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6209193 Method of making read sensor with self-aligned low resistance leads  
A method makes a magnetic head at first, second, third, fourth and fifth regions on a substrate including forming a read sensor material layer in all regions, forming a first capping layer on the...
6199267 Method for the production of a magnetic head  
A method for the production of a magnetic head, where first a lower magnetic pole is formed on a wafer. Next, a nonmagnetic write gap layer is formed on the lower magnetic pole. A coil is then...
6183566 UV/halogen metals removal process  
A chlorine based dry-cleaning system appropriate for removing metal contaminants from the surface of substrate is described in which the metal contaminant is chlorinated and reduced to a volatile...
6180421 Method and apparatus for manufacturing magnetic head  
A magnetic head manufacturing method including the steps of forming a recording lower magnetic pole and a recording upper magnetic pole on a substrate and trimming, by the ion milling method, a...
6177147 Process and apparatus for treating a substrate  
To produce a desirable amount of desirable radical and/or ion in treating a substrate such as etching the substrate, depositing a thin film on the substrate and the like by using plasma and the...
6162735 In-situ method for preparing and highlighting of defects for failure analysis  
In accordance with the present invention, a method for inspecting a semiconductor sample for failures includes the steps of determining a target area for observation on the semiconductor sample,...
6143191 Method for etch fabrication of iridium-based electrode structures  
A method of forming an iridium-based electrode structure on a substrate, from an iridium-containing precursor thereof which is decomposed to deposit iridium on the substrate. The iridium-based...
6136210 Photoetching of acoustic lenses for acoustic ink printing  
A method of fabricating a lens comprising providing a photosoluble substrate having opposed first and second surfaces; exposing one of the surfaces of the substrate to a photoactive etchant; and...
6124211 Cleaning method  
A method for removing native oxides and other contaminants from a wafer surface while minimizing the loss of a desired film on the wafer surface. The method is carried out in a hermetically sealed...
6117344 Method for manufacturing low work function surfaces  
Methods for fabricating nano-structured surfaces having geometries in which the passage of elementary particles through a potential barrier is enhanced are described. The methods use combinations...
6107207 Procedure for generating information for producing a pattern defined by design information  
A method for generating information for producing a pattern, defined by design information on a medium, using at least one direct-writing pattern generating process, which first provides the...
6098637 In situ cleaning of the surface inside a vacuum processing chamber  
The invention provides generally a method and an apparatus for in situ cleaning of a surface in a semiconductor substrate processing chamber which operates quickly and reduces the downtime for...
6099698 Magnetic disc and method of manufacturing same  
It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably...
6093445 Microscopic element manufacturing method and equipment for carrying out the same  
A mask with a microscopic pin-hole having a circular configuration with a diameter of 1 nm to 10 μm or a rectangular configuration with a side of 1 nm to 10 μm is arranged opposite to a substrate....
6086774 Method of making released micromachined structures by directional etching  
A method of making released structures by using at least two directional etching steps. Cantilevers, bridges and many other structures can be made with the present invention. In a preferred...
6083841 Method of etching gallium-nitride based compound semiconductor layer and method of manufacturing semiconductor light emitting device utilizing the same  
A GaN-based compound semiconductor layer is formed on a substrate. An etch mask of a Ti film is formed on a surface of said gallium-nitride based compound semiconductor. The gallium-nitride based...
6074569 Stripping method for photoresist used as mask in Ch4 /H2 based reactive ion etching (RIE) of compound semiconductors  
A method for stripping photoresist used as an etch mask in carbon based reactive ion etching includes flood exposing a patterned photoresist with a light and cyclically exposing the photoresist...
6061897 Fabrication of rail of magnetic head slider  
A first resist mask is formed on a rail, covering an area where none of a shallow surface and a deep surface are formed. A first etching process is performed to etch the rail not covered with the...
6056887 Process for fabricating a feeler member for a micromechanical probe, in particular for an atomic force microscope  
A process for fabricating a feeler member for a micromechanical probe, in particular for an atomic force microscope, consists in creating a "positive" first mold by isotropically or...
6048671 Ultra-fine microfabrication method using an energy beam  
An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine...
6048588 Method for enhancing chemisorption of material  
An apparatus and method for selectively removing undesired material from the surface of a substrate provides a flow of inert gas over the undesired material substrate surface while irradiating the...
6042736 Method for preparing samples for microscopic examination  
The present invention provides a method for preparing samples for microscopic examination that requires a glass slide to be laminated to a sample substrate by an adhesive layer for polishing in a...
6033484 Method and apparatus for cleaning contaminated surfaces using energetic cluster beams  
A method for cleaning contaminated surfaces, especially semiconductor wafers, using energetic cluster beams is disclosed. In this system, charged beams consisting of microdroplets or clusters...
6030514 Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor  
A target for sputtering is subjected to a surface treatment process and special packaging after target manufacture for improved sputtering performance and process and yield by reducing...
6024884 Method for creating microstructures  
Microstructures are ion milled in an existing layer by a process including forming a metal mask then milling in the presence of a reactive gas which combines with the metal to form a surface that...
6024886 Planarizing method for fabricating an inductive magnetic write head for high density magnetic recording  
Within a method for forming a magnetic transducer head there is first provided a substrate having formed thereover a lower magnetic pole layer in turn having formed thereupon a gap filling layer...
