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7625822 |
Semiconductor device and method for manufacturing the same including two antireflective coating films
A method for manufacturing a semiconductor device deposits a plurality of bottom antireflective coating films to prevent a standing wave caused by a light source of a short wavelength in forming a...
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7622049 |
Passivation for cleaning a material
A contact is defined by an opening etched into borophosphosilicate glass (BPSG) down to a silicon substrate. In a contact cleaning process designed to remove native oxide at the bottom of the...
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7615482 |
Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength
Disclosed is a structure and method for forming a structure including a SiCOH layer having increased mechanical strength. The structure includes a substrate having a layer of dielectric or...
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7608196 |
Method of forming high aspect ratio apertures
A plasma etch process for etching a dielectric material employing two primary etchants at low flows and pressures, and a relatively low temperature environment within the etch chamber. The two...
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7608194 |
Photonic structures, devices, and methods
Photonic crystal structures are made by a method including steps of providing a substrate, depositing at least one planar layer to form a stack, each planar layer of the stack comprising two or...
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7601645 |
Methods for fabricating device features having small dimensions
Methods for fabricating devices having small feature sizes are provided. In an exemplary embodiment, a method comprises forming a patterned first mask layer overlying a subject material layer and...
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7591955 |
Method for forming an etched soft edge metal foil and the product thereof
A metal processing method includes etching to remove material from a thin metal part. A pattern of etch resistant material is used to prevent etching of the metal in desired locations. The etch...
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7585614 |
Sub-lithographic imaging techniques and processes
A method of patterning which provides images substantially smaller than that possible by lithographic techniques is provided. In the method of the invention, a substrate has a memory layer and a...
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7585424 |
Pattern reversal process for self aligned imprint lithography and device
This invention provides a pattern reversal process for self aligned imprint lithography (SAIL). The method includes providing a substrate and depositing at least one layer of material upon the...
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7585419 |
Substrate structure and the fabrication method thereof
A substrate structure and the fabrication method thereof are provided herein. The present invention utilizes a laminate as the support of the package process and then removes the laminate after the...
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7582218 |
Method for merging sensor field-mill and electronic lapping guide material placement for a partial mill process and sensor formed according to the method
A method for merging sensor field-mill and electronic lapping guide material placement for a partial mill process and sensor formed according to the method is disclosed. An electronic lapping guide...
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7581645 |
Method for manufacturing carbon nanotubes with desired length
A method for manufacturing carbon nanotubes with a desired length includes the steps of: providing an array of carbon nanotubes; placing a mask having at least an opening defined therein on the...
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7579284 |
Etching solution, method of forming a pattern using the same, method of manufacturing a multiple gate oxide layer using the same and method of manufacturing a flash memory device using the same
Example embodiments of the present invention relate to an etching solution, a method of forming a pattern using the same, a method of manufacturing a multiple gate oxide layer using the same and a...
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7575694 |
Method of selectively stripping a metallic coating
A process for chemically stripping a metallic coating on an external surface of a substrate without attacking an internal surface defined by an internal passage within the substrate. Processing...
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7575692 |
Method for etching chromium thin film and method for producing photomask
An object to be processed has a chromium-based thin film made of a material containing chromium. The thin film is etched using a resist pattern as a mask. The thin film is etched by the use of a...
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7569153 |
Fabrication method of liquid crystal display device
A method for forming a pattern includes forming a resist pattern on a printing roll, printing a multi-stepped resist pattern on an etching object layer formed on a substrate by using the printing...
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7565732 |
Method of manufacturing a write pole
A method of fabricating a magnetic write head, in accordance with one embodiment, includes forming a beveled write pole. A conformal spacer may be formed upon a portion of a flare length proximate...
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7563382 |
Mask and method of fabricating the same, and method of machining material
A method of fabricating a mask which can endure use for a long time and can be used for forming an isolated pattern with a high aspect ratio. The method includes the steps of: forming a soft...
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7563379 |
Dry etching method and photonic crystal device fabricated by use of the same
In a dry etching method in which clusters formed by agglomeration of atoms or molecules are ionized and accelerated as a cluster ion beam for irradiation of an object surface to etch away therefrom...
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7560040 |
Etching method and article etched molded by that method
A tuning-fork crystal wafer 1 A which has legs 11, 12 with grooves 11 c, 12 c is shaped by etching of a crystal substrate 2 . To improve processing precision of the depth of the grooves 11...
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7560039 |
Methods of deep reactive ion etching
A method of substantially simultaneously forming at least two fluid supply slots through a thickness of semiconductor substrate from a first surface to a second surface thereof. The method includes...
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7553430 |
Polishing slurries and methods for chemical mechanical polishing
Aqueous polishing slurries for chemical-mechanical polishing are effective for polishing copper at high polish rates. The aqueous slurries according to the present invention may include soluble...
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7550044 |
Hard mask structure for patterning of materials
Techniques for magnetic device fabrication are provided. In one aspect, a method of patterning at least one, e.g., nonvolatile, material comprises the following steps. A hard mask structure is...
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7541286 |
Method for manufacturing semiconductor device using KrF light source
A semiconductor device manufacturing method using a KrF light source is disclosed. Embodiments relate to a method for manufacturing a semiconductor device including forming an oxide film over a...
