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4662985 Method of smoothing out an irregular surface of an electronic device  
An photoresist deposited by sputtering or evaporation on an insulation layer to be smoothed out is etched by an ion beam applied at a first angle of ion bombardment which is smaller than an angle...
4657844 Plasma developable negative resist compositions for electron beam, X-ray and optical lithography  
A negative resist composition including a polymeric matrix material, a polymerizable monomer, and an onium salt radiation sensitive initiator. The monomer is polymerized by irradiating the resist...
4654119 Method for making submicron mask openings using sidewall and lift-off techniques  
A method is disclosed for making submicron openings in a substrate. A mesa is formed on the substrate by reactive ion etching techniques. A film is deposited over the entire structure and the mesa...
4643799 Method of dry etching  
A dry etching method according to the present invention is composed of the steps of evacuating the reaction chamber in which a substrate to be etched is set, introducing etching gas into the...
4642171 Phototreating apparatus  
A phototreating apparatus has a vacuum container for storing a solid material, a gas inlet for introducing a photoreactive gas into the container, and a light source for radiating into the...
4639301 Focused ion beam processing  
An apparatus is described which makes possible the precise sputter etching and imaging of insulating and other targets, using a finely focused beam of ions produced from a liquid metal ion source....
4620898 Ion beam sputter etching  
An ion beam etching process which forms extremely high aspect ratio surface microstructures using thin sputter masks is utilized in the fabrication of integrated circuits. A carbon rich sputter...
4619894 Solid-transformation thermal resist  
A negative resist and masking process for microfabrication comprising an evaporated film of aluminum and oxygen which, in the as-deposited state, is highly conductive and has low resistance to...
4617085 Process for removing organic material in a patterned manner from an organic film  
A method is provided for removing organic material from an organic film in a patterned manner using ultraviolet light at sufficient power density to effect the patterned ablative...
4614563 Process for producing multilayer conductor structure  
A process for producing a multilayer conductor structure having at least two conductor patterns in layers and a smooth surface over the upper pattern, which comprises the steps of: (1) forming a...
4613404 Materials which exhibit a surface active effect with vacuum baked photoresists and method of using the same  
A process for manufacturing a thin film magnetic head, the improvement wherein a metal, alloy or mixture thereof which improves the surface characteristics of a vacuum baked photoresist is...
4612099 Reactive ion etching method  
According to the present invention, there is used a usual reactive ion etching apparatus (as shown in FIG. 1) including a vacuum vessel (1), exhaust means (2), etching gas supply means (4), plasma...
4601782 Reactive ion etching process  
In a process for etching by reactive ion etching, a ceramic partially masked by an organic photoresist, an etch gas containing SF6, a noble gas and a small percentage of a carbon-containing gas is...
4599135 Thin film deposition  
In a thin film deposition apparatus, means for depositing a film on a substrate and means for etching the deposited film to make flat the surface thereof, are provided in a reaction vessel...
4597826 Method for forming patterns  
A method is disclosed of forming a fine pattern on a substrate, in which an etching mask pattern is formed on a layer of material of a pattern to be formed, an overlying layer is deposited on the...
4595601 Method of selectively forming an insulation layer  
An insulation layer is selectively formed by exposing the surface of a workpiece to an atmosphere comprising a mixture of a halogen-based gas and a raw gas containing a compoundable element...
4595484 Reactive ion etching apparatus  
Disclosed is a RIE apparatus wherein the anode (maintained at ground potential) is composed of a three-plate configuration and is disposed in parallel relationship with the cathode plate. The top...
4592801 Method of patterning thin film  
A method of patterning a thin film by dry etching is disclosed in which, in order for a thin alumina film to have a predetermined pattern, the thin alumina film is selectively removed by carrying...
4590093 Method of manufacturing a pattern of conductive material  
A method of providing narrow conductor tracks of metal silicide is provided. According to this technique, a pattern of polycrystalline silicon covered by a protective layer is converted along the...
4587184 Method for manufacturing accurate structures with a high aspect ratio and particularly for manufacturing X-ray absorber masks  
A method for manufacturing structures having dimensions in a range of 1 μm and below in a layer of material by applying an auxiliary layer consisting of metal or metal oxide on the layer to be...
4575180 Intrawaveguide fiber optic beamsplitter/coupler  
An intrawaveguide fiber optic beamsplitter/coupler and method is enclosed and claimed in which an oriented slot is formed in an intact optical fiber whereby the internal slot functions to divide...
4569124 Method for forming thin conducting lines by ion implantation and preferential etching  
A thin conducting line such as a gate pattern is defined on a semiconductor chip (10) by applying a narrow ion beam, suitably a focused-ion-beam (16) having a submicrometer thickness from a source...
4566889 Process of fabricating a portion of an optical fiber capable of reflecting predetermined wavelength bands of light  
The invention covers a process of forming gratings in optical fiber. The gratings are formed at depth wherein the evanescent waves of the optical fiber are encountered. The process permits the...
4564585 Process for fabricating negative pressure sliders  
A process for fabricating a negative pressure slider is disclosed which briefly comprises the steps of: (a) applying a dry negative photoresist layer to the surface of the slider; (b) positioning...
