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4973345 Surface treatments for optical fibre preforms  
Halide fibres are protected by coatings up to 2 μm thick of chalcogenide glasses, eg glasses based on compounds of S, Se or Te with Ge or As. The coatings are deposited on the fibre preform by ion...
4968585 Microfabricated cantilever stylus with integrated conical tip  
A cantilever stylus with an integrally formed conical tip is provided for atomic force microscopy AFM. The method for forming a stylus includes forming a circular masking pattern on the surface of...
4968552 Versatile reactive ion etch barriers from polyamic acid salts  
The present invention provides a novel approach to forming a RIE etch barrier in processes where thermally stable polymeric materials containing free carboxyl groups, such as polyamic acid...
4968382 Electronic devices  
In the production of micron-size pyramid emitters for field emission devices, very sharp emitter points are achieved by providing a layer of suitable metal, metal compound or semiconductor,...
4963225 Method of fabricating a contact device  
A contact element is formed on a sheet of dielectric material by depositing conductive material in an opening in a first layer of dielectric material, and depositing a second layer of dielectric...
4954215 Method for manufacture stress detector  
This invention relates to a method for manufacturing a highly reliable stress detector. Conventionally, a step of bonding and securing magnetic elements (4) to a driven shaft (1) receiving a...
4954216 Process of making thin film vector magnetometer  
A thin film vector magnetometer is configured to produce an output that varies linearly with the component of an externally applied magnetic field in the plane of a thin film chip portion thereof...
4948461 Dry-etching method and plasma  
An etching plasma containing a reactive fluorine-containing gas and atoms or ions of a heavy metal is particularly useful in a method of removing material from a substrate by reactive ion etching.
4940508 Apparatus and method for forming die sites in a high density electrical interconnecting structure  
The present invention is directed to a system for removing material from a structure. The system includes an excimer laser for removing material by ablative photodecomposition and means for...
4936968 Ion-beam machining method and apparatus  
In an ion-beam machining method and apparatus of effecting sputtering by deflecting a focused ion beam and scanning it on a material surface, the relationship between the diameter d of the beam on...
4925523 Enhancement of ultraviolet laser ablation and etching organic solids  
A method and apparatus are described which enhance the ablative effect of a UV laser. The ablative effect of a pulsed UV laser is enhanced using a second, longer wavelength pulsed laser. Each...
4919750 Etching metal films with complexing chloride plasma  
A method for dry etching metals that form low volatility chlordes, in which Z-Cl reaction products are controllably introduced into a conventional Cl-based plasma independent of the workpiece. The...
4919780 Method of making self-aligned apertures  
A method for fabricating exactly aligned apertures for use in electron and ion microscopy involves the placing of a very sharply pointed tip (1) in front of a set of extremely thin, precisely...
4912584 Method for fabricating magnetic recording poles  
The poles are suited for mounting on the side of a slider carrying a magnetic head. The method allows very narrow gaps between poles. In one embodiment of the invention, a magnetic pole is...
4878290 Method for making thin film magnetic head  
A method for making a thin film magnetic head in which the pole tips are trimmed to a predetermined width prior to the completion of the magnetic yoke structure. The thin film magnetic head is...
4877479 Method and apparatus for ion deposition and etching  
The disclosure relates to maskless deposition and etching and more particularly to maskless deposition and etching of the surface of objects using single and multiple ion sources.
4874947 Focused ion beam imaging and process control  
Ion beam machining apparatus which uses a focused ion beam to sputter particles from a target is disclosed. The beam is scanned over the target and photons emitted in response to the incidence of...
4874493 Method of deposition of metal into cavities on a substrate  
A process for filling cavities in a flat surface on a substrate by metal deposition which includes depositing a film of metal onto the flat surface and cavities in a substantially perpendicular...
4874460 Method and apparatus for modifying patterned film  
Apparatus for modifying a patterned film, composed of an ion source for producing an ion beam which is focused and caused to impinge upon a sample to microscopically machine a small region upon...
4871630 Mask using lithographic image size reduction  
Disclosed is a process for reducing lithographic image size for integrated circuit manufacture. A mask of photosensitive material having an opening of a minimum size dictated by the limits of...
4869714 Luminal surface fabrication for cardiovascular prostheses  
A method is provided for forming a mold surface with microscopic upstanding pillars for molding the inside surface of a vascular prostheses (synthetic blood vessel). The mold article is formed...
4867840 Method of making artifically textured layered catalyst  
A method for making a layered metal chalcogenide catalyst wherein the catalyst has a crystalline structure with increased edge sites produced by lithographic methods.
4857137 Process for surface treatment  
An ion beam is allowed to hit the surface of a target and the resulting forward scattered particle beam is then allowed to hit the surface of a workpiece, thereby etching or modifying the surface...
4856181 Method for manufacturing terminal contacts for thin-film magnetic heads  
Method for manufacturing terminal contacts for thin-film magnetic heads. The method of manufacturing reinforced terminal contacts for thin-film magnetic heads provides a photolithographic process...
4851097 Apparatus for repairing a pattern film  
The present invention relates to an apparatus for repairing a pattern film of a photomask, reticle, X-ray mask, semiconductor, etc. In the apparatus, a focused ion beam is applied to an excess...