6015503 Method and apparatus for surface conditioning  
Apparatus and process for conditioning a generally planar substrate, contained in a chamber isolatable from the ambient environment and fed with a conditioning gas which includes a reactive gas....
6015759 Surface modification of semiconductors using electromagnetic radiation  
Deposition rates of undoped silicate glass dielectric layers on thermal oxide are increased by pre-treating the thermal oxide layer with electromagnetic radiation in the ultraviolet (UV) and/or...
5998297 Method of etching copper or copper-doped aluminum  
An embodiment of the instant invention is a method of etching a conductive structure comprised of copper and overlying a semiconductor substrate, the method comprising the step of: subjecting the...
5981001 Processing method for selectively irradiating a surface in presence of a reactive gas to cause etching  
A processing method comprises: a first step of depositing on a substrate which is a specimen a film of any one of a semiconductor, a metal and an insulator; a second step of subjecting the surface...
5935454 Ultrafine fabrication method  
A method of fabricating nanometric structures on a substrate by dry etching includes setting the substrate at a temperature at which condensation of etching gas products of etching gas decomposed,...
5925261 Method for fabricating a taper on a recording head slider  
A method of forming a leading edge taper in a selected area on the bearing surface of a disc head slider includes directing an etching beam toward the bearing surface, with a first portion of the...
5922219 UV/halogen treatment for dry oxide etching  
The uniformity of SiO2 etching over the surface area of a substrate using a conventional SiO2 etching reaction, such as a HF/ROH reaction where R is H or alkyl, is improved when the substrate is...
5910235 Etching and pipelined texturing of a substrate in a stationary vacuum deposition machine  
A stationary vacuum deposition machine is used in a method for controlling the height of bumps formed in annular regions of substrates; the substrates are transported to the machine in a first...
5906950 Selective etch process  
Disclosed is an etch process wherein hydrogen monoiodide (HI) ions are employed to bombard a patterned film, thereby creating geometric features in the patterned film with substantially...
5897378 Method of monitoring deposit in chamber, method of plasma processing, method of dry-cleaning chamber, and semiconductor manufacturing apparatus  
In the process of dry etching or the like, the bond between specific atoms contained in a deposit attached on the interior wall of a chamber and composed of an etching by-product is monitored by...
5891806 Proximity-type microlithography apparatus and method  
Apparatus and methods are disclosed for increasing the illuminance at a mask used for proximity-type microlithography and for achieving increases in throughput. A mask defining a pattern is...
5874010 Pole trimming technique for high data rate thin film heads  
A method for trimming a pole used in a read-write head comprises the step of depositing a metallic layer on a layer of pole material, patterning the metallic layer so that it can serve as a mask,...
5868952 Fabrication method with energy beam  
Three-dimensional ultra-fine micro-fabricated structures of the order of μm and less are produced for use in advanced optical communication systems and quantum effect devices. The basic components...
5861103 Etching method and apparatus  
Each of a pair of electrodes is provided in high-frequency power supply. A sample placed on the one of electrodes is etched by RIE (reactive ion etching) method. At the time, the power supply...
5846442 Controlled diffusion partial etching  
A single stage expose/etch partial etching process fabricates at least two areas of differing remaining thicknesses in a substrate. The process comprises (a) applying a resist mask to the...
5840201 Method for forming spacers in flat panel displays using photo-etching  
Photoetchable glass is used to form spacer elements for large area field emission displays. Frit dots are placed onto a substrate. A sheet of photo etchable glass is exposed to UV light using a...
5840203 In-situ bake step in plasma ash process to prevent corrosion  
The present invention describes a modified dry etching, or plasma ashing, method for removing photoresist residue which avoids corrosion of metal electrodes. The wafers are placed in a batch type...
5830376 Topographical selective patterns  
A maskless process generates a patterned coating on a polymeric substrate, wherein the pattern is at least partially defined by the substrate topography. The process uses a high intensity/high...
5814238 Method for dry etching of transition metals  
A method for dry etching of transition metals. The method for dry etching of a transition metal (or a transition metal alloy such as a silicide) on a substrate comprises providing at least one...
5786242 Method of manufacturing SOI semiconductor integrated circuit  
It is intended to provide a method for forming a semiconductor integrated circuit using single crystal silicon on an inexpensive substrate such as glass. An insulating layer mainly made of silicon...
5783371 Process for manufacturing optical data storage disk stamper  
A process for manufacturing an optical data storage disk stamper includes the steps of providing an amorphous electroless nickel substrate including phosphorous in the amount in a range of about 5...
5770721 Method of manufacturing a matrix for the detection of mismatches  
This method for preparing micromatrices consists in applying a specially-patterned intermediate layer of laser-absorbing substance on a solid support. The configuration of the sublayer fully...
5766497 Ablation pattering of multilayered structures  
A process for ablation etching through one or more layers of dielectric materials while not etching an underlying conductive material layer comprises selecting parameters whereby the ablation...
5759423 Electron beam writing method and apparatus for carrying out the same  
An electron beam writing apparatus comprises: an electron beam source for projecting an electron beam; a first mask provided with a first rectangular aperture for passing the electron beam...