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7403832 |
Method and system for advanced process control including tool dependent machine constants
A controller and a method of controlling a process tool is provided, in which machine constants used for calibrating manipulated variables of the control algorithm are explicitly introduced into...
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7402527 |
Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
When etching is performed with respect to a silicon-containing material by using a dry etching apparatus having a dual power source, the application of bias power is initiated before oxidization...
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7402523 |
Etching method
A method for etching an insulation film through a patterned mask, includes the steps of etching the insulation film until just before an underlayer is about to be exposed by applying a plasma, and...
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7402261 |
Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions
A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an...
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7402257 |
Plasma state monitoring to control etching processes and across-wafer uniformity, and system for performing same
The present invention is generally directed to plasma state monitoring to control etching processes and across-wafer uniformity, and a system for performing same. In one illustrative embodiment,...
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7398591 |
Manufacturing method of a thin-film magnetic head
The present invention relates to a manufacturing method of a thin-film magnetic head whereby re-deposition and an overlapped part in a region of a magnetoresistive effect multi-layered structure...
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7396481 |
Etching method of organic insulating film
This invention relates to a method for etching an organic insulating film used in the production of semiconductor devices. A sample to be etched on which a low dielectric constant organic...
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7395595 |
Method for manufacturing P3 layer of a perpendicular magnetic write head
A method for forming a P 3 layer with NiFe and alumina mask using resist shrink process for use in perpendicular magnetic write heads. The method includes forming a laminated layer, forming an...
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7393788 |
Method and system for selectively etching a dielectric material relative to silicon
A method and system for selectively and uniformly etching a dielectric layer with respect to silicon and polysilicon in a dry plasma etching system are described. The etch chemistry comprises the...
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7393460 |
Plasma processing method and plasma processing apparatus
The plasma processing method comprises the step of removing an organic material film forming an upper layer relative to a patterned SiOCH series film by the processing with a plasma of a process...
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7392579 |
Method for protecting a slider mounted CPP GMR or TMR read head sensor from noise and ESD damage
A slider mounted CPP GMR or TMR read head sensor is protected from electrostatic discharge (ESD) damage and from noise and cross-talk from an adjacent write head by means of a balanced...
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7390753 |
In-situ plasma treatment of advanced resists in fine pattern definition
A novel, in-situ plasma treatment method for eliminating or reducing striations caused by standing waves in a photoresist mask, is disclosed. The method includes providing a photoresist mask on a...
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7389578 |
Manufacturing method of a perpendicular recording magnetic head
Embodiments in accordance with the present invention relate to methods wherein when a main pole is processed by using an ion milling technique, a re-adhesion layer created on the side face of the...
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7387743 |
Etching method and apparatus, computer program and computer readable storage medium
An etching method, for etching a silicon nitride film on an underlying silicon oxide film by using a hard mask whose principal component is a silicon oxide, includes a step of etching the hard mask...
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7384567 |
Method of manufacturing thin film magnetic head
Provided is a method of manufacturing a thin film magnetic head. In particular, a method of manufacturing a thin film magnetic head is provided in which a flow process of a photoresist is applied...
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7381653 |
Plasma processing method
A plasma processing method is conducted while a thickness of a resist film being monitored, thereby preventing the thickness of the resist film from being reduced. The plasma processing method...
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7381344 |
Method to reduce particle level for dry-etch
The invention teaches a multi-step method for shutting down the dry-etch process. The ICP rf power is reduced between each of these consecutive power-down steps of the dry-etch process, the...
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7378346 |
Integrated multi-wavelength Fabry-Perot filter and method of fabrication
A method is provided for forming a monolithically integrated optical filter, for example, a Fabry-Perot filter, over a substrate ( 10 ). The method comprises forming a first mirror ( 16 ) over the...
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7378028 |
Method for fabricating patterned magnetic recording media
A method of fabricating a patterned magnetic layer comprises sequential steps of: (a) providing a workpiece comprising a non-magnetic substrate, a layer of magnetic material overlying a surface of...
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7375947 |
Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output
In a plasma reactor having an electrostatic chuck, wafer voltage is determined from RF measurements at the bias input using previously determined constants based upon transmission line properties...
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7374696 |
Method and apparatus for removing a halogen-containing residue
The invention provides for a method and integrated system for removing a halogen-containing residue from a substrate comprising etching the substrate, heating the substrate and exposing the heated...
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7371485 |
Multi-step process for etching photomasks
Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic...
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7371332 |
Uniform etch system
Etching a layer over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is...
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7370405 |
Fabrication method of a high gradient-field recording head for perpendicular magnetic recording
A thin film magnetic head for perpendicular recording of a single-pole type has a flux enhanced part and a flux enhanced end arranged on a leading side of the main pole in parallel with the cross...
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7368393 |
Chemical oxide removal of plasma damaged SiCOH low k dielectrics
A method for removing damages of a dual damascene structure after plasma etching is disclosed. The method comprises the use of sublimation processes to deposit reactive material onto the damaged...
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7368062 |
Method and apparatus for a low parasitic capacitance butt-joined passive waveguide connected to an active structure
Undoped layers are introduced in the passive waveguide section of a butt-joined passive waveguide connected to an active structure. This reduces the parasitic capacitance of the structure.
