|
Match
|
Document |
Document Title |
|
|
8124906 |
Method and apparatus for processing metal bearing gases
A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the...
|
|
|
8084705 |
Quartz guard ring centering features
An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the...
|
|
|
8067711 |
Deposition apparatus and methods
Microspray apparatus and methods involve injecting powdered material into a plasma gas stream. The material comprises first and second component powders. The second powder is a majority by the...
|
|
|
8058585 |
Plasma processing method, plasma processing apparatus and storage medium
A plasma processing method includes the steps of: loading a substrate on a lower electrode, the substrate having a resist mask formed on a transcription film; supplying a processing gas into a...
|
|
|
8035056 |
Plasma generation apparatus
A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the...
|
|
|
8003913 |
Base plate with electrodes, process for producing the same, and electro-optical device
Electrodes are formed in a predetermined pattern on a base plate. Side face regions of each electrode or certain regions of each electrode, which certain regions contain the side face regions and...
|
|
|
7875824 |
Quartz guard ring centering features
An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the...
|
|
|
7858898 |
Bevel etcher with gap control
A device for cleaning a bevel edge of a semiconductor substrate. The device includes a lower electrode assembly that has a top surface and is adapted to support the substrate and an upper electrode...
|
|
|
7737382 |
Device for processing welding wire
A device for processing a wire having an outer surface and moving along a given path in a give direction. The device comprises a conductive contact tube surrounding said path and electrically...
|
|
|
7728251 |
Plasma processing apparatus with dielectric plates and fixing member wavelength dependent spacing
In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a...
|
|
|
7679024 |
Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamber
A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber. The plasma tube has a top end. The arrangement includes a body having...
|
|
|
7674998 |
Cutting machine
To enable the amount of air capable of bringing smoke to the vicinity of a discharge opening of a gas discharge chamber to be sent into the gas discharge chamber. A cutting machine has gas...
|
|
|
7554054 |
High-frequency heating device, semiconductor manufacturing device, and light source device
A high-frequency heating device including: a solid-state oscillator that generates a microwave; an amplifier that amplifies the microwave generated by the solid-state oscillator; an isolator that...
|
|
|
7491908 |
Plasma processing device and ashing method
A plasma processing device comprises a chamber capable of maintaining an atmosphere depressurized less than atmospheric pressure, a transfer pipe connected to the chamber, a gas introduction...
|
|
|
7371992 |
Method for non-contact cleaning of a surface
A flame torch can be used to clean the surface of a contact-sensitive object, such as a glass optic, extremely thin workpiece, or semiconductor wafer by providing a reactive precursor gas to the...
|
|
|
7335851 |
Gap measurement apparatus
A detection unit (8) is disposed for detecting the magnitudes of f1 and f2 frequency components of a composite signal which is passed through a center electrode cable (4). A detecting signal...
|
|
|
7304264 |
Micro thermal chamber having proximity control temperature management for devices under test
A temperature unit to control a temperature of a device under test using a fluid includes a block disposed opposite the device under test and which defines a gap therebetween and through which the...
|
|
|
7297894 |
Method for multi-step temperature control of a substrate
A method of changing the temperature of a substrate during processing of the substrate includes providing the substrate on a substrate holder, the substrate holder including a temperature...
|
|
|
7256134 |
Selective etching of carbon-doped low-k dielectrics
The present invention includes a process for selectively etching a low-k dielectric material formed on a substrate using a plasma of a gas mixture in a plasma etch chamber. The gas mixture...
|
|
|
7199327 |
Method and system for arc suppression in a plasma processing system
An arc suppression system for plasma processing comprising at least one sensor coupled to the plasma processing system, and a controller coupled to the at least one sensor. The controller provides...
|
|
|
7189940 |
Plasma-assisted melting
Apparatus and methods for plasma-assisted melting are provided. In one embodiment, a plasma-assisted melting method can include: (1) adding a solid to a melting region, (2) forming a plasma in a...
|
|
|
7176402 |
Method and apparatus for processing electronic parts
An electronic part processing method for peeling off a resin coating of an electronic part having a terminal section. The method includes a step of irradiating, with plasma, a coated wire having...
|
|
|
7161111 |
Plasma torch having a quick-connect retaining cup
A plasma torch assembly having a quick-connect retaining cup is disclosed. The plasma torch has a torch body constructed to receive an electrode therein. A retaining cup secures the electrode to...
|
|
|
7141757 |
Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent
A plasma reactor operable over a very wide process window of pressure, source power and bias power includes a resonant circuit consisting of an overhead electrode having a first impedance, a wafer...
|
|
|
7067761 |
Semiconductor device manufacturing system for etching a semiconductor by plasma discharge
A semiconductor device manufacturing system has a vacuum chamber which is provided with a cathode electrode for holding a substrate to be processed and into which a reactive gas for generating...
|
|
|
7015416 |
Plasma cutting torch speed modulation
A method and a system for the plasma arc cutting of a workpiece with automatic adaptation of the characteristics of the plasma jet by making various corrections, simultaneously and in real time, to...
