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7404904 Method and apparatus to clean particulate matter from a toxic fluid  
There is a method of capturing, removing or collecting the particulate matter from a fluid containing a toxic liquid reaction and particulate matter produced from the reaction. The method includes...
7354523 Methods for sidewall etching and etching during filling of a trench  
A method for sidewall etching includes providing a substrate having a trench defined therein, with the trench having fill material disposed over a bottom thereof, along a sidewall thereof, and at...
7351343 Copper metal recovery system  
The present invention generally relates to a copper metal recovery system, able to integrate with a waste treatment system of a circuit board manufacture plant, includes a stirring unit, a...
7303691 Polishing method for semiconductor wafer  
A polishing method includes a slurry adjusting step for adjusting a polishing slurry containing silica particles so that the number of silica particles having a composition ratio of Si/O of 50–60...
7238295 Regeneration process of etching solution, etching process, and etching system  
A regeneration process is disclosed for an etching solution composed of a phosphoric acid solution and used in etching silicon nitride films in an etch bath. As a result of the etching, the etching...
7097784 Etching method and apparatus for semiconductor wafers  
A method for etching semiconductor wafers in an etching apparatus including an etching bath filled with an etchant and capable of setting liquid temperature and process sequence, comprises...
7083741 Process and device for the wet-chemical treatment of silicon  
A device and process for the wet-chemical treatment of silicon using an etching liquid that contains water, nitric acid and hydrofluoric acid. The etching liquid is activated by introducing...
7067068 Method for preventing lead from dissolving from a lead-containing copper-based alloy  
A lead-containing copper-based alloy is immersed into a weak acidic or neutral etching solution having a buffer effect which is formed by adding an organic acid into a complexing agent having a...
7056447 Semiconductor processing methods  
Embodiments in accordance with the present invention provide for removing organic materials from substrates, for example substrates employed in the fabrication of integrated circuits, liquid...
7026255 Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride  
In a method for photo-electrochemical etching of a semiconductor sample, the semiconductor sample is brought in contact with an electrolyte liquid. The contact area formed thereby is illuminated...
6953044 Drained water recovery system and method for operating the same  
A drained water recovery system of a process device and recovering method thereof is provided. The recovering method includes using a conductivity meter to measure the conductivity of the drained...
6946055 Method for recovering an organic solvent from a waste stream containing supercritical CO2  
An organic solvent is separated from a waste stream containing supercritical CO 2 , an organic solvent and etchant contaminants. The process includes separating the supercritical CO 2 by...
6939472 Etching method in fabrications of microstructures  
The present invention teaches a method and apparatus for removing sacrificial materials in fabrications of microstructures using one or more selected spontaneous vapor phase etchants. The selected...
6878303 Substrate processing apparatus and substrate processing method  
A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a...
6863836 Method for removal of photoresist using sparger  
A method of removing photoresist from semiconductor wafers through the use of a sparger plate. According to the inventive method, at least one semiconductor wafer is positioned in a process tank...
6844269 Etching method for semiconductor silicon wafer  
An etchant and an etching method that contribute to prevention of metal contamination of a semiconductor silicon wafer, and a semiconductor silicon wafer in which metal contamination is extremely...
6706121 Device and method for the treatment of semiconductor wafers  
In a method of treating substrates a treatment fluid is fed into a collection vessel after treatment, at least a portion of the treatment fluid is withdrawn from the collection vessel and returned...
6699400 Etch process and apparatus therefor  
In a process using a hot phosphoric acid etchant ( 12 ) to etch silicon nitride on a semiconductor wafer ( 15 ) submerged in a tank ( 11 ) of the etchant ( 12 ), a recirculating path is established...
6652658 Method for machining/cleaning by hydroxide ion in ultrapure water  
A method for clean processing wherein an object and a high pressure nozzle are disposed a specific distance apart from each other inside a washing tank containing only ultra-pure water, an ion...
6610213 Process for the wet chemical treatment of a semiconductor wafer  
A process for the wet chemical treatment of a semiconductor wafer in a vessel, in which the semiconductor wafer is brought into contact with a liquid in which very small gas bubbles are dispersed....
6527969 Method and apparatus for rejuvenating polishing slurry  
A method for rejuvenating a polishing slurry that has been used for a chemical-mechanical polishing process includes the steps of: recovering the polishing slurry; and re-dispersing abrasive grains...
6503363 System for reducing wafer contamination using freshly, conditioned alkaline etching solution  
A system for conditioning an alkaline etching solution for reducing contamination in a silicon wafer etching process. The system includes a conditioning tank for mixing a conditioned alkaline...
6500353 Disposable device for end finishing of plastic optical fiber  
Finishing the end of a plastic optical fiber by a device having a semi-rigid or rigid base, a solvent liner for absorbing and holding a solvent, and a re-attachable pull-off cover for keeping the...
6497238 Method of manufacturing electronic devices and apparatus for carrying out such a method  
A method of manufacturing electronic devices, in particular, but not exclusively, semiconductor devices, and apparatus for carrying out such a method, in which method substrates 1, which are...
6495055 Variable time etching system according to the accumulated number of devices being processed and a method for etching in the same manner  
An etching system and method. In the method, layers are etched on a plurality of substrates using a single amount of etchant to form a predetermined pattern on each of the layers, wherein an...
6454958 Method and device for operating etching baths  
A method of operating a milling bath wherein a metal workpiece to be milled is immersed in a milling bath containing a milling medium, the metal oxidizing owing to a chemical reaction between the...
