|
Match
|
Document |
Document Title |
|
|
7635649 |
Method for manufacturing semiconductor device
A method for manufacturing a semiconductor device is provided. The method includes forming a polysilicon layer on a semiconductor substrate, forming an anti-reflection coating on the polysilicon...
|
|
|
7615482 |
Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength
Disclosed is a structure and method for forming a structure including a SiCOH layer having increased mechanical strength. The structure includes a substrate having a layer of dielectric or...
|
|
|
7597816 |
Wafer bevel polymer removal
A method of forming a semiconductor device is provided. A wafer with a dielectric layer disposed under a photoresist mask is placed in an etch chamber. The dielectric layer is etched. The wafer is...
|
|
|
7591955 |
Method for forming an etched soft edge metal foil and the product thereof
A metal processing method includes etching to remove material from a thin metal part. A pattern of etch resistant material is used to prevent etching of the metal in desired locations. The etch...
|
|
|
7585423 |
Liquid discharge head and producing method therefor
A liquid discharge head includes, on a same substrate, pressure generating chambers, nozzle apertures communicating with the pressure generating chambers through nozzle communicating pans, and a...
|
|
|
7582218 |
Method for merging sensor field-mill and electronic lapping guide material placement for a partial mill process and sensor formed according to the method
A method for merging sensor field-mill and electronic lapping guide material placement for a partial mill process and sensor formed according to the method is disclosed. An electronic lapping guide...
|
|
|
7560039 |
Methods of deep reactive ion etching
A method of substantially simultaneously forming at least two fluid supply slots through a thickness of semiconductor substrate from a first surface to a second surface thereof. The method includes...
|
|
|
7540968 |
Micro movable device and method of making the same using wet etching
A micro movable device includes a base substrate, a fixed portion bonded to the base substrate, a movable portion having a fixed end connected to the fixed portion and extending along the base...
|
|
|
7524428 |
Display device and method of manufacturing transparent substrate for display device
A display device comprises a substrate and a laminate structure formed on the substrate and comprising a plurality of layers including a display region. The laminate structure has a...
|
|
|
7523549 |
Dimensionally stabilized flexible circuit fabrication method and product
A method of fabricating a flexible circuit interconnect comprising a conductive pattern on a flexible substrate comprising layers of different components having different coefficients of thermal...
|
|
|
7517466 |
Method for manufacturing porous structure and method for forming pattern
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer...
|
|
|
7502605 |
Sub-millimeter wavelength camera
The invention relates to an imaging device to be used with millimeter and/or sub-millimeter radiation comprising at least a pair of substrates, at least one of which is patterned on at least one...
|
|
|
7485236 |
Interference display cell and fabrication method thereof
An optical interference display unit with a first electrode, a second electrode and support structures located between the two electrodes is provided. The second electrode has at least a first...
|
|
|
7481942 |
Monolithic ink-jet printhead and method of manufacturing the same
An ink-jet printhead and a method of manufacturing the same include a substrate on which a heater and a passivation layer protecting the heater are formed, a passage plate on which an ink chamber...
|
|
|
7473377 |
Plasma processing method
A plasma processing method includes a step of preparing a process subject having an organic layer on a surface thereof, and a step of irradiating the process subject with H 2 plasma to improve...
|
|
|
7427477 |
Method of activating a silicon surface for subsequent patterning of molecules onto said surface
The present invention relates to a method of activating a silicon surface for subsequent patterning of molecules onto said surface, and to patterns produced by this method, and further to uses of...
|
|
|
7427360 |
Process and ink for making electronic devices
A process for making an electronic device comprising a dielectric substrate laminated with an electrically conductive metal or alloy which comprises applying a non-aqueous etch-resistant ink by ink...
|
|
|
7405161 |
Method for fabricating a semiconductor device
Method for fabricating a semiconductor device in which a by-product of etching is deposited on a photoresist film for using as a mask. The method for fabricating a semiconductor device includes the...
|
|
|
7396475 |
Method of forming stepped structures employing imprint lithography
The present invention provides a method for forming a stepped structure on a substrate that features transferring, into the substrate, an inverse shape of the stepped structure disposed on the...
|
|
|
7393795 |
Methods for post-etch deposition of a dielectric film
Methods for post-etch deposition on a dielectric film are provided in the present invention. In one embodiment, the method includes providing a substrate having a low-k dielectric layer disposed...
|
|
|
7378028 |
Method for fabricating patterned magnetic recording media
A method of fabricating a patterned magnetic layer comprises sequential steps of: (a) providing a workpiece comprising a non-magnetic substrate, a layer of magnetic material overlying a surface of...
|
|
|
7357877 |
Dispersion of nanowires of semiconductor material
A method of manufacturing nanowires ( 104 ) is provided, according to which method the nanowires are prepared by anodic etching a semiconductor substrate ( 10 ) with an alternating current density,...
|
|
|
7354525 |
Specimen surface processing apparatus and surface processing method
For a surface processing apparatus using a plasma, a mixed gas of a fluorine-containing gas and an oxygen gas is used as an ashing gas. A mixed gas of an oxygen gas and a fluorine-containing gas is...
|
|
|
7338614 |
Vapor HF etch process mask and method
A method of processing a semiconductor wafer provides a wafer, and then forms an organic mask on at least a portion of the wafer. The method then applies a vapor etching process to the wafer...
|
|
|
7335980 |
Hardmask for reliability of silicon based dielectrics
The present invention provides a hardmask that is located on a surface of a low k dielectric material having at least one conductive feature embedded therein. The hardmask includes a lower region...
