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7632419 Apparatus and method for monitoring processing of a substrate  
Apparatus for in-situ monitoring of a process in a semiconductor wafer processing system consists of a process chamber having a dome, an enclosure disposed above the chamber, a process monitoring...
7618686 Method and apparatus for sequential plasma treatment  
An apparatus for plasma treatment of a non-conductive hollow substrate, including a plurality of ionization energy sources disposed adjacent to each other all along the part of the substrate to be...
7619179 Electrode for generating plasma and plasma processing apparatus using same  
In an electrode for generating a plasma, disposed to face a surface of a substrate to perform a plasma processing on the surface of the substrate, the electrode includes a metal-based composite...
7615259 Method and apparatus for processing workpiece  
The present invention is a processing method for applying predetermined processing to a workpiece with said workpiece mounted on a mounting stage arranged in a process chamber in a depressurized...
7601619 Method and apparatus for plasma processing  
A method and an apparatus for plasma processing which can accurately monitor an ion current applied to the surface of a sample. Predetermined gas is exhausted via an exhaust port by a...
7578946 Plasma processing system and plasma processing method  
An object of the present invention is to provide a plasma processing system and a plasma processing method which use inductive coupled plasmas but do not cause disadvantages due to slant electric...
7531102 Simultaneous selective polymer deposition and etch pitch doubling for sub 50nm line/space patterning  
First radicals and second radicals are simultaneous deposited into a space defined by two adjacent lines of photoresists and an underlying layer. A portion of the first radicals and the second...
7491344 Method for etching an object using a plasma and an object etched by a plasma  
Disclosed herein is a method for etching a face of an object and more particularly a method for etching a rear face of a silicon substrate. The object having a silicon face is positioned so as to...
7476328 Method of manufacturing printed circuit board  
A printed circuit board having prescribed conductive patterns formed on an insulating layer is provided about 20 mm apart from an AC electrode provided in a plasma etching device. An earth...
7465407 Plasma processing method and apparatus  
In a plasma processing method for supplying an electric power to a first electrode, making a first electrode have a ground potential, or making a first electrode have a floating potential while...
7439188 Reactor with heated and textured electrodes and surfaces  
A reactor for processing semiconductor wafers with electrodes and other surfaces that can be one of heated, textured and/or pre-coated in order to facilitate adherence of materials deposited...
7435687 Plasma processing method and plasma processing device  
The invention provides a plasma processing method and plasma processing device for manufacturing semiconductor devices in which the number of foreign particles being adhered to the wafer is reduced...
7416677 Exhaust assembly for plasma processing system and method  
An exhaust assembly is described for use in a plasma processing system, whereby secondary plasma is formed in the exhaust assembly between the processing space and chamber exhaust ports in order to...
7393460 Plasma processing method and plasma processing apparatus  
The plasma processing method comprises the step of removing an organic material film forming an upper layer relative to a patterned SiOCH series film by the processing with a plasma of a process...
7390751 Dry etching method and apparatus for performing dry etching  
A dry etching method includes loading a wafer on a lower electrode having at least two cooling paths. Cooling fluids having different temperatures are supplied to each of the cooling paths of the...
7335601 Method of processing an object and method of controlling processing apparatus to prevent contamination of the object  
A method of manufacture includes processing an object in a chamber and subsequently generating an electrical force of attraction to float contaminants off of a region adjacent the processed object...
7314574 Etching method and apparatus  
An etching apparatus comprises a workpiece holder ( 21 ) for holding a workpiece (X), a plasma generator ( 10, 20 ) for generating a plasma ( 30 ) in a vacuum chamber ( 3 ), an orifice electrode (...
7306829 RF plasma reactor having a distribution chamber with at least one grid  
A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of...
7291559 Etching method, gate etching method, and method of manufacturing semiconductor devices  
In a method of manufacturing a semiconductor device, a dummy sample and an actual device are prepared. The dummy sample and the actual device have substantially an identical layer and an identical...
7279429 Method to improve ignition in plasma etching or plasma deposition steps  
In one embodiment, the present invention relates to a method for increasing the ignition reliability of a plasma in a plasma reactor, the method comprising: supplying a source gas to the plasma...
7264850 Process for treating a substrate with a plasma  
A process for depositing a diamond-like carbon film, which comprises providing a means for generating a sheet-like beam-type plasma region inside a vacuum vessel for depositing the diamond-like...
7223446 Plasma CVD apparatus and dry cleaning method of the same  
In a parallel flat plate type plasma CVD apparatus, plasma damage of constituent parts in a reaction chamber due to irregularity of dry cleaning in the reaction chamber is reduced and the cost is...
7147793 Method of and apparatus for tailoring an etch profile  
An etch profile tailoring system ( 100 ), for use with an etching process carried out on a wafer ( 130 ), has a scavenging plate ( 170 ) with a baseline etch profile, and at least one etch profile...
7144521 High aspect ratio etch using modulation of RF powers of various frequencies  
A method for etching a high aspect ratio feature through a mask into a layer to be etched over a substrate is provided. The substrate is placed in a process chamber, which is able to provide RF...
7144520 Etching method and apparatus  
An etching apparatus comprises a workpiece holder ( 21 ) for holding a workpiece (X), a plasma generator ( 10, 20 ) for generating a plasma ( 30 ) in a vacuum chamber ( 3 ), an orifice electrode (...