4552615 Process for forming a high density metallurgy system on a substrate and structure thereof  
A process for forming a top surface metallurgy pattern on a green unsintered ceramic substrate including the steps of forming indented lines on the surface of the substrate, sintering the...
4548883 Correction of lithographic masks  
A lithographic mask is corrected by ion beam removal of material at the location of a defect after the mask is initially formed. In the case of defects due to excess material (opaque defects), the...
4539222 Process for forming metal patterns wherein metal is deposited on a thermally depolymerizable polymer and selectively removed  
A process for forming a desired metal pattern on a substrate which comprises forming a mask of a thermally depolymerizable polymer on the substrate with a pattern of openings complementary to the...
4536252 Laser-induced production of nitrosyl fluoride for etching of semiconductor surfaces  
Nitrosyl fluoride is prepared by laser-induced method wherein the nitrosyl luoride is produced in situ or in close proximity to where it is used to etch semiconductor surfaces.A reaction mixture...
4523971 Programmable ion beam patterning system  
This ion beam system provides an ion beam pattern which is produced without the need for a mask. A programmable grid is used in combination with an ion beam source, where the apertures of the...
4518629 Process for positioning an electrical contact hole between two interconnection lines of an integrated circuit  
Process for positioning an electrical contact hole between a first and a second interconnection line of an integrated circuit. The first interconnection line is produced by depositing an...
4517066 Ion beam deposition or etching re rubber-metal adhesion  
Metal to rubber adhesion is improved by metal substrates having a coating thereon such as brass, copper, and the like. The coating is applied by an ion beam sputter deposition or, in the...
4514479 Method of making near infrared polarizers  
A method of producing near infrared polarizers is disclosed using holograc techniques. The interference pattern from two intersecting laser beams is used to produce a plane grating in a layer of...
4512847 Method of measuring the thickness of the removed layer in subtractive workpiece processing  
A test sample (7) of the same material, or with the same structure as the workpiece (5) exposed to subtractive processing is simultaneously exposed to such processing and consists of a wedge (10)...
4508070 Arrangement in the combustion chamber of an internal combustion engine  
In internal combustion engines with electric ignition being driven with petrol, at least part of the area of the combustion chamber and/or piston head is provided with a very fine surface...
4507331 Dry process for forming positive tone micro patterns  
A dry process for forming a positive tone micro pattern by coating a substrate with an organic polymer film then with a film of an oxygen etch barrier, selected from the group consisting of films...
4502916 Process for forming fine patterns  
Fine patterns are formed by a process wherein a workpiece is spin coated with a heat-resistant resin layer, this resin layer is spin coated with an organotitanium or titanium oxide layer, a resist...
4495220 Polyimide inter-metal dielectric process  
A technique for employing polyimide as an inter-metal dielectric layer, while avoiding the difficulties usually associated with this material. An upper layer of silicon dioxide is employed as a...
4482427 Process for forming via holes having sloped walls  
A dry process for forming via holes with sloped walls by oxygen reactive ion etching through a perforated mask.
4465768 Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate  
A radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer, or a...
4464459 Method of forming a pattern of metal elements  
A method of forming a pattern of metal elements arranged with very small gaps therebetween on a substrate in magnetic bubble memory devices, semiconductor devices, and the like. In this method,...
4464460 Process for making an imaged oxygen-reactive ion etch barrier  
A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.
4462881 Method of forming a multilayer thin film  
A method of forming a multilayer thin film is disclosed in which a second thin conductive film is deposited on a first thin conductive film uninterruptedly after the first thin film has been...
4454014 Etched article  
A method for fabricating a metallic pattern on a substrate is disclosed. The method consists of depositing an adhesive and/or plating base material on a substrate upon which a narrow...
4454221 Anisotropic wet etching of chalcogenide glass resists  
A method for enhancing linewidth control during the patterning of a substrate with a resist is disclosed. Resists used in the invention have chemically separated structures characterized by two...
4452665 Polymeric halocarbons as plasma etch barriers  
A polymeric halocarbon is used as an etch barrier for plasma etching in a process to make high resolution, high aspect ratio polymer patterns.
4450031 Ion shower apparatus  
An ion shower apparatus comprising a plasma formation chamber in which plasma is produced so as to produce ions, a single ion extraction grid disposed in one portion of the plasma formation...
4445751 Metal coated, tapered, optical fiber coupled to substrate and method of fabrication  
The invention comprises an optical interferometer system utilizing optical fibers. Titanium is diffused into the surface of lithium niobate substrate to form an optical waveguide utilized by the...
4439294 Reactive ion etching of soft-magnetic substrates  
A method of providing grooves in a body of a soft-magnetic, iron-containing material. The method includes reactive ion etching the body in a chlorine-containing or bromine-containing plasma after...
4436593 Self-aligned pole tips  
A method is disclosed for precisely aligning the pole tips of a thin film magnetic head. Two separate metallic layers, such as Permalloy (Ni-Fe alloy) are separated by a layer of insulating...
4432853 Method of making an ion beam sputter-etched ventricular catheter for hydrocephalus shunt  
The centricular catheter 10 of the present invention comprises a multiplicity of inlet microtubules 12. Each microtubule has both a large opening 16 at its inlet end and a multiplicity of...