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7625494 |
Plasma etching method and plasma etching unit
The present invention is a plasma etching method including: an arranging step of arranging a pair of electrodes oppositely in a chamber and making one of the electrodes support a substrate to be...
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7622693 |
Plasma whirl reactor apparatus and methods of use
Apparatus for synergistically combining a plasma with a comminution means such as a fluid kinetic energy mill (jet mill), preferably in a single reactor and/or in a single process step is provided...
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7619184 |
Multi-parameter process and control method
A method and system for generating control settings for a multi-parameter control system. The interdependencies of processing tools and the related effect on semiconductor wafers within a...
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7619178 |
Directly connected magnetron powered self starting plasma plume igniter
An igniter for use in aircraft gas turbine and rocket engines that derives its energy from a directly connected magnetron. The igniter is intended to be mounted exterior of the engine, and to...
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7619179 |
Electrode for generating plasma and plasma processing apparatus using same
In an electrode for generating a plasma, disposed to face a surface of a substrate to perform a plasma processing on the surface of the substrate, the electrode includes a metal-based composite...
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7608796 |
Plasma generating electrode and plasma reactor
A plasma generating electrode capable of generating plasma with a high energy level by using a small amount of electric power is provided. The plasma generating electrode includes at least a pair...
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7595462 |
Plasma processing method and plasma processing apparatus
A plasma processing is performed by using a plasma processing apparatus which includes a first electrode and a second electrode disposed relatively movable to the first electrode between which an...
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7592564 |
Plasma generation and processing with multiple radiation sources
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a radiation cavity to electromagnetic radiation...
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7586099 |
Vacuum plasma generator
A vacuum plasma generator (VPG) includes an output connector for electrical connection of the VPG to at least one electrode of a plasma chamber. The VPG includes a mains connector for connection of...
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7582845 |
Microwave plasma processing device and plasma processing gas supply member
A microwave plasma processing device can form a uniform thin film on a substrate to be processed. The microwave plasma processing device includes a fixing device for fixing a substrate to be...
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7569791 |
Inductively-driven plasma light source
An electromagnetic radiation source includes a toroidal chamber that contains an ionizable medium. The electromagnetic radiation source also includes a magnetic core that surrounds a portion of the...
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7569790 |
Method and apparatus for processing metal bearing gases
A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the...
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7560657 |
Plasma-assisted processing in a manufacturing line
Methods and apparatus are provided for plasma-assisted processing multiple work pieces in a manufacturing line. In one embodiment, the method can include placing the work pieces in movable...
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7557328 |
High rate method for stable temperature control of a substrate
A method for multi-step temperature control of a substrate includes selecting a first set-point temperature and a second set-point temperature for the substrate, and selecting a first PID parameter...
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7554054 |
High-frequency heating device, semiconductor manufacturing device, and light source device
A high-frequency heating device including: a solid-state oscillator that generates a microwave; an amplifier that amplifies the microwave generated by the solid-state oscillator; an isolator that...
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7547860 |
Microwave plasma processing apparatus for semiconductor element production
A plasma processing apparatus 100 used to execute a specific type of processing such as plasma processing on a workpiece by supplying a processing gas into a chamber 110 while applying...
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7541558 |
Inductively-coupled toroidal plasma source
Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary...
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7511246 |
Induction device for generating a plasma
A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a...
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7507934 |
Plasma generation electrode, plasma reactor, and exhaust gas cleaning apparatus
A plasma generation electrode capable of subjecting predetermined components contained in a fluid to be treated to their respective reaction treatments with plasmas having different intensities...
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7501605 |
Method of tuning thermal conductivity of electrostatic chuck support assembly
A method of tuning the thermal conductivity of an electrostatic chuck (ESC) support assembly comprises measuring the temperature at a plurality of sites on a support assembly surface in which each...
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7501600 |
Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a...
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7491908 |
Plasma processing device and ashing method
A plasma processing device comprises a chamber capable of maintaining an atmosphere depressurized less than atmospheric pressure, a transfer pipe connected to the chamber, a gas introduction...
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7485827 |
Plasma generator
A plasma generator comprising a propagation chamber propagating an electromagnetic radiation, and a plasma-generating chamber associated with the propagation chamber; said propagation chamber has a...
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7482550 |
Quartz guard ring
An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper electrode, a backing member attachable to an upper surface of the...
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7468494 |
Reaction enhancing gas feed for injecting gas into a plasma chamber
In one aspect of the invention is a gas feed for injecting gas into a plasma-processing chamber that reduces the speed at which the gas interacts with the plasma discharge, so enhancing the...
