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8999178 Method for fabricating emitter  
A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward...
8999183 Fabrication of conducting open nanoshells  
A method involving ion milling is demonstrated to fabricate open-nanoshell suspensions and open-nanoshell monolayer structures. Ion milling technology allows the open-nanoshell geometry and upward...
8984741 Differentiated liftoff process for ultra-shallow mask defined narrow trackwidth magnetic sensor  
A method for manufacturing a magnetic read sensor allows for the construction of a very narrow trackwidth sensor while avoiding problems related to mask liftoff and shadowing related process...
8945412 Substrate cleaning apparatus, substrate cleaning method, and substrate processing apparatus  
A substrate cleaning apparatus is capable of cleaning an entire periphery of a substrate end portion at a time by simple control without polishing the end portion and without generating plasma....
8914955 Method for manufacturing piezoelectric element and method for manufacturing liquid ejection head  
A method for manufacturing a piezoelectric element includes a process for forming a first conductive layer, a process for forming a piezoelectric layer having a region serving as an active region,...
8900470 Differential measurements for endpoint signal enhancement  
A method for etching a layer is provided. A substrate is provided in a chamber. An etch plasma for etching a layer on the substrate is generated. Light from a first region of the chamber is...
8893376 Method of forming a straight top main pole for PMR bevel writer  
A method of forming a magnetic recording head is provided. The method comprises the steps of forming a damascene trench comprising a lower region having a substantially trapezoidal cross-section...
8881378 Method to improve performance of a magneto-resistive (MR) sensor  
A method is described to improve performance of a magneto-resistive (MR) sensor under conditions of high areal density. The free layer is partially etched away, the removed material being replaced...
8884526 Coherent multiple side electromagnets  
In some embodiments, the present disclosure relates to a plasma processing system that generates a magnetic field having a maximum strength that is independent of workpiece size. The plasma...
8864959 Method for manufacturing workpieces with ion-etched surface  
Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of...
8845913 Ion radiation damage prediction method, ion radiation damage simulator, ion radiation apparatus and ion radiation method  
An ion radiation damage prediction method includes a parameter computation step of computing the incidence energy and incidence angle of an incident ion hitting a fabricated object, and a step of...
8819903 Manufacturing method of a piezoelectric element and a liquid ejecting head  
A manufacturing method of a piezoelectric element includes: forming a first conductive layer upon a substrate; forming a piezoelectric layer upon the first conductive layer; forming a second...
8815060 Method for minimizing magnetically dead interfacial layer during COC process  
A method for applying a protective layer to an electronic device such as the ABS of a slider, magnetic head, etc. for reducing paramagnetic deadlayer thickness includes selecting an etching angle...
8808557 Pattern forming method  
In one embodiment, a pattern forming method includes forming a physical guide that includes a first pattern in a first region and a second pattern in a second region on an underlying film,...
8808558 System and method for alignment of nanoparticles on substrate  
The invention provides a system and method for alignment of nanoparticles on a substrate. The system includes: a substrate; a plurality of polypeptide templates formed on the substrate; and a...
8801945 Write element, thermally assisted magnetic head slider, head gimbal assembly, hard disk drive with the same, and manufacturing method thereof  
A write element for a thermally assisted magnetic head slider includes an air bearing surface facing to a magnetic recording medium; a first magnetic pole, a second magnetic pole, and coils...
8801944 Method for manufacturing a magnetic write head using novel mask structure  
A method for manufacturing a magnetic write pole of a magnetic write head that achieves improved write pole definition reduced manufacturing cost and improves ease of photoresist mask re-work. The...
8793849 Method of manufacturing high frequency thickness shear mode gas and organic vapor sensors  
A method of fabricating a thickness shear mode (TSM) gas and organic vapor sensor having a visco-elastic polymer coating and a fundamental frequency greater than 20 MHz. The method begins by...
8771538 Plasma source design  
Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that...
8764952 Method for smoothing a solid surface  
In a method of irradiating a gas cluster ion beam on a solid surface and smoothing the solid surface, the angle formed between the solid surface and the gas cluster ion beam is chosen to be...
8764905 Cleaning organic residues from EUV optics and masks  
A method and system for cleaning lithography components including contacting a substrate having residue including organic compounds and graphitic carbon deposited on a surface thereof with...
8765496 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis  
Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a...
8764994 Method for fabricating emitter  
A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward...
8758637 Apparatus and method of removing coating of line-shaped body using plasma  
An apparatus of removing coatings of a line-shaped body of the invention includes a non-equilibrium atmospheric pressure plasma source with radicals controlled, having a plasma generating gas, a...
8734663 Purging of porogen from UV cure chamber  
A method for removing species from a substrate includes arranging a purge ring in a chamber proximate to a pedestal. The purge ring includes an inlet portion and an exhaust portion. The inlet...
8728286 Method of manufacturing sample for atom probe analysis by FIB and focused ion beam apparatus implementing the same  
A method of manufacturing a sample for an atom probe analysis of the invention is made one going through a step of manufacturing a concave/convex structure in both of a base needle and a...