6444589 Method and apparatus for etching silicon  
An etching method and an etching apparatus for applying an etchant containing nitric acid and hydrofluoric acid to silicon to etch the silicon. The etchant used in etching is recovered, and brought...
6423290 Method for recovering an organic solvent from an acidic waste stream such as in integrated chip manufacturing  
An organic solvent is separated from a waste stream comprising hydrofluoric acid, an organic solvent and etchant contaminants. The process comprises separating the hydrofluoric acid by subjecting...
6387206 Method and system for plastic package decapsulation of electronic devices  
Aspects for a decapsulation system and technique are described. In a method aspect, a portable decapsulation system is provided beneath at least one integrated circuit device on a printed circuit...
6383332 Endpoint detection method and apparatus which utilize a chelating agent to detect a polishing endpoint  
A method of planarizing a semiconductor wafer having a polishing endpoint layer that includes a ligand is disclosed. One step of the method includes polishing a first side of the wafer in order to...
6355184 Method of eliminating agglomerate particles in a polishing slurry  
The present invention, in one embodiment, provides a method for eliminating agglomerate particles in a polishing slurry. In this particular embodiment, the method is directed to reducing...
6315836 Clean, recirculating processing method which prevents surface contamination of an object  
A clean, recirculating and processing method which prevents surface contamination of an object, such as a semiconductor, semi-conductor wafer, glass for LCD or magnetic disk is provided which...
6294472 Dual slurry particle sizes for reducing microscratching of wafers  
A method includes providing at least one wafer having a process layer formed thereon for polishing. The process layer is polished using a first polishing process that is associated with a slurry...
6294145 Piranha etch preparation having long shelf life and method of making same  
A method of formulating a strong oxidizing solution comprising formulating a strong oxidizing solution having from about 2 to about 5 percent PDSA with concentrated sulfuric acid in the ratio of...
6258205 Endpoint detection method and apparatus which utilize an endpoint polishing layer of catalyst material  
An apparatus for planarizing a semiconductor wafer having a polishing endpoint layer that includes a catalyst material is disclosed. The apparatus is operable to detect the endpoint based upon the...
6254720 Wafer-processing apparatus  
A wafer-processing apparatus is provided which includes an container, a gas-supplying pipe, a pressure-leveling sensor, a controller, and an auto-cleaning device. The container is used for...
6238589 Methods for monitoring components in the TiW etching bath used in the fabrication of C4s  
Monitoring techniques have been developed for direct/indirect determination of metal etching bath components and for managing their replenishment. The disclosed methods have been successfully...
6218022 Resin etching solution and process for etching polyimide resins  
A resin etching solution containing a hydroxyalkylamine, an alkali metal compound and water, or an aliphatic alcohol, an aliphatic amine, an alkali metal compound and water, and a process for...
6210650 Process for regenerating hydrochloric acid from pickling plants  
In order to reduce pollutants in the waste gas of regeneration plants for spent hydrochloric acid from pickling plants a process is provided, comprising the thermal decomposition of iron chloride...
6210525 Apparatus and methods for chemical-mechanical polishing of semiconductor wafers  
An apparatus and method for polishing the surface of a semiconductor wafer is provided in which the polishing pad has on its surface a multiplicity of nanoasperities which are particles having an...
6207068 Silicon nitride etch bath system  
An improved silicon nitride etch bath system is provided. The improved etch bath system includes a silicon dioxide condensing system formed of a heat exchanger and a secondary filter. The heat...
6203659 Method and apparatus for controlling the quality of a photoresist stripper bath  
A photoresist stripper bath includes a filter in a re-circulation line for filtering residual photoresist materials from said bath. The quality of the stripper and the concentration of the...
6110839 Method of purifying alkaline solution and method of etching semiconductor wafers  
A method of purifying an alkaline solution includes dissolving metallic silicon and/or silicon compounds in the alkaline solution and non-ionizing metallic ions in the alkaline solution with...
6086779 Copper etching compositions and method for etching copper  
This invention relates to an aqueous etching composition for etching metallic copper comprising (a) an acid, (b) a copper complexing agent, (c) a metal capable of having a multiplicity of...
6066266 In-situ chemical-mechanical polishing slurry formulation for compensation of polish pad degradation  
A process for compensating for degradation of a first polishing pad during polishing on the first polishing pad of a plurality of substrate surfaces that have substantially similar film stacks is...
6045763 Process for working up ammoniacal metal solutions including treating the wash water with an organic extraction solution  
The invention relates to a process for working up charged aqueous solutions, more especially etching solutions, which contain ammonia, at least one ammonium salt and metal ions in dissolved form...
6039835 Etching apparatus and method of etching a substrate  
A etcher (10) has an inner chamber (22) that is in communication with a collection chamber (17). A cover (33) is made from a substrate (11) and an outer housing (34). The cover (33) is attached to...
6033989 Device for and method of concentrating chemical substances for semiconductor fabrication  
A device for concentrating chemical substances for use during the fabrication of a semiconductor device uses a sample container for holding chemical substances. A feed tube in gas flow...
6001216 Apparatus and methods for rerecirculating etching solution during semiconductor wafer processing  
Semiconductor wafer processing methods and apparatus recirculates etching solution from a lowermost point of a container hosting wafers through a filtration device and back to a point above the...
5985165 Process for the purification of aluminum hydroxide and process for the surface treatment of aluminum plate utilizing the purification process  
The present invention allows the reproduction of a crystalline aluminum hydroxide having a high particle strength and a high purity which can find wide application such as abrasive from a...
Matches 1 - 50 out of 307 1 2 3 4 5 6 7 >