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7435926 |
Methods and array for creating a mathematical model of a plasma processing system
A method of creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator...
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7432470 |
Surface cleaning and sterilization
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. Such treatments include cleaning and sterilizing parts. In some...
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7432468 |
Plasma processing apparatus and plasma processing method
A microwave plasma processing apparatus 100 allows microwaves, passed through a plurality of slots 37 , to be transmitted through a plurality of dielectric parts 31 supported by beams 26 ,...
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7411148 |
Plasma generation apparatus
A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber;...
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7404879 |
Ionized physical vapor deposition apparatus using helical self-resonant coil
Provided is an ionized physical vapor deposition (IPVD) apparatus having a helical self-resonant coil. The IPVD apparatus comprises a process chamber having a substrate holder that supports a...
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7399944 |
Method and arrangement for controlling a glow discharge plasma under atmospheric conditions
The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at...
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7399943 |
Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece
A plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber. A process gas inlet is...
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7371991 |
Iron beam irradiation device and insulating spacer for the device
Disclosed is a structure aimed to reduce the frequency of replacement of an insulating spacer arranged between grids of an ion beam irradiation device. More specifically, disclosed is a so-called...
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7355143 |
Circuit board production method and its apparatus
Making it possible to execute the detection of the particles floating inside a processing chamber with the use of an optical system including one observing window and one unit (An object of the...
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7345260 |
Heater and method of manufacturing the same
A heater including a plate-shaped substrate having a heating surface for heating an object and a heater element provided in the substrate or on its surface. A central axis C 2 of a circumscribed...
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7335851 |
Gap measurement apparatus
A detection unit ( 8 ) is disposed for detecting the magnitudes of f 1 and f 2 frequency components of a composite signal which is passed through a center electrode cable ( 4 ). A detecting...
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7334477 |
Apparatus and methods for the detection of an arc in a plasma processing system
In a plasma processing system, a method for detecting an arc event on a substrate in a plasma chamber having a chuck is disclosed. The method includes positioning a substrate on the chuck. The...
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7326872 |
Multi-frequency dynamic dummy load and method for testing plasma reactor multi-frequency impedance match networks
In one implementation, a method is provided for testing a plasma reactor multi-frequency matching network comprised of multiple matching networks, each of the multiple matching networks having an...
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7323655 |
Inductively coupled plasma reactor for producing nano-powder
Disclosed herein is a high-frequency induction plasma reactor apparatus for producing nano-powder, which is configured to continuously manufacture nano-powder in large quantities using solid-phase...
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7312415 |
Plasma method with high input power
A plasma device which is provided with a container, a gas supply system, and an exhaust system. The container is composed of a first dielectric plate made of a material capable of transmitting...
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7309842 |
Shielded monolithic microplasma source for prevention of continuous thin film formation
A monolithic microplasma source includes a dielectric substrate having an outer surface that is exposed to a time varying electric field. A gap layer is positioned on an inner surface of the...
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7304264 |
Micro thermal chamber having proximity control temperature management for devices under test
A temperature unit to control a temperature of a device under test using a fluid includes a block disposed opposite the device under test and which defines a gap therebetween and through which the...
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7297894 |
Method for multi-step temperature control of a substrate
A method of changing the temperature of a substrate during processing of the substrate includes providing the substrate on a substrate holder, the substrate holder including a temperature...
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7273995 |
Plasma generator
A microfabricated plasma generator and a method of generating a plasma, the plasma generator comprising: a substrate chip; a chamber defined by the substrate chip, the chamber including an inlet...
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7271363 |
Portable microwave plasma systems including a supply line for gas and microwaves
Portable microwave plasma systems including supply lines for providing microwaves and gas flow are disclosed. The supply line includes at least one gas line or conduit and a microwave coaxial...
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7262384 |
Reaction vessel and method for synthesizing nanoparticles using cyclonic gas flow
A reaction vessel and a method for efficiently producing and collecting nanoparticles in the reaction vessel using cyclonic gas flow. Gas is injected through an inlet tangentially positioned...
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7230202 |
Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
Disclosed herein is a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a...
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7227097 |
Plasma generation and processing with multiple radiation sources
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic...
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7220937 |
Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
A gas distribution ceiling electrode for use as a capacitive source power applicator and gas distribution showerhead in a plasma reactor includes a metal base and a process-compatible protective...
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7199328 |
Apparatus and method for plasma processing
A plasma processing system including a process chamber, a substrate holder provided within the process chamber, and a gas injection system configured to supply a first gas and a second gas to the...
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