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7045052 |
Method of manufacturing a spectral filter for green and longer wavelengths
A method of manufacture for optical spectral filters with omnidirectional properties in the visible, near IR, mid IR and/or far IR (infrared) spectral ranges is based on the formation of large...
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7037843 |
Plasma etching method
To provide a plasma etching method that can suppress discharge of active gases that do not contribute to plasma etching into the atmosphere, a plasma etching apparatus 10 is composed of a vacuum...
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7033515 |
Method for manufacturing microstructure
A method is for manufacturing a microstructure having a thin-walled portion with use of a material substrate. The material substrate has a laminated structure which includes a first conductor layer...
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7033514 |
Method and apparatus for micromachining using a magnetic field and plasma etching
This invention relates to a method and apparatus for forming a micromachined device, where a workpiece is plasma etched to define a microstructure. The plasma etching is conducted in the presence...
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RE39064 |
Electronic device manufacturing apparatus and method for manufacturing electronic device
An electronic device manufacturing apparatus includes: a reaction chamber including a wall having a ground potential level; a reaction gas inlet for introducing a reaction gas into the reaction...
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7029594 |
Plasma processing method
A plasma processing method for providing plasma processing to an object to be processed disposed within a vacuum processing chamber in which a process gas feeding device feeds process gas into the...
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7029593 |
Method for controlling CD during an etch process
A method for controlling CD of etch process defines difference between designed dimension and etched dimension as dimensional displacement and defines target value of the dimensional displacement....
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7026252 |
Etching aftertreatment method
After etching a Si-containing low permittivity insulating film with chlorine based gas, the etched wafer is subjected to an etching aftertreatment process comprising introducing oxygen gas to a...
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7025895 |
Plasma processing apparatus and method
A plasma processing apparatus and method are capable of performing etching with high precision without damaging the semiconductor wafer. The plasma processing apparatus has a plasma generation...
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7025858 |
Apparatus for supporting wafer in semiconductor process
The present invention provides an apparatus for supporting a wafer in a semiconductor process. The apparatus includes an electrostatic chuck, a focus ring and a conductive material. The...
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7022245 |
Fabrication of a reflective spatial light modulator
Fabrication of a reflective spatial light modulator including a micro-mirror array. In one embodiment, the micro mirror array is fabricated from a substrate that is a single crystal material by...
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7018780 |
Methods for controlling and reducing profile variation in photoresist trimming
A method for controlling a removal of photoresist material from a semiconductor substrate is provided. The method includes providing the semiconductor substrate having a photoresist mask formed...
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7018554 |
Method to reduce stacking fault nucleation sites and reduce forward voltage drift in bipolar devices
A method is disclosed for preparing a substrate and epilayer for reducing stacking fault nucleation and reducing forward voltage (V f ) drift in silicon carbide-based bipolar devices. The method...
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7018553 |
Optical monitoring and control system and method for plasma reactors
A method of adjusting plasma processing of a substrate in a plasma reactor having an electrode assembly. The method includes the steps of positioning the substrate in the plasma reactor, creating a...
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7018552 |
Method of manufacturing electronic device
A method of manufacturing an electronic device comprises forming a wiring material layer made of aluminum or an aluminum alloy on the surface of an insulating film on a substrate, patterning the...
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7014958 |
Method for dry etching photomask material
A photomask is formed by depositing an opaque layer on a transparent substrate. A resist is formed on the opaque layer and selectively patterned to expose the portions of the opaque layer that are...
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7014788 |
Surface treatment method and equipment
A method for treating material surface utilizing atomic hydrogen. The method includes utilizing atomic hydrogen by mixing halogen and/or halide to a gas which is used for generating, atomic...
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7005032 |
Wafer table for local dry etching apparatus
To resolve a problem that an etching rate profile is changed by a position of a nozzle relative to a semiconductor wafer and accordingly, at a vicinity of an outer edge of the semiconductor wafer,...
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7001698 |
Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof
A chromium-containing half-tone phase-shift photomask comprising coarse and dense patterns coexisting in a plane is prepared by a series of pattern-forming steps including forming a resist layer on...
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7001529 |
Pre-endpoint techniques in photoresist etching
A method for controlling a photoresist etch step in a plasma processing chamber is disclosed. The photoresist etch step being configured to etch back a photoresist layer deposited on a substrate...
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6998221 |
Method for forming a via in a substrate
The present invention provides a method for forming a via (e.g., a trench, via or contact) in a substrate. The method, in one embodiment of the invention, includes patterning an opening 220 in a...
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6991739 |
Method of photoresist removal in the presence of a dielectric layer having a low k-value
A method of photoresist removal is described. A substrate is located in a processing chamber. A mixture of gases is excited, the mixture comprising a majority component of a reducing process gas...
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6989105 |
Detection of hardmask removal using a selective etch
A method of creating electrical shorts within an interconnection structure, using a selective etch, to detect a region that is missing a protective hardmask in order to prevent future use of the...
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6986851 |
Dry developing method
A dry developing method for drawing a resist formed on a processed body by leading processing gas between parallel flat electrodes installed in a vacuum processing container and forming the plasma...
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6984472 |
Exposure method and apparatus
An unwanted deposited film is removed from the surface of a photomask in which a desired pattern has been formed. Then, a resist film is exposed to extreme ultraviolet radiation through the...