|
|
|
7316784 |
Method of patterning transparent conductive film, thin film transistor substrate using the same and fabricating method thereof
A method of patterning a transparent conductive film adaptive for selectively etching a transparent conductive film without any mask processes, a thin film transistor for a display device using the...
|
|
|
7311850 |
Method of forming patterned thin film and method of fabricating micro device
In a method of forming a patterned thin film, first, an etching stopper film and a film to be patterned are formed in this order on a base layer. Next, a patterned first film is formed on the film...
|
|
|
7306742 |
Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template
A template 1 is brought close to or in contact with a surface to be patterned 111 and patterns are formed with liquid 62 on the surface 111 . This method comprises the steps of: bringing the...
|
|
|
7303689 |
Method of manufacturing a nozzle assembly
A method of manufacturing a nozzle assembly, the method comprising the steps of depositing a first dielectric layer 18 on a substrate 16 , depositing a first metal layer 102 at least partially...
|
|
|
7297635 |
Processing method
A processing method which, when an organic film layer such as a PR film layer 202 formed on the surface of a wafer W is to be removed from an SiO 2 film layer 204 below it by generating plasma...
|
|
|
RE39913 |
Method to control gate CD
The invention is a process for reducing variations in CD from wafer to wafer. It begins by increasing all line widths in the original pattern data file by a fixed amount that is sufficient to...
|
|
|
7291517 |
Method for removing resin mask layer and method for manufacturing solder bumped substrate
Using a dry film resist that is a photosensitive resin, a resin mask layer is formed around electrodes on a substrate. A solder precipitating composition is applied on the substrate, and this...
|
|
|
7270761 |
Fluorine free integrated process for etching aluminum including chamber dry clean
A fluorine-free integrated process for plasma etching aluminum lines in an integrated circuit structure including an overlying anti-reflection coating (ARC) and a dielectric layer underlying the...
|
|
|
7262068 |
Microneedle array module and method of fabricating the same
A microneedle array module is disclosed comprising a multiplicity of microneedles affixed to and protruding outwardly from a front surface of a substrate to form the array, each microneedle of the...
|
|
|
7258808 |
High-power ball grid array package, heat spreader used in the BGA package and method for manufacturing the same
A high-power BGA includes a printed circuit board with a through hole, connection pads formed on the bottom of the printed circuit board, matrix solder balls surrounding the through hole and...
|
|
|
7255804 |
Process for making photonic crystal circuits using an electron beam and ultraviolet lithography combination
A process for making photonic crystal circuit and a photonic crystal circuit consisting of regularly-distributed holes in a high index dielectric material, and controllably-placed defects within...
|
|
|
7247247 |
Selective etching method
A selective etching method with lateral protection function is provided. The steps includes: (a) providing a substrate; (b) forming a plurality of tunnels; (c) forming a lateral strengthening...
|
|
|
7244368 |
Manufacturing process of a magnetic head, magnetic head, pattern formation method
A manufacturing method of a magnetic head includes a process for forming a lift-off mask pattern on a magnetoresistance effect element, such that the upper part of the lift-off mask pattern is...
|
|
|
7238292 |
Method of fabricating a write element with a reduced yoke length
A head including a write element for writing data to a magnetic media, and methods for its production are provided. A write element of the invention includes one or more of a recessed first pole, a...
|
|
|
7238293 |
Slotted substrate and method of making
The described embodiments relate to a slotted substrate and methods of forming same. One exemplary method patterns a hardmask on a first substrate surface sufficient to expose a first area of the...
|
|
|
7229564 |
Method for manufacturing bipolar plate and direct methanol fuel cell
A DMFC (direct methanol fuel cell) includes two bipolar plates, a membrane electrode assembly, a bonding layer, and a fuel container base. The bipolar plate is a releasable substrate that includes...
|
|
|
7195715 |
Method for manufacturing quartz oscillator
A method for manufacturing quartz oscillators is provided which permits quartz oscillators having an oscillation frequency, as designed, to be obtained with small variation of individual...
|
|
|
7189435 |
Nanofabrication
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is...
|
|
|
7169440 |
Method for removing photoresist and etch residues
A method is provided for plasma ashing to remove photoresist remnants and etch residues that are formed during preceding plasma etching of dielectric layers. The ashing method uses a two-step...
|
|
|
7132054 |
Method to fabricate hollow microneedle arrays
An inexpensive and rapid method for fabricating arrays of hollow microneedles uses a photoetchable glass. Furthermore, the glass hollow microneedle array can be used to form a negative mold for...
|
|
|
7128842 |
Polyimide as a mask in vapor hydrogen fluoride etching
A layer of polyimide or polysilicon is used as a mask in vapor hydrogen fluoride etching. Both non-photosensitive and photosensitive type polyimide may be used. A non-photosensitive polyimide mask...
|
|
|
7118683 |
Methods of etching silicon-oxide-containing compositions
The invention encompasses a method of enhancing selectivity of etching silicon dioxide relative to one or more organic substances. A material comprising one or more elements selected from Group...
|
|
|
7107668 |
Method of manufacturing a longitudinal microsolenoid
A photosensitive material is coated on an insulating material ( 13 ) stacked on a substrate ( 1 ) (FIG. 16 A), and exposed and developed using a mask having a light-shielding film capable of...
|
|
|
7105097 |
Substrate and method of forming substrate for fluid ejection device
A method of forming an opening through a substrate includes etching into the substrate from a first side so as to form a first portion of the opening, etching into the substrate from a second side...
|
|
|
7097777 |
Magnetic switching device
A method of forming a magnetic switching device is provided. The method includes depositing a bilayer hardmask, which may comprise a first mask layer of titanium nitride with a second mask layer of...
|