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7540970 |
Methods of fabricating a semiconductor device
Methods of fabricating a semiconductor device are provided. Methods of forming a finer pattern of a semiconductor device using a buffer layer for retarding, or preventing, bridge formation between...
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7540968 |
Micro movable device and method of making the same using wet etching
A micro movable device includes a base substrate, a fixed portion bonded to the base substrate, a movable portion having a fixed end connected to the fixed portion and extending along the base...
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7531293 |
Radiation sensitive self-assembled monolayers and uses thereof
The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group...
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7531100 |
Method of making a fuel cell component using an easily removed mask
A method of making a fuel cell component using a mask, which is removed after further processing to yield a surface with variable properties.
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7524431 |
Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of...
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7524428 |
Display device and method of manufacturing transparent substrate for display device
A display device comprises a substrate and a laminate structure formed on the substrate and comprising a plurality of layers including a display region. The laminate structure has a...
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7517808 |
Method for forming and removing a patterned silicone film
A method for reworking semiconductor materials includes: (i) applying a silicone composition to a surface of a substrate to form a film, (ii) exposing a portion of the film to radiation to produce...
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7517466 |
Method for manufacturing porous structure and method for forming pattern
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer...
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7517465 |
Ultra lightweight photovoltaic device and method for its manufacture
An ultra lightweight semiconductor device such as a photovoltaic device is fabricated on a non-etchable barrier layer which is disposed upon an etchable substrate. The device is contacted with an...
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7517464 |
Method for manufacturing an LCD device
A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another...
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7516545 |
Method of manufacturing printed circuit board having landless via hole
Disclosed is a method of manufacturing a printed circuit board having a landless via hole. Specifically, this invention provides a method of manufacturing a printed circuit board having a landless...
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7510978 |
Method for forming mask for using dry-etching and method for forming fine structure pattern
In the invention of this application, the resist pattern having a given pattern of opening concavity is formed on the component to be dry etched, the aqueous solution containing a water-soluble...
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7510976 |
Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity
A plasma etch process for successively different layers, including an anti-reflection coating (ARC), an amorphous carbon layer (ACL) and a dielectric layer, with successively different etch...
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7510763 |
Substrate with a self-cleaning coating
The invention relates to a transparent substrate based on glass or one or more polymers, or a ceramic or glass substrate, or a substrate made of architectural material of the type comprising a wall...
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7502605 |
Sub-millimeter wavelength camera
The invention relates to an imaging device to be used with millimeter and/or sub-millimeter radiation comprising at least a pair of substrates, at least one of which is patterned on at least one...
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7501071 |
Method of forming a patterned conductive structure
A method of producing a patterned mirror on a transparent conductive substrate comprises the steps of; coating a layer of conductive material onto a substrate, coating a layer of metal onto the...
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7497009 |
Main pole forming method of perpendicular magnetic recording head
A main pole forming method is provided. The main pole forming method includes etching an exposed side face of a main pole layer, and the plated foundation film, thereby defining a recording track...
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7491343 |
Line end shortening reduction during etch
A method for etching features in an etch layer is provided. A patterned photoresist mask is provided over the etch layer, the photoresist mask having at least one photoresist line having a pair of...
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7488429 |
Method of dry etching, method of manufacturing magnetic recording medium, and magnetic recording medium
The recording layer (to-be-etched layer), a main mask layer, and a sub mask layer are formed in this order over a substrate, and the sub mask layer is processed into a predetermined concavo-convex...
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7485891 |
Multi-bit phase change memory cell and multi-bit phase change memory including the same, method of forming a multi-bit phase change memory, and method of programming a multi-bit phase change memory
A multi-bit phase change memory cell including a stack of a plurality of conductive layers and a plurality of phase change material layers, each of the phase change material layers disposed between...
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7485238 |
Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same
In a state in which respective portions of a quartz wafer have been masked by a plurality of kinds of mask layers that have respectively different etching rates, the quartz wafer is subjected to an...
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7485236 |
Interference display cell and fabrication method thereof
An optical interference display unit with a first electrode, a second electrode and support structures located between the two electrodes is provided. The second electrode has at least a first...
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7481942 |
Monolithic ink-jet printhead and method of manufacturing the same
An ink-jet printhead and a method of manufacturing the same include a substrate on which a heater and a passivation layer protecting the heater are formed, a passage plate on which an ink chamber...
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7476329 |
Methods for contacting conducting layers overlying magnetoelectronic elements of MRAM devices
A method for contacting an electrically conductive layer overlying a magnetoelectronics element includes forming a memory element layer overlying a dielectric region. A first electrically...
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7475470 |
Method for manufacturing a magnetic head for perpendicular recording
On the trailing side of a main pole air bearing surface of a magnetic head for perpendicular recording, the central portion is formed closer to the leading side than the corners on the trailing...
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7472470 |
Method of manufacturing a perpendicular magnetic recording head
A main magnetic pore layer is formed on an insulating layer flattened into a high-flatness surface, and a yoke layer having a large film thickness is formed under the main magnetic pole layer...
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