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7367114 |
Method for plasma etching to manufacture electrical devices having circuit protection
Methods of manufacturing a variety of circuit protection devices are provided as well as devices so manufactured. In an embodiment, a surface mount electrical device having a substrate and a pair...
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RE40264 |
Multi-temperature processing
The present invention provides a technique, including a method and apparatus, for etching a substrate in the manufacture of a device. The apparatus includes a chamber and a substrate holder...
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7364665 |
Selective etching processes of SiO2 , Ti and In2 O3 thin films for FeRAM device applications
A method of selectively etching a three-layer structure consisting of SiO 2 , In 2 O 3 , and titanium, includes etching the SiO 2 , stopping at the titanium layer, using C 3 F 8 in a range of...
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7361607 |
Method for multi-layer resist plasma etch
A method for etching a multi-layer resist defined over a substrate in a plasma etch chamber is provided. The method initiates with introducing the substrate having a pattern defined on a first...
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7361287 |
Method for etching structures in an etching body by means of a plasma
A method is proposed for etching structures into an etching body, in particular, recesses which are laterally precisely defined by an etching mask, into a silicon body, using a plasma. In the...
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7360302 |
Manufacturing method of a magnetic sensor
A magnetic sensor comprises magnetoresistive elements and permanent magnet films, which are combined together to form GMR elements formed on a quartz substrate having a square shape, wherein the...
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7360301 |
Method of manufacturing a thin film magnetic head
The invention is directed to improvement of a write element of a thin film magnetic head. The first pole portion projects from a flat surface of a first yoke portion at a medium-facing surface side...
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7358192 |
Method and apparatus for in-situ film stack processing
Embodiments of a cluster tool, processing chamber and method for processing a film stack are provided. In one embodiment, a method for in-situ etching of silicon and metal layers of a film stack is...
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7357138 |
Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
A process for the removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance...
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7354695 |
Producing a substrate having high surface-area texturing
A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one...
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7354525 |
Specimen surface processing apparatus and surface processing method
For a surface processing apparatus using a plasma, a mixed gas of a fluorine-containing gas and an oxygen gas is used as an ashing gas. A mixed gas of an oxygen gas and a fluorine-containing gas is...
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7354520 |
Method of manufacturing optical element
An optical element comprising at least a plurality of pixels formed on a substrate and partition walls arranged respectively between adjacent pixels is manufactured by a method comprising steps of...
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H002212 |
Method and apparatus for producing an ion-ion plasma continuous in time
An ion-ion plasma source, that features a processing chamber containing a large concentration of halogen or halogen-based gases. A second chamber is coupled to the processing chamber and features...
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7347951 |
Method of manufacturing electronic device
A method of manufacturing an electronic device comprises forming a wiring material layer made of aluminum or an aluminum alloy on the surface of an insulating film on a substrate, patterning the...
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7344652 |
Plasma etching method
An etching method for forming a recess ( 220 ) having an opening dimension (R) of millimeter order in an object ( 212 ) to be etched such as a semiconductor wafer. A mask ( 214 ) having an opening...
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7343669 |
Method of manufacturing a thin film magnetic head
A manufacturing method of a thin film magnetic head is provided. In the manufacturing method of a thin film magnetic head, an inorganic insulating layer is formed along at least a sidewall surface...
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7343668 |
Method of manufacturing perpendicular magnetic recording head capable of highly precisely defining gap distance
A method of manufacturing a perpendicular magnetic recording head is provided. The method accurately defines a gap layer. The method includes forming a lower gap layer made of a non-magnetic...
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7343667 |
Methods of making a side-by-side read/write head with a self-aligned trailing shield structure
A side-by-side read/write head includes a self-aligned trailing shield, where a rear edge of the trailing shield is defined by the same lithography/etching process used to define a rear edge of a...
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7343666 |
Methods of making magnetic write heads with use of linewidth shrinkage techniques
In one illustrative example, a method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first...
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7341673 |
Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
A method in a plasma processing system of determining the temperature of a substrate. The method includes providing a substrate comprising a set of materials, wherein the substrate being configured...
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7338907 |
Selective etching processes of silicon nitride and indium oxide thin films for FeRAM device applications
A dry etch process is described for selectively etching silicon nitride from conductive oxide material for use in a semiconductor fabrication process. Adding an oxidant in the etch gas mixture...
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7338610 |
Etching method for manufacturing semiconductor device
A wafer having a dielectric layer and an electrode partially protruding from the top surface of the dielectric layer is provided. The dielectric layer is etched with a chemical solution such as...
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7335601 |
Method of processing an object and method of controlling processing apparatus to prevent contamination of the object
A method of manufacture includes processing an object in a chamber and subsequently generating an electrical force of attraction to float contaminants off of a region adjacent the processed object...
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7335315 |
Method and device for measuring wafer potential or temperature
The present invention attracts a wafer 6 , placed on a susceptor 5 , toward the susceptor 5 by the electrostatic attractive power of an electrostatic chuck electrode 7 , varies the output...
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