4838994 Method for structuring a copper and/or permalloy layer by means of dry etching  
A copper and/or permalloy layer is structured by means of dry etching. A layer of tantalum is applied as a mask to a layer to be structured, and a photoresist layer is applied to the tantalum...
4836882 Method of making an acceleration hardened resonator  
An acceleration hardened resonator is made by a method including the steps f:(A) manufacturing and mounting the resonator,(B) performing acceleration tests to determine the acceleration...
4832997 Production of asymmetrical microporous membranes by double irradiation and asymmetrical membranes  
Process for the production of asymmetrical microporous membranes by double irradiation.A membrane (5) is exposed to two irradiations, whereof one has an inadequate energy level to pass through the...
4830706 Method of making sloped vias  
Sloped vias are formed in a resinous layer made from a material which is curable in stages, which can be coated on a substrate prior to partial curing, which adheres to the substrate and which...
4824522 Fabrication of polydiacetylene waveguides  
Novel optical waveguides and methods for their fabrication are provided. The waveguides are made from polydiacetylene materials. The waveguides are made by a bilayer process wherein a film made...
4810601 Top imaged resists  
The present invention is concerned with methods of converting a single resist layer into a multilayered resist.The upper portion of the single resist layer can be converted into a dry-etch...
4808511 Vapor phase photoresist silylation process  
A process for improved vapor phase silylation of photoresist is disclosed. The process uses silylation materials which either produce a strong base such as dimethylamine upon reaction with a...
4805683 Method for producing a plurality of layers of metallurgy  
A method for selectively depositing a plurality of metal layers on a substrate. The method includes the steps of depositing at least one layer of blanket metal on a surface of a substrate,...
4803095 Chemical vapor reaction process by virtue of uniform irradiation  
An improved chemical vapor reaction system is described. The system is characterized by its light source which radiates ultraviolet light to a substrate to be processed. Before the light source,...
4778562 Reactive ion etching of tin oxide films using neutral reactant gas containing hydrogen  
High resolution patterns can be etched in tin oxide films in one step using reactive ion etching when the reactant gas consists substantially of nitrogen and/or argon and from small but effective...
4772539 High resolution E-beam lithographic technique  
A method of reproducing sub-micron images in a first imaging layer. A second imaging layer is deposited on an etch-stop film formed on the first layer, and the second imaging layer is exposed to...
4758304 Method and apparatus for ion etching and deposition  
The disclosure relates to a method and apparatus using ion etching and ion assisted deposition to reform a surface of an object, such as a large lens, from its existing topography to a...
4741800 Etching method for the manufacture of a semiconductor integrated circuit  
A dry etching method for use in the manufacture of a semiconductor integrated circuit using an etching apparatus which is provided with an exciting chamber into which a reactive gas is introduced...
4740700 Thermally insulative and electrically conductive interconnect and process for making same  
A pyroelectric focal plane array useful for thermal imaging applications comprises a detector (10), comprises a reticulated and aluminized pyroelectric chip (12) interfaced with a signal processor...
4731157 Process for the production of a magnetic head for perpendicular recording  
In a magnetic material film is etched a first wide, closed channel leaving intact an elongated central portion having a rectilinear axis. A coil is formed in the channel and surrounds the central...
4718974 Photoresist stripping apparatus using microwave pumped ultraviolet lamp  
Apparatus and method for removing organic polymers, such as photoresist, from the surface of an object, such as a semiconductor wafer. The apparatus comprises a microwave energy source and a...
4714516 Method to produce via holes in polymer dielectrics for multiple electronic circuit chip packaging  
A method for producing holes in a polymer film includes the steps of irradiating a spot on the film with a burst of focused laser energy at a level sufficient to damage the film without puncturing...
4701366 Micro-porous superlattice material having zeolite-like properties  
A high surface area substrate with controlled pore size and slot geometry is made by depositing at least two materials in alternating layers. The film is then broken up and one of the materials is...
4699689 Method and apparatus for dry processing of substrates  
A method is provided for removing photoresist from a substrate, wherein the method comprises producing a gas plasma from a gas mixture comprising oxygen, CF4, nitrogen, and hydrogen; substantially...
4698238 Pattern-forming method  
A pattern is formed by providing a reaction field in which a photo-induced reaction proceeds when a substrate is irradiated with light so as to form a pattern on the substrate, and setting, in the...
4690838 Process for enhancing the resistance of a resist image to reactive ion etching and to thermal flow  
The reactive ion etching and thermal flow resistance of a resist image is enhanced by contacting the resist image with an alkyl metal compound of magnesium or aluminum.
4685014 Production method of thin film magnetic head  
In producing a magnetic head by thin film technique, a magnetic film is formed on an insulating member covering coil conductor films after the surface of the insulating member is flattened. After...
4684437 Selective metal etching in metal/polymer structures  
A differential material removal process wherein a selected material can be rapidly removed without adverse impact to surrounding layers of different materials. Ultraviolet radiation is used to...
4675072 Trench etch endpoint detection by LIF  
Laser induced fluorescence is utilized to detect and control the reactive ion etch-through of a given layer in a wafer by detecting a large change in the concentration of a selected minor species...
4666554 Method of manufacturing a sensor having a magnetic field sensitive element  
A sensor suitable for measuring magnetic field gradients spanning very small regions has a magnetic field-sensitive element (37, 42) with a very accurately defined height and thickness (even into...