7135412 Method to control a management system to control semiconductor manufacturing equipment  
In the control method in a management system of semiconductor manufacturing equipment to enhance a product yield through a control of etching process, information of a corresponding lot for the...
7122125 Controlled polymerization on plasma reactor wall  
An integrated etch process, for example as used for etching an anti-reflection layer and an underlying aluminum layer, in which the chamber wall polymerization is controlled by coating polymer onto...
7105100 System and method for gas distribution in a dry etch process  
A system and method for distributing gas to a substrate in a dry etch chamber make use of different flow channels to distribute the gas to different portions of a substrate. A first flow channel...
7093560 Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system  
A clamping ring configured to be coupled to a chamber structure of a plasma processing chamber is disclosed. The clamping ring has a plurality of holes for accommodating a plurality of fasteners....
7048869 Plasma processing apparatus and a plasma processing method  
In an oxide film etching process, a plasma having a suitable ratio of CF 3 , CF 2 , CF, F is necessary, and there is a problem in that the etching characteristic fluctuates with a temperature...
7029594 Plasma processing method  
A plasma processing method for providing plasma processing to an object to be processed disposed within a vacuum processing chamber in which a process gas feeding device feeds process gas into the...
7005032 Wafer table for local dry etching apparatus  
To resolve a problem that an etching rate profile is changed by a position of a nozzle relative to a semiconductor wafer and accordingly, at a vicinity of an outer edge of the semiconductor wafer,...
6972264 Method and apparatus for etching Si  
A method for dry-etching a Si substrate or a Si layer in a processing chamber includes the step of supplying an etching gas into the processing chamber, wherein the etching gas is a mixture gas...
6926011 Post etching treatment process for high density oxide etcher  
A three-step polymer removal process that reverses the conventional sequence in which polymer is removed. In the preferred embodiment of the present invention the polymer is first removed from the...
6921722 Coating, modification and etching of substrate surface with particle beam irradiation of the same  
There is provided a method of performing a surface treatment, such as coating, denaturation, modification and etching, on a surface of a substrate. The method comprises the steps of bringing a...
6902683 Plasma processing apparatus and plasma processing method  
A method of plasma-processing is provided which includes placing a sample on one of electrodes provided in a vacuum processing chamber and holding the sample onto the electrodes by an electrostatic...
6896775 High-power pulsed magnetically enhanced plasma processing  
Magnetically enhanced plasma processing methods and apparatus are described. A magnetically enhanced plasma processing apparatus according to the present invention includes an anode and a cathode...
6863835 Magnetic barrier for plasma in chamber exhaust  
A plasma chamber apparatus and method employing a magnet system to block the plasma within the chamber interior from reaching the exhaust pump. An exhaust channel between the chamber interior and...
6863784 Linear drive system for use in a plasma processing system  
A plasma processing system for processing a substrate is disclosed. The system includes a process component capable of effecting a plasma inside a process chamber. The system also includes a gear...
6852243 Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surface  
A confinement device for operative arrangement within a substrate etching chamber, having a lower surface of the device generally arranged over a substrate outer top surface such that a gap-spacing...
6852195 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment  
An apparatus for low-damage, anisotropic etching of substrates having the substrate mounted upon a mechanical support located within an ac or dc plasma reactor. The mechanical support is...
6838012 Methods for etching dielectric materials  
Methods of etching dielectric materials in a semiconductor processing apparatus use a thick silicon upper electrode that can be operated at high power levels for an extended service life.
6828246 Gas delivering device  
A gas delivering device inside a gaseous reaction chamber capable of increasing gas flow in areas having a deficient supply of gas by forming additional holes in corresponding positions. Because a...
6827870 Method and apparatus for etching and deposition using micro-plasmas  
Plasma etching or deposition is performed over substrates using spatially localized micro-plasmas operating in parallel with each other. A plasma generating electrode is positioned closely adjacent...
6822311 DC or AC electric field assisted anneal  
A method for forming a desired junction profile in a semiconductor device. At least one dopant is introduced into a semiconductor substrate. The at least one dopant is diffused in the semiconductor...
6815366 Method for etching organic insulating film and method for fabricating semiconductor device  
In the method for etching the organic insulating film in which the first RF power is applied to the electrode 12 with the object-to-be-processed having the organic insulating film mounted on and...
6814814 Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates  
In a method of cleaning process residues formed on surfaces in a substrate processing chamber, a sacrificial substrate comprising a sacrificial material is placed in the chamber, a sputtering gas...
6802942 Storage plate support for receiving disk-shaped storage plates  
To generate an especially good heat transfer between a seating face of a storage plate support and a storage plate, during coating with a sputter source in a vacuum installation, the seating face...
6796313 Methods of cleaning vaporization surfaces  
In one aspect, the invention encompasses a method of utilizing a vaporization surface as an electrode to form a plasma within a vapor forming device. In another aspect, the invention encompasses a...
6793834 Apparatus for and method of processing an object to be processed  
A magnetron reactive ion etching apparatus comprises: an electrode unit including electrodes facing each other through a semiconductor device; a high-frequency power source forming an electric...
Matches 1 - 50 out of 218 1 2 3 4 5 >