8721907 Method and system for milling and imaging an object  
A system and a method for milling and inspecting an object. The method may include performing at least one iteration of a sequence that includes: milling, by a particle beam, a first surface of...
8715472 Substrate processing methods for reflectors  
A substrate processing method may include forming a plasma; extracting ions from the plasma and accelerating the ions to have uniform or substantially uniform directivity using a grid system;...
8709269 Method and system for imaging a cross section of a specimen  
A method and a system for obtaining an image of a cross section of a specimen, the method includes: milling the specimen so as to expose a cross section of the specimen, in which the cross section...
8691700 Gas cluster ion beam etch profile control using beam divergence  
A method of etching a substrate is described. In one embodiment, the method includes preparing a mask layer having a pattern formed therein on or above at least a portion of a substrate, etching a...
8691103 Surface profile adjustment using gas cluster ion beam processing  
A method of treating a workpiece is described. The method comprises computing correction data from metrology data related to a workpiece surface profile, adjusting the surface profile in...
8663491 ION etching of growing InP nanocrystals using microwave  
High quantum yield InP nanocrystals are used in the bio-technology, bio-medical, and photovoltaic, specifically IV, III-V and III-VI nanocrystal technological applications. InP nanocrystals...
8648316 Apparatus for cooling samples during ion beam preparation  
The invention relates to a cooling apparatus (101) for a sample in an ion beam etching process, including, a sample stage (102) for arranging the sample, a coolant receptacle (120) containing a...
8636911 Process for MEMS scanning mirror with mass remove from mirror backside  
Two methods of fabricating a MEMS scanning mirror having a tunable resonance frequency are described. The resonance frequency of the mirror is set to a particular value by mass removal from the...
8636913 Removing residues in magnetic head fabrication  
The present invention generally relates to a method of forming a magnetic head while ensuring residues do not negatively impact the magnetic head. In particular, when performing a RIE process to...
8632687 Method for electron beam induced etching of layers contaminated with gallium  
The invention relates to a method for electron beam induced etching of a layer contaminated with gallium, with the method steps of providing at least one first halogenated compound as an etching...
8628672 Process for manufacturing a perpendicular magnetic recording writer pole with nonmagnetic bevel  
A method for fabricating a magnetic recording transducer having a magnetic writer pole with a short effective throat height is provided. In an embodiment, a writer structure comprising a magnetic...
8621744 Method of manufacturing an inductor for a microelectronic device  
A method of manufacturing an inductor for a microelectronic device comprises providing a substrate (610), forming a first plurality of inductor windings (111, 211, 411, 620, 2030) over the...
8623230 Methods and systems for removing a material from a sample  
The present method relates to processes for the removal of a material from a sample by a gas chemical reaction activated by a charged particle beam. The method is a multiple step process wherein...
8615868 Method for manufacturing a magnetic sensor using two step ion milling  
A method for manufacturing a magnetic sensor that includes depositing a plurality of mask layers, then forming a stripe height defining mask over the sensor layers. A first ion milling is...
8607439 Method for providing an energy assisted magnetic recording (EAMR) head  
A method and system for providing an energy assisted magnetic recording (EAMR) head are described. The method and system include providing a slider, an EAMR transducer coupled with the slider, and...
8607438 Method for fabricating a read sensor for a read transducer  
A read sensor for a transducer is fabricated. The transducer has a field region and a sensor region corresponding to the sensor. A sensor stack is deposited. A hybrid mask including hard and field...
8580130 Laser-assisted nanomaterial deposition, nanomanufacturing, in situ monitoring and associated apparatus  
Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex...
8567041 Method of fabricating a heated quartz crystal resonator  
A heated resonator includes a base substrate, a piezoelectric piece having a thickness and a top side and a bottom side, a first electrode on the top side, a second electrode opposite the first...
8568602 Method of manufacturing a magnetic read sensor having a low resistance cap structure  
A method for manufacturing a magnetic sensor that decreases area resistance and decreases MR ratio of the sensor by eliminating any oxide formation in the capping layer of the sensor. The method...
8568605 Forming nanometer-sized patterns by electron microscopy  
A method for forming nanometer-sized patterns and pores in a membrane is described. The method comprises incorporating a reactive material onto the membrane, the reactive material being a material...
8557710 Gas cluster ion beam etching process for metal-containing materials  
A method and system for performing gas cluster ion beam (GCIB) etch processing of metal-containing material is described. In particular, the GCIB etch processing includes forming a GCIB that...
8551348 Magnetic recording medium and method of manufacturing the same  
A magnetic recording medium has magnetic patterns formed of a patterned ferromagnetic layer, and a non-magnetic layer including a component of the ferromagnetic layer and separating the magnetic...
8546264 Etching radical controlled gas chopped deep reactive ion etching  
A method for silicon micromachining techniques based on high aspect ratio reactive ion etching with gas chopping has been developed capable of producing essentially scallop-free, smooth, sidewall...
8545710 Ion radiation damage prediction method, ion radiation damage simulator, ion radiation apparatus and ion radiation method  
An ion radiation damage prediction method includes a parameter computation step of computing the collision position and the incidence angle of an incident ion hitting a fabricated object by...