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6982175 |
End point detection in time division multiplexed etch processes
An improved method for determining endpoint of a time division multiplexed process by monitoring an identified region of a spectral emission of the process at a characteristic process frequency....
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6982042 |
Ion bombardment of electrical lapping guides to decrease noise during lapping process
A method for reducing noise in a lapping guide. Selected portions of a Giant magnetoresistive device wafer are masked, thereby defining masked and unmasked regions of the wafer in which the...
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6981508 |
On-site cleaning gas generation for process chamber cleaning
Provided herein is a method for cleaning a process chamber for semiconductor and/or flat panel display manufacturing. This method comprises the steps of converting a non-cleaning feed gas to a...
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6979408 |
Method and apparatus for photomask fabrication
The invention provides methods and apparatuses for controlling critical dimension (CD) uniformity of a photomask by neutralizing CD variation associated with pattern density and process fluctuation.
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6972071 |
High-speed symmetrical plasma treatment system
A plasma treatment system ( 10 ) and related methods for rapidly treating a workpiece ( 56 ) with ions from a plasma having an ion density that is reproducibly uniform and symmetrical. The...
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6969470 |
Method for fabricating ESI device using smile and delayed LOCOS techniques
Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The...
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6967170 |
Methods of forming silicon nitride spacers, and methods of forming dielectric sidewall spacers
The invention includes a method of patterning a material over a semiconductive substrate, comprising: a) forming a layer of first material against a second material and over the substrate, the...
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6966997 |
Methods for patterning polymer films, and use of the methods
In a method for patterning a polymer film forming a coating on a material surface, a thin film of polymer is deposited on the surface and the patterning takes place by applying to the material...
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6964743 |
Inkjet printhead and manufacturing method thereof
An inkjet printhead and a manufacturing method thereof. The inkjet printhead includes a substrate, a substantially cylindrical ink chamber storing ink and formed in an upper portion of the...
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6962772 |
Method for manufacturing 3-D high aspect-ratio microneedle array device
A method for manufacturing a 3-D high aspect-ratio microneedle array device, comprising steps of: providing a substrate, with a photoresist layer coated thereon; performing photolithography on the...
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6962664 |
Controlled method for segmented electrode apparatus and method for plasma processing
An electrode assembly ( 50 ) and an associated plasma reactor system ( 10 ) and related methods for a variety of plasma processing applications. The electrode assembly provides control of a plasma...
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6960413 |
Multi-step process for etching photomasks
Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic...
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6960306 |
Low Cu percentages for reducing shorts in AlCu lines
In a method of fabricating a metallization structure during formation of a microelectronic device, the improvement of reducing metal shorts in blanket metal deposition layers later subjected to...
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6955991 |
Atmospheric process and system for controlled and rapid removal of polymers from high depth to width aspect ratio holes
A hot arc-type plasma generating system is described to etch a polymer on a substrate used in the manufacture of semiconductor devices. The etching process is particularly useful to remove a...
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6953753 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device having a movable unit includes a step of forming an SOI substrate that includes a semiconductor substrate, an insulating layer, and a semiconductor...
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6953531 |
Methods of etching silicon-oxide-containing materials
The invention encompasses a method of enhancing selectivity of etching silicon dioxide relative to one or more organic substances. A material comprising one or more elements selected from Group...
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6949204 |
Deformation reduction at the main chamber
A vacuum chamber with a cover with a first section, a second section, and a pocket between the first section and second section is provided. The vacuum chamber has a main cavity to which the first...
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6949203 |
System level in-situ integrated dielectric etch process particularly useful for copper dual damascene
An integrated in situ etch process performed in a multichamber substrate processing system having first and second etching chambers. In one embodiment the first chamber includes an interior surface...
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6949202 |
Apparatus and method for flow of process gas in an ultra-clean environment
Processes for the addition or removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the use of recirculation of...
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6942816 |
Methods of reducing photoresist distortion while etching in a plasma processing system
A method for substantially reducing photoresist wiggling while etching a layer on a substrate is provided. The substrate having thereon the layer disposed below a photoresist mask is introduced...
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6942813 |
Method of etching magnetic and ferroelectric materials using a pulsed bias source
A method for etching magnetic and ferroelectric materials using a pulsed substrate biasing technique (PSBT) that applies a plurality of processing cycles to the substrate, where each cycle...
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6942812 |
Method of manufacturing etalon
In producing an etalon, a thickness of an etalon base plate is measured, and the etalon base plate is placed in a process chamber. Then, a gas having a chemical reactivity with respect to a...
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6939796 |
System, method and apparatus for improved global dual-damascene planarization
A system and method for planarizing a patterned semiconductor substrate includes receiving a patterned semiconductor substrate. The patterned semiconductor substrate having a conductive...
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6939473 |
Method of making an X-Y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging
A method for making an angular velocity sensor having two masses which are laterally disposed in an X-Y plane and indirectly connected to a frame provided. The two masses are linked together by a...
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6936310 |
Plasma processing method
In a plasma processing method making use of a plasma processing gas of a reactant gas and an inert gas, it is aimed at enhancing an efficiency of use of high-frequency power and a reactant gas to...
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