adjacent the thermal...
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7358462 |
Apparatus and method for reducing stray light in substrate processing chambers
A method and apparatus for heating semiconductor wafers in thermal processing chambers is disclosed. The apparatus includes a non-contact temperature measurement system that utilizes radiation...
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7351936 |
Method and apparatus for preventing baking chamber exhaust line clog
A method and apparatus involve providing a supply of nitrogen gas, heating the supply of nitrogen gas to a temperature, and ejecting the heated nitrogen gas through the exhaust line of the baking...
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7339137 |
Electric grilling appliance
A food heating appliance is disclosed that comprises a chamber portion and a lid portion that defines a heating chamber. The chamber portion has a perimeter wall extending about the heating chamber...
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7332691 |
Cooling plate, bake unit, and substrate treating apparatus
A bake unit includes a cooling plate for cooling a substrate and a lift pin assembly for loading a substrate on the cooling plate. When a wafer is cooled on the cooling plate, a guide groove is...
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7323663 |
Multi-purpose oven using infrared heating for reduced cooking time
An oven using radiant heat at infrared wavelengths optimized for producing rapid and uniform cooking of a wide variety of foods. The infrared oven toasts, bakes, broils, and re-heats food at a much...
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7317174 |
Reconfigurable food heating apparatus
A food heating or cooking appliance has at least one electrical heating element within its interior that is adjustable in position so as to be able to be moved close to thin or small food items...
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7312423 |
Cooking device
A heating cooker ( 100 ) for heating to process an object placed on a mounting base of a heating chamber ( 51 ) including at least a single piece of a rod-like heater arranged along a face member...
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7312422 |
Semiconductor batch heating assembly
A heat treatment apparatus for use in batch heating/wafer processing is provided, which comprises a process chamber for receiving a wafer boat, at least a heating element comprising a substrate...
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7294811 |
Heating cooking device
A heating cooking device includes a housing having a wall portion; a first base material provided in at least a portion of the wall portion; and optionally a second base material formed on the...
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7285758 |
Rapid thermal processing lamp and method for manufacturing the same
A method and system for inductively coupling energy to a heating filament ( 7 A′, 7 B′, 7 C′, 7 A, 7 B, 7 C) in a thermal processing environment. By applying AC power to a coil antenna (...
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7274006 |
Heater
A heater includes a heating member formed in a plate shape that includes a substrate-heating surface on which a substrate is mounted and a heating member rear surface which is on the opposite side...
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7256370 |
Vacuum thermal annealer
A vacuum thermal annealing device is provided having a temperature control for use with various materials, such as semiconductor substrates. A vacuum is used to remove air and outgas residual...
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7239804 |
Cooling device, and apparatus and method for manufacturing image display panel using cooling device
A method for manufacturing an image display panel includes the steps of heating a substrate for the image display panel having a different-emissivity member on at least a part of one surface of the...
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7238920 |
Modular bat warming system
Disclosed is a baseball and/or softball bat warmer system. Each individual bat heater includes an elongated outer tubular member having a closed bottom surface. An inner tubular member is spaced...
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7230709 |
Measuring method and measuring apparatus of optical energy absorption ratio, and thermal processing apparatus
Reflection intensities of a standard wafer with a known reflectance, a plain wafer on which no pattern is formed, and a semiconductor wafer to be processed practically are measured by using an...
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7211769 |
Heating chamber and method of heating a wafer
A heating chamber which can be used during a reflow process to form a metal wiring having a multi-layered writing structure and a method of heating a wafer using the same, are provided. The heating...
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7193184 |
Impingement oven with radiant heating
An oven for providing radiant and impingement heat to a food item. The oven includes a fan mechanism for drawing air around the radiant heat elements of the oven. The air is then delivered to an...
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7190889 |
Non-contact heater and method for non-contact heating of a substrate for material deposition
A heater for the non-contact heating of an object, such as a substrate for material deposition, includes a housing defining a deposition cavity and a source of radiation outside the deposition...
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7145104 |
Silicon layer for uniformizing temperature during photo-annealing
An apparatus and method for uniformizing the temperature distribution across a semiconductor wafer during radiation annealing of process regions formed in the wafer is disclosed. The method...
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7141763 |
Method and apparatus for rapid temperature change and control
An apparatus and a method for controlling the temperature of a substrate during substrate processing. The apparatus comprises a substrate table having a thermal surface supporting the substrate....
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