|
|
|
6943316 |
Arrangement for generating an active gas jet
The invention is directed to an arrangement for generating a chemically active jet (active gas jet) by a plasma generated by electric discharge in a process gas. It is the object of the invention...
|
|
|
6870123 |
Microwave applicator, plasma processing apparatus having same, and plasma processing method
In order to more accurately control the radiation characteristics of microwaves to improve the controllability of processing in radial and circumferential directions of an article, there are...
|
|
|
6855908 |
Glass substrate and leveling thereof
A glass substrate having a surface which has been leveled, preferably to a flatness of 0.04-1.3 nm/cm2 of the surface, by local plasma etching is provided. A glass substrate whose surface carries...
|
|
|
6806437 |
Inductively coupled plasma generating apparatus incorporating double-layered coil antenna
An inductively coupled plasma (ICP) generating apparatus is provided. The apparatus includes an evacuated reaction chamber; an antenna system installed at an upper portion of the reaction chamber...
|
|
|
6774335 |
Plasma reactor and gas modification method
This invention provides a plasma reactor for modifying gas by plasma, including a first planar electrode and a second planar electrode, the two electrodes facing opposite each other approximately...
|
|
|
6770836 |
Impedance matching circuit for inductively coupled plasma source
An impedance matching circuit for a plasma source includes: a first network including: a first coil; and a RF power supply applying a first voltage to the first coil; and a second network...
|
|
|
6756559 |
Plasma etching apparatus
The apparatus for etching a thin film using the plasma includes a reaction chamber having a diffusion area and a reaction area; an upper electrode disposed in the top of the reaction area; a lower...
|
|
|
6717368 |
Plasma generator using microwave
Here is disclosed a plasma generator using microwave wherein a plasma generating chamber is provided with a plurality of wave guide tubes extending in parallel one to another at regular intervals,...
|
|
|
6700089 |
Plasma processing device, its maintenance method, and its installation method
An upper electrode unit constituting the upper wall of a processing chamber of an etching device includes a first assembly that includes an upper electrode, a second assembly that supports the...
|
|
|
6680455 |
Plasma resistant quartz glass jig
It is an object of the present invention to provide a quartz glass jig excellent in the plasma etching resistant characteristics, which does not generate an abnormal etching and particles when used...
|
|
|
6659110 |
Method and apparatus for cleaning drums or belts
A method of removing organic impurities from a surface of a substrate that is used for feeding or processing web material, wherein a jet of an atmospheric plasma is directed onto the surface of the...
|
|
|
6616767 |
High temperature ceramic heater assembly with RF capability
The present invention provides techniques for coupling radio-frequency (RF) power to a metal plate in a ceramic pedestal. Perforations in the metal plate allow ceramic-to-ceramic bonding through...
|
|
|
6603091 |
Cleaning device with deeply reaching plasma and assisting electrodes
A cleaning device with deeply reaching plasma and assisting electrodes has supporting racks, a chamber, a plasma sources, metallic grids. Flat boards to be cleaned such as circuit boards are...
|
|
|
6504126 |
Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions
The invention is embodied in an antenna for radiating RF power supplied by an RF source into a vacuum chamber, the antenna including plural concentrically spiral conductors, each having a first end...
|
|
|
6455806 |
Arrangement for shaping and marking a target
An arrangement for shaping and marking a target includes a processing apparatus that is configured to mechanically shape the target, a marking unit that is arranged to non-mechanically provide...
|
|
|
6429399 |
Discharge tube for a local etching apparatus and a local etching apparatus using the discharge tube
A discharge tube for a local etching apparatus has a portion positioned within a waveguide which is for the generation of plasma, the said portion being tapered so as to be divergent toward an...
|
|
|
6423924 |
Method for treating the surface of a material or an object and implementing device
The invention relates to a method of treating the surface of a material or of an object by means of plasma generated by an electric discharge. It also relates to a device for implementing the...
|
|
|
6396024 |
Permanent magnet ECR plasma source with integrated multipolar magnetic confinement
A method and apparatus for integrating multipolar confinement with permanent magnetic electron cyclotron resonance plasma sources to produce highly uniform plasma processing for use in...
|
|
|
6376795 |
Direct current dechucking system
An electrostatic chuck, disposed within a processing chamber, receives a substrate and signals to selectively grip and release the substrate. A radio frequency power supply creates and passes a...
|
|
|
6373022 |
Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry
The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a...
|
|
|
6369348 |
Plasma reactor with coil antenna of plural helical conductors with equally spaced ends
The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a...
|
|
|
6369349 |
Plasma reactor with coil antenna of interleaved conductors
The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a...
|
|
|
6348669 |
RF/microwave energized plasma light source
Apparatus for radiating energy at one or more predetermined wavelength comprising: a housing (4), a source of microwave energy coupled to and located outside the housing and a window forming part...
|
|
|
6339206 |
Apparatus and method for adjusting density distribution of a plasma
An apparatus and method for adjusting a distribution of a density of a plasma and/or a distribution of a chemical composition of a plasma, thereby adjusting the characteristics of